The invention provides a plasma processing apparatus aimed at suppressing {HEAD ~ the corrosion} caused by {TAIL ~ reactive gas} and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit 
The invention provides a plasma processing apparatus aimed at suppressing { HEAD ~ the corrosion } caused by { TAIL ~ reactive gas } and heavy metal contamination caused by plasma damage of components constituting the high frequency electrode and gas supply unit
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH