Methods are discussed for forming a localized halo structure and {TAIL ~ a retrograde profile} in a substrate of {HEAD ~ a semiconductor device} 
Methods are discussed for forming a localized halo structure and { TAIL ~ a retrograde profile } in a substrate of { HEAD ~ a semiconductor device }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD