The method further including applying {HEAD ~ an oxide material} over {TAIL ~ the first silicon nitride barrier layer} that overlies the substrate and the metallization line 
over
The method further including applying { HEAD ~ an oxide material } over { TAIL ~ the first silicon nitride barrier layer } that overlies the substrate and the metallization line
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH