Subsequently, {TAIL ~ a photoresist film} is coated on the polysilicon layer 32 and then patterned by {HEAD ~ an exposure and development process} to form a photoresist pattern 
Subsequently , { TAIL ~ a photoresist film } is coated on the polysilicon layer 32 and then patterned by { HEAD ~ an exposure and development process } to form a photoresist pattern
OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH