The polishing pad 1, wherein the polishing layer comprises polyurethane obtained by reacting {TAIL ~ a polymer diol}, {HEAD ~ an organic diisocyanate}, and a chain extender 
The polishing pad 1 , wherein the polishing layer comprises polyurethane obtained by reacting { TAIL ~ a polymer diol } , { HEAD ~ an organic diisocyanate } , and a chain extender
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH