The present invention relates generally to semiconductor devices and more particularly to methods for forming localized halo structures in a semiconductor substrate in {HEAD ~ the fabrication} of {TAIL ~ semiconductor devices} 
of
The present invention relates generally to semiconductor devices and more particularly to methods for forming localized halo structures in a semiconductor substrate in { HEAD ~ the fabrication } of { TAIL ~ semiconductor devices }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL