The semiconductor wafer is rotated by {HEAD ~ the spin chuck} to spread the resist solution over {TAIL ~ the entire surface} of the semiconductor wafer W 
The semiconductor wafer is rotated by { HEAD ~ the spin chuck } to spread the resist solution over { TAIL ~ the entire surface } of the semiconductor wafer W
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH