The Plasma Etch is located in room 20b of the ASTeCCbuilding. It is useful for plasma etching and cleaning of substrates. It is a microwave excited plasma source.
The Center does provide Oxygen, Argon, and
The Plasma Etch is located in room 20b of the ASTeCCbuilding. It is useful for plasma etching and cleaning of substrates. It is a microwave excited plasma source.
The Center does provide Oxygen, Argon, and Nitrogen gases. Any other gases are the responsibility of the user and subject to
Plasma etchers can operate in several modes by adjusting the parameters of the plasma. Ordinary plasma etching operates between 0.1 and 5 Torr. (This unit of pressure, commonly used in vacuum engineering, equals approximately 133.3 pascals.) The plasma produces energetic free radicals, neutrally charged, that react at t