A method for forming {HEAD ~ a localized halo structure} in {TAIL ~ a semiconductor substrate} of a semiconductor device, comprising: 
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A method for forming { HEAD ~ a localized halo structure } in { TAIL ~ a semiconductor substrate } of a semiconductor device , comprising :
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH