The invention provides a cushion for a polishing pad, wherein, when a dynamic compression viscoelasticity measurement is performed under {HEAD ~ conditions} of 23° C., a static load of 27.6 kPa, a frequency of 11 Hz and an amplitude of 1 μm, a phase difference between {TAIL ~ dynamic stress} and deformation is 4° or less, and a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress is 0.5 μm/kPa or more 
The invention provides a cushion for a polishing pad , wherein , when a dynamic compression viscoelasticity measurement is performed under { HEAD ~ conditions } of 23 ° C. , a static load of 27.6 kPa , a frequency of 11 Hz and an amplitude of 1 μm , a phase difference between { TAIL ~ dynamic stress } and deformation is 4 ° or less , and a ratio of the maximum value of the deformation amount to the maximum value of the dynamic stress is 0.5 μm / kPa or more
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH