The apparatus comprises a first vacuum processing chamber adapted to plasma clean a workpiece with a plasma having a high ion density, {HEAD ~ low ion energy} and {TAIL ~ low plasma potential} 
The apparatus comprises a first vacuum processing chamber adapted to plasma clean a workpiece with a plasma having a high ion density , { HEAD ~ low ion energy } and { TAIL ~ low plasma potential }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL