The monolithic optical coupler 1, wherein said lithographically definable material is a positive photoresist material, wherein said {HEAD ~ exposed pattern} in each of said first and additional layers is removed by {TAIL ~ development} and unexposed portions of each of said layers form said optical device 
is removed by
The monolithic optical coupler 1 , wherein said lithographically definable material is a positive photoresist material , wherein said { HEAD ~ exposed pattern } in each of said first and additional layers is removed by { TAIL ~ development } and unexposed portions of each of said layers form said optical device
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