This invention relates to vacuum based vacuum based arcs and plasma ion implantation, and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing {TAIL ~ films} of carbon and {HEAD ~ carbon nitrides} with variable / ratios 
This invention relates to vacuum based vacuum based arcs and plasma ion implantation , and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing { TAIL ~ films } of carbon and { HEAD ~ carbon nitrides } with variable / ratios
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