The invention provides {TAIL ~ a plasma processing apparatus} aimed at suppressing {HEAD ~ the corrosion} caused by reactive gas and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit 
The invention provides { TAIL ~ a plasma processing apparatus } aimed at suppressing { HEAD ~ the corrosion } caused by reactive gas and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit
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