The flux enhancement layer may then be selectively removed substantially surrounding the upper pole by {HEAD ~ means} of {TAIL ~ a relatively brief ion milling process} in which only on the order of 1.0 kÅ of the layer need be removed and during which only an insignificant amount of the material removed might be re deposited on the sides of the upper pole 
The flux enhancement layer may then be selectively removed substantially surrounding the upper pole by { HEAD ~ means } of { TAIL ~ a relatively brief ion milling process } in which only on the order of 1.0 kÅ of the layer need be removed and during which only an insignificant amount of the material removed might be re deposited on the sides of the upper pole
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH