{TAIL ~ The invention} relates generally to processing a surface on a substrate, e.g., depositing a coating on or etching by using a carbon containing {HEAD ~ ion bean} using a gridded ion source, particularly an RF or microwave plasma source 
{ TAIL ~ The invention } relates generally to processing a surface on a substrate , e.g. , depositing a coating on or etching by using a carbon containing { HEAD ~ ion bean } using a gridded ion source , particularly an RF or microwave plasma source
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