the present invention provides improvements to the use of silyating agents in semiconductor processing . more particularly , the silyating agents may be provided in combination with a substantially non - flammable ether , so that the combination is substantially non - flammable . additionally , the silyating agent may be utilized in vapor form , or applied in conjunction with the electromagnetic radiation . each of these embodiments can enhance the usability of the silyating agent , i . e ., by rendering the silyating agent more safe , more easily utilized in a variety of processing equipment and / or by enhancing the passivation efficacy / efficiency of the silyating agent .