A substrate processing apparatus 3, wherein {HEAD ~ said gas heating tube} extends from {TAIL ~ said first gas introducing section side} toward said gas exhausting section side, is bent back before an end of said substrate at said gas exhausting section side, and extends from said gas exhausting section side toward said first gas introducing section side 
A substrate processing apparatus 3 , wherein { HEAD ~ said gas heating tube } extends from { TAIL ~ said first gas introducing section side } toward said gas exhausting section side , is bent back before an end of said substrate at said gas exhausting section side , and extends from said gas exhausting section side toward said first gas introducing section side
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH