FIG 4 is {HEAD ~ a photograph} of {TAIL ~ the Strontium Tantalum Oxide film} deposited on a patterned silicon substrate according to an embodiment of the present invention, and illustrates the result that Sr—Ta—O thin films formed by the above mentioned method 
of
FIG 4 is { HEAD ~ a photograph } of { TAIL ~ the Strontium Tantalum Oxide film } deposited on a patterned silicon substrate according to an embodiment of the present invention , and illustrates the result that Sr — Ta — O thin films formed by the above mentioned method
OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH