As described in the foregoing, such process overcomes the fundamental problem causing nonuniformity in the plasma density and realizes {HEAD ~ the formation} of {TAIL ~ a thin film} of amorphous silicon with a uniform film thickness distribution 
of
As described in the foregoing , such process overcomes the fundamental problem causing nonuniformity in the plasma density and realizes { HEAD ~ the formation } of { TAIL ~ a thin film } of amorphous silicon with a uniform film thickness distribution
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH