A trench is formed in {TAIL ~ the source/drain region} of the semiconductor substrate thereby removing at least a portion of the halo structure in {HEAD ~ the source/drain region} 
A trench is formed in { TAIL ~ the source / drain region } of the semiconductor substrate thereby removing at least a portion of the halo structure in { HEAD ~ the source / drain region }
OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD HEAD