The method further including applying an oxide material over {HEAD ~ the first silicon nitride barrier layer} that overlies the substrate and {TAIL ~ the metallization line} 
overlies
The method further including applying an oxide material over { HEAD ~ the first silicon nitride barrier layer } that overlies the substrate and { TAIL ~ the metallization line }
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL