{HEAD ~ The reactor tube} is evacuated to {TAIL ~ a pressure} of less than 500 millitorr and is heated to a temperature of not less than 350° C. and not greater than 500° C. A mixture of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer 
{ HEAD ~ The reactor tube } is evacuated to { TAIL ~ a pressure } of less than 500 millitorr and is heated to a temperature of not less than 350 ° C. and not greater than 500 ° C. A mixture of silane , phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer
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