An important technical advantage of the invention in {TAIL ~ its provision} of {HEAD ~ the JFET gate region} with dopant concentration that is enhanced over that of the semiconductor layer 
An important technical advantage of the invention in { TAIL ~ its provision } of { HEAD ~ the JFET gate region } with dopant concentration that is enhanced over that of the semiconductor layer
OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH