The present invention relates to {HEAD ~ a sputtering target} producing {TAIL ~ few particles} during deposition, a backing plate or sputtering apparatus and a sputtering method producing few particles 
producing
The present invention relates to { HEAD ~ a sputtering target } producing { TAIL ~ few particles } during deposition , a backing plate or sputtering apparatus and a sputtering method producing few particles
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH