The reflection mask of FIG 11 is constructed such that, in order to reduce or prevent emergence of {TAIL ~ reflections} from a right hand side boundary 47 of the pattern 221 formed from {HEAD ~ a multilayer} when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ, an absorber 2211 is provided on the right hand side boundary 47 
The reflection mask of FIG 11 is constructed such that , in order to reduce or prevent emergence of { TAIL ~ reflections } from a right hand side boundary 47 of the pattern 221 formed from { HEAD ~ a multilayer } when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ , an absorber 2211 is provided on the right hand side boundary 47
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH