A spin coating process for controlling {TAIL ~ the mean thickness} of {HEAD ~ photoresist} on the surface of a semiconductor wafer 
A spin coating process for controlling { TAIL ~ the mean thickness } of { HEAD ~ photoresist } on the surface of a semiconductor wafer
OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH