One method of fabrication of the source and drain regions is to form {HEAD ~ an isolating isolation region} around {TAIL ~ active areas} in which a transistor is to be formed in a semiconductor body 
around
One method of fabrication of the source and drain regions is to form { HEAD ~ an isolating isolation region } around { TAIL ~ active areas } in which a transistor is to be formed in a semiconductor body
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH