In this way, the nickel elements are selectively introduced into a part of the amorphous silicon film, and {HEAD ~ a heat treatment} is also conducted to allow {TAIL ~ crystal growth} to proceed from that portion toward a direction parallel to a substrate 
is conducted to allow
In this way , the nickel elements are selectively introduced into a part of the amorphous silicon film , and { HEAD ~ a heat treatment } is also conducted to allow { TAIL ~ crystal growth } to proceed from that portion toward a direction parallel to a substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL OTH REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH