FIG 2 illustrates, in a cross sectional view, a dry plasma etched multilayer semiconductor structure 20 of {HEAD ~ a semiconductor device} 2000, according to {TAIL ~ the present invention} 
according to
FIG 2 illustrates , in a cross sectional view , a dry plasma etched multilayer semiconductor structure 20 of { HEAD ~ a semiconductor device } 2000 , according to { TAIL ~ the present invention }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL