For a rare gas to be used at the time of processing the insulating film, any one of Xe, Kr, a mixed gas of Ar and Xe, and a mixed gas of Ar and {TAIL ~ Kr} is applied in place of Ar, giving rise to {HEAD ~ reduction} in pitting and striations after etching 
For a rare gas to be used at the time of processing the insulating film , any one of Xe , Kr , a mixed gas of Ar and Xe , and a mixed gas of Ar and { TAIL ~ Kr } is applied in place of Ar , giving rise to { HEAD ~ reduction } in pitting and striations after etching
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