Methods are discussed for forming a localized halo structure and a retrograde profile in {HEAD ~ a substrate} of {TAIL ~ a semiconductor device} 
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Methods are discussed for forming a localized halo structure and a retrograde profile in { HEAD ~ a substrate } of { TAIL ~ a semiconductor device }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL