A substrate processing apparatus 3, wherein said gas heating tube extends from said first gas introducing section side toward said gas exhausting section side, is bent back before {HEAD ~ an end} of said substrate at said gas exhausting section side, and extends from said gas exhausting section side toward {TAIL ~ said first gas introducing section side} 
extends toward
A substrate processing apparatus 3 , wherein said gas heating tube extends from said first gas introducing section side toward said gas exhausting section side , is bent back before { HEAD ~ an end } of said substrate at said gas exhausting section side , and extends from said gas exhausting section side toward { TAIL ~ said first gas introducing section side }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL