A quick wet etching process is performed to remove {HEAD ~ a portion} of {TAIL ~ the remaining first oxide} located on the top of the gate structure and on the substrate 
A quick wet etching process is performed to remove { HEAD ~ a portion } of { TAIL ~ the remaining first oxide } located on the top of the gate structure and on the substrate
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH