{TAIL ~ The monolithic optical coupler} 1, wherein said {HEAD ~ lithographically definable material} is a positive photoresist material, wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of each of said layers form said optical device 
{ TAIL ~ The monolithic optical coupler } 1 , wherein said { HEAD ~ lithographically definable material } is a positive photoresist material , wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of each of said layers form said optical device
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