The oxide application includes a deposition component and a sputtering component, and the sputtering component is configured to remove at least a part of {HEAD ~ an edge} of {TAIL ~ the first silicon nitride layer} 
The oxide application includes a deposition component and a sputtering component , and the sputtering component is configured to remove at least a part of { HEAD ~ an edge } of { TAIL ~ the first silicon nitride layer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL