In one aspect, a method of depositing an aluminum nitride comprising {HEAD ~ layer} over a semiconductor substrate includes positioning {TAIL ~ a semiconductor substrate} within a chemical vapor deposition reactor 
In one aspect , a method of depositing an aluminum nitride comprising { HEAD ~ layer } over a semiconductor substrate includes positioning { TAIL ~ a semiconductor substrate } within a chemical vapor deposition reactor
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH