The method for manufacturing {HEAD ~ a thermistor} 1, wherein {TAIL ~ a thickness} of the metal base material after firing is 10 to 80 μm, and a thickness of the thermistor film layer after firing is 1 to 10 μm 
wherein
The method for manufacturing { HEAD ~ a thermistor } 1 , wherein { TAIL ~ a thickness } of the metal base material after firing is 10 to 80 μm , and a thickness of the thermistor film layer after firing is 1 to 10 μm
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH