The pattern of the partially etched cavities is determined in accordance with {HEAD ~ the pattern} of {TAIL ~ dies} on the device wafer  
of
The pattern of the partially etched cavities is determined in accordance with { HEAD ~ the pattern } of { TAIL ~ dies } on the device wafer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH