The invention is applied in {HEAD ~ exposure machines} for {TAIL ~ semiconductor lithography} for spatially stable generation of radiation 
The invention is applied in { HEAD ~ exposure machines } for { TAIL ~ semiconductor lithography } for spatially stable generation of radiation
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH