More specifically, the invention relates to patterning materials at {HEAD ~ the nanoscale level} utilizing {TAIL ~ block copolymers} 
utilizing
More specifically , the invention relates to patterning materials at { HEAD ~ the nanoscale level } utilizing { TAIL ~ block copolymers }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL