An anisotropic etch which selectively removes silicon is used to remove the silicon from regions adjacent to {TAIL ~ the polysilicon gates} 320 a and 320 b to from {HEAD ~ trenches} 238 
An anisotropic etch which selectively removes silicon is used to remove the silicon from regions adjacent to { TAIL ~ the polysilicon gates } 320 a and 320 b to from { HEAD ~ trenches } 238
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH