A substrate processing apparatus 3, wherein said gas heating tube extends from {HEAD ~ said first gas introducing section side} toward {TAIL ~ said gas exhausting section side}, is bent back before an end of said substrate at said gas exhausting section side, and extends from said gas exhausting section side toward said first gas introducing section side 
A substrate processing apparatus 3 , wherein said gas heating tube extends from { HEAD ~ said first gas introducing section side } toward { TAIL ~ said gas exhausting section side } , is bent back before an end of said substrate at said gas exhausting section side , and extends from said gas exhausting section side toward said first gas introducing section side
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