The method further including applying an oxide material over {HEAD ~ the first silicon nitride barrier layer} that overlies {TAIL ~ the substrate} and the metallization line 
overlies
The method further including applying an oxide material over { HEAD ~ the first silicon nitride barrier layer } that overlies { TAIL ~ the substrate } and the metallization line
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH