{HEAD ~ The object} of the present invention is to provide {TAIL ~ a semiconductor device} provided with a protective film excellent in water and oil repellency, durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or a color filter and a manufacturing method thereof 
{ HEAD ~ The object } of the present invention is to provide { TAIL ~ a semiconductor device } provided with a protective film excellent in water and oil repellency , durability and anti soiling property by forming a very thin uniform film with such a small thickness as measured on the nanometer order on the surface of a semiconductor device or a color filter and a manufacturing method thereof
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