The layer is not developed after exposure; instead, {HEAD ~ a second layer} of photoresist material is deposited and is also exposed in {TAIL ~ a desired pattern} 
is deposited in
The layer is not developed after exposure ; instead , { HEAD ~ a second layer } of photoresist material is deposited and is also exposed in { TAIL ~ a desired pattern }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL REL OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL