This CMP slurry includes {TAIL ~ suspended solids} as well as a chemical solution component which attacks {HEAD ~ the material} being polished 
This CMP slurry includes { TAIL ~ suspended solids } as well as a chemical solution component which attacks { HEAD ~ the material } being polished
OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH