Explanation: Thick film technology produces cheap and rugged components, whereas thin film technology provides greater precision in manufacturing but is quite expensive. The processing equipment for thick film circuit is relatively inexpensive and is easy to use. 4. How is the process of film deposition carried out in cathode sputtering?
A. Slower than evaporation method
B. Faster than evaporation method
C. Similar to same as evaporation method
D. All of the mentioned
Answer:A
Explanation: Thick film technology produces cheap and rugged components, whereas thin film technology provides greater precision in manufacturing but is quite expensive. The processing equipment for thick film circuit is relatively inexpensive and is easy to use. 4. How is the process of film deposition carried out in cathode sputtering?
A. Slower than evaporation method B. Faster than evaporation method C. Similar to same as evaporation method D. All of the mentioned
Explanation: Cathode sputtering and vacuum evaporation uses identical system. However, the process of film deposition in cathode sputtering is slower than evaporation method. Since depositing a micron-thick film takes minutes to hours, compared to seconds to minutes for evaporation. 5. How a uniform film with good crystal structure is attained in cathode sputtering process?