a method of reducing agglomerated particles in a slurry for use in a chemical mechanical polishing machine , the cmp machine also using deionized water , is disclosed . the method comprises the steps of : monitoring the ph of the slurry that is provided to the cmp machine ; monitoring the ph of the deionized water that is provided to the cmp machine ; and adjusting the ph of the deionized water to be substantially the same as the ph of the slurry .