{HEAD ~ This mode} of operation can be readily applied to maskless lithography that utilizes a programmable patterning device, such as {TAIL ~ a programmable mirror array} of a type as referred to above 
{ HEAD ~ This mode } of operation can be readily applied to maskless lithography that utilizes a programmable patterning device , such as { TAIL ~ a programmable mirror array } of a type as referred to above
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH