The device further includes, out of the detection zone, {TAIL ~ additional thin localized elements} of {HEAD ~ high magnetic permeability material} having a thickness much lower than that of the patterns, obtainable by photolithography and located at the same level as the thin detection elements 
The device further includes , out of the detection zone , { TAIL ~ additional thin localized elements } of { HEAD ~ high magnetic permeability material } having a thickness much lower than that of the patterns , obtainable by photolithography and located at the same level as the thin detection elements
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