In the processing space supplied with {TAIL ~ the solvent}, evaporation of {HEAD ~ the solvent} from the resist solution is suppressed 
In the processing space supplied with { TAIL ~ the solvent } , evaporation of { HEAD ~ the solvent } from the resist solution is suppressed
OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH