The method 4, wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber, the type of {HEAD ~ the deposited film} in {TAIL ~ the chemical vapor deposition chamber} and the conditions for the post process 
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The method 4 , wherein the dry cleaning timing is determined from at least one of information selected from a group consisting of the accumulated deposition thickness in the chemical vapor deposition chamber , the type of { HEAD ~ the deposited film } in { TAIL ~ the chemical vapor deposition chamber } and the conditions for the post process
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