A Beautiful Planet calls Earth's atmosphere "a delicate cocoon of air that shields us from our star's radiation." Of course, the atmosphere doesn't completely block electromagnetic radiation from the Sun; without some sunlight reaching the surface, plants could not harvest the Sun's energy, and practically no life as we know it could exist. The atmosphere's ozone layer does filter out much of the harmful ultraviolet light (or "UV rays") produced by the Sun. UV rays can cause skin cancer, and catastrophic damage to the ozone layer may have contributed to Earth's most extensive mass extinction of species ever, the End-Permian extinction (also known
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a