{TAIL ~ An anisotropic etch} which selectively removes silicon is used to remove {HEAD ~ the silicon} from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238 
{ TAIL ~ An anisotropic etch } which selectively removes silicon is used to remove { HEAD ~ the silicon } from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH