This mode of operation can be readily applied to {HEAD ~ maskless lithography} that utilizes a programmable patterning device, such as a programmable mirror array of {TAIL ~ a type} as referred to above 
This mode of operation can be readily applied to { HEAD ~ maskless lithography } that utilizes a programmable patterning device , such as a programmable mirror array of { TAIL ~ a type } as referred to above
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH