An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein {HEAD ~ the unit} measures the concentrations of metals, or fine particles, or {TAIL ~ the amount} of carbon 
An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein { HEAD ~ the unit } measures the concentrations of metals , or fine particles , or { TAIL ~ the amount } of carbon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH