The polishing pad 1, wherein the polishing layer comprises {HEAD ~ polyurethane} obtained by reacting a polymer diol, {TAIL ~ an organic diisocyanate}, and a chain extender 
obtained by reacting
The polishing pad 1 , wherein the polishing layer comprises { HEAD ~ polyurethane } obtained by reacting a polymer diol , { TAIL ~ an organic diisocyanate } , and a chain extender
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL REL REL OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH