This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring {HEAD ~ a pattern}, defined by a mask or reticle, onto {TAIL ~ a suitable substrate} such as a semiconductor wafer 
onto
This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring { HEAD ~ a pattern } , defined by a mask or reticle , onto { TAIL ~ a suitable substrate } such as a semiconductor wafer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH