In this study, a novel digital atomic force microscope (AFM) moir? method is established to measure the displacement and strain fields. The moir? pattern is generated by the interference between the specimen grating and the virtual reference grating formed by digital image processes. The overlapped image is filtered by the 2-D wavelet transformation to obtain clear interference moir? patterns. From moir? patterns, the displacement and strain fields can be analyzed. The experimental results show that the digital AFM moir? method is very sensitive and easy to realize in nanoscale measurements.
Algorithms Image Processing, Computer-Assisted