Consequently, maintenance may be required for the chamber {HEAD ~ 212A} after processing {TAIL ~ 6000 substrates} in the tool 200, i.e., 3000 substrates in the chamber 212A and 3000 substrates in the chamber 212B 
after processing
Consequently , maintenance may be required for the chamber { HEAD ~ 212A } after processing { TAIL ~ 6000 substrates } in the tool 200 , i.e. , 3000 substrates in the chamber 212A and 3000 substrates in the chamber 212B
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH