The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy metal contamination caused by plasma damage of {HEAD ~ components} constituting {TAIL ~ the high frequency electrode and gas supply unit} 
constituting
The invention provides a plasma processing apparatus aimed at suppressing the corrosion caused by reactive gas and heavy metal contamination caused by plasma damage of { HEAD ~ components } constituting { TAIL ~ the high frequency electrode and gas supply unit }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL