The layer is not developed after {HEAD ~ exposure}; instead, a second layer of {TAIL ~ photoresist material} is deposited and is also exposed in a desired pattern 
The layer is not developed after { HEAD ~ exposure } ; instead , a second layer of { TAIL ~ photoresist material } is deposited and is also exposed in a desired pattern
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH