{HEAD ~ A two step annealing process} is utilized for performing {TAIL ~ imputity} induced disordering comprising an initial higher temperature, shorter term or rapid thermal anneal treatment followed by a lower temperature, longer term or slow thermal anneal treatment 
is utilized for performing
{ HEAD ~ A two step annealing process } is utilized for performing { TAIL ~ imputity } induced disordering comprising an initial higher temperature , shorter term or rapid thermal anneal treatment followed by a lower temperature , longer term or slow thermal anneal treatment
HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH