A first layer of photoresist material is spun onto a substrate surface and is exposed in a desired pattern corresponding to {HEAD ~ the shape} of {TAIL ~ a final structure}, at a corresponding cross sectional level in the structure 
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A first layer of photoresist material is spun onto a substrate surface and is exposed in a desired pattern corresponding to { HEAD ~ the shape } of { TAIL ~ a final structure } , at a corresponding cross sectional level in the structure
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH