{TAIL ~ A method} for forming a dual oxide layer on a silicon substrate provides that layer having {HEAD ~ varying thicknesses} by using a damage layer formed on the silicon substrate, or a silicon nitride layer deposited on the silicon substrate 
{ TAIL ~ A method } for forming a dual oxide layer on a silicon substrate provides that layer having { HEAD ~ varying thicknesses } by using a damage layer formed on the silicon substrate , or a silicon nitride layer deposited on the silicon substrate
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