Nonmetal as nonmetals. Among the reactive nonmetals, carbon, phosphorus, selenium, and iodine—which border the metalloids—show some metallic character, as does hydrogen. Among the noble gases, radon is the most metallic and begins to show some cationic behaviour, which is unusual for a nonmetal. The seven metalloids are boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te), and astatine (At). On a standard periodic table, they occupy a diagonal area in the p-block extending from boron at the upper left to astatine at lower right, along the dividing line between metals and nonmetals shown on some periodic tables. They
Silicon-germanium Silicon-germanium SiGe ( or ), or silicon-germanium, is an alloy with any molar ratio of silicon and germanium, i.e. with a molecular formula of the form SiGe. It is commonly used as a semiconductor material in integrated circuits (ICs) for heterojunction bipolar transistors or as a strain-inducing layer for CMOS transistors. IBM introduced the technology into mainstream manufacturing in 1989. This relatively new technology offers opportunities in mixed-signal circuit and analog circuit IC design and manufacture. SiGe is also used as a thermoelectric material for high temperature applications (>700 K). The use of silicon-germanium as a semiconductor was championed by