{HEAD ~ A two step annealing process} is utilized for performing imputity induced disordering comprising an initial higher temperature, shorter term or {TAIL ~ rapid thermal anneal treatment} followed by a lower temperature, longer term or slow thermal anneal treatment 
comprising
{ HEAD ~ A two step annealing process } is utilized for performing imputity induced disordering comprising an initial higher temperature , shorter term or { TAIL ~ rapid thermal anneal treatment } followed by a lower temperature , longer term or slow thermal anneal treatment
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