After {TAIL ~ a self aligned, silicide layer} has been formed over already fabricated polysilicon and diffusion regions, {HEAD ~ a 750 Angstrom layer} of silicon nitride is deposited by low pressure chemical vapor deposition 
After { TAIL ~ a self aligned , silicide layer } has been formed over already fabricated polysilicon and diffusion regions , { HEAD ~ a 750 Angstrom layer } of silicon nitride is deposited by low pressure chemical vapor deposition
OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH