{TAIL ~ The present invention} relates to {HEAD ~ a resist composition} which has high resistance to oxygen plasmas and can form high precision fine patterns such as semiconductor circuits 
{ TAIL ~ The present invention } relates to { HEAD ~ a resist composition } which has high resistance to oxygen plasmas and can form high precision fine patterns such as semiconductor circuits
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH