Resist layer 12 may be formed of any of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at {HEAD ~ adjacent positions} on {TAIL ~ the molecule} 
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Resist layer 12 may be formed of any of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at { HEAD ~ adjacent positions } on { TAIL ~ the molecule }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL