In a preferred method for depositing of these materials, capacitive coupling forms {HEAD ~ a highly uniform, selectively energized stream} of {TAIL ~ ions} from a dense, inductively ionized plasma 
of
In a preferred method for depositing of these materials , capacitive coupling forms { HEAD ~ a highly uniform , selectively energized stream } of { TAIL ~ ions } from a dense , inductively ionized plasma
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH