This CMP slurry includes {TAIL ~ suspended solids} as well as {HEAD ~ a chemical solution component} which attacks the material being polished 
This CMP slurry includes { TAIL ~ suspended solids } as well as { HEAD ~ a chemical solution component } which attacks the material being polished
OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH