The method for manufacturing a thermistor 1, wherein {HEAD ~ a thickness} of the metal base material after firing is {TAIL ~ 10 to 80 μm}, and a thickness of the thermistor film layer after firing is 1 to 10 μm 
after firing is
The method for manufacturing a thermistor 1 , wherein { HEAD ~ a thickness } of the metal base material after firing is { TAIL ~ 10 to 80 μm } , and a thickness of the thermistor film layer after firing is 1 to 10 μm
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH