Origin and use of the term metalloid antimony and tellurium, was recorded merely on a 'sometimes' basis. Use of the term metalloid subsequently underwent a period of great flux up to 1940. Consensus as to its application to intermediate or borderline elements did not occur until the ensuing years, between 1940 and 1960. In 1947, Pauling included a reference to metalloids in his classic and influential textbook, "General chemistry: An introduction to descriptive chemistry and modern chemical theory." He described them as 'elements with intermediate properties ... occupy[ing] a diagonal region [on the periodic table], which includes boron, silicon, germanium, arsenic, antimony, tellurium, and polonium.' In 1959
Silicon-germanium Silicon-germanium SiGe ( or ), or silicon-germanium, is an alloy with any molar ratio of silicon and germanium, i.e. with a molecular formula of the form SiGe. It is commonly used as a semiconductor material in integrated circuits (ICs) for heterojunction bipolar transistors or as a strain-inducing layer for CMOS transistors. IBM introduced the technology into mainstream manufacturing in 1989. This relatively new technology offers opportunities in mixed-signal circuit and analog circuit IC design and manufacture. SiGe is also used as a thermoelectric material for high temperature applications (>700 K). The use of silicon-germanium as a semiconductor was championed by