It should be appreciated that the second annealing process has {HEAD ~ a process temperature} that is substantially larger than {TAIL ~ the crystalline temperature} of the high k dielectric layer 12; accordingly, the second annealing process can assist the transformation of the high k dielectric layer 12 
It should be appreciated that the second annealing process has { HEAD ~ a process temperature } that is substantially larger than { TAIL ~ the crystalline temperature } of the high k dielectric layer 12 ; accordingly , the second annealing process can assist the transformation of the high k dielectric layer 12
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH