{HEAD ~ The oxide layer} 22 may comprise {TAIL ~ silicon dioxide} and may be formed by, for example, a thermal oxidation process or a chemical vapor deposition process 
{ HEAD ~ The oxide layer } 22 may comprise { TAIL ~ silicon dioxide } and may be formed by , for example , a thermal oxidation process or a chemical vapor deposition process
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH