A cap layer is then formed over {HEAD ~ the patterned top magnetic material layer} using a lift off {TAIL ~ technique}, wherein when the resist is removed, a material disposed over the resist is also removed 
A cap layer is then formed over { HEAD ~ the patterned top magnetic material layer } using a lift off { TAIL ~ technique } , wherein when the resist is removed , a material disposed over the resist is also removed
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH