{TAIL ~ The present invention} is aimed at overcoming the aforementioned problems of the prior art, and it provides {HEAD ~ an aqueous dispersion} for CMP that has an excellent balance between chemical etching and mechanical polishing ability 
{ TAIL ~ The present invention } is aimed at overcoming the aforementioned problems of the prior art , and it provides { HEAD ~ an aqueous dispersion } for CMP that has an excellent balance between chemical etching and mechanical polishing ability
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH