{TAIL ~ This invention} pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern, defined by a mask or reticle, onto a suitable substrate such as {HEAD ~ a semiconductor wafer} 
{ TAIL ~ This invention } pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern , defined by a mask or reticle , onto a suitable substrate such as { HEAD ~ a semiconductor wafer }
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