A method for forming a dual oxide layer on a silicon substrate provides {TAIL ~ that layer} having varying thicknesses by using a damage layer formed on {HEAD ~ the silicon substrate}, or a silicon nitride layer deposited on the silicon substrate 
A method for forming a dual oxide layer on a silicon substrate provides { TAIL ~ that layer } having varying thicknesses by using a damage layer formed on { HEAD ~ the silicon substrate } , or a silicon nitride layer deposited on the silicon substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH