The apparatus comprises {HEAD ~ a first vacuum processing chamber} adapted to plasma clean a workpiece with {TAIL ~ a plasma} having a high ion density, low ion energy and low plasma potential 
The apparatus comprises { HEAD ~ a first vacuum processing chamber } adapted to plasma clean a workpiece with { TAIL ~ a plasma } having a high ion density , low ion energy and low plasma potential
OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH