The method includes providing a substrate prepared with a cell area and forming {HEAD ~ first and second gates} of {TAIL ~ first and second transistors} in the cell area 
of
The method includes providing a substrate prepared with a cell area and forming { HEAD ~ first and second gates } of { TAIL ~ first and second transistors } in the cell area
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH