Metalloid found in cell phones (along with at least 39 other metals and nonmetals). Tellurium is expected to find such use. Of the less often recognised metalloids, phosphorus, gallium (in particular) and selenium have semiconductor applications. Phosphorus is used in trace amounts as a dopant for n-type semiconductors. The commercial use of gallium compounds is dominated by semiconductor applications—in integrated circuits, cell phones, laser diodes, light-emitting diodes, photodetectors, and solar cells. Selenium is used in the production of solar cells and in high-energy surge protectors. Boron, silicon, germanium, antimony, and tellurium, as well as heavier metals and metalloids such as Sm,
Porous silicon Porous silicon Porous silicon (abbreviated as "PS" or "pSi") is a form of the chemical element silicon that has introduced nanopores in its microstructure, rendering a large surface to volume ratio in the order of 500 m/cm. Porous silicon was discovered by accident in 1956 by Arthur Uhlir Jr. and Ingeborg Uhlir at the Bell Labs in the U.S. At the time, the Ulhirs were in the process of developing a technique for polishing and shaping the surfaces of silicon and germanium. However, it was found that under several conditions a crude product in the form of thick black, red