When dry etching is performed after {HEAD ~ wet etching}, a rinse and drying process is not necessary, so water does not present on the sidewalls of {TAIL ~ the storage nodes} 
When dry etching is performed after { HEAD ~ wet etching } , a rinse and drying process is not necessary , so water does not present on the sidewalls of { TAIL ~ the storage nodes }
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL