Here, {HEAD ~ the etch stopping layer} 12 is formed of {TAIL ~ a material} having an excellent etching selectivity to the mold silicon oxide layer 14 
Here , { HEAD ~ the etch stopping layer } 12 is formed of { TAIL ~ a material } having an excellent etching selectivity to the mold silicon oxide layer 14
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH