{HEAD ~ Alkali metal impurity specifications} for chemical precursor solutions for integrated circuit applications are typically set to allow {TAIL ~ impurity levels} of about 20 parts per billion maximum for each type of alkali metal 
typically set to allow
{ HEAD ~ Alkali metal impurity specifications } for chemical precursor solutions for integrated circuit applications are typically set to allow { TAIL ~ impurity levels } of about 20 parts per billion maximum for each type of alkali metal
HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH