An anisotropic etch which selectively removes silicon is used to remove the silicon from {HEAD ~ regions} adjacent to the polysilicon gates 320 a and {TAIL ~ 320 b} to from trenches 238 
adjacent to
An anisotropic etch which selectively removes silicon is used to remove the silicon from { HEAD ~ regions } adjacent to the polysilicon gates 320 a and { TAIL ~ 320 b } to from trenches 238
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL REL OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH