Accordingly, {HEAD ~ an object} of the present invention is to provide {TAIL ~ a process} for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of a relatively large insulating substrate 
is to provide
Accordingly , { HEAD ~ an object } of the present invention is to provide { TAIL ~ a process } for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of a relatively large insulating substrate
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH