The process for forming {HEAD ~ a thin film} 9, further comprising selecting {TAIL ~ a modulation frequency} and a duty ratio for the intermittent generation of the high frequency discharge based on the time period necessary for a DC bias voltage to attain said maximum value 
The process for forming { HEAD ~ a thin film } 9 , further comprising selecting { TAIL ~ a modulation frequency } and a duty ratio for the intermittent generation of the high frequency discharge based on the time period necessary for a DC bias voltage to attain said maximum value
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH