The removal is accomplished by patterning the first conductor 106 by depositing a layer of {HEAD ~ photoresist} 112 and, by {TAIL ~ conventional photolithographic techniques}, forming a resist pattern on the surface of the first conductor 
The removal is accomplished by patterning the first conductor 106 by depositing a layer of { HEAD ~ photoresist } 112 and , by { TAIL ~ conventional photolithographic techniques } , forming a resist pattern on the surface of the first conductor
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH