As described in the foregoing, {HEAD ~ such process} overcomes {TAIL ~ the fundamental problem} causing nonuniformity in the plasma density and realizes the formation of a thin film of amorphous silicon with a uniform film thickness distribution 
overcomes
As described in the foregoing , { HEAD ~ such process } overcomes { TAIL ~ the fundamental problem } causing nonuniformity in the plasma density and realizes the formation of a thin film of amorphous silicon with a uniform film thickness distribution
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH