An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein the unit measures the concentrations of {TAIL ~ metals}, or {HEAD ~ fine particles}, or the amount of carbon 
An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein the unit measures the concentrations of { TAIL ~ metals } , or { HEAD ~ fine particles } , or the amount of carbon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH