When a phenol resin, polyvinylpyrolidone, and the like are used as the resin, the resist pattern is excellent particularly in etch resistance because the resin and {HEAD ~ the compound} represented by {TAIL ~ the General Formula} respectively have an aromatic ring 
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When a phenol resin , polyvinylpyrolidone , and the like are used as the resin , the resist pattern is excellent particularly in etch resistance because the resin and { HEAD ~ the compound } represented by { TAIL ~ the General Formula } respectively have an aromatic ring
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH