The apparatus also includes a second vacuum processing chamber adapted to perform a process selected from the group consisting of CVD, PVD, sputtering, and {HEAD ~ etching} of {TAIL ~ a workpiece} 
of
The apparatus also includes a second vacuum processing chamber adapted to perform a process selected from the group consisting of CVD , PVD , sputtering , and { HEAD ~ etching } of { TAIL ~ a workpiece }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL