Explanation: In pinched resistor structure, one of the diode conducts in reverse direction and only a small reverse saturation current can flow through n-type material. By doing so, the effective cross-sectional area of the conduction path will be reduced and resistance between two contact lead increases. 4. Which of the following is not used as metallic film in the thin film resistor?
A. Nichrome (NiCr)
B. Tantalum (Ta)
C. Stannic oxide (SnO2)
D. Silicon dioxide (SiO2)
Answer:A
Explanation: In pinched resistor structure, one of the diode conducts in reverse direction and only a small reverse saturation current can flow through n-type material. By doing so, the effective cross-sectional area of the conduction path will be reduced and resistance between two contact lead increases. 4. Which of the following is not used as metallic film in the thin film resistor?
A. Nichrome (NiCr) B. Tantalum (Ta) C. Stannic oxide (SnO2) D. Silicon dioxide (SiO2)
Explanation: Silicon dioxide is the non-metallic layer on which the metallic thin films are deposited. 5. Pick out the incorrect statement