The method 4, wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of {TAIL ~ the accumulated deposition thickness} in the chemical vapor deposition chamber, the type of {HEAD ~ the deposited film} in the chemical vapor deposition chamber and the conditions for the post process 
The method 4 , wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of { TAIL ~ the accumulated deposition thickness } in the chemical vapor deposition chamber , the type of { HEAD ~ the deposited film } in the chemical vapor deposition chamber and the conditions for the post process
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH