An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein {HEAD ~ the unit} measures {TAIL ~ the concentrations} of metals, or fine particles, or the amount of carbon 
measures
An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein { HEAD ~ the unit } measures { TAIL ~ the concentrations } of metals , or fine particles , or the amount of carbon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH