The present invention is aimed at overcoming the aforementioned problems of the prior art, and it provides an aqueous dispersion for {TAIL ~ CMP} that has {HEAD ~ an excellent balance} between chemical etching and mechanical polishing ability 
The present invention is aimed at overcoming the aforementioned problems of the prior art , and it provides an aqueous dispersion for { TAIL ~ CMP } that has { HEAD ~ an excellent balance } between chemical etching and mechanical polishing ability
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH