{TAIL ~ The oxide application} includes {HEAD ~ a deposition component} and a sputtering component, and the sputtering component is configured to remove at least a part of an edge of the first silicon nitride layer 
{ TAIL ~ The oxide application } includes { HEAD ~ a deposition component } and a sputtering component , and the sputtering component is configured to remove at least a part of an edge of the first silicon nitride layer
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH