In a semiconductor device and {HEAD ~ a method} of manufacturing {TAIL ~ the semiconductor device}, the source wires 126 of a pixel portion 205 are formed of material having low resistance  
In a semiconductor device and { HEAD ~ a method } of manufacturing { TAIL ~ the semiconductor device } , the source wires 126 of a pixel portion 205 are formed of material having low resistance
OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH