A first layer of photoresist material is spun onto a substrate surface and is exposed in {TAIL ~ a desired pattern} corresponding to the shape of a final structure, at {HEAD ~ a corresponding cross sectional level} in the structure 
A first layer of photoresist material is spun onto a substrate surface and is exposed in { TAIL ~ a desired pattern } corresponding to the shape of a final structure , at { HEAD ~ a corresponding cross sectional level } in the structure
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH