The process involved in photolithography is,
A. Making of a photographic mask only
B. Photo etching
C. Both photo etching and making of photographic mask
D. None of the mentioned
Answer:A
The process involved in photolithography is,
A. Making of a photographic mask only B. Photo etching C. Both photo etching and making of photographic mask D. None of the mentioned
Explanation: Photolithographic involves both processes in sequence. First photographic mask is used for artwork and reduction. Then Photo etching for removal of SiO2 from designed region. 2. How will be the initial artwork done for a normal IC?