The method for processing a high k dielectric layer 13, wherein the first process gas comprises oxygen radicals and {HEAD ~ the second process gas} comprises {TAIL ~ nitrogen}  
comprises
The method for processing a high k dielectric layer 13 , wherein the first process gas comprises oxygen radicals and { HEAD ~ the second process gas } comprises { TAIL ~ nitrogen }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH