{TAIL ~ A contact level layer} of photoresist is applied, and {HEAD ~ the contact level pattern} is lithographically defined in the resist 
{ TAIL ~ A contact level layer } of photoresist is applied , and { HEAD ~ the contact level pattern } is lithographically defined in the resist
TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH