The method does so by employing bistertiarybutylaminesilane as a silicon source to react with {HEAD ~ a reducing agent} to form {TAIL ~ a dielectric film}, which includes silicon, on a substrate 
The method does so by employing bistertiarybutylaminesilane as a silicon source to react with { HEAD ~ a reducing agent } to form { TAIL ~ a dielectric film } , which includes silicon , on a substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH