The substrate processing apparatus 4, further comprising {TAIL ~ a plurality} of contact members arranges on {HEAD ~ the outer periphery} of said substrate sucked by said proximity suction member in the proximity state, wherein 
The substrate processing apparatus 4 , further comprising { TAIL ~ a plurality } of contact members arranges on { HEAD ~ the outer periphery } of said substrate sucked by said proximity suction member in the proximity state , wherein
OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH