Atmospheric physics radiation (emitted by the sun) and terrestrial radiation (emitted by Earth's surface and atmosphere). Solar radiation contains variety of wavelengths. Visible light has wavelengths between 0.4 and 0.7 micrometers. Shorter wavelengths are known as the ultraviolet (UV) part of the spectrum, while longer wavelengths are grouped into the infrared portion of the spectrum. Ozone is most effective in absorbing radiation around 0.25 micrometers, where UV-c rays lie in the spectrum. This increases the temperature of the nearby stratosphere. Snow reflects 88% of UV rays, while sand reflects 12%, and water reflects only 4% of incoming UV radiation. The more glancing
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a