This invention relates to vacuum based vacuum based arcs and plasma ion implantation, and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing {HEAD ~ films} of {TAIL ~ carbon} and carbon nitrides with variable / ratios 
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This invention relates to vacuum based vacuum based arcs and plasma ion implantation , and more particularly to cathodic and anodic vacuum arcs and plasma immersion ion implantation methods for depositing { HEAD ~ films } of { TAIL ~ carbon } and carbon nitrides with variable / ratios
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH