Further, the method includes depositing a second silicon nitride layer over the oxide material that is applied by the deposition component and the edge of the first silicon nitride layer sputtered by {HEAD ~ the sputtering component} to establish {TAIL ~ a moisture and mobile ion repelling barrier} between the second and first silicon nitride layers 
to establish
Further , the method includes depositing a second silicon nitride layer over the oxide material that is applied by the deposition component and the edge of the first silicon nitride layer sputtered by { HEAD ~ the sputtering component } to establish { TAIL ~ a moisture and mobile ion repelling barrier } between the second and first silicon nitride layers
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