At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for {HEAD ~ each} of {TAIL ~ a plurality} of the films 
of
At the time of patterning a resist film of the mask blank according to pattern data , film information to check with a pattern is obtained for { HEAD ~ each } of { TAIL ~ a plurality } of the films
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH