When {HEAD ~ the degree} of accumulation in {TAIL ~ the ideal orientation} of is too high, etching develops along the crystal lattice during etching of a rolled plate into a shadow mask and the etched hole is irregular in profile and poor in degree of circularity as shown in FIG 1C 
in
When { HEAD ~ the degree } of accumulation in { TAIL ~ the ideal orientation } of is too high , etching develops along the crystal lattice during etching of a rolled plate into a shadow mask and the etched hole is irregular in profile and poor in degree of circularity as shown in FIG 1C
OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH