A two step annealing process is utilized for performing {HEAD ~ imputity} induced disordering comprising an initial higher temperature, shorter term or rapid thermal anneal treatment followed by a lower temperature, longer term or {TAIL ~ slow thermal anneal treatment} 
A two step annealing process is utilized for performing { HEAD ~ imputity } induced disordering comprising an initial higher temperature , shorter term or rapid thermal anneal treatment followed by a lower temperature , longer term or { TAIL ~ slow thermal anneal treatment }
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL