The oxide layer 22 may comprise silicon dioxide and may be formed by, for example, {HEAD ~ a thermal oxidation process} or {TAIL ~ a chemical vapor deposition process} 
The oxide layer 22 may comprise silicon dioxide and may be formed by , for example , { HEAD ~ a thermal oxidation process } or { TAIL ~ a chemical vapor deposition process }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL