The oxide application includes a deposition component and {TAIL ~ a sputtering component}, and the sputtering component is configured to remove {HEAD ~ at least a part} of an edge of the first silicon nitride layer 
The oxide application includes a deposition component and { TAIL ~ a sputtering component } , and the sputtering component is configured to remove { HEAD ~ at least a part } of an edge of the first silicon nitride layer
OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH