Because a wet etching process is used to pattern the top magnetic material layer of {TAIL ~ the MTJ}, lateral etching of {HEAD ~ the top magnetic material layer} is reduced or eliminated 
Because a wet etching process is used to pattern the top magnetic material layer of { TAIL ~ the MTJ } , lateral etching of { HEAD ~ the top magnetic material layer } is reduced or eliminated
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH