According to the present invention, a semiconductor pattern may be formed with a soluble semiconductor material without a mask, using the SAM, so that {HEAD ~ the display substrate} having the switching element may be manufactured with {TAIL ~ a four mask process} 
According to the present invention , a semiconductor pattern may be formed with a soluble semiconductor material without a mask , using the SAM , so that { HEAD ~ the display substrate } having the switching element may be manufactured with { TAIL ~ a four mask process }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL