The reflection mask of FIG 11 is constructed such that, in order to reduce or prevent {HEAD ~ emergence} of reflections from a right hand side boundary 47 of the pattern 221 formed from a multilayer when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ, an absorber 2211 is provided on {TAIL ~ the right hand side boundary} 47 
The reflection mask of FIG 11 is constructed such that , in order to reduce or prevent { HEAD ~ emergence } of reflections from a right hand side boundary 47 of the pattern 221 formed from a multilayer when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ , an absorber 2211 is provided on { TAIL ~ the right hand side boundary } 47
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