Subsequently, a photoresist film is coated on the polysilicon layer 32 and then patterned by {HEAD ~ an exposure and development process} to form {TAIL ~ a photoresist pattern} 
to form
Subsequently , a photoresist film is coated on the polysilicon layer 32 and then patterned by { HEAD ~ an exposure and development process } to form { TAIL ~ a photoresist pattern }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL