Accordingly, an object of {HEAD ~ the present invention} is to provide {TAIL ~ a process} for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of a relatively large insulating substrate 
Accordingly , an object of { HEAD ~ the present invention } is to provide { TAIL ~ a process } for forming a thin film of amorphous silicon of a uniform thickness over the entire surface of a relatively large insulating substrate
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