Explanation: The silicon rods are not directly placed in the reaction chamber instead they are placed on a rectangular graphite rod called boats and then it is heated to 1200oc. 4. Which of the following is used to obtain silicon crystal structure while fabricating Integrating Circuits?
A. Oxidation
B. Epitaxial growth
C. Photolithography
D. Silicon wafer preparations
Answer:A
Explanation: The silicon rods are not directly placed in the reaction chamber instead they are placed on a rectangular graphite rod called boats and then it is heated to 1200oc. 4. Which of the following is used to obtain silicon crystal structure while fabricating Integrating Circuits?
A. Oxidation B. Epitaxial growth C. Photolithography D. Silicon wafer preparations
Explanation: Epitaxial growth is arranging of atoms in single crystal fashion upon a single crystal substrate, so that the resulting layer is an extension of the substrate crystal structure. 5. Why oxidation process is required?