The sixth aspect of the present invention provides the plasma processing apparatus, wherein the ceramic spraying utilizes a ceramic including at least one element selected from a group consisting of {HEAD ~ Al}, Si and Y, such as Al2O3, SiC and Si3N4, and after forming the ceramic sprayed film, a sealing treatment using {TAIL ~ polymer} is performed 
The sixth aspect of the present invention provides the plasma processing apparatus , wherein the ceramic spraying utilizes a ceramic including at least one element selected from a group consisting of { HEAD ~ Al } , Si and Y , such as Al2O3 , SiC and Si3N4 , and after forming the ceramic sprayed film , a sealing treatment using { TAIL ~ polymer } is performed
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