In this way, the nickel elements are selectively introduced into a part of the amorphous silicon film, and a heat treatment is also conducted to allow {TAIL ~ crystal growth} to proceed from that portion toward a direction parallel to {HEAD ~ a substrate} 
In this way , the nickel elements are selectively introduced into a part of the amorphous silicon film , and a heat treatment is also conducted to allow { TAIL ~ crystal growth } to proceed from that portion toward a direction parallel to { HEAD ~ a substrate }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD