The pattern of the partially etched cavities is determined in {TAIL ~ accordance} with the pattern of dies on {HEAD ~ the device wafer}  
The pattern of the partially etched cavities is determined in { TAIL ~ accordance } with the pattern of dies on { HEAD ~ the device wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH