The process comprising forming {TAIL ~ a thin film} of amorphous silicon on {HEAD ~ an insulating substrate} by a plasma enhanced chemical vapor deposition process while intermittently generating a high frequency discharge 
The process comprising forming { TAIL ~ a thin film } of amorphous silicon on { HEAD ~ an insulating substrate } by a plasma enhanced chemical vapor deposition process while intermittently generating a high frequency discharge
OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH