An objective of {TAIL ~ the present invention} is to provide a method for processing a high k dielectric layer to improve the quality of {HEAD ~ the high k dielectric layer} 
An objective of { TAIL ~ the present invention } is to provide a method for processing a high k dielectric layer to improve the quality of { HEAD ~ the high k dielectric layer }
OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD