The sixth aspect of the present invention provides the plasma processing apparatus, wherein the ceramic spraying utilizes a ceramic including at least one element selected from {HEAD ~ a group} consisting of Al, Si and Y, such as Al2O3, {TAIL ~ SiC} and Si3N4, and after forming the ceramic sprayed film, a sealing treatment using polymer is performed 
consisting of
The sixth aspect of the present invention provides the plasma processing apparatus , wherein the ceramic spraying utilizes a ceramic including at least one element selected from { HEAD ~ a group } consisting of Al , Si and Y , such as Al2O3 , { TAIL ~ SiC } and Si3N4 , and after forming the ceramic sprayed film , a sealing treatment using polymer is performed
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