Explanation: The basic processes used are as same as BJT fabrication. Epitaxial layer (collector of BJT) is used as the n-channel of JFET. The p+ is formed in n-channel by process of diffusion and n+ region formed under drain and source provide good ohmic contact. 2. What are the types of MOSFET devices available?
A. P-type enhancement type MOSFET
B. N-type enhancement type MOSFET
C. Depletion type MOSFET
D. All of the mentioned
Answer:A
Explanation: The basic processes used are as same as BJT fabrication. Epitaxial layer (collector of BJT) is used as the n-channel of JFET. The p+ is formed in n-channel by process of diffusion and n+ region formed under drain and source provide good ohmic contact. 2. What are the types of MOSFET devices available?
A. P-type enhancement type MOSFET B. N-type enhancement type MOSFET C. Depletion type MOSFET D. All of the mentioned
Explanation: MOSFET are available as Enhancement type and depletion type MOSFET. These are further classified into n-type and p-type device. 3. Which insulating layer used in Fabrication of MOSFET?