Thus, {TAIL ~ a semiconductor substrate} including a semiconductor film on {HEAD ~ the substrate body} via an insulating film, having superior crystallinity, including no sub grain boundary, and having a thickness of more than several μm, is obtained 
Thus , { TAIL ~ a semiconductor substrate } including a semiconductor film on { HEAD ~ the substrate body } via an insulating film , having superior crystallinity , including no sub grain boundary , and having a thickness of more than several μm , is obtained
OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH