Sun tanning However, it operates not by inducing direct DNA damage, but by producing reactive oxygen species which damage DNA indirectly. UVA (see above) induces a cosmetic tan but little extra melanin protection against sun damage, sun burn, or cancer. Ultraviolet B (UVB) radiation is in the wavelength range 280 to 320 nm. Much of this band is blocked by the Earth's ozone layer, but some penetrates. UVB: A person's natural skin color affects their reaction to exposure to the sun. An individual's natural skin color can vary from a dark brown to a nearly colorless pigmentation, which may appear white .
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a