patterning {TAIL ~ the layer} of dielectric material to expose at least one portion of {HEAD ~ the semiconductor substrate} overlying the channel region 
patterning { TAIL ~ the layer } of dielectric material to expose at least one portion of { HEAD ~ the semiconductor substrate } overlying the channel region
OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH