Swiss Federal Institute of Technology Lausanne (EPFL); Skolkovo Institute of Science and Technology, Moscow, Russia; Samsung AI Center Moscow; Samsung Research
Roman Suvorov, Elizaveta Logacheva, Anton Mashikhin, Anastasia Remizova, Arsenii Ashukha, Aleksei Silvestrov, Naejin Kong, Harshith Goka, Kiwoong Park, Victor Lempitsky
Resolution-Robust Large Mask Inpainting With Fourier Convolutions