Ammonia and at least one compound of the formula {HEAD ~ R3Al}, where “R” is an alkyl group or a mixture of alkyl groups, is fed to the reactor while the substrate is at a temperature of about 500° C. or less, and at {TAIL ~ a reactor pressure} from about 100 mTorr to about 725 Torr, effective to deposit a layer comprising aluminum nitride over the substrate at such temperature and reactor pressure 
Ammonia and at least one compound of the formula { HEAD ~ R3Al } , where “ R ” is an alkyl group or a mixture of alkyl groups , is fed to the reactor while the substrate is at a temperature of about 500 ° C. or less , and at { TAIL ~ a reactor pressure } from about 100 mTorr to about 725 Torr , effective to deposit a layer comprising aluminum nitride over the substrate at such temperature and reactor pressure
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH