A spin coating process for controlling {HEAD ~ the mean thickness} of {TAIL ~ photoresist} on the surface of a semiconductor wafer 
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A spin coating process for controlling { HEAD ~ the mean thickness } of { TAIL ~ photoresist } on the surface of a semiconductor wafer
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH