Accordingly, an object of the present invention is to provide a process for forming a thin film of amorphous silicon of a uniform thickness over {HEAD ~ the entire surface} of {TAIL ~ a relatively large insulating substrate} 
Accordingly , an object of the present invention is to provide a process for forming a thin film of amorphous silicon of a uniform thickness over { HEAD ~ the entire surface } of { TAIL ~ a relatively large insulating substrate }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL