The invention relates generally to processing {HEAD ~ a surface} on a substrate, e.g., depositing a coating on or etching by using a carbon containing ion bean using {TAIL ~ a gridded ion source}, particularly an RF or microwave plasma source 
The invention relates generally to processing { HEAD ~ a surface } on a substrate , e.g. , depositing a coating on or etching by using a carbon containing ion bean using { TAIL ~ a gridded ion source } , particularly an RF or microwave plasma source
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH