The correct sequence for the procedure adopted for making a pure elemental semiconductor consist of ___________
A. Preparation of ultrapure Si or Ge >> Doping >> Preparation of single crystals of Si or Ge
B. Doping >> Preparation of ultrapure Si or Ge >> Preparation of single crystals of Si or Ge
C. Preparation of ultrapure Si or Ge >> Preparation of single crystals of Si or Ge >> Doping
D. Preparation of single crystals of Si or Ge >> Preparation of ultrapure Si or Ge >> Doping
Answer:C
The correct sequence for the procedure adopted for making a pure elemental semiconductor consist of ___________
A. Preparation of ultrapure Si or Ge >> Doping >> Preparation of single crystals of Si or Ge B. Doping >> Preparation of ultrapure Si or Ge >> Preparation of single crystals of Si or Ge C. Preparation of ultrapure Si or Ge >> Preparation of single crystals of Si or Ge >> Doping D. Preparation of single crystals of Si or Ge >> Preparation of ultrapure Si or Ge >> Doping
Explanation: The correct sequence for the procedure adopted for making a pure