selectively etching {HEAD ~ a part} of {TAIL ~ the second conductive layer} to form a portion of the gate electrode consisting of the first conductive layer 
of
selectively etching { HEAD ~ a part } of { TAIL ~ the second conductive layer } to form a portion of the gate electrode consisting of the first conductive layer
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH