{HEAD ~ An anisotropic etch} which selectively removes silicon is used to remove {TAIL ~ the silicon} from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238 
is used to remove
{ HEAD ~ An anisotropic etch } which selectively removes silicon is used to remove { TAIL ~ the silicon } from regions adjacent to the polysilicon gates 320 a and 320 b to from trenches 238
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH