When a phenol resin, polyvinylpyrolidone, and the like are used as the resin, {HEAD ~ the resist pattern} is excellent particularly in etch resistance because the resin and the compound represented by the General Formula respectively have {TAIL ~ an aromatic ring} 
When a phenol resin , polyvinylpyrolidone , and the like are used as the resin , { HEAD ~ the resist pattern } is excellent particularly in etch resistance because the resin and the compound represented by the General Formula respectively have { TAIL ~ an aromatic ring }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL