Furthermore, {HEAD ~ application} of the method and apparatus, in which resist modification and etching are carried out by turns, provides an improvement in apparatus cost and throughput as well as {TAIL ~ a contribution} to the enhancement of productivity compared to the case where the resist modification is performed in a standalone apparatus 
Furthermore , { HEAD ~ application } of the method and apparatus , in which resist modification and etching are carried out by turns , provides an improvement in apparatus cost and throughput as well as { TAIL ~ a contribution } to the enhancement of productivity compared to the case where the resist modification is performed in a standalone apparatus
OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH