{TAIL ~ A method} for forming {HEAD ~ a localized halo structure} in a semiconductor substrate of a semiconductor device, comprising: 
{ TAIL ~ A method } for forming { HEAD ~ a localized halo structure } in a semiconductor substrate of a semiconductor device , comprising :
TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH