An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X radiation, or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and {HEAD ~ the direction} of {TAIL ~ side faces} of the patterns may extend in parallel to each other 
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An optical element which allows replication of a refined pattern and a projection exposure apparatus employing the optical element are disposed so that side face portions of predetermined patterns which create shadows from oblique incident exposure radiation may be minimized at a predetermined incidence angle of vacuum ultrasonic radiation or X radiation , or the patterns of the optical element are formed such that the direction in which incident radiation is reflected regularly and { HEAD ~ the direction } of { TAIL ~ side faces } of the patterns may extend in parallel to each other
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