The layer is not developed after exposure; instead, {HEAD ~ a second layer} of {TAIL ~ photoresist material} is deposited and is also exposed in a desired pattern 
of
The layer is not developed after exposure ; instead , { HEAD ~ a second layer } of { TAIL ~ photoresist material } is deposited and is also exposed in a desired pattern
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH