In 1974 proposals for two-dimensional fabrication techniques were presented. These proposals included contact imaging to create a pattern in relief, photolithography, electron lithography, X-ray lithography, or ion bombardment, on an appropriate planar substrate. The shared technological goals of the metamaterial lens and the variety of lithography aim to optically resolve features having dimensions much smaller than that of the vacuum wavelength of the exposing light. In 1981 two different techniques of contact imaging of planar (flat) submicroscopic metal patterns with blue light (400 nm) were demonstrated. One demonstration resulted in an image resolution of 100 nm and the other a resolution of 50 to 70 nm.