The monolithic optical coupler 1, wherein said {TAIL ~ lithographically definable material} is a positive photoresist material, wherein said exposed pattern in each of said first and additional layers is removed by {HEAD ~ development} and unexposed portions of each of said layers form said optical device 
The monolithic optical coupler 1 , wherein said { TAIL ~ lithographically definable material } is a positive photoresist material , wherein said exposed pattern in each of said first and additional layers is removed by { HEAD ~ development } and unexposed portions of each of said layers form said optical device
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