In a method for performing {TAIL ~ microlithography} of a pattern onto a substrate, using {HEAD ~ a charged particle beam}, wherein at least the substrate is mounted on a movable stage, the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam, an improvement comprising: 
In a method for performing { TAIL ~ microlithography } of a pattern onto a substrate , using { HEAD ~ a charged particle beam } , wherein at least the substrate is mounted on a movable stage , the microlithography being performed by scanningly moving the stage at a stage velocity while continuously transferring successive portions of the pattern to the substrate using the charged particle beam , an improvement comprising :
OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH