An objective of the present invention is to provide {HEAD ~ a method} for processing {TAIL ~ a high k dielectric layer} to improve the quality of the high k dielectric layer 
An objective of the present invention is to provide { HEAD ~ a method } for processing { TAIL ~ a high k dielectric layer } to improve the quality of the high k dielectric layer
OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD REL REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH