To achieve these and other advantages and in accordance with the purpose of the invention, as embodied and broadly described herein, the invention provides {HEAD ~ a method} of manufacturing {TAIL ~ a spacer} for a substrate having a gate structure formed thereon 
To achieve these and other advantages and in accordance with the purpose of the invention , as embodied and broadly described herein , the invention provides { HEAD ~ a method } of manufacturing { TAIL ~ a spacer } for a substrate having a gate structure formed thereon
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH