{TAIL ~ Photopolymerization} of the low conductivity polymer films of the present invention is useful in the formation of polymer resist/masks for microcircuit photolithography where high resolution patterned lines can be achieved by argon ion laser or {HEAD ~ electron beam exposure} of the microcircuit patterns 
{ TAIL ~ Photopolymerization } of the low conductivity polymer films of the present invention is useful in the formation of polymer resist / masks for microcircuit photolithography where high resolution patterned lines can be achieved by argon ion laser or { HEAD ~ electron beam exposure } of the microcircuit patterns
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