Though there are various embodiments, the first electrode 812 and the second electrode 813 are located close to a portion where the electric field intensity generated by {TAIL ~ the electromagnetic waves} becomes strong in the antenna 820 when the electromagnetic waves are fed to the antenna 820 in the plasma apparatus using {HEAD ~ a cylinder head} of the present invention 
Though there are various embodiments , the first electrode 812 and the second electrode 813 are located close to a portion where the electric field intensity generated by { TAIL ~ the electromagnetic waves } becomes strong in the antenna 820 when the electromagnetic waves are fed to the antenna 820 in the plasma apparatus using { HEAD ~ a cylinder head } of the present invention
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH