The pattern of the partially etched cavities is determined in {HEAD ~ accordance} with {TAIL ~ the pattern} of dies on the device wafer  
with
The pattern of the partially etched cavities is determined in { HEAD ~ accordance } with { TAIL ~ the pattern } of dies on the device wafer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH