Pulsar star. The neutron star retains most of its angular momentum, and since it has only a tiny fraction of its progenitor's radius (and therefore its moment of inertia is sharply reduced), it is formed with very high rotation speed. A beam of radiation is emitted along the magnetic axis of the pulsar, which spins along with the rotation of the neutron star. The magnetic axis of the pulsar determines the direction of the electromagnetic beam, with the magnetic axis not necessarily being the same as its rotational axis. This misalignment causes the beam to be seen once for every rotation
Proximity effect (electron beam lithography) 50 nanometers) that ultimately affects the practical resolution of the EBL process. The model described above can be extended for these effects. Proximity effect (electron beam lithography) The proximity effect in electron beam lithography (EBL) is the phenomenon that the exposure dose distribution, and hence the developed pattern, is wider than the scanned pattern, due to the interactions of the primary beam electrons with the resist and substrate. These cause the resist outside the scanned pattern to receive a non-zero dose. Important contributions to weak-resist polymer chain scission (for positive resists) or crosslinking (for negative resists) come from electron forward