selectively etching a part of {HEAD ~ the second conductive layer} to form a portion of the gate electrode consisting of {TAIL ~ the first conductive layer} 
selectively etching a part of { HEAD ~ the second conductive layer } to form a portion of the gate electrode consisting of { TAIL ~ the first conductive layer }
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL