An anisotropic etch which selectively removes silicon is used to remove {HEAD ~ the silicon} from {TAIL ~ regions} adjacent to the polysilicon gates 320 a and 320 b to from trenches 238 
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An anisotropic etch which selectively removes silicon is used to remove { HEAD ~ the silicon } from { TAIL ~ regions } adjacent to the polysilicon gates 320 a and 320 b to from trenches 238
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH