This first source/drain implant is immediately followed with a second source/drain implant with, for example, arsenic at an implantation energy of approximately 120 KeV and {HEAD ~ a dose} of {TAIL ~ 5×1015 atoms} cm2 
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This first source / drain implant is immediately followed with a second source / drain implant with , for example , arsenic at an implantation energy of approximately 120 KeV and { HEAD ~ a dose } of { TAIL ~ 5×1015 atoms } cm2
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH