The method of forming a dual oxide layer 1, wherein {HEAD ~ said removing} of {TAIL ~ one portion} of the nitride layer comprises depositing a photoresist on the nitride layer, and exposing the photoresist to light and developing the photoresist 
of
The method of forming a dual oxide layer 1 , wherein { HEAD ~ said removing } of { TAIL ~ one portion } of the nitride layer comprises depositing a photoresist on the nitride layer , and exposing the photoresist to light and developing the photoresist
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