A two step annealing process is utilized for performing imputity induced disordering comprising an initial higher temperature, shorter term or {HEAD ~ rapid thermal anneal treatment} followed by a lower temperature, {TAIL ~ longer term} or slow thermal anneal treatment 
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A two step annealing process is utilized for performing imputity induced disordering comprising an initial higher temperature , shorter term or { HEAD ~ rapid thermal anneal treatment } followed by a lower temperature , { TAIL ~ longer term } or slow thermal anneal treatment
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH