The second blocking layer has a thickness of 5 to 40 μm, and a photoconductive layer formed of a Si is stacked on {HEAD ~ the second blocking layer} to {TAIL ~ a thickness} of 0.5 to 5 μm 
The second blocking layer has a thickness of 5 to 40 μm , and a photoconductive layer formed of a Si is stacked on { HEAD ~ the second blocking layer } to { TAIL ~ a thickness } of 0.5 to 5 μm
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH