A method is provided for a repetitive deposition and etch of a substrate using a carbon containing {HEAD ~ ion beam} in {TAIL ~ a gridded ion source} 
in
A method is provided for a repetitive deposition and etch of a substrate using a carbon containing { HEAD ~ ion beam } in { TAIL ~ a gridded ion source }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL