The sixth aspect of the present invention provides {HEAD ~ the plasma processing apparatus}, wherein the ceramic spraying utilizes a ceramic including at least one element selected from a group consisting of Al, Si and Y, such as Al2O3, {TAIL ~ SiC} and Si3N4, and after forming the ceramic sprayed film, a sealing treatment using polymer is performed 
The sixth aspect of the present invention provides { HEAD ~ the plasma processing apparatus } , wherein the ceramic spraying utilizes a ceramic including at least one element selected from a group consisting of Al , Si and Y , such as Al2O3 , { TAIL ~ SiC } and Si3N4 , and after forming the ceramic sprayed film , a sealing treatment using polymer is performed
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