{TAIL ~ A cap layer} 130 further included on the gate structure 120 is used as {HEAD ~ a hard mask} while the etching process is performed 
{ TAIL ~ A cap layer } 130 further included on the gate structure 120 is used as { HEAD ~ a hard mask } while the etching process is performed
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH