{HEAD ~ The present invention} relates to a resist composition which has {TAIL ~ high resistance} to oxygen plasmas and can form high precision fine patterns such as semiconductor circuits 
{ HEAD ~ The present invention } relates to a resist composition which has { TAIL ~ high resistance } to oxygen plasmas and can form high precision fine patterns such as semiconductor circuits
HEAD HEAD HEAD HEAD HEAD HEAD HEAD OTH OTH OTH OTH OTH OTH OTH TAIL TAIL TAIL TAIL TAIL TAIL OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH OTH