Explanation: The mentioned steps are the sequence of steps involved in the fabrication of poly silicon gate MOSFET. 7. What is used to higher the speed of operation in MOSFET fabrication?
A. Ceramic gate
B. Silicon dioxide
C. Silicon nitride
D. Poly silicon gate
Answer:A
Explanation: The mentioned steps are the sequence of steps involved in the fabrication of poly silicon gate MOSFET. 7. What is used to higher the speed of operation in MOSFET fabrication?
A. Ceramic gate B. Silicon dioxide C. Silicon nitride D. Poly silicon gate
Explanation: In conventional metal gate, small overlap capacitance is present, which lowers the speed of operation. Due to self aligning property of poly silicon gate, it eliminates this capacitance. 8. Why MOSFET is preferred over BJT in IC components?