Subsequently, {HEAD ~ a photoresist film} is coated on {TAIL ~ the polysilicon layer} 32 and then patterned by an exposure and development process to form a photoresist pattern 
is coated on
Subsequently , { HEAD ~ a photoresist film } is coated on { TAIL ~ the polysilicon layer } 32 and then patterned by an exposure and development process to form a photoresist pattern
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH