After {TAIL ~ a self aligned, silicide layer} has been formed over already fabricated polysilicon and diffusion regions, a 750 Angstrom layer of silicon nitride is deposited by {HEAD ~ low pressure chemical vapor deposition} 
After { TAIL ~ a self aligned , silicide layer } has been formed over already fabricated polysilicon and diffusion regions , a 750 Angstrom layer of silicon nitride is deposited by { HEAD ~ low pressure chemical vapor deposition }
OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD