Mask layout and {HEAD ~ method} for forming {TAIL ~ vertical channel transistor} in semiconductor device using the same 
for forming
Mask layout and { HEAD ~ method } for forming { TAIL ~ vertical channel transistor } in semiconductor device using the same
OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH