Methods are disclosed for improving the yield of {HEAD ~ acceptable product} from {TAIL ~ microlithography} using a charged particle beam 
Methods are disclosed for improving the yield of { HEAD ~ acceptable product } from { TAIL ~ microlithography } using a charged particle beam
OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH