The present invention relates to {TAIL ~ a sputtering target} producing {HEAD ~ few particles} during deposition, a backing plate or sputtering apparatus and a sputtering method producing few particles 
The present invention relates to { TAIL ~ a sputtering target } producing { HEAD ~ few particles } during deposition , a backing plate or sputtering apparatus and a sputtering method producing few particles
OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH