Further, ref (19) shows only a comparatively slow degradation with an Rsurfexch increase by a factor of 2 after annealing 16 h at 400 °C in 10–3 bar p(O2) and in the Supporting Information of ref (21) even absence of any degradation was found for a thin film annealed at 450 °C for 7 h in 4 × 10–5 bar p(O2).