Because {HEAD ~ a wet etching process} is used to pattern {TAIL ~ the top magnetic material layer} of the MTJ, lateral etching of the top magnetic material layer is reduced or eliminated 
Because { HEAD ~ a wet etching process } is used to pattern { TAIL ~ the top magnetic material layer } of the MTJ , lateral etching of the top magnetic material layer is reduced or eliminated
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH