At this time, a decreasing step is performed with a step for removing {HEAD ~ an impurity concentrating film} on {TAIL ~ the surface} of a silicon wafer, such as an oxide film, depending on the surface state of the silicon water 
on
At this time , a decreasing step is performed with a step for removing { HEAD ~ an impurity concentrating film } on { TAIL ~ the surface } of a silicon wafer , such as an oxide film , depending on the surface state of the silicon water
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH