Technologies are generally described for {TAIL ~ methods}, systems, and {HEAD ~ structures} that include patterns formed by optical lithography 
Technologies are generally described for { TAIL ~ methods } , systems , and { HEAD ~ structures } that include patterns formed by optical lithography
OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH