said sidewall surface of said main part including {HEAD ~ a sharply pointed tip end part} defined by {TAIL ~ two crystal surfaces} and located at a lower side of an interface between said gate insulation film and said silicon substrate 
defined by
said sidewall surface of said main part including { HEAD ~ a sharply pointed tip end part } defined by { TAIL ~ two crystal surfaces } and located at a lower side of an interface between said gate insulation film and said silicon substrate
OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH