Earth's magnetic field the charged particles of the solar wind and cosmic rays that would otherwise strip away the upper atmosphere, including the ozone layer that protects the Earth from harmful ultraviolet radiation. The Earth's magnetic field serves to deflect most of the solar wind, whose charged particles would otherwise strip away the ozone layer that protects the Earth from harmful ultraviolet radiation. One stripping mechanism is for gas to be caught in bubbles of magnetic field, which are ripped off by solar winds. Calculations of the loss of carbon dioxide from the atmosphere of Mars, resulting from scavenging of ions by the
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a