Therefore, a space pattern of resist formed with the thickened resist pattern has {HEAD ~ a fine structure}, exceeding {TAIL ~ the exposure limit} of light sources of an available exposure device 
exceeding
Therefore , a space pattern of resist formed with the thickened resist pattern has { HEAD ~ a fine structure } , exceeding { TAIL ~ the exposure limit } of light sources of an available exposure device
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH