At the time of patterning {HEAD ~ a resist film} of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of {TAIL ~ the films} 
At the time of patterning { HEAD ~ a resist film } of the mask blank according to pattern data , film information to check with a pattern is obtained for each of a plurality of { TAIL ~ the films }
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL