Methods are disclosed for improving {HEAD ~ the yield} of acceptable product from {TAIL ~ microlithography} using a charged particle beam 
Methods are disclosed for improving { HEAD ~ the yield } of acceptable product from { TAIL ~ microlithography } using a charged particle beam
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH