Furthermore, application of the method and apparatus, in which resist modification and etching are carried out by turns, provides {HEAD ~ an improvement} in apparatus cost and {TAIL ~ throughput} as well as a contribution to the enhancement of productivity compared to the case where the resist modification is performed in a standalone apparatus 
in
Furthermore , application of the method and apparatus , in which resist modification and etching are carried out by turns , provides { HEAD ~ an improvement } in apparatus cost and { TAIL ~ throughput } as well as a contribution to the enhancement of productivity compared to the case where the resist modification is performed in a standalone apparatus
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH