performing a first polishing step having a first removal rate on the oxide layer with a non FA pad until {HEAD ~ a thickness} of {TAIL ~ a remaining portion} of the oxide layer reaches a prescribed thickness that is at least 10 nm; and 
of
performing a first polishing step having a first removal rate on the oxide layer with a non FA pad until { HEAD ~ a thickness } of { TAIL ~ a remaining portion } of the oxide layer reaches a prescribed thickness that is at least 10 nm ; and
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH