Because a wet etching process is used to pattern {HEAD ~ the top magnetic material layer} of {TAIL ~ the MTJ}, lateral etching of the top magnetic material layer is reduced or eliminated 
of
Because a wet etching process is used to pattern { HEAD ~ the top magnetic material layer } of { TAIL ~ the MTJ } , lateral etching of the top magnetic material layer is reduced or eliminated
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH