A first method is to simply direct {TAIL ~ the e beam} towards the wafer surface at one point for {HEAD ~ a certain time} until X rays are caused to be emitted from the sample in response to the e beam 
A first method is to simply direct { TAIL ~ the e beam } towards the wafer surface at one point for { HEAD ~ a certain time } until X rays are caused to be emitted from the sample in response to the e beam
OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH