In the Strontium Tantalum Oxide films deposited by using {TAIL ~ plasma} and the atomic layer deposition, its leakage current is very low, and its dielectric constant has a range of 30 to 100 depending on {HEAD ~ the there heating conditions} 
In the Strontium Tantalum Oxide films deposited by using { TAIL ~ plasma } and the atomic layer deposition , its leakage current is very low , and its dielectric constant has a range of 30 to 100 depending on { HEAD ~ the there heating conditions }
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD