{TAIL ~ The FIG 1 embodiment} includes a liquid jet type X ray generating device 1 located at {HEAD ~ the most upstream portion} of the depicted optical system of the exposure apparatus 
{ TAIL ~ The FIG 1 embodiment } includes a liquid jet type X ray generating device 1 located at { HEAD ~ the most upstream portion } of the depicted optical system of the exposure apparatus
TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH