{HEAD ~ A lithographic apparatus} for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce {TAIL ~ the transmission} of forces between the different parts 
arranged to reduce
{ HEAD ~ A lithographic apparatus } for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce { TAIL ~ the transmission } of forces between the different parts
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH