{HEAD ~ An object} of {TAIL ~ the present invention} is to provide a polishing pad that is excellent in flatness of a surface to be polished and evenness of a film thickness after polishing and also excellent in a polishing rate, and can achieve excellent polishing to a material to be polished such as an insulating film, a metallic film, etc, and a cushion using for the polishing pad 
of
{ HEAD ~ An object } of { TAIL ~ the present invention } is to provide a polishing pad that is excellent in flatness of a surface to be polished and evenness of a film thickness after polishing and also excellent in a polishing rate , and can achieve excellent polishing to a material to be polished such as an insulating film , a metallic film , etc , and a cushion using for the polishing pad
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