The large scatter of Rsurfexch values measured on supposedly freshly deposited LSC thin films might therefore only reflect different surface states obtained unintentionally because of (i) preparation procedures, films grown on polycrystalline or single crystalline substrates, with or without GDC buffer layers, PLD conditions (temperature, p(O2), laser fluence, substrate-target distance, cooling procedure), sample cleaning by solvents, current collector preparation on top or below, microstructuring; (ii) sample storage conditions, humidity, gas composition (e.g., with CO2, S-containing gases), storage time; and (iii) setup for electrochemical measurements, heating procedure, purity of applied gas mixtures, possible contamination sources inside setup (including Si), temperature gradients during microelectrode measurements.