{HEAD ~ The object} of the present invention is to provide a semiconductor device provided with a protective film excellent in water and oil repellency, durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or a color filter and {TAIL ~ a manufacturing method} thereof 
is to provide
{ HEAD ~ The object } of the present invention is to provide a semiconductor device provided with a protective film excellent in water and oil repellency , durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or a color filter and { TAIL ~ a manufacturing method } thereof
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