The layer is not developed after exposure; instead, a second layer of {TAIL ~ photoresist material} is deposited and is also exposed in {HEAD ~ a desired pattern} 
The layer is not developed after exposure ; instead , a second layer of { TAIL ~ photoresist material } is deposited and is also exposed in { HEAD ~ a desired pattern }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD