It is desirable, for example, to provide a lithographic apparatus and method for EUV radiation lithography wherein the losses in intensity of {TAIL ~ the radiation} referred to above, and {HEAD ~ the increased complexity} of the apparatus referred to above, are obviated or mitigated 
It is desirable , for example , to provide a lithographic apparatus and method for EUV radiation lithography wherein the losses in intensity of { TAIL ~ the radiation } referred to above , and { HEAD ~ the increased complexity } of the apparatus referred to above , are obviated or mitigated
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH