{HEAD ~ Deposition} of {TAIL ~ the insulating layer} 30 can be by sputtering, chemical vapor deposition, or other methods 
of
{ HEAD ~ Deposition } of { TAIL ~ the insulating layer } 30 can be by sputtering , chemical vapor deposition , or other methods
HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH