The reactor tube is evacuated to {HEAD ~ a pressure} of {TAIL ~ less than 500 millitorr} and is heated to a temperature of not less than 350° C. and not greater than 500° C. A mixture of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer 
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The reactor tube is evacuated to { HEAD ~ a pressure } of { TAIL ~ less than 500 millitorr } and is heated to a temperature of not less than 350 ° C. and not greater than 500 ° C. A mixture of silane , phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH