The substrate processing apparatus 4, further comprising a plurality of contact members arranges on the outer periphery of {HEAD ~ said substrate} sucked by {TAIL ~ said proximity suction member} in the proximity state, wherein 
sucked by
The substrate processing apparatus 4 , further comprising a plurality of contact members arranges on the outer periphery of { HEAD ~ said substrate } sucked by { TAIL ~ said proximity suction member } in the proximity state , wherein
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH