At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for {TAIL ~ each} of {HEAD ~ a plurality} of the films 
At the time of patterning a resist film of the mask blank according to pattern data , film information to check with a pattern is obtained for { TAIL ~ each } of { HEAD ~ a plurality } of the films
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH