A spin coating process for controlling the mean thickness of {TAIL ~ photoresist} on {HEAD ~ the surface} of a semiconductor wafer 
A spin coating process for controlling the mean thickness of { TAIL ~ photoresist } on { HEAD ~ the surface } of a semiconductor wafer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH