The process for forming a thin film 9, further comprising selecting a modulation frequency and a duty ratio for the intermittent generation of the high frequency discharge based on the time period necessary for {HEAD ~ a DC bias voltage} to attain {TAIL ~ said maximum value} 
to attain
The process for forming a thin film 9 , further comprising selecting a modulation frequency and a duty ratio for the intermittent generation of the high frequency discharge based on the time period necessary for { HEAD ~ a DC bias voltage } to attain { TAIL ~ said maximum value }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL