A process temperature of the second annealing process is substantially larger than {HEAD ~ the crystalline temperature} of {TAIL ~ the high k dielectric layer} 12: for example, the process temperature of the second annealing process is substantially larger than 500 C 
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A process temperature of the second annealing process is substantially larger than { HEAD ~ the crystalline temperature } of { TAIL ~ the high k dielectric layer } 12 : for example , the process temperature of the second annealing process is substantially larger than 500 C
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH