It is desirable, for example, to provide a lithographic apparatus and {TAIL ~ method} for EUV radiation lithography wherein the losses in intensity of the radiation referred to above, and the increased complexity of {HEAD ~ the apparatus} referred to above, are obviated or mitigated 
It is desirable , for example , to provide a lithographic apparatus and { TAIL ~ method } for EUV radiation lithography wherein the losses in intensity of the radiation referred to above , and the increased complexity of { HEAD ~ the apparatus } referred to above , are obviated or mitigated
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