The pattern of {TAIL ~ the partially etched cavities} is determined in {HEAD ~ accordance} with the pattern of dies on the device wafer  
The pattern of { TAIL ~ the partially etched cavities } is determined in { HEAD ~ accordance } with the pattern of dies on the device wafer
OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH