The reactor tube is evacuated to a pressure of less than 500 millitorr and is heated to {HEAD ~ a temperature} of not less than 350° C. and {TAIL ~ not greater than 500° C. A mixture} of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer 
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The reactor tube is evacuated to a pressure of less than 500 millitorr and is heated to { HEAD ~ a temperature } of not less than 350 ° C. and { TAIL ~ not greater than 500 ° C. A mixture } of silane , phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer
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