Which of the following is added as an impurity to p-type material in diffusion process?
A. Phosphorous pentaoxide (P2O5)
B. Phosphorous oxychloride (POcl3)
C. Boron oxide (B2O3)
D. None of the mentioned
Answer:A
Which of the following is added as an impurity to p-type material in diffusion process?
A. Phosphorous pentaoxide (P2O5) B. Phosphorous oxychloride (POcl3) C. Boron oxide (B2O3) D. None of the mentioned
Explanation: Boron is a p-type material, whereas Phosphorous is an n-type material. 10. In the fabrication of monolithic ICs, Boron chloride is added as an impurity in the diffusion process. Find the diffusion time, if the furnace is heated up to 1200oc.