{HEAD ~ The method} includes forming a first interconnect structure having a first interfacial structure and forming a second interconnect structure adjacent to {TAIL ~ the first structure} 
{ HEAD ~ The method } includes forming a first interconnect structure having a first interfacial structure and forming a second interconnect structure adjacent to { TAIL ~ the first structure }
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL