{HEAD ~ Resist layer} 12 may be formed of {TAIL ~ any} of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule 
{ HEAD ~ Resist layer } 12 may be formed of { TAIL ~ any } of the commercially available positive resists composed of an alkali soluble phenol formaldehyde novolak resin and a photoactive compound containing diazo and keto groups at adjacent positions on the molecule
HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH