etching the organic anti reflection coating using {HEAD ~ the resist pattern} as {TAIL ~ a mask}; and 
as
etching the organic anti reflection coating using { HEAD ~ the resist pattern } as { TAIL ~ a mask } ; and
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH