Since it is formed on a flat top surface in such a case, it is possible to apply the conditions for diffusion or ion implantation that are used in {HEAD ~ the fabrication} of {TAIL ~ VSLIs}, with substantially no change of the process 
of
Since it is formed on a flat top surface in such a case , it is possible to apply the conditions for diffusion or ion implantation that are used in { HEAD ~ the fabrication } of { TAIL ~ VSLIs } , with substantially no change of the process
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH