Provided are methods for manufacturing silicon rich oxide layers useful in the fabrication of semiconductor devices, for example, non volatile memory devices, and {HEAD ~ methods} for fabricating {TAIL ~ semiconductor devices} incorporating such SRO layers 
Provided are methods for manufacturing silicon rich oxide layers useful in the fabrication of semiconductor devices , for example , non volatile memory devices , and { HEAD ~ methods } for fabricating { TAIL ~ semiconductor devices } incorporating such SRO layers
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