First, {HEAD ~ the backside} 96 of {TAIL ~ the silicon substrate} 80 is coated with a suitable contact material that has good electrical conductivity for electrochemical etching processes 
of
First , { HEAD ~ the backside } 96 of { TAIL ~ the silicon substrate } 80 is coated with a suitable contact material that has good electrical conductivity for electrochemical etching processes
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH