The flux enhancement layer may then be selectively removed substantially surrounding the upper pole by means of a relatively brief ion milling process in which only on the order of {HEAD ~ 1.0 kÅ} of {TAIL ~ the layer} need be removed and during which only an insignificant amount of the material removed might be re deposited on the sides of the upper pole 
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The flux enhancement layer may then be selectively removed substantially surrounding the upper pole by means of a relatively brief ion milling process in which only on the order of { HEAD ~ 1.0 kÅ } of { TAIL ~ the layer } need be removed and during which only an insignificant amount of the material removed might be re deposited on the sides of the upper pole
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH