cond-mat.mtrl-sci physics.app-ph
Effect of Top Al$_2$O$_3$ Interlayer Thickness on Memory Window and Reliability of FeFETs With TiN/Al$_2$O$_3$/Hf$_{0.5}$Zr$_{0.5}$O$_2$/SiO$_x$/Si (MIFIS) Gate Structure
Tao Hu Xinpei Jia Runhao Han Jia Yang Mingkai Bai Saifei Dai Zeqi Chen Yajing Ding Shuai Yang Kai Han Yanrong Wang Jing Zhang Yuanyuan Zhao Xiaoyu Ke Xiaoqing Sun Junshuai Chai Hao Xu Xiaolei Wang Wenwu Wang Tianchun Ye