In a method for performing microlithography of a pattern onto a substrate, using a charged particle beam, wherein {HEAD ~ at least the substrate} is mounted on {TAIL ~ a movable stage}, the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam, an improvement comprising: 
In a method for performing microlithography of a pattern onto a substrate , using a charged particle beam , wherein { HEAD ~ at least the substrate } is mounted on { TAIL ~ a movable stage } , the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam , an improvement comprising :
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH