An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein the unit measures {HEAD ~ the concentrations} of metals, or {TAIL ~ fine particles}, or the amount of carbon 
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An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein the unit measures { HEAD ~ the concentrations } of metals , or { TAIL ~ fine particles } , or the amount of carbon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH