{HEAD ~ A collar layer} 12, preferably including {TAIL ~ a silicon oxide} deposited by a CVD method, is, subsequently, applied to the side walls of the trench 5 
{ HEAD ~ A collar layer } 12 , preferably including { TAIL ~ a silicon oxide } deposited by a CVD method , is , subsequently , applied to the side walls of the trench 5
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH