A spin coating process for controlling the mean thickness of photoresist on {HEAD ~ the surface} of {TAIL ~ a semiconductor wafer} 
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A spin coating process for controlling the mean thickness of photoresist on { HEAD ~ the surface } of { TAIL ~ a semiconductor wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL