{HEAD ~ The oxide layer} 22 may comprise silicon dioxide and may be formed by, for example, a thermal oxidation process or {TAIL ~ a chemical vapor deposition process} 
formed by
{ HEAD ~ The oxide layer } 22 may comprise silicon dioxide and may be formed by , for example , a thermal oxidation process or { TAIL ~ a chemical vapor deposition process }
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL REL OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL