This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern, defined by a mask or reticle, onto {HEAD ~ a suitable substrate} such as {TAIL ~ a semiconductor wafer} 
This invention pertains to microlithography apparatus and methods employing a charged particle beam for transferring a pattern , defined by a mask or reticle , onto { HEAD ~ a suitable substrate } such as { TAIL ~ a semiconductor wafer }
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL