An apparatus for {HEAD ~ surface treatment} of semiconductor substrate with {TAIL ~ chemical solution} 3, wherein the unit measures the concentrations of metals, or fine particles, or the amount of carbon 
with
An apparatus for { HEAD ~ surface treatment } of semiconductor substrate with { TAIL ~ chemical solution } 3 , wherein the unit measures the concentrations of metals , or fine particles , or the amount of carbon
OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH