{HEAD ~ The apparatus} also includes {TAIL ~ a second vacuum processing chamber} adapted to perform a process selected from the group consisting of CVD, PVD, sputtering, and etching of a workpiece 
includes
{ HEAD ~ The apparatus } also includes { TAIL ~ a second vacuum processing chamber } adapted to perform a process selected from the group consisting of CVD , PVD , sputtering , and etching of a workpiece
HEAD HEAD HEAD HEAD HEAD HEAD OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH