Embodiments of the present invention provide a process for forming porous silicon oxide based films using a sol gel approach utilizing {HEAD ~ a precursor solution formulation}, which includes {TAIL ~ a purified surfactant} such as a non ionic surfactant, and an additive among other components 
includes
Embodiments of the present invention provide a process for forming porous silicon oxide based films using a sol gel approach utilizing { HEAD ~ a precursor solution formulation } , which includes { TAIL ~ a purified surfactant } such as a non ionic surfactant , and an additive among other components
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH