In a preferred method for depositing of {TAIL ~ these materials}, capacitive coupling forms a highly uniform, selectively energized stream of {HEAD ~ ions} from a dense, inductively ionized plasma 
In a preferred method for depositing of { TAIL ~ these materials } , capacitive coupling forms a highly uniform , selectively energized stream of { HEAD ~ ions } from a dense , inductively ionized plasma
OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH