the present invention relates to a substrate cleaning apparatus , and more particularly to a substrate cleaning apparatus suitable for cleaning a substrate which requires a high level of cleanliness , such as a semiconductor wafer , a glass substrate , a liquid crystal panel , etc . the substrate cleaning apparatus comprises a substrate holder for holding a substrate while rotating the substrate in a substantially horizontal plane , a cleaning device for scrubbing a surface to be cleaned of the substrate , a cleaning device holder for holding the cleaning device rotatably about its own axis , the cleaning device having a shaft and a cleaning member disposed around the shaft , the cleaning member being permeable to a cleaning liquid , the shaft having an axially extending shaft hole and a cleaning liquid ejection port extending radially therethrough from the shaft hole , and a fluid - lubricated bearing disposed between the shaft and the cleaning device holder in at least one end thereof and lubricated by a cleaning liquid as a lubricating fluid .