{TAIL ~ The monolithic optical coupler} 1, wherein said lithographically definable material is {HEAD ~ a positive photoresist material}, wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of each of said layers form said optical device 
{ TAIL ~ The monolithic optical coupler } 1 , wherein said lithographically definable material is { HEAD ~ a positive photoresist material } , wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of each of said layers form said optical device
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