A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of {TAIL ~ the substrate table} may be arranged to reduce {HEAD ~ the transmission} of forces between the different parts 
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of { TAIL ~ the substrate table } may be arranged to reduce { HEAD ~ the transmission } of forces between the different parts
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH