The method can create pseudo ternary semiconductor alloys as {TAIL ~ part} of {HEAD ~ a CTSL} by employing at least two binary compound semiconductor alloys in the deposition process 
The method can create pseudo ternary semiconductor alloys as { TAIL ~ part } of { HEAD ~ a CTSL } by employing at least two binary compound semiconductor alloys in the deposition process
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH