The method does so by employing bistertiarybutylaminesilane as {HEAD ~ a silicon source} to react with {TAIL ~ a reducing agent} to form a dielectric film, which includes silicon, on a substrate 
to react with
The method does so by employing bistertiarybutylaminesilane as { HEAD ~ a silicon source } to react with { TAIL ~ a reducing agent } to form a dielectric film , which includes silicon , on a substrate
OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH