The method 4, wherein {HEAD ~ the dry cleaning timing} is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber, {TAIL ~ the type} of the deposited film in the chemical vapor deposition chamber and the conditions for the post process 
The method 4 , wherein { HEAD ~ the dry cleaning timing } is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber , { TAIL ~ the type } of the deposited film in the chemical vapor deposition chamber and the conditions for the post process
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH