It is known in the semiconductor integrated circuit industry that alkali metal ions are desirably excluded from silicon dioxide films used as {TAIL ~ metal oxide semiconductor transistor insulators} and {HEAD ~ multilevel interconnection insulators}, because these positively charged ions are mobile when exposed to electric fields 
It is known in the semiconductor integrated circuit industry that alkali metal ions are desirably excluded from silicon dioxide films used as { TAIL ~ metal oxide semiconductor transistor insulators } and { HEAD ~ multilevel interconnection insulators } , because these positively charged ions are mobile when exposed to electric fields
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