The positive resist composition 1, wherein in {TAIL ~ the compound} , R1 and {HEAD ~ R3} are selected from the group consisting of methyl groups, ethyl groups, n propyl groups, isopropyl groups, and cyclohexyl groups 
in
The positive resist composition 1 , wherein in { TAIL ~ the compound } , R1 and { HEAD ~ R3 } are selected from the group consisting of methyl groups , ethyl groups , n propyl groups , isopropyl groups , and cyclohexyl groups
OTH OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH