{HEAD ~ Alkali metal impurity specifications} for {TAIL ~ chemical precursor solutions} for integrated circuit applications are typically set to allow impurity levels of about 20 parts per billion maximum for each type of alkali metal 
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{ HEAD ~ Alkali metal impurity specifications } for { TAIL ~ chemical precursor solutions } for integrated circuit applications are typically set to allow impurity levels of about 20 parts per billion maximum for each type of alkali metal
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