Resist layer 12 may be formed of any of {HEAD ~ the commercially available positive resists} composed of {TAIL ~ an alkali soluble phenol formaldehyde novolak resin} and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule 
composed of
Resist layer 12 may be formed of any of { HEAD ~ the commercially available positive resists } composed of { TAIL ~ an alkali soluble phenol formaldehyde novolak resin } and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH