Though there are various embodiments, {HEAD ~ the first electrode} 812 and the second electrode 813 are located close to {TAIL ~ a portion} where the electric field intensity generated by the electromagnetic waves becomes strong in the antenna 820 when the electromagnetic waves are fed to the antenna 820 in the plasma apparatus using a cylinder head of the present invention 
located close to
Though there are various embodiments , { HEAD ~ the first electrode } 812 and the second electrode 813 are located close to { TAIL ~ a portion } where the electric field intensity generated by the electromagnetic waves becomes strong in the antenna 820 when the electromagnetic waves are fed to the antenna 820 in the plasma apparatus using a cylinder head of the present invention
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH