For example, in the manufacture of {TAIL ~ semiconductor devices} it is common to deposit a photoresist material onto a substrate to form a mask for {HEAD ~ the etching operation} and to subsequently remove the photoresist material from the substrate 
For example , in the manufacture of { TAIL ~ semiconductor devices } it is common to deposit a photoresist material onto a substrate to form a mask for { HEAD ~ the etching operation } and to subsequently remove the photoresist material from the substrate
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