A method is provided for a repetitive deposition and {TAIL ~ etch} of a substrate using {HEAD ~ a carbon} containing ion beam in a gridded ion source 
A method is provided for a repetitive deposition and { TAIL ~ etch } of a substrate using { HEAD ~ a carbon } containing ion beam in a gridded ion source
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH