depositing {HEAD ~ an insulating layer} over {TAIL ~ the substrate} and on the lower polysilicon gate level after removing the first masking layer 
over
depositing { HEAD ~ an insulating layer } over { TAIL ~ the substrate } and on the lower polysilicon gate level after removing the first masking layer
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH