{HEAD ~ The invention} is applied in {TAIL ~ exposure machines} for semiconductor lithography for spatially stable generation of radiation 
is applied in
{ HEAD ~ The invention } is applied in { TAIL ~ exposure machines } for semiconductor lithography for spatially stable generation of radiation
HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH