In another embodiment, a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets, flowing one or more gases through the manifold to a vacuum environment by passing {HEAD ~ the processing chamber} prior to processing or to a calibration circuit, and flowing the one or more gases into the processing chamber during {TAIL ~ substrate processing} 
In another embodiment , a method includes providing a manifold having at least a plurality of inlet that may be selectively coupled to at least one of a plurality of outlets , flowing one or more gases through the manifold to a vacuum environment by passing { HEAD ~ the processing chamber } prior to processing or to a calibration circuit , and flowing the one or more gases into the processing chamber during { TAIL ~ substrate processing }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL