As used herein, the phrase thin film when referring to Class IIB VIA semiconductor materials refers to a layer of the semiconductor material having {HEAD ~ a thickness} of from {TAIL ~ about 0.01 micrometer} to about 10 micrometers, and preferably from about 0.5 micrometer to about 2 micrometers 
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As used herein , the phrase thin film when referring to Class IIB VIA semiconductor materials refers to a layer of the semiconductor material having { HEAD ~ a thickness } of from { TAIL ~ about 0.01 micrometer } to about 10 micrometers , and preferably from about 0.5 micrometer to about 2 micrometers
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH