The flux enhancement layer may then be selectively removed substantially surrounding the upper pole, using the upper pole as a mask, by means of a relatively brief ion milling process in which only on the order of {HEAD ~ 1.0 kÅ} of the layer need be removed and during which {TAIL ~ a relatively insignificant amount} of the material removed might be re deposited on the sides of the upper pole 
The flux enhancement layer may then be selectively removed substantially surrounding the upper pole , using the upper pole as a mask , by means of a relatively brief ion milling process in which only on the order of { HEAD ~ 1.0 kÅ } of the layer need be removed and during which { TAIL ~ a relatively insignificant amount } of the material removed might be re deposited on the sides of the upper pole
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