The method does so by employing bistertiarybutylaminesilane as {HEAD ~ a silicon source} to react with a reducing agent to form a dielectric film, which includes {TAIL ~ silicon}, on a substrate 
The method does so by employing bistertiarybutylaminesilane as { HEAD ~ a silicon source } to react with a reducing agent to form a dielectric film , which includes { TAIL ~ silicon } , on a substrate
OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH