In this case, {HEAD ~ silicon nitride} is also deposited on {TAIL ~ the formed silicon nitride film} 5, so that the thickness of the passivation film 5 of silicon nitride is increased 
is deposited on
In this case , { HEAD ~ silicon nitride } is also deposited on { TAIL ~ the formed silicon nitride film } 5 , so that the thickness of the passivation film 5 of silicon nitride is increased
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH