Therefore, {HEAD ~ a space pattern} of resist formed with the thickened resist pattern has {TAIL ~ a fine structure}, exceeding the exposure limit of light sources of an available exposure device 
has
Therefore , { HEAD ~ a space pattern } of resist formed with the thickened resist pattern has { TAIL ~ a fine structure } , exceeding the exposure limit of light sources of an available exposure device
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH