The method for manufacturing a thermistor 1, wherein a thickness of the metal base material after firing is 10 to 80 μm, and {HEAD ~ a thickness} of the thermistor film layer after firing is {TAIL ~ 1 to 10 μm} 
after firing is
The method for manufacturing a thermistor 1 , wherein a thickness of the metal base material after firing is 10 to 80 μm , and { HEAD ~ a thickness } of the thermistor film layer after firing is { TAIL ~ 1 to 10 μm }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL