a programmable multizone fluids injector for use in single - wafer semiconductor processing equipment including an injector having a plurality of orifices therein which are divided into a number of separate zones or areas . these zones or areas are connected by means of appropriate passageways and conduits to a source of process fluids . each of the separate conduits has at least one flow control device located therein for independently controlling the amounts and ratios of process fluids flowing into each zone . the fluid control devices are responsive to input signals so that the fluid flow rates from the orifices can maintain a desired flow pattern within the process chamber to suit the individual needs of a particular fabrication processs .