thereafter annealing said structure at a lower temperature in the range of 700° C. to 900° C. to induce an extension of {HEAD ~ the diffusion profile} deeper into {TAIL ~ said structure}, 
deeper into
thereafter annealing said structure at a lower temperature in the range of 700 ° C. to 900 ° C. to induce an extension of { HEAD ~ the diffusion profile } deeper into { TAIL ~ said structure } ,
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH