thereafter annealing {HEAD ~ said structure} at {TAIL ~ a lower temperature} in the range of 700° C. to 900° C. to induce an extension of the diffusion profile deeper into said structure, 
at
thereafter annealing { HEAD ~ said structure } at { TAIL ~ a lower temperature } in the range of 700 ° C. to 900 ° C. to induce an extension of the diffusion profile deeper into said structure ,
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH