selectively etching a part of the second conductive layer to form {HEAD ~ a portion} of {TAIL ~ the gate electrode} consisting of the first conductive layer 
of
selectively etching a part of the second conductive layer to form { HEAD ~ a portion } of { TAIL ~ the gate electrode } consisting of the first conductive layer
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH