The polishing pad 1, wherein {HEAD ~ the polishing layer} comprises {TAIL ~ polyurethane} obtained by reacting a polymer diol, an organic diisocyanate, and a chain extender 
The polishing pad 1 , wherein { HEAD ~ the polishing layer } comprises { TAIL ~ polyurethane } obtained by reacting a polymer diol , an organic diisocyanate , and a chain extender
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH