A method is provided for a repetitive deposition and etch of a substrate using {HEAD ~ a carbon} containing {TAIL ~ ion beam} in a gridded ion source 
containing
A method is provided for a repetitive deposition and etch of a substrate using { HEAD ~ a carbon } containing { TAIL ~ ion beam } in a gridded ion source
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH