An anisotropic etch which selectively removes silicon is used to remove the silicon from regions adjacent to the polysilicon gates 320 a and {HEAD ~ 320 b} to from {TAIL ~ trenches} 238 
to from
An anisotropic etch which selectively removes silicon is used to remove the silicon from regions adjacent to the polysilicon gates 320 a and { HEAD ~ 320 b } to from { TAIL ~ trenches } 238
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL OTH