A lithographic apparatus for immersion lithography is disclosed in which {HEAD ~ a seal} between {TAIL ~ different parts} of the substrate table may be arranged to reduce the transmission of forces between the different parts 
between
A lithographic apparatus for immersion lithography is disclosed in which { HEAD ~ a seal } between { TAIL ~ different parts } of the substrate table may be arranged to reduce the transmission of forces between the different parts
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH