The positive resist composition 1, wherein in the compound , R1 and R3 are selected from {HEAD ~ the group} consisting of methyl groups, ethyl groups, n propyl groups, isopropyl groups, and {TAIL ~ cyclohexyl groups} 
consisting of
The positive resist composition 1 , wherein in the compound , R1 and R3 are selected from { HEAD ~ the group } consisting of methyl groups , ethyl groups , n propyl groups , isopropyl groups , and { TAIL ~ cyclohexyl groups }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL