These manufacturing methods facilitate {HEAD ~ control} of {TAIL ~ the oxygen concentration} in the SRO, the relative thicknesses of the silicon oxide and silicon layers, and provides improved step coverage, thus allowing the manufacturing of high quality semiconductor devices 
These manufacturing methods facilitate { HEAD ~ control } of { TAIL ~ the oxygen concentration } in the SRO , the relative thicknesses of the silicon oxide and silicon layers , and provides improved step coverage , thus allowing the manufacturing of high quality semiconductor devices
OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH