International Ultraviolet Explorer was considered the most successful astronomical satellite ever. The human eye can perceive light with wavelengths between roughly 350 (violet) and 700 (red) nanometres. Ultraviolet light has wavelengths between roughly 10 nm and 350 nm. UV light can be harmful to human beings, and is strongly absorbed by the ozone layer. This makes it impossible to observe UV emission from astronomical objects from the ground. Many types of object emit copious quantities of UV radiation, though: the hottest and most massive stars in the universe can have surface temperatures high enough that the vast majority of their light is emitted
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a