A first method is to simply direct the e beam towards {HEAD ~ the wafer surface} at {TAIL ~ one point} for a certain time until X rays are caused to be emitted from the sample in response to the e beam 
A first method is to simply direct the e beam towards { HEAD ~ the wafer surface } at { TAIL ~ one point } for a certain time until X rays are caused to be emitted from the sample in response to the e beam
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH