The removal is accomplished by patterning the first conductor 106 by depositing {HEAD ~ a layer} of {TAIL ~ photoresist} 112 and, by conventional photolithographic techniques, forming a resist pattern on the surface of the first conductor 
of
The removal is accomplished by patterning the first conductor 106 by depositing { HEAD ~ a layer } of { TAIL ~ photoresist } 112 and , by conventional photolithographic techniques , forming a resist pattern on the surface of the first conductor
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH