In this case, {HEAD ~ silicon nitride} is also deposited on the formed silicon nitride film 5, so that the thickness of the passivation film 5 of {TAIL ~ silicon nitride} is increased 
In this case , { HEAD ~ silicon nitride } is also deposited on the formed silicon nitride film 5 , so that the thickness of the passivation film 5 of { TAIL ~ silicon nitride } is increased
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH