Explanation:The depth of penetration of any particular type of ion increases with increasing accelerating voltage. 13. What is the advantage of using Ion implantation process?
A. Lateral spreading is more
B. Performed at high temperature
C. Beam current controlled from outside
D. Performed at low temperature
Answer:A
Explanation:The depth of penetration of any particular type of ion increases with increasing accelerating voltage. 13. What is the advantage of using Ion implantation process?
A. Lateral spreading is more B. Performed at high temperature C. Beam current controlled from outside D. Performed at low temperature
Explanation: In diffusion process, temperature has to be controlled over a large area inside the oven, whereas in ion implantation technique, accelerating potential and the beam current are electrically controlled from outside. Sanfoundry Global Education & Learning Series – Linear Integrated Circuit.