FIG 11 shows a sectional structure of a reflection mask, which is another example of an optical element of the present invention, and {HEAD ~ the relationship} between {TAIL ~ the position} of a pattern 221 formed from a multilayer, which is a region having a high reflectivity, and the reflected radiation intensity of incident radiation when vacuum ultraviolet radiation or X radiation 411 is introduced at an incidence angle θ to the reflection mask 
FIG 11 shows a sectional structure of a reflection mask , which is another example of an optical element of the present invention , and { HEAD ~ the relationship } between { TAIL ~ the position } of a pattern 221 formed from a multilayer , which is a region having a high reflectivity , and the reflected radiation intensity of incident radiation when vacuum ultraviolet radiation or X radiation 411 is introduced at an incidence angle θ to the reflection mask
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