{TAIL ~ A method} for forming a localized halo structure in {HEAD ~ a semiconductor substrate} of a semiconductor device, comprising: 
{ TAIL ~ A method } for forming a localized halo structure in { HEAD ~ a semiconductor substrate } of a semiconductor device , comprising :
TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH