{HEAD ~ The relatively thick layers} 112 are composed of a relatively high index of refraction material such as silicon, and in the preferred embodiment are formed with a thickness of approximately 78.0 microns, with a thickness variation of {TAIL ~ 0.1 microns} 
{ HEAD ~ The relatively thick layers } 112 are composed of a relatively high index of refraction material such as silicon , and in the preferred embodiment are formed with a thickness of approximately 78.0 microns , with a thickness variation of { TAIL ~ 0.1 microns }
HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL