This is achieved by employing bistertiarybutylaminesilane as {TAIL ~ a silicon source} to react with an oxidizing agent to form a dielectric film on {HEAD ~ a substrate} that includes silicon 
This is achieved by employing bistertiarybutylaminesilane as { TAIL ~ a silicon source } to react with an oxidizing agent to form a dielectric film on { HEAD ~ a substrate } that includes silicon
OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH