The object of the present invention is to provide a semiconductor device provided with a protective film excellent in water and oil repellency, durability and anti soiling property by forming a very thin uniform film with {HEAD ~ such a small thickness} as measured on {TAIL ~ the nanometer order} on the surface of a semiconductor device or a color filter and a manufacturing method thereof 
as measured on
The object of the present invention is to provide a semiconductor device provided with a protective film excellent in water and oil repellency , durability and anti soiling property by forming a very thin uniform film with { HEAD ~ such a small thickness } as measured on { TAIL ~ the nanometer order } on the surface of a semiconductor device or a color filter and a manufacturing method thereof
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