performing {HEAD ~ a first polishing step} having {TAIL ~ a first removal rate} on the oxide layer with a non FA pad until a thickness of a remaining portion of the oxide layer reaches a prescribed thickness that is at least 10 nm; and 
performing { HEAD ~ a first polishing step } having { TAIL ~ a first removal rate } on the oxide layer with a non FA pad until a thickness of a remaining portion of the oxide layer reaches a prescribed thickness that is at least 10 nm ; and
OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH