While {HEAD ~ each} of {TAIL ~ the above embodiments} and examples has been described with reference to an ECR plasma generator serving as plasma generation means, the present invention is not restricted to this but another plasma CVD apparatus such as a high frequency plasma CVD apparatus or a DC plasma CVD apparatus is also employable 
While { HEAD ~ each } of { TAIL ~ the above embodiments } and examples has been described with reference to an ECR plasma generator serving as plasma generation means , the present invention is not restricted to this but another plasma CVD apparatus such as a high frequency plasma CVD apparatus or a DC plasma CVD apparatus is also employable
OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH