performing {TAIL ~ a first polishing step} having a first removal rate on the oxide layer with a non FA pad until {HEAD ~ a thickness} of a remaining portion of the oxide layer reaches a prescribed thickness that is at least 10 nm; and 
performing { TAIL ~ a first polishing step } having a first removal rate on the oxide layer with a non FA pad until { HEAD ~ a thickness } of a remaining portion of the oxide layer reaches a prescribed thickness that is at least 10 nm ; and
OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH