For example, in the manufacture of semiconductor devices it is common to deposit a photoresist material onto {HEAD ~ a substrate} to form {TAIL ~ a mask} for the etching operation and to subsequently remove the photoresist material from the substrate 
For example , in the manufacture of semiconductor devices it is common to deposit a photoresist material onto { HEAD ~ a substrate } to form { TAIL ~ a mask } for the etching operation and to subsequently remove the photoresist material from the substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH