Furthermore, application of the method and apparatus, in which resist modification and etching are carried out by turns, provides an improvement in {HEAD ~ apparatus cost} and throughput as well as a contribution to the enhancement of {TAIL ~ productivity} compared to the case where the resist modification is performed in a standalone apparatus 
Furthermore , application of the method and apparatus , in which resist modification and etching are carried out by turns , provides an improvement in { HEAD ~ apparatus cost } and throughput as well as a contribution to the enhancement of { TAIL ~ productivity } compared to the case where the resist modification is performed in a standalone apparatus
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH