In this case, silicon nitride is also deposited on {HEAD ~ the formed silicon nitride film} 5, so that {TAIL ~ the thickness} of the passivation film 5 of silicon nitride is increased 
In this case , silicon nitride is also deposited on { HEAD ~ the formed silicon nitride film } 5 , so that { TAIL ~ the thickness } of the passivation film 5 of silicon nitride is increased
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH