the present invention has a subject to provide an apparatus that optimizes scanning in accordance with circumstances or purposes , reduces distortion of images , and improves throughput , image quality , and defect detection rate by controlling deflection of a charged particle beam in a stage tracking system . to solve this subject , an apparatus according to the present invention is an inspection apparatus for detecting abnormal conditions of an inspection target by irradiating the inspection target with the charged particle beam and detecting generated secondary electrons , including both a stage that moves continuously with the inspection target placed thereon and a deflection control circuit for providing a deflector with a scanning signal that causes the charged particle beam to scan repeatedly in a direction substantially perpendicular to a stage movement axis direction while the charged particle beam being deflected in the stage movement axis direction in accordance with a change in movement speed of the stage during movement of the stage .