The semiconductor wafer is rotated by the spin chuck to spread {HEAD ~ the resist solution} over {TAIL ~ the entire surface} of the semiconductor wafer W 
over
The semiconductor wafer is rotated by the spin chuck to spread { HEAD ~ the resist solution } over { TAIL ~ the entire surface } of the semiconductor wafer W
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH