Thus, a semiconductor substrate including {HEAD ~ a semiconductor film} on the substrate body via an insulating film, having {TAIL ~ superior crystallinity}, including no sub grain boundary, and having a thickness of more than several μm, is obtained 
Thus , a semiconductor substrate including { HEAD ~ a semiconductor film } on the substrate body via an insulating film , having { TAIL ~ superior crystallinity } , including no sub grain boundary , and having a thickness of more than several μm , is obtained
OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH