In a method for performing microlithography of a pattern onto a substrate, using a charged particle beam, wherein at least the substrate is mounted on a movable stage, the microlithography being performed by scanningly moving {HEAD ~ the stage} at a stage velocity while continuously transferring successive portions of {TAIL ~ the pattern} to the substrate using the charged particle beam, an improvement comprising: 
In a method for performing microlithography of a pattern onto a substrate , using a charged particle beam , wherein at least the substrate is mounted on a movable stage , the microlithography being performed by scanningly moving { HEAD ~ the stage } at a stage velocity while continuously transferring successive portions of { TAIL ~ the pattern } to the substrate using the charged particle beam , an improvement comprising :
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