using {HEAD ~ a wet etch process} for etching TiN, etching {TAIL ~ said first layer}; and 
using { HEAD ~ a wet etch process } for etching TiN , etching { TAIL ~ said first layer } ; and
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH