In the Strontium Tantalum Oxide films deposited by using plasma and the atomic layer deposition, its leakage current is very low, and its dielectric constant has {HEAD ~ a range} of 30 to 100 depending on {TAIL ~ the there heating conditions} 
depending on
In the Strontium Tantalum Oxide films deposited by using plasma and the atomic layer deposition , its leakage current is very low , and its dielectric constant has { HEAD ~ a range } of 30 to 100 depending on { TAIL ~ the there heating conditions }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL