depositing {HEAD ~ an insulating layer} over the substrate and on {TAIL ~ the lower polysilicon gate level} after removing the first masking layer 
on
depositing { HEAD ~ an insulating layer } over the substrate and on { TAIL ~ the lower polysilicon gate level } after removing the first masking layer
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH