An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein the unit measures {HEAD ~ the concentrations} of metals, or fine particles, or the amount of {TAIL ~ carbon} 
An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein the unit measures { HEAD ~ the concentrations } of metals , or fine particles , or the amount of { TAIL ~ carbon }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL