{TAIL ~ The second blocking layer} has a thickness of 5 to 40 μm, and a photoconductive layer formed of a Si is stacked on {HEAD ~ the second blocking layer} to a thickness of 0.5 to 5 μm 
{ TAIL ~ The second blocking layer } has a thickness of 5 to 40 μm , and a photoconductive layer formed of a Si is stacked on { HEAD ~ the second blocking layer } to a thickness of 0.5 to 5 μm
TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH