{TAIL ~ The reactor tube} is evacuated to a pressure of less than 500 millitorr and is heated to a temperature of not less than 350° C. and {HEAD ~ not greater than 500° C. A mixture} of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer 
{ TAIL ~ The reactor tube } is evacuated to a pressure of less than 500 millitorr and is heated to a temperature of not less than 350 ° C. and { HEAD ~ not greater than 500 ° C. A mixture } of silane , phosphine and boron trichloride gases is flowed into the reactor tube so that the mixture contacts the silicon wafer
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH