The process for forming a thin film 9, further comprising selecting a modulation frequency and a duty ratio for {HEAD ~ the intermittent generation} of {TAIL ~ the high frequency discharge} based on the time period necessary for a DC bias voltage to attain said maximum value 
The process for forming a thin film 9 , further comprising selecting a modulation frequency and a duty ratio for { HEAD ~ the intermittent generation } of { TAIL ~ the high frequency discharge } based on the time period necessary for a DC bias voltage to attain said maximum value
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH