According to the present invention, a polishing pad that is useful for polishing {HEAD ~ a material} to be polished such as {TAIL ~ a semiconductor wafer} at good precision and high polishing efficiency, and a cushion for a polishing pad used for producing the polishing pad 
such as
According to the present invention , a polishing pad that is useful for polishing { HEAD ~ a material } to be polished such as { TAIL ~ a semiconductor wafer } at good precision and high polishing efficiency , and a cushion for a polishing pad used for producing the polishing pad
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH