{HEAD ~ This invention} pertains to {TAIL ~ microlithography apparatus} and methods employing a charged particle beam for transferring a pattern, defined by a mask or reticle, onto a suitable substrate such as a semiconductor wafer 
pertains to
{ HEAD ~ This invention } pertains to { TAIL ~ microlithography apparatus } and methods employing a charged particle beam for transferring a pattern , defined by a mask or reticle , onto a suitable substrate such as a semiconductor wafer
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