Therefore, {HEAD ~ a space pattern} of resist formed with the thickened resist pattern has a fine structure, exceeding the exposure limit of {TAIL ~ light sources} of an available exposure device 
Therefore , { HEAD ~ a space pattern } of resist formed with the thickened resist pattern has a fine structure , exceeding the exposure limit of { TAIL ~ light sources } of an available exposure device
OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH