The method for processing a high k dielectric layer 13, wherein the first process gas comprises {TAIL ~ oxygen radicals} and {HEAD ~ the second process gas} comprises nitrogen  
The method for processing a high k dielectric layer 13 , wherein the first process gas comprises { TAIL ~ oxygen radicals } and { HEAD ~ the second process gas } comprises nitrogen
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH