using {HEAD ~ a wet etch process} for etching {TAIL ~ TiN}, etching said first layer; and 
using { HEAD ~ a wet etch process } for etching { TAIL ~ TiN } , etching said first layer ; and
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH