In processing {HEAD ~ a wafer W}, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of {TAIL ~ the wafer W} relatively 
In processing { HEAD ~ a wafer W } , the substrate processing apparatus moves the fluid suppliers 61 , 62 , 63 along the peripheral part of { TAIL ~ the wafer W } relatively
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH