Instead of the element isolation region, {HEAD ~ an offset region} is formed between the N type semiconductor region 202 and {TAIL ~ the well electrode} 101 
is formed between
Instead of the element isolation region , { HEAD ~ an offset region } is formed between the N type semiconductor region 202 and { TAIL ~ the well electrode } 101
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH