As phase-shift masks are applied to printing smaller and smaller features, it becomes more and more important to model them accurately using rigorous simulation software, such as Panoramic Technology or Sigma-C. It becomes especially important as the mask topography starts to play an important role in scattering the light, and the light itself starts to propagate at larger angles. The performance of phase-shift masks can also be previewed with the use of aerial image microscopes. Defect inspection remains a critical aspect of phase-shift mask technology, as the set of printable mask defects has expanded to include those with phase effects in addition to conventional transmission effects.