a method for utilizing a dry film is provided . a dry film is pressed onto a substrate , such as a wafer . the dry film includes a photoresist layer tightly attached to the substrate and an exposed carrier film with light transmission . before exposure and development , the carrier film of the dry film is cleaned in a darkroom , wherein the cleaning method may include a step of chemical spraying and a step of rinsing through di water . accordingly , the contaminant on the carrier film can be removed . in addition , the dry film burrs can be also removed . thus , an excellent production yield for sequent exposure and development can be achieved .