The invention is applied in exposure machines for semiconductor lithography for {HEAD ~ spatially stable generation} of {TAIL ~ radiation} 
of
The invention is applied in exposure machines for semiconductor lithography for { HEAD ~ spatially stable generation } of { TAIL ~ radiation }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL