It is desirable, for example, to provide a lithographic apparatus and method for EUV radiation lithography wherein the losses in {HEAD ~ intensity} of {TAIL ~ the radiation} referred to above, and the increased complexity of the apparatus referred to above, are obviated or mitigated 
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It is desirable , for example , to provide a lithographic apparatus and method for EUV radiation lithography wherein the losses in { HEAD ~ intensity } of { TAIL ~ the radiation } referred to above , and the increased complexity of the apparatus referred to above , are obviated or mitigated
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH