As described in the foregoing, {HEAD ~ such process} overcomes the fundamental problem causing nonuniformity in the plasma density and realizes the formation of a thin film of amorphous silicon with {TAIL ~ a uniform film thickness distribution} 
As described in the foregoing , { HEAD ~ such process } overcomes the fundamental problem causing nonuniformity in the plasma density and realizes the formation of a thin film of amorphous silicon with { TAIL ~ a uniform film thickness distribution }
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL