In one embodiment, {HEAD ~ the doped regions} can be self aligned using the first sub gates and {TAIL ~ isolation regions} as implant masks 
self aligned using
In one embodiment , { HEAD ~ the doped regions } can be self aligned using the first sub gates and { TAIL ~ isolation regions } as implant masks
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL REL REL OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH