The invention is applied in exposure machines for {TAIL ~ semiconductor lithography} for spatially stable generation of {HEAD ~ radiation} 
The invention is applied in exposure machines for { TAIL ~ semiconductor lithography } for spatially stable generation of { HEAD ~ radiation }
OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD