{HEAD ~ The invention} relates generally to processing a surface on a substrate, e.g., depositing {TAIL ~ a coating} on or etching by using a carbon containing ion bean using a gridded ion source, particularly an RF or microwave plasma source 
relates generally to depositing
{ HEAD ~ The invention } relates generally to processing a surface on a substrate , e.g. , depositing { TAIL ~ a coating } on or etching by using a carbon containing ion bean using a gridded ion source , particularly an RF or microwave plasma source
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