According to the present invention, resist {HEAD ~ damage}, which typically presents {TAIL ~ a problem} in pattern formation using a resist of ArF or later lithography generation that is less resistant to etching, can be efficiently prevented, and pitting and striations due to resist damage can be improved 
typically presents
According to the present invention , resist { HEAD ~ damage } , which typically presents { TAIL ~ a problem } in pattern formation using a resist of ArF or later lithography generation that is less resistant to etching , can be efficiently prevented , and pitting and striations due to resist damage can be improved
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH