{HEAD ~ The layer} is not developed after {TAIL ~ exposure}; instead, a second layer of photoresist material is deposited and is also exposed in a desired pattern 
not developed after
{ HEAD ~ The layer } is not developed after { TAIL ~ exposure } ; instead , a second layer of photoresist material is deposited and is also exposed in a desired pattern
HEAD HEAD HEAD HEAD HEAD HEAD OTH REL REL REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH