In outside vapor deposition or vapor axial deposition, the glass is formed by "flame hydrolysis", a reaction in which silicon tetrachloride and germanium tetrachloride are oxidized by reaction with water (H2O) in an oxyhydrogen flame. In outside vapor deposition the glass is deposited onto a solid rod, which is removed before further processing. In vapor axial deposition, a short "seed rod" is used, and a porous preform, whose length is not limited by the size of the source rod, is built up on its end. The porous preform is consolidated into a transparent, solid preform by heating to about 1,800 K (1,500 °C, 2,800 °F).