Ultraviolet photography Silicon (from which DSLR sensors are made) can respond to wavelengths between 1100-190 nm. Photography based on visible fluorescence induced by UV radiation uses the same ultraviolet illumination as in reflected UV photography. However, the glass barrier filter used on the lens must now absorb or block all ultraviolet and infrared light and must permit only the "visible" radiation to pass. Visible fluorescence is produced in a suitable subject when the shorter, higher energy ultraviolet wavelengths are absorbed, lose some energy and are emitted as longer, lower energy visible wavelengths. UV induced visible fluorescence photography must take place in a
Ultraviolet the sample where no photoresist remains. Photolithography is used in the manufacture of semiconductors, integrated circuit components, and printed circuit boards. Photolithography processes used to fabricate electronic integrated circuits presently use 193 nm UV and are experimentally using 13.5 nm UV for extreme ultraviolet lithography. Electronic components that require clear transparency for light to exit or enter (photovoltaic panels and sensors) can be potted using acrylic resins that are cured using UV energy. The advantages are low VOC emissions and rapid curing. Certain inks, coatings, and adhesives are formulated with photoinitiators and resins. When exposed to UV light, polymerization occurs,