A rotating or vibrating disk or pad is moved relative to {HEAD ~ the semiconductor wafer surface} in {TAIL ~ the presence} of a chemical mechanical polishing slurry 
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A rotating or vibrating disk or pad is moved relative to { HEAD ~ the semiconductor wafer surface } in { TAIL ~ the presence } of a chemical mechanical polishing slurry
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH