{TAIL ~ The resulting structure} is then masked using a photoresist layer 406, which is patterned to define contact areas 408 within which electrodes 111, 113, and 150 will make {HEAD ~ contact} to vias 403.  
{ TAIL ~ The resulting structure } is then masked using a photoresist layer 406 , which is patterned to define contact areas 408 within which electrodes 111 , 113 , and 150 will make { HEAD ~ contact } to vias 403 .
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH