Lists of metalloids cluster. Cluster 1 (93%) = B, Si, Ge, As, Sb, Te; cluster 2 (44%) = Po, At; cluster 3 (24%) = Se; cluster 4 (9%) = C, Al; cluster 5 (5%) = Be, P, Bi; cluster 6 (3%) = Sn; and cluster 7 (1%) = H, Ga, S, I, Pb, Fl, Mc, Lv, Ts. The resulting geometric trend line has the formula y = 199.47e and an R value of 0.9962. The elements commonly classified as metalloids are boron, silicon, germanium, arsenic, antimony and tellurium. The status of polonium and astatine is not settled. Most authors recognise one or the
Silicon-germanium Silicon-germanium SiGe ( or ), or silicon-germanium, is an alloy with any molar ratio of silicon and germanium, i.e. with a molecular formula of the form SiGe. It is commonly used as a semiconductor material in integrated circuits (ICs) for heterojunction bipolar transistors or as a strain-inducing layer for CMOS transistors. IBM introduced the technology into mainstream manufacturing in 1989. This relatively new technology offers opportunities in mixed-signal circuit and analog circuit IC design and manufacture. SiGe is also used as a thermoelectric material for high temperature applications (>700 K). The use of silicon-germanium as a semiconductor was championed by