The positive resist composition 1, wherein in the compound , {HEAD ~ R1} and R3 are selected from {TAIL ~ the group} consisting of methyl groups, ethyl groups, n propyl groups, isopropyl groups, and cyclohexyl groups 
are selected from
The positive resist composition 1 , wherein in the compound , { HEAD ~ R1 } and R3 are selected from { TAIL ~ the group } consisting of methyl groups , ethyl groups , n propyl groups , isopropyl groups , and cyclohexyl groups
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH