{HEAD ~ The monolithic optical coupler} 1, wherein said lithographically definable material is a positive photoresist material, wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of {TAIL ~ each} of said layers form said optical device 
{ HEAD ~ The monolithic optical coupler } 1 , wherein said lithographically definable material is a positive photoresist material , wherein said exposed pattern in each of said first and additional layers is removed by development and unexposed portions of { TAIL ~ each } of said layers form said optical device
HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH