a method for multi - step temperature control of a substrate includes selecting a first set - point temperature and a second set - point temperature for the substrate , and selecting a first pid parameter set including a first proportional constant k p1 , a first integral constant k i1 and a first derivative constant k d1 , and selecting a second pid parameter set including a second proportional constant k p2 , a second integral constant k i2 and a second derivative constant k d2 . the substrate is placed on a substrate holder , the temperature of the substrate is adjusted to the first set - point temperature and the substrate is processed for a first period of time at the first set - point temperature . the temperature of a region of the substrate is changed from the first set - point temperature to the second set - point temperature using the first pid parameter set for a first ramp period of time and using the second pid parameter set for a second ramp period of time , the second ramp period of time following the first ramp period of time . the substrate is then processed for a second period of time at the second set - point temperature .