The FIG 1 embodiment includes a liquid jet type X ray generating device 1 located at {TAIL ~ the most upstream portion} of {HEAD ~ the depicted optical system} of the exposure apparatus 
The FIG 1 embodiment includes a liquid jet type X ray generating device 1 located at { TAIL ~ the most upstream portion } of { HEAD ~ the depicted optical system } of the exposure apparatus
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH