A method is provided for a repetitive deposition and etch of a substrate using {TAIL ~ a carbon} containing {HEAD ~ ion beam} in a gridded ion source 
A method is provided for a repetitive deposition and etch of a substrate using { TAIL ~ a carbon } containing { HEAD ~ ion beam } in a gridded ion source
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH