The removal is accomplished by patterning the first conductor 106 by depositing a layer of photoresist 112 and, by conventional photolithographic techniques, forming {HEAD ~ a resist pattern} on {TAIL ~ the surface} of the first conductor 
The removal is accomplished by patterning the first conductor 106 by depositing a layer of photoresist 112 and , by conventional photolithographic techniques , forming { HEAD ~ a resist pattern } on { TAIL ~ the surface } of the first conductor
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH