Resist layer 12 may be formed of {HEAD ~ any} of {TAIL ~ the commercially available positive resists} composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule 
of
Resist layer 12 may be formed of { HEAD ~ any } of { TAIL ~ the commercially available positive resists } composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH