The at least one metallization line having a Lop surface and transition edges leading to the semiconductor substrate, and {TAIL ~ the metallization line} preferably has a first thickness measured between the semiconductor substrate surface and the top surface of {HEAD ~ the at least one metallization line} 
The at least one metallization line having a Lop surface and transition edges leading to the semiconductor substrate , and { TAIL ~ the metallization line } preferably has a first thickness measured between the semiconductor substrate surface and the top surface of { HEAD ~ the at least one metallization line }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD