Then the antireflection film 7 of silicon nitride having a thickness of 1.8 μm is formed on {HEAD ~ the exposed surface} of {TAIL ~ the P+ type region} 6 by plasma CVD 
Then the antireflection film 7 of silicon nitride having a thickness of 1.8 μm is formed on { HEAD ~ the exposed surface } of { TAIL ~ the P+ type region } 6 by plasma CVD
OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH HEAD HEAD HEAD HEAD HEAD HEAD HEAD REL TAIL TAIL TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH