FIG 11 shows a sectional structure of a reflection mask, which is another example of an optical element of {HEAD ~ the present invention}, and the relationship between the position of a pattern 221 formed from a multilayer, which is a region having a high reflectivity, and {TAIL ~ the reflected radiation intensity} of incident radiation when vacuum ultraviolet radiation or X radiation 411 is introduced at an incidence angle θ to the reflection mask 
FIG 11 shows a sectional structure of a reflection mask , which is another example of an optical element of { HEAD ~ the present invention } , and the relationship between the position of a pattern 221 formed from a multilayer , which is a region having a high reflectivity , and { TAIL ~ the reflected radiation intensity } of incident radiation when vacuum ultraviolet radiation or X radiation 411 is introduced at an incidence angle θ to the reflection mask
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH