The method includes forming a first interconnect structure having a first interfacial structure and forming {HEAD ~ a second interconnect structure} adjacent to {TAIL ~ the first structure} 
The method includes forming a first interconnect structure having a first interfacial structure and forming { HEAD ~ a second interconnect structure } adjacent to { TAIL ~ the first structure }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL