For this reason, {HEAD ~ a surface layer} or a mixing layer formed as a result of an interaction between the resist pattern thickening material and the resist pattern is efficiently formed on {TAIL ~ the surface} of the resist pattern in a state where the resist pattern constitutes the innerlayer thereof 
is efficiently formed on
For this reason , { HEAD ~ a surface layer } or a mixing layer formed as a result of an interaction between the resist pattern thickening material and the resist pattern is efficiently formed on { TAIL ~ the surface } of the resist pattern in a state where the resist pattern constitutes the innerlayer thereof
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH