In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of {HEAD ~ a plurality} of {TAIL ~ outlets}, flowing one or more gases through the manifold to a vacuum environment by passing the processing chamber prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during substrate processing 
of
In another embodiment , a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of { HEAD ~ a plurality } of { TAIL ~ outlets } , flowing one or more gases through the manifold to a vacuum environment by passing the processing chamber prior to processing or to a calibration circuit , and flowing the one or more gases into the processing chamber during substrate processing
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