This invention relates to vacuum based vacuum based arcs and plasma ion implantation, and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing films of carbon and {HEAD ~ carbon nitrides} with {TAIL ~ variable / ratios} 
This invention relates to vacuum based vacuum based arcs and plasma ion implantation , and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing films of carbon and { HEAD ~ carbon nitrides } with { TAIL ~ variable / ratios }
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