The relatively thick layers 112 are composed of a relatively high index of refraction material such as silicon, and in the preferred embodiment are formed with {HEAD ~ a thickness} of {TAIL ~ approximately 78.0 microns}, with a thickness variation of 0.1 microns 
of
The relatively thick layers 112 are composed of a relatively high index of refraction material such as silicon , and in the preferred embodiment are formed with { HEAD ~ a thickness } of { TAIL ~ approximately 78.0 microns } , with a thickness variation of 0.1 microns
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH