The object of {TAIL ~ the present invention} is to provide a semiconductor device provided with a protective film excellent in water and oil repellency, durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or {HEAD ~ a color filter} and a manufacturing method thereof 
The object of { TAIL ~ the present invention } is to provide a semiconductor device provided with a protective film excellent in water and oil repellency , durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or { HEAD ~ a color filter } and a manufacturing method thereof
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