A substrate processing apparatus 3, wherein said gas heating tube extends from said first gas introducing section side toward said gas exhausting section side, is bent back before an end of {HEAD ~ said substrate} at {TAIL ~ said gas exhausting section side}, and extends from said gas exhausting section side toward said first gas introducing section side 
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A substrate processing apparatus 3 , wherein said gas heating tube extends from said first gas introducing section side toward said gas exhausting section side , is bent back before an end of { HEAD ~ said substrate } at { TAIL ~ said gas exhausting section side } , and extends from said gas exhausting section side toward said first gas introducing section side
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