An objective of the present invention is to provide a method for processing a high k dielectric layer to improve {TAIL ~ the quality} of {HEAD ~ the high k dielectric layer} 
An objective of the present invention is to provide a method for processing a high k dielectric layer to improve { TAIL ~ the quality } of { HEAD ~ the high k dielectric layer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD