An anisotropic etch which selectively removes {TAIL ~ silicon} is used to remove the silicon from regions adjacent to {HEAD ~ the polysilicon gates} 320 a and 320 b to from trenches 238 
An anisotropic etch which selectively removes { TAIL ~ silicon } is used to remove the silicon from regions adjacent to { HEAD ~ the polysilicon gates } 320 a and 320 b to from trenches 238
OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH