An objective of the present invention is to provide a method for processing {HEAD ~ a high k dielectric layer} to improve {TAIL ~ the quality} of the high k dielectric layer 
to improve
An objective of the present invention is to provide a method for processing { HEAD ~ a high k dielectric layer } to improve { TAIL ~ the quality } of the high k dielectric layer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH