the present invention relates to a temperature regulation apparatus capable of easily regulating the temperature of a support for a substance to be treated , such as a semiconductor wafer . the temperature regulation apparatus includes a liquid nitrogen supply device for supplying liquid nitrogen into a temperature regulation space provided in the inside of a support so as to effect flashing of the liquid nitrogen . a heating device for heating the support and temperature sensors for detecting the temperature of the support are also provided . a temperature setting device sets the temperature of the support at a desired temperature and a controller controls the liquid nitrogen supply device and the heating device based on a temperature detected by the temperature sensors , so that the support reaches and is maintained at the set temperature .