In this manner, the central processing unit 10 may control the amount of average RF power distributed to {TAIL ~ each} of {HEAD ~ the applicators} 45 to 52 
In this manner , the central processing unit 10 may control the amount of average RF power distributed to { TAIL ~ each } of { HEAD ~ the applicators } 45 to 52
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH