This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern, defined by {TAIL ~ a mask} or reticle, onto a suitable substrate such as {HEAD ~ a semiconductor wafer} 
This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern , defined by { TAIL ~ a mask } or reticle , onto a suitable substrate such as { HEAD ~ a semiconductor wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD