The pattern of the partially etched cavities is determined in accordance with {TAIL ~ the pattern} of dies on {HEAD ~ the device wafer}  
The pattern of the partially etched cavities is determined in accordance with { TAIL ~ the pattern } of dies on { HEAD ~ the device wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH