{TAIL ~ This CMP slurry} includes suspended solids as well as {HEAD ~ a chemical solution component} which attacks the material being polished 
{ TAIL ~ This CMP slurry } includes suspended solids as well as { HEAD ~ a chemical solution component } which attacks the material being polished
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH