At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of {HEAD ~ a plurality} of {TAIL ~ the films} 
of
At the time of patterning a resist film of the mask blank according to pattern data , film information to check with a pattern is obtained for each of { HEAD ~ a plurality } of { TAIL ~ the films }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL