{HEAD ~ This invention} relates to vacuum based vacuum based arcs and plasma ion implantation, and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing films of {TAIL ~ carbon} and carbon nitrides with variable / ratios 
{ HEAD ~ This invention } relates to vacuum based vacuum based arcs and plasma ion implantation , and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing films of { TAIL ~ carbon } and carbon nitrides with variable / ratios
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