Therefore, a space pattern of resist formed with {TAIL ~ the thickened resist pattern} has a fine structure, exceeding {HEAD ~ the exposure limit} of light sources of an available exposure device 
Therefore , a space pattern of resist formed with { TAIL ~ the thickened resist pattern } has a fine structure , exceeding { HEAD ~ the exposure limit } of light sources of an available exposure device
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH