The flux enhancement layer may then be selectively removed substantially surrounding the upper pole, using the upper pole as a mask, by {HEAD ~ means} of {TAIL ~ a relatively brief ion milling process} in which only on the order of 1.0 kÅ of the layer need be removed and during which a relatively insignificant amount of the material removed might be re deposited on the sides of the upper pole 
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The flux enhancement layer may then be selectively removed substantially surrounding the upper pole , using the upper pole as a mask , by { HEAD ~ means } of { TAIL ~ a relatively brief ion milling process } in which only on the order of 1.0 kÅ of the layer need be removed and during which a relatively insignificant amount of the material removed might be re deposited on the sides of the upper pole
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH