The flux enhancement layer may then be selectively removed substantially surrounding the upper pole, using {HEAD ~ the upper pole} as a mask, by means of a relatively brief ion milling process in which only on the order of 1.0 kÅ of the layer need be removed and during which {TAIL ~ a relatively insignificant amount} of the material removed might be re deposited on the sides of the upper pole 
The flux enhancement layer may then be selectively removed substantially surrounding the upper pole , using { HEAD ~ the upper pole } as a mask , by means of a relatively brief ion milling process in which only on the order of 1.0 kÅ of the layer need be removed and during which { TAIL ~ a relatively insignificant amount } of the material removed might be re deposited on the sides of the upper pole
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH