At this time, a decreasing step is performed with a step for removing {HEAD ~ an impurity concentrating film} on the surface of a silicon wafer, such as {TAIL ~ an oxide film}, depending on the surface state of the silicon water 
such as
At this time , a decreasing step is performed with a step for removing { HEAD ~ an impurity concentrating film } on the surface of a silicon wafer , such as { TAIL ~ an oxide film } , depending on the surface state of the silicon water
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH