The method 11, wherein patterning the resist comprises exposing the entire top surface of the second magnetic layer, wherein removing the resist comprises leaving {HEAD ~ the cap layer} residing over {TAIL ~ the entire top surface} of the second magnetic layer 
residing over
The method 11 , wherein patterning the resist comprises exposing the entire top surface of the second magnetic layer , wherein removing the resist comprises leaving { HEAD ~ the cap layer } residing over { TAIL ~ the entire top surface } of the second magnetic layer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH