{HEAD ~ Resist layer} 12 may be formed of any of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at {TAIL ~ adjacent positions} on the molecule 
{ HEAD ~ Resist layer } 12 may be formed of any of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at { TAIL ~ adjacent positions } on the molecule
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH