The reactor tube is evacuated to a pressure of less than 500 millitorr and is heated to a temperature of not less than 350° C. and not greater than 500° C. A mixture of silane, phosphine and boron trichloride gases is flowed into the reactor tube so that {HEAD ~ the mixture} contacts {TAIL ~ the silicon wafer} 
contacts
The reactor tube is evacuated to a pressure of less than 500 millitorr and is heated to a temperature of not less than 350 ° C. and not greater than 500 ° C. A mixture of silane , phosphine and boron trichloride gases is flowed into the reactor tube so that { HEAD ~ the mixture } contacts { TAIL ~ the silicon wafer }
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