For a material located at least in an upper layer of a plurality of materials forming the object, the secondary electron yield ratio can be made nearly unity and {HEAD ~ appropriate contrast} of {TAIL ~ an obtained image} can be provided with minimized influence of charge up 
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For a material located at least in an upper layer of a plurality of materials forming the object , the secondary electron yield ratio can be made nearly unity and { HEAD ~ appropriate contrast } of { TAIL ~ an obtained image } can be provided with minimized influence of charge up
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