a liquid immersion lithography apparatus includes a projection system including an optical member of which an incidence side has a convex lens shape , the projection system being configured to project an image through a liquid on a workpiece , and a liquid immersion member arranged below the optical member , the liquid immersion member having a plurality of openings through which the liquid is allowed to flow . a material of which the optical member is made is more resistant to the liquid than a material of which the liquid immersion member is made .