More specifically, the invention relates to patterning {HEAD ~ materials} at {TAIL ~ the nanoscale level} utilizing block copolymers 
at
More specifically , the invention relates to patterning { HEAD ~ materials } at { TAIL ~ the nanoscale level } utilizing block copolymers
OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH