Method for {TAIL ~ forming CMOS device} with {HEAD ~ self aligned contacts} and region formed using salicide process 
Method for { TAIL ~ forming CMOS device } with { HEAD ~ self aligned contacts } and region formed using salicide process
OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH