A spin coating process for controlling {TAIL ~ the mean thickness} of photoresist on the surface of {HEAD ~ a semiconductor wafer} 
A spin coating process for controlling { TAIL ~ the mean thickness } of photoresist on the surface of { HEAD ~ a semiconductor wafer }
OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD