It is possible to provide an apparatus capable of reliably preventing {HEAD ~ mist} of a processing solution or the processing solution from reaching {TAIL ~ the upper surface} of the substrate when rotating the substrate and supplying the processing solution to the lower surface for processing the substrate 
It is possible to provide an apparatus capable of reliably preventing { HEAD ~ mist } of a processing solution or the processing solution from reaching { TAIL ~ the upper surface } of the substrate when rotating the substrate and supplying the processing solution to the lower surface for processing the substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH