A method 4, characterized in that the gas required for particle displacement is identical to {HEAD ~ the gas} used as {TAIL ~ process gas} in the two coating steps 
used as
A method 4 , characterized in that the gas required for particle displacement is identical to { HEAD ~ the gas } used as { TAIL ~ process gas } in the two coating steps
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH