{TAIL ~ The FIG 1 embodiment} includes a liquid jet type X ray generating device 1 located at the most upstream portion of {HEAD ~ the depicted optical system} of the exposure apparatus 
{ TAIL ~ The FIG 1 embodiment } includes a liquid jet type X ray generating device 1 located at the most upstream portion of { HEAD ~ the depicted optical system } of the exposure apparatus
TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH