Further, {HEAD ~ a first silicon nitride barrier layer} is defined over the semiconductor substrate and {TAIL ~ the at least one metallization line} that is patterned over the substrate 
Further , { HEAD ~ a first silicon nitride barrier layer } is defined over the semiconductor substrate and { TAIL ~ the at least one metallization line } that is patterned over the substrate
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH