Embodiments of the present invention provide a process for forming {HEAD ~ porous silicon oxide based films} using {TAIL ~ a sol gel approach} utilizing a precursor solution formulation, which includes a purified surfactant such as a non ionic surfactant, and an additive among other components 
Embodiments of the present invention provide a process for forming { HEAD ~ porous silicon oxide based films } using { TAIL ~ a sol gel approach } utilizing a precursor solution formulation , which includes a purified surfactant such as a non ionic surfactant , and an additive among other components
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