In this manner, the central processing unit 10 may control {HEAD ~ the amount} of average RF power distributed to each of {TAIL ~ the applicators} 45 to 52 
In this manner , the central processing unit 10 may control { HEAD ~ the amount } of average RF power distributed to each of { TAIL ~ the applicators } 45 to 52
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH