In the processing space supplied with {HEAD ~ the solvent}, evaporation of the solvent from {TAIL ~ the resist solution} is suppressed 
In the processing space supplied with { HEAD ~ the solvent } , evaporation of the solvent from { TAIL ~ the resist solution } is suppressed
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH