A method is provided for a repetitive deposition and etch of {HEAD ~ a substrate} using a carbon containing ion beam in {TAIL ~ a gridded ion source} 
A method is provided for a repetitive deposition and etch of { HEAD ~ a substrate } using a carbon containing ion beam in { TAIL ~ a gridded ion source }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL