As described in the foregoing, such process overcomes the fundamental problem causing nonuniformity in the plasma density and realizes the formation of {TAIL ~ a thin film} of {HEAD ~ amorphous silicon} with a uniform film thickness distribution 
As described in the foregoing , such process overcomes the fundamental problem causing nonuniformity in the plasma density and realizes the formation of { TAIL ~ a thin film } of { HEAD ~ amorphous silicon } with a uniform film thickness distribution
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH