{HEAD ~ An anisotropic etch} which selectively removes {TAIL ~ silicon} is used to remove the silicon from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238 
selectively removes
{ HEAD ~ An anisotropic etch } which selectively removes { TAIL ~ silicon } is used to remove the silicon from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH