Which of the following statement is not true?
A. X-ray and Electron beam lithography technique, produce device dimensions down to submicron range.
B. Ultraviolet lithography has limitation due to diffraction effects of wavelength.
C. The cost of X-ray or Electron beam is less compared to Ultraviolet photolithography.
D. The exposure time is less in Ultraviolet compared to X-ray or Electron beam lithography.
Answer:C
Which of the following statement is not true?
A. X-ray and Electron beam lithography technique, produce device dimensions down to submicron range. B. Ultraviolet lithography has limitation due to diffraction effects of wavelength. C. The cost of X-ray or Electron beam is less compared to Ultraviolet photolithography. D. The exposure time is less in Ultraviolet compared to X-ray or Electron beam lithography.
Explanation: The cost of X-ray or Electron beam is very high and thus, it is an expensive process. Therefore, it is used only when very small device dimension (<1 µm) are needed. [/expand]