The invention relates generally to processing a surface on a substrate, e.g., depositing a coating on or etching by using a carbon containing {HEAD ~ ion bean} using {TAIL ~ a gridded ion source}, particularly an RF or microwave plasma source 
using
The invention relates generally to processing a surface on a substrate , e.g. , depositing a coating on or etching by using a carbon containing { HEAD ~ ion bean } using { TAIL ~ a gridded ion source } , particularly an RF or microwave plasma source
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH