For a rare gas to be used at the time of processing the insulating film, any one of Xe, Kr, a mixed gas of Ar and {TAIL ~ Xe}, and a mixed gas of Ar and Kr is applied in place of Ar, giving rise to reduction in pitting and {HEAD ~ striations} after etching 
For a rare gas to be used at the time of processing the insulating film , any one of Xe , Kr , a mixed gas of Ar and { TAIL ~ Xe } , and a mixed gas of Ar and Kr is applied in place of Ar , giving rise to reduction in pitting and { HEAD ~ striations } after etching
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH