When a phenol resin, polyvinylpyrolidone, and the like are used as the resin, {HEAD ~ the resist pattern} is excellent particularly in {TAIL ~ etch resistance} because the resin and the compound represented by the General Formula respectively have an aromatic ring 
is excellent particularly in
When a phenol resin , polyvinylpyrolidone , and the like are used as the resin , { HEAD ~ the resist pattern } is excellent particularly in { TAIL ~ etch resistance } because the resin and the compound represented by the General Formula respectively have an aromatic ring
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH