{HEAD ~ A first layer} of photoresist material is spun onto {TAIL ~ a substrate surface} and is exposed in a desired pattern corresponding to the shape of a final structure, at a corresponding cross sectional level in the structure 
{ HEAD ~ A first layer } of photoresist material is spun onto { TAIL ~ a substrate surface } and is exposed in a desired pattern corresponding to the shape of a final structure , at a corresponding cross sectional level in the structure
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH