The reflection mask of FIG 11 is constructed such that, in {HEAD ~ order} to reduce or prevent {TAIL ~ emergence} of reflections from a right hand side boundary 47 of the pattern 221 formed from a multilayer when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ, an absorber 2211 is provided on the right hand side boundary 47 
The reflection mask of FIG 11 is constructed such that , in { HEAD ~ order } to reduce or prevent { TAIL ~ emergence } of reflections from a right hand side boundary 47 of the pattern 221 formed from a multilayer when the vacuum ultraviolet radiation or X radiation 411 is introduced at the incidence angle θ , an absorber 2211 is provided on the right hand side boundary 47
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