The pattern of the partially etched cavities is determined in accordance with {HEAD ~ the pattern} of dies on {TAIL ~ the device wafer}  
on
The pattern of the partially etched cavities is determined in accordance with { HEAD ~ the pattern } of dies on { TAIL ~ the device wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH