A contact level layer of photoresist is applied, and {HEAD ~ the contact level pattern} is lithographically defined in {TAIL ~ the resist} 
A contact level layer of photoresist is applied , and { HEAD ~ the contact level pattern } is lithographically defined in { TAIL ~ the resist }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL