{TAIL ~ The semiconductor wafer} is rotated by the spin chuck to spread {HEAD ~ the resist solution} over the entire surface of the semiconductor wafer W 
{ TAIL ~ The semiconductor wafer } is rotated by the spin chuck to spread { HEAD ~ the resist solution } over the entire surface of the semiconductor wafer W
TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH