{HEAD ~ A first method} is to simply direct {TAIL ~ the e beam} towards the wafer surface at one point for a certain time until X rays are caused to be emitted from the sample in response to the e beam 
{ HEAD ~ A first method } is to simply direct { TAIL ~ the e beam } towards the wafer surface at one point for a certain time until X rays are caused to be emitted from the sample in response to the e beam
HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH