{HEAD ~ The semiconductor wafer} is rotated by the spin chuck to spread the resist solution over {TAIL ~ the entire surface} of the semiconductor wafer W 
{ HEAD ~ The semiconductor wafer } is rotated by the spin chuck to spread the resist solution over { TAIL ~ the entire surface } of the semiconductor wafer W
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH