Methods are discussed for forming {TAIL ~ a localized halo structure} and a retrograde profile in {HEAD ~ a substrate} of a semiconductor device 
Methods are discussed for forming { TAIL ~ a localized halo structure } and a retrograde profile in { HEAD ~ a substrate } of a semiconductor device
OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH