In one aspect, a method of depositing an aluminum nitride comprising {HEAD ~ layer} over {TAIL ~ a semiconductor substrate} includes positioning a semiconductor substrate within a chemical vapor deposition reactor 
over
In one aspect , a method of depositing an aluminum nitride comprising { HEAD ~ layer } over { TAIL ~ a semiconductor substrate } includes positioning a semiconductor substrate within a chemical vapor deposition reactor
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH