Simultaneously, the resist solution is dropped from {TAIL ~ a resist solution supply nozzle} onto {HEAD ~ the semiconductor wafer} and spread following the solvent 
Simultaneously , the resist solution is dropped from { TAIL ~ a resist solution supply nozzle } onto { HEAD ~ the semiconductor wafer } and spread following the solvent
OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH