The positive resist composition 1, wherein in the compound , R1 and R3 are selected from {HEAD ~ the group} consisting of methyl groups, ethyl groups, {TAIL ~ n propyl groups}, isopropyl groups, and cyclohexyl groups 
The positive resist composition 1 , wherein in the compound , R1 and R3 are selected from { HEAD ~ the group } consisting of methyl groups , ethyl groups , { TAIL ~ n propyl groups } , isopropyl groups , and cyclohexyl groups
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH