{HEAD ~ A cap layer} is then formed over the patterned top magnetic material layer using {TAIL ~ a lift} off technique, wherein when the resist is removed, a material disposed over the resist is also removed 
{ HEAD ~ A cap layer } is then formed over the patterned top magnetic material layer using { TAIL ~ a lift } off technique , wherein when the resist is removed , a material disposed over the resist is also removed
HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL OTH REL OTH OTH OTH OTH OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH