In a method for performing {HEAD ~ microlithography} of {TAIL ~ a pattern} onto a substrate, using a charged particle beam, wherein at least the substrate is mounted on a movable stage, the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam, an improvement comprising: 
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In a method for performing { HEAD ~ microlithography } of { TAIL ~ a pattern } onto a substrate , using a charged particle beam , wherein at least the substrate is mounted on a movable stage , the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam , an improvement comprising :
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