The present invention relates generally to semiconductor devices and more particularly to methods for forming {HEAD ~ localized halo structures} in {TAIL ~ a semiconductor substrate} in the fabrication of semiconductor devices 
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The present invention relates generally to semiconductor devices and more particularly to methods for forming { HEAD ~ localized halo structures } in { TAIL ~ a semiconductor substrate } in the fabrication of semiconductor devices
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH