Thus, a semiconductor substrate including a semiconductor film on the substrate body via an insulating film, having superior crystallinity, including no sub grain boundary, and having {HEAD ~ a thickness} of {TAIL ~ more than several μm}, is obtained 
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Thus , a semiconductor substrate including a semiconductor film on the substrate body via an insulating film , having superior crystallinity , including no sub grain boundary , and having { HEAD ~ a thickness } of { TAIL ~ more than several μm } , is obtained
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH