{HEAD ~ This mode} of operation can be readily applied to {TAIL ~ maskless lithography} that utilizes a programmable patterning device, such as a programmable mirror array of a type as referred to above 
readily applied to
{ HEAD ~ This mode } of operation can be readily applied to { TAIL ~ maskless lithography } that utilizes a programmable patterning device , such as a programmable mirror array of a type as referred to above
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH