Light-emitting diode of Cambridge, opt towards a multi-layer structure, in order to reduce (crystal) lattice mismatch and different thermal expansion ratios, in order to avoid cracking of the LED chip at high temperatures (e.g. during manufacturing), reduce heat generation and increase luminous efficiency. Epitaxy (or patterned sapphire) can be carried out with nanoimprint lithography. Even though white light can be created using individual red, green and blue LEDs, perhaps using a single SMD (Surface Mount Device) or through-hole RGB LED, this setup results in poor color rendering or CRI, due to the fact that virtually only 3 wavelengths of light are being
Superluminescent diode Superluminescent diode A superluminescent diode (SLED or SLD) is an edge-emitting semiconductor light source based on superluminescence. It combines the high power and brightness of laser diodes with the low coherence of conventional light-emitting diodes. Its emission band is 5–100 nm wide. In 1986 Dr. Gerard A. Alphonse at RCA Laboratories (now SRI International), invented the superluminescent diode. This light source was developed as a key component in the next generations of fibre optic gyroscopes, low coherence tomography for medical imaging, and external cavity tunable lasers with applications to fiber-optic communications. In 1989 the technology was transferred to GE-RCA in