In the Strontium Tantalum Oxide films deposited by using plasma and the atomic layer deposition, its leakage current is very low, and {HEAD ~ its dielectric constant} has {TAIL ~ a range} of 30 to 100 depending on the there heating conditions 
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In the Strontium Tantalum Oxide films deposited by using plasma and the atomic layer deposition , its leakage current is very low , and { HEAD ~ its dielectric constant } has { TAIL ~ a range } of 30 to 100 depending on the there heating conditions
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH