Referring now to FIG 8, a lift off resist layer 30 is formed on {TAIL ~ the layered structure} T1, and side portions of the layered structure T1 not covered with the lift off resist layer 30 are removed by {HEAD ~ etching} or the like 
Referring now to FIG 8 , a lift off resist layer 30 is formed on { TAIL ~ the layered structure } T1 , and side portions of the layered structure T1 not covered with the lift off resist layer 30 are removed by { HEAD ~ etching } or the like
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH