In the Strontium Tantalum Oxide films deposited by using {TAIL ~ plasma} and the atomic layer deposition, its leakage current is very low, and {HEAD ~ its dielectric constant} has a range of 30 to 100 depending on the there heating conditions 
In the Strontium Tantalum Oxide films deposited by using { TAIL ~ plasma } and the atomic layer deposition , its leakage current is very low , and { HEAD ~ its dielectric constant } has a range of 30 to 100 depending on the there heating conditions
OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH