Referring to FIGS 5 and 6A, {HEAD ~ an etch stopping layer} 12 and a mold silicon oxide layer 14 are sequentially deposited on {TAIL ~ a substrate} 10 in step S51 
Referring to FIGS 5 and 6A , { HEAD ~ an etch stopping layer } 12 and a mold silicon oxide layer 14 are sequentially deposited on { TAIL ~ a substrate } 10 in step S51
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH