History of the telescope of the IRAS satellite in 1983 revolutionized infrared astronomy from space. This reflecting telescope which had a mirror, operated for nine months until its supply of coolant (liquid helium) ran out. It surveyed the entire sky detecting 245,000 infrared sources—more than 100 times the number previously known. Although optical telescopes can image the near ultraviolet, the ozone layer in the stratosphere absorbs ultraviolet radiation shorter than 300 nm so most ultra-violet astronomy is conducted with satellites. Ultraviolet telescopes resemble optical telescopes, but conventional aluminium-coated mirrors cannot be used and alternative coatings such as magnesium fluoride or lithium fluoride are used
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a