{TAIL ~ A method} for forming a localized halo structure in a semiconductor substrate of {HEAD ~ a semiconductor device}, comprising: 
{ TAIL ~ A method } for forming a localized halo structure in a semiconductor substrate of { HEAD ~ a semiconductor device } , comprising :
TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH