According to the present invention, a semiconductor pattern may be formed with a soluble semiconductor material without a mask, using the SAM, so that {HEAD ~ the display substrate} having {TAIL ~ the switching element} may be manufactured with a four mask process 
According to the present invention , a semiconductor pattern may be formed with a soluble semiconductor material without a mask , using the SAM , so that { HEAD ~ the display substrate } having { TAIL ~ the switching element } may be manufactured with a four mask process
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH