One method of {HEAD ~ fabrication} of {TAIL ~ the source} and drain regions is to form an isolating isolation region around active areas in which a transistor is to be formed in a semiconductor body 
One method of { HEAD ~ fabrication } of { TAIL ~ the source } and drain regions is to form an isolating isolation region around active areas in which a transistor is to be formed in a semiconductor body
OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH