Pollen Analysis Circular The last issue of the "Pollen and Spore Circular" (#18) was edited by Calvin J. Heusser and announced the fusion, indicating that "the spore and pollen section will constitute four to six pages in each issue and contain essentially the same material" as in the "Pollen and Spore Circular". The final issue also included abstracts from the First Palynology Conference (February 25, 1953), held at Yale University as well as correspondence from researchers working as far afield as Düsseldorf, Lucknow, and Indianapolis. It was in the pages of the "Pollen Analysis Circular" that the field of pollen analysis was given
Chemical Agent Resistant Coating combined to produce a cured paint film. The materials were designed for resistance to windblown dust, sand and chemical agents. An improvement to solvent-borne polyurethanes, MCU materials offered both lower levels of volatile organic compounds and elimination of hazardous air pollutants. 2) Two-component, high-performance, water-reducible polyurethane: Waterbased CARCs, most commonly used by the military, were composed of water-reducible polyurethane resins, marking the first time a water-based two-component CARC was commercially available. This formulation eliminated several solvents, including methyl isobutyl ketone, toluene and xylene. Citation Chemical Agent Resistant Coating Chemical Agent Resistant Coating is a paint commonly applied to military vehicles