This first source/drain implant is immediately followed with a second source/drain implant with, for example, arsenic at an implantation energy of {TAIL ~ approximately 120 KeV} and a dose of {HEAD ~ 5×1015 atoms} cm2 
This first source / drain implant is immediately followed with a second source / drain implant with , for example , arsenic at an implantation energy of { TAIL ~ approximately 120 KeV } and a dose of { HEAD ~ 5×1015 atoms } cm2
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH