Provided are {TAIL ~ methods} for manufacturing {HEAD ~ silicon rich oxide layers} useful in the fabrication of semiconductor devices, for example, non volatile memory devices, and methods for fabricating semiconductor devices incorporating such SRO layers 
Provided are { TAIL ~ methods } for manufacturing { HEAD ~ silicon rich oxide layers } useful in the fabrication of semiconductor devices , for example , non volatile memory devices , and methods for fabricating semiconductor devices incorporating such SRO layers
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