{TAIL ~ Embodiments} of the present invention provide {HEAD ~ a process} for forming porous silicon oxide based films using a sol gel approach utilizing a precursor solution formulation, which includes a purified surfactant such as a non ionic surfactant, and an additive among other components 
{ TAIL ~ Embodiments } of the present invention provide { HEAD ~ a process } for forming porous silicon oxide based films using a sol gel approach utilizing a precursor solution formulation , which includes a purified surfactant such as a non ionic surfactant , and an additive among other components
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