Referring to FIGS 5 and 6A, an etch stopping layer 12 and {HEAD ~ a mold silicon oxide layer} 14 are sequentially deposited on {TAIL ~ a substrate} 10 in step S51 
Referring to FIGS 5 and 6A , an etch stopping layer 12 and { HEAD ~ a mold silicon oxide layer } 14 are sequentially deposited on { TAIL ~ a substrate } 10 in step S51
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH