In accordance with the invention, a method of forming a compound film includes {HEAD ~ the steps} of preparing a source material, depositing the source material on a base to form a precursor film, and heating {TAIL ~ the precursor film} in a suitable atmosphere to form a film 
In accordance with the invention , a method of forming a compound film includes { HEAD ~ the steps } of preparing a source material , depositing the source material on a base to form a precursor film , and heating { TAIL ~ the precursor film } in a suitable atmosphere to form a film
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH