In the processing space supplied with the solvent, {TAIL ~ evaporation} of the solvent from {HEAD ~ the resist solution} is suppressed 
In the processing space supplied with the solvent , { TAIL ~ evaporation } of the solvent from { HEAD ~ the resist solution } is suppressed
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH