{HEAD ~ The process} for forming a thin film 9, further comprising selecting a modulation frequency and {TAIL ~ a duty ratio} for the intermittent generation of the high frequency discharge based on the time period necessary for a DC bias voltage to attain said maximum value 
comprising selecting
{ HEAD ~ The process } for forming a thin film 9 , further comprising selecting a modulation frequency and { TAIL ~ a duty ratio } for the intermittent generation of the high frequency discharge based on the time period necessary for a DC bias voltage to attain said maximum value
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL REL OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH