According to the present invention, resist damage, which typically presents a problem in {HEAD ~ pattern formation} using {TAIL ~ a resist} of ArF or later lithography generation that is less resistant to etching, can be efficiently prevented, and pitting and striations due to resist damage can be improved 
using
According to the present invention , resist damage , which typically presents a problem in { HEAD ~ pattern formation } using { TAIL ~ a resist } of ArF or later lithography generation that is less resistant to etching , can be efficiently prevented , and pitting and striations due to resist damage can be improved
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