An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so {HEAD ~ that side face portions} of {TAIL ~ predetermined patterns} which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other 
An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so { HEAD ~ that side face portions } of { TAIL ~ predetermined patterns } which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X radiation , or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and the direction of side faces of the patterns may extend in parallel to each other
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