The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by {TAIL ~ reactive gas} and {HEAD ~ heavy metal contamination} caused by plasma damage of components constituting the high frequency electrode and gas supply unit 
The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by { TAIL ~ reactive gas } and { HEAD ~ heavy metal contamination } caused by plasma damage of components constituting the high frequency electrode and gas supply unit
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH