In the processing space supplied with the solvent, {HEAD ~ evaporation} of the solvent from {TAIL ~ the resist solution} is suppressed 
from
In the processing space supplied with the solvent , { HEAD ~ evaporation } of the solvent from { TAIL ~ the resist solution } is suppressed
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH