{HEAD ~ The invention} provides {TAIL ~ a plasma processing apparatus} aimed at suppressing the corrosion caused by reactive gas and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit 
provides
{ HEAD ~ The invention } provides { TAIL ~ a plasma processing apparatus } aimed at suppressing the corrosion caused by reactive gas and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit
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