In a preferred method for depositing of these materials, capacitive coupling forms {HEAD ~ a highly uniform, selectively energized stream} of ions from {TAIL ~ a dense, inductively ionized plasma} 
In a preferred method for depositing of these materials , capacitive coupling forms { HEAD ~ a highly uniform , selectively energized stream } of ions from { TAIL ~ a dense , inductively ionized plasma }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL