The method 4, wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber, the type of the deposited film in the chemical vapor deposition chamber and {HEAD ~ the conditions} for {TAIL ~ the post process} 
The method 4 , wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber , the type of the deposited film in the chemical vapor deposition chamber and { HEAD ~ the conditions } for { TAIL ~ the post process }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL