{HEAD ~ Methods} are discussed for forming a localized halo structure and {TAIL ~ a retrograde profile} in a substrate of a semiconductor device 
are discussed for forming
{ HEAD ~ Methods } are discussed for forming a localized halo structure and { TAIL ~ a retrograde profile } in a substrate of a semiconductor device
HEAD HEAD HEAD HEAD HEAD REL REL REL REL OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH