{HEAD ~ A first layer} of {TAIL ~ photoresist material} is spun onto a substrate surface and is exposed in a desired pattern corresponding to the shape of a final structure, at a corresponding cross sectional level in the structure 
of
{ HEAD ~ A first layer } of { TAIL ~ photoresist material } is spun onto a substrate surface and is exposed in a desired pattern corresponding to the shape of a final structure , at a corresponding cross sectional level in the structure
HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH