The present invention relates to {HEAD ~ a cushion} for {TAIL ~ a polishing pad} and a polishing pad using the cushion, and the polishing pad is useful for polishing a material to be polished, for example, a semiconductor wafer and the like, at good precision and high polishing efficiency 
The present invention relates to { HEAD ~ a cushion } for { TAIL ~ a polishing pad } and a polishing pad using the cushion , and the polishing pad is useful for polishing a material to be polished , for example , a semiconductor wafer and the like , at good precision and high polishing efficiency
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