Consequently, the reproducibility of treatment of {HEAD ~ semiconductor substrate} with chemical solution can be enhanced, and improvements in {TAIL ~ yield} and reliability of semiconductor device can be expected 
Consequently , the reproducibility of treatment of { HEAD ~ semiconductor substrate } with chemical solution can be enhanced , and improvements in { TAIL ~ yield } and reliability of semiconductor device can be expected
OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH