A quick wet etching process is performed to remove {TAIL ~ a portion} of {HEAD ~ the remaining first oxide} located on the top of the gate structure and on the substrate 
A quick wet etching process is performed to remove { TAIL ~ a portion } of { HEAD ~ the remaining first oxide } located on the top of the gate structure and on the substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH