{HEAD ~ The plasma apparatus} of {TAIL ~ the present invention} may be applicable for which the electrode is located close to a portion where the electric field intensity generated by the electromagnetic waves becomes strong in the antenna when the electromagnetic waves are fed to the antenna 
of
{ HEAD ~ The plasma apparatus } of { TAIL ~ the present invention } may be applicable for which the electrode is located close to a portion where the electric field intensity generated by the electromagnetic waves becomes strong in the antenna when the electromagnetic waves are fed to the antenna
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