The plasma apparatus of the present invention may be applicable for which the electrode is located close to a portion where the electric field intensity generated by the electromagnetic waves becomes strong in {HEAD ~ the antenna} when the electromagnetic waves are fed to {TAIL ~ the antenna} 
The plasma apparatus of the present invention may be applicable for which the electrode is located close to a portion where the electric field intensity generated by the electromagnetic waves becomes strong in { HEAD ~ the antenna } when the electromagnetic waves are fed to { TAIL ~ the antenna }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL