forming source/drain regions in a semiconductor substrate, wherein {HEAD ~ the source/drain regions} define {TAIL ~ a channel region} therebetween 
forming source / drain regions in a semiconductor substrate , wherein { HEAD ~ the source / drain regions } define { TAIL ~ a channel region } therebetween
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH