SAGE III on ISS role in climate processes. water vapor measurements will provide important contributions on the long-term effect of this green house gas. Ozone research has remained at the forefront of atmospheric science for many years because stratospheric ozone shields the Earth's surface (and its inhabitants) from harmful ultraviolet radiation. Since recent declines in stratospheric ozone have been linked to human activity, accurate long-term measurements of ozone remain crucial. It is important to monitor ozone levels in the lower stratosphere and upper troposphere since observed trends are the largest and most poorly understood at those altitudes. SAGE III's high vertical resolution and long-term
Extreme ultraviolet lithography Extreme ultraviolet lithography Extreme ultraviolet lithography (also known as EUV or EUVL) is a next-generation lithography technology using an extreme ultraviolet (EUV) wavelength, currently expected to be 13.5 nm. EUV is currently being developed for high volume use by 2020. The tool consists of a laser-driven tin (Sn) plasma light source, reflective optics comprising multilayer mirrors, contained within a hydrogen gas ambient. The hydrogen is used for keeping the EUV collector mirror in the source free of Sn deposition. EUVL is a significant departure from the deep ultraviolet lithography standard. All matter absorbs EUV radiation. Hence, EUV lithography requires a