Alkali metal impurity specifications for chemical precursor solutions for integrated circuit applications are typically set to allow impurity levels of about 20 parts per billion maximum for {HEAD ~ each type} of {TAIL ~ alkali metal} 
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Alkali metal impurity specifications for chemical precursor solutions for integrated circuit applications are typically set to allow impurity levels of about 20 parts per billion maximum for { HEAD ~ each type } of { TAIL ~ alkali metal }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL