The layer is not developed after exposure; instead, {HEAD ~ a second layer} of photoresist material is deposited and is also exposed in {TAIL ~ a desired pattern} 
is exposed in
The layer is not developed after exposure ; instead , { HEAD ~ a second layer } of photoresist material is deposited and is also exposed in { TAIL ~ a desired pattern }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL OTH OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL