an epitaxial layer formed on said {HEAD ~ second semiconductor substrate} to fill {TAIL ~ said etched portion}, said epitaxial layer being electrically connected to said first and second semiconductor substrates; and 
to fill
an epitaxial layer formed on said { HEAD ~ second semiconductor substrate } to fill { TAIL ~ said etched portion } , said epitaxial layer being electrically connected to said first and second semiconductor substrates ; and
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH