patterning {HEAD ~ the layer} of {TAIL ~ dielectric material} to expose at least one portion of the semiconductor substrate overlying the channel region 
patterning { HEAD ~ the layer } of { TAIL ~ dielectric material } to expose at least one portion of the semiconductor substrate overlying the channel region
OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH