selectively etching a part of {HEAD ~ the second conductive layer} to form {TAIL ~ a portion} of the gate electrode consisting of the first conductive layer 
to form
selectively etching a part of { HEAD ~ the second conductive layer } to form { TAIL ~ a portion } of the gate electrode consisting of the first conductive layer
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH