The present invention relates to a resist composition which has {HEAD ~ high resistance} to {TAIL ~ oxygen plasmas} and can form high precision fine patterns such as semiconductor circuits 
to
The present invention relates to a resist composition which has { HEAD ~ high resistance } to { TAIL ~ oxygen plasmas } and can form high precision fine patterns such as semiconductor circuits
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH