The invention relates generally to processing a surface on a substrate, e.g., depositing a coating on or etching by using a carbon containing {HEAD ~ ion bean} using a gridded ion source, {TAIL ~ particularly an RF or microwave plasma source} 
using
The invention relates generally to processing a surface on a substrate , e.g. , depositing a coating on or etching by using a carbon containing { HEAD ~ ion bean } using a gridded ion source , { TAIL ~ particularly an RF or microwave plasma source }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL