A trench is formed in the source/drain region of the semiconductor substrate thereby removing at least a portion of {HEAD ~ the halo structure} in {TAIL ~ the source/drain region} 
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A trench is formed in the source / drain region of the semiconductor substrate thereby removing at least a portion of { HEAD ~ the halo structure } in { TAIL ~ the source / drain region }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL