Introduction to general relativity in a setting with comparatively strong gravitational fields. This has become possible thanks to precision observations of binary pulsars. In such a star system, two highly compact neutron stars orbit each other. At least one of them is a pulsar – an astronomical object that emits a tight beam of radiowaves. These beams strike the Earth at very regular intervals, similarly to the way that the rotating beam of a lighthouse means that an observer sees the lighthouse blink, and can be observed as a highly regular series of pulses. General relativity predicts specific deviations from the regularity of these
Proximity effect (electron beam lithography) 50 nanometers) that ultimately affects the practical resolution of the EBL process. The model described above can be extended for these effects. Proximity effect (electron beam lithography) The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern, due to the interactions of the primary beam electrons with the resist and substrate. These cause the resist outside the scanned pattern to receive a non-zero dose. Important contributions to weak-resist polymer chain scission (for positive resists) or crosslinking (for negative resists) come from electron forward