Nonmetal are called "metalloids" mainly in light of their physical resemblance to metals. While they each have a metallic appearance, they are brittle and only fair conductors of electricity. Boron, silicon, germanium, tellurium are semiconductors. Arsenic and antimony have the electronic band structures of semimetals although both have less stable semiconducting allotropes. Astatine has been predicted to have a metallic crystalline structure. Chemically the metalloids generally behave like (weak) nonmetals. They have moderate ionisation energies, low to high electron affinities, moderate electronegativity values, are poor to moderately strong oxidising agents, and demonstrate a tendency to form alloys with metals. The reactive
Silicon-germanium Silicon-germanium SiGe ( or ), or silicon-germanium, is an alloy with any molar ratio of silicon and germanium, i.e. with a molecular formula of the form SiGe. It is commonly used as a semiconductor material in integrated circuits (ICs) for heterojunction bipolar transistors or as a strain-inducing layer for CMOS transistors. IBM introduced the technology into mainstream manufacturing in 1989. This relatively new technology offers opportunities in mixed-signal circuit and analog circuit IC design and manufacture. SiGe is also used as a thermoelectric material for high temperature applications (>700 K). The use of silicon-germanium as a semiconductor was championed by