performing a first polishing step having {HEAD ~ a first removal rate} on the oxide layer with a non FA pad until a thickness of {TAIL ~ a remaining portion} of the oxide layer reaches a prescribed thickness that is at least 10 nm; and 
performing a first polishing step having { HEAD ~ a first removal rate } on the oxide layer with a non FA pad until a thickness of { TAIL ~ a remaining portion } of the oxide layer reaches a prescribed thickness that is at least 10 nm ; and
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH