Methods are discussed for forming a localized halo structure and {HEAD ~ a retrograde profile} in {TAIL ~ a substrate} of a semiconductor device 
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Methods are discussed for forming a localized halo structure and { HEAD ~ a retrograde profile } in { TAIL ~ a substrate } of a semiconductor device
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH