Provided are methods for manufacturing silicon rich oxide layers useful in {HEAD ~ the fabrication} of semiconductor devices, for example, non volatile memory devices, and {TAIL ~ methods} for fabricating semiconductor devices incorporating such SRO layers 
Provided are methods for manufacturing silicon rich oxide layers useful in { HEAD ~ the fabrication } of semiconductor devices , for example , non volatile memory devices , and { TAIL ~ methods } for fabricating semiconductor devices incorporating such SRO layers
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