{HEAD ~ The method} 12, wherein {TAIL ~ the boron doped region} is formed by solid state diffusion and etching 
{ HEAD ~ The method } 12 , wherein { TAIL ~ the boron doped region } is formed by solid state diffusion and etching
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH