{HEAD ~ A process temperature} of the second annealing process is substantially larger than {TAIL ~ the crystalline temperature} of the high k dielectric layer 12: for example, the process temperature of the second annealing process is substantially larger than 500 C 
is substantially larger than
{ HEAD ~ A process temperature } of the second annealing process is substantially larger than { TAIL ~ the crystalline temperature } of the high k dielectric layer 12 : for example , the process temperature of the second annealing process is substantially larger than 500 C
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH