{HEAD ~ A collar layer} 12, preferably including a silicon oxide deposited by a CVD method, is, subsequently, applied to {TAIL ~ the side walls} of the trench 5 
is applied to
{ HEAD ~ A collar layer } 12 , preferably including a silicon oxide deposited by a CVD method , is , subsequently , applied to { TAIL ~ the side walls } of the trench 5
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH