This is achieved by employing bistertiarybutylaminesilane as a silicon source to react with {TAIL ~ an oxidizing agent} to form {HEAD ~ a dielectric film} on a substrate that includes silicon 
This is achieved by employing bistertiarybutylaminesilane as a silicon source to react with { TAIL ~ an oxidizing agent } to form { HEAD ~ a dielectric film } on a substrate that includes silicon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH