sputter etching the surface of said substrate with energetic gas ions to remove traces of residual hydrocarbon and to preferentially reduce {TAIL ~ the concentration} of {HEAD ~ alkali metal atoms} and alkali metal oxides at the substrate surface 
sputter etching the surface of said substrate with energetic gas ions to remove traces of residual hydrocarbon and to preferentially reduce { TAIL ~ the concentration } of { HEAD ~ alkali metal atoms } and alkali metal oxides at the substrate surface
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH