An apparatus for surface treatment of semiconductor substrate with chemical solution 3, wherein the unit measures the concentrations of metals, or fine particles, or {HEAD ~ the amount} of {TAIL ~ carbon} 
An apparatus for surface treatment of semiconductor substrate with chemical solution 3 , wherein the unit measures the concentrations of metals , or fine particles , or { HEAD ~ the amount } of { TAIL ~ carbon }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL