The invention is directed to a process whereby layers of borophosphosilicate glass are deposited at low pressure on {HEAD ~ a plurality} of {TAIL ~ silicon wafers} located within a process tube 
of
The invention is directed to a process whereby layers of borophosphosilicate glass are deposited at low pressure on { HEAD ~ a plurality } of { TAIL ~ silicon wafers } located within a process tube
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH