{TAIL ~ The oxide layer} 22 may comprise silicon dioxide and may be formed by, for example, a thermal oxidation process or {HEAD ~ a chemical vapor deposition process} 
{ TAIL ~ The oxide layer } 22 may comprise silicon dioxide and may be formed by , for example , a thermal oxidation process or { HEAD ~ a chemical vapor deposition process }
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD