Accordingly, {HEAD ~ an object} of the present invention is to provide a process for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of {TAIL ~ a relatively large insulating substrate} 
Accordingly , { HEAD ~ an object } of the present invention is to provide a process for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of { TAIL ~ a relatively large insulating substrate }
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL