The substrate processing system 17 wherein {HEAD ~ the dielectric layer} is {TAIL ~ a silicon nitride or silicon oxynitride layer} 
is
The substrate processing system 17 wherein { HEAD ~ the dielectric layer } is { TAIL ~ a silicon nitride or silicon oxynitride layer }
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL