to date , almost all color imaging cameras use different lacquers as color filters on their pixels . three filters for different colors are commonly used in various patterns . two examples of patterns for color image sensors are shown in fig1 . fig1 ( a ) shows an rgb bayer pattern with the primary colors red r , green g and blue b . this pattern alternates a row of red and green filters with a row of blue and green filters . the distribution with more green filters than red and blue filters better imitates the sensitivity of the human eye . instead of adding the different values of red , green and blue , it is possible to subtract values of the typesetting colors cyan c , magenta m and yellow y . an example of a cmy filter is shown in fig1 ( b ). according to the invention , the color selectivity of the pixels is achieved by means of diffractive color filters ( dcf ) on top of the pixels . a dcf comprises diffractive gratings and / or structures with different material layers of different refractive indices . these structures act like color filters with respect to reflection and / or transmission . a schematic example of a dcf 1 is shown in the cross section of fig2 ( a ). the dcf 1 is a two - or three - dimensional structure made of at least two essentially transparent materials 11 , 12 with different refractive indices . the refractive index n low of a first one 11 of the at least two materials is lower than the refractive index n high of a second one 12 of the at least two materials . the layers of the dcf 1 may comprise a material or a combination of materials such as epoxy , acrylate , polycarbonate , uv - curable sol - gel material , silicon oxide , carbide , diamond , carbon , carbon derivative , zno , zns , and / or titanium oxide . the layers of the dcf 1 may also comprise inorganic materials filled with inorganic nanoparticles . low - index materials 11 may be , e . g ., a polymer ( n low = 1 . 34 − 1 . 65 ), sio 2 ( n low ≈ 1 . 46 ) or mgf 2 ( n low ≈ 1 . 39 ); the indices of refraction are data for a wavelength of 550 nm . the low - index material 11 may also be a porous aerogel ( n low close to 1 . 0 ). the index of refraction of sol - gel processed silica aerogel as described by tsutsui et . al . (“ doubling coupling - out efficiency in organic light - emitting devices using a thin silica aerogel layer ”, adv . mater . 13 , 2001 , p . 1149 - 1152 ) is between 1 . 01 and 1 . 10 . the low - index material 11 forms a layer on top of a pixel of the solid - state image sensor . in the low - index layer 11 , a structure of high - index material 12 is embedded , that acts as subwavelength waveguide . the high - index material 12 may be , e . g ., zns ( n high ≈ 2 . 38 ), tio 2 ( n high ≈ 2 . 1 − 2 . 5 ), ta 2 o 5 ( n high ≈ 2 . 1 − 2 . 3 ) or si 3 n 4 ( n high ≈ 2 . 03 ). the high - index structure is inhomogeneous in at least one direction of a plane defined by the pixel surface . in the example of fig2 , the high - index structure comprises a ruled grating . the ruled grating is essentially a two - dimensional structure . a plurality of such gratings can be arranged one above the other within the low - index layer 11 , thus making a three - dimensional dcf . if the low - index material 11 has an index of refraction well below 1 . 5 , the high - index material 12 can even be a layer with index of refraction of about 1 . 5 , e . g . a polymer layer . the important parameter is the refractive - index difference between the high index n high and the low index n low . a wet - process - able class of high - index materials 12 are nano - sized particles of a high - index material embedded in a polymeric matrix . an example are mixtures of pbs nano - particle and gelatine that have indices of refraction of up to 2 . 5 ( zimmermann et . al . j . mater . res ., vol . 8 , no . 7 , 1993 , 1742 - 1748 ). mixtures containing al 2 o 3 , zro 2 or tio 2 particles are also possible . when light 90 impinges onto the dcf 1 with a certain angle of incidence θ in , a first portion 91 of the light 90 is reflected and a second portion 92 is transmitted through the dcf 1 . since the dcf 1 is a zero - order filter , the direction of propagation of the second , transmitted portion 92 is the same as that of the incident light 90 . fig2 ( b )-( d ) schematically show intensity spectra , i . e ., intensity versus wavelength , of the incident light 90 and the two portions 91 , 92 , respectively . it is assumed that the incident light 90 is white , i . e ., all visible wavelengths are present with equal intensities ( fig2 ( b )). the dcf 1 of this example reflects blue light , i . e ., the spectrum of the first light portion 91 ( fig2 ( c )) has a peak around the wavelength λ ≈ 460 nm . the spectrum of the second light portion 92 ( fig2 ( d )) is complementary to that of the first light portion 91 and shows a notch around the wavelength λ ≈ 460 nm . the transmitted light 92 is thus yellow , the complementary color of blue . in other words : the dcf 1 of fig2 is a blue band - pass filter in reflection and a yellow notch filter in transmission . the diffractive structure profile can by made of gratings with various types of profiles . fig3 shows some examples of many possible grating profiles . the profile of fig3 ( a ) is a simple square profile . the multiple square profile of fig3 ( b ) is formed by arranging a plurality of profiles such as shown in fig3 ( a ) one above the other . fig3 ( c ) shows a multiple sinus profile , and fig3 ( d ) a multiple triangular or sawtooth profile . the profile shapes have no restrictions about the symmetry , i . e ., the profile shape need not be symmetric : the triangular profile can be blazed , or one side can be longer further optical elements can be arranged beneath and / or above the dcf structure according to the invention . such further optical elements may comprise as a thin layer or a stack of thin dielectric layers acting as a dielectric filter , metal layers , absorbing layers , diffractive elements , etc . they further may comprise a high - index layer acting as a waveguide , with a thickness between 10 nm and 1000 nm , and preferably between 50 nm and 500 nm , and with a refractive index that is at least by 0 . 2 higher than the refractive index of the surrounding material . other appropriate means such as specialized camera optics , microlenses or additional grating structures may also be arranged on top of the dcf . an appropriate choice of the dcf parameters will define the filter properties of the corresponding color band pass filter or notch filter . an important variable parameter , which essentially influences the spectral characteristics of the dcf , is the grating period . other variable parameters are the grating depth , the grating profile , the height of the high - index layer , the refractive indices , the number of high - index / low - index transitions and / or the spacing between the high - index layers . the dcfs according to the invention have periods that are approximately equal to or smaller than the wavelength of the light to be detected by the pixel . typical grating periods are between 50 nm and 1000 nm , and preferably between 100 nm and 800 nm . the grating depth ( of one layer ) is between a few nanometers to a few micrometers , e . g ., between 10 nm and 1000 nm , and preferably between 50 nm and 300 nm . the difference n 2 − n 1 of the refractive indices of the high - index material ( waveguide material ) 12 and the low - index material 11 should , but must not necessarily , be high , e . g ., higher than 0 . 2 and preferably higher than 0 . 4 . the number of layers has no upper limit . distances between two high - index layers of less than a few ( approximately 2 or 3 ) micrometers will produce a coupling effect between the different dcf layers ; more than a few micrometers will decouple them . both effects can be used for the dcfs . examples of calculated transmission spectra for three different dcfs are shown in fig4 . the three filters were designed to transmit the typesetting colors cyan , magenta and yellow . the calculations were performed for one square - shaped grating structure with one layer of high - index material ( waveguide material ) 12 . the parameters used in the calculation and some resulting characteristics are listed in table i . already with this simple model , very effective dcfs with the desired transmission characteristics were obtained . by entering further dcf parameters into the calculation , e . g ., multiple high - index layers , the design can even more specifically fit a given need . the lateral dimensions of a pixel and thus of the dcf may be a further parameter that influences the reflectivity and / or transmissivity characteristics of the dcf , especially when these dimensions are in the range of approximately twenty times the grating period or smaller . of course , the pixels and dcfs need not have a square shape , as those of fig1 . alternatively , they may be of rectangular , hexagonal or any other appropriate shape . it is true that dcfs 1 as shown in fig2 and 3 have a spectral characteristic that depends on the azimuthal angle of the incident light 90 . this undesired effect can be eliminated or reduced by choosing other diffractive structures than ruled gratings , e . g ., circular gratings or two perpendicular ruled gratings , or by other measures . it is also true that the transmissivity of the dcfs 1 as shown in fig2 and 3 depends on the angle of incidence θ in of the incident light 90 . this undesired dependence can be reduced , e . g ., by depositing a high - index layer on top of the dcf . the large number of degrees of freedom of the dcfs according to the invention opens a wide range of possibilities to design the properties of the dcfs . consequently , many problems can be avoided , minimized or reduced by choosing an appropriate dcf design . for the fabrication of the dcf according to the invention , only two essential steps are necessary : a replication step and a deposition step . standard replication and evaporation processes can be used . for the replication , a specific master is needed . the master has the desired dcf pattern with the three grating periods and the profiles and depths which are necessary to obtain the specific color of the dcf . any nano imprint process can be used for the replication process , such as nanolithography , uv casting or uv embossing . it is also possible to directly etch the grating into the semiconductor detector material by means of standard photolithography . for the deposition step , thermal evaporation and / or spin coating from the liquid phase can be used . the high - index material ( waveguide material ) can be deposited by an evaporation process in one step , provided that all the three dcfs need the same high - index - layer thickness . multi - step evaporations with shadow mask are also possible , but more complicated . depending on the materials used and the thickness required , spin coating of the materials on the wafer is also possible for the deposition of the dielectric layers . the basic production steps are described in fig5 . an image sensor 2 with a plurality of pixels 21 , typically arranged in a one - or two - dimensional array , is provided . the low - index material 11 , e . g ., in the form of a sol - gel , is spread over the image sensor 2 ( fig5 ( a )). a complex grating master 3 is used to replicate the grating structure on the image sensor 2 . the grating master 3 is aligned with the image sensor 2 with the aid of a microscope 5 ( fig5 ( b )); the alignment is indicated by two arrows 51 , 52 . by using uv embossing , only selected regions of the image sensor 2 can be covered with the grating structures . for this purpose , the master 3 additionally comprises a mask 4 with transparent areas 41 and opaque areas 42 . the low - index material 11 is exposed to uv radiation 6 through the mask 4 ( fig5 ( c )). after an appropriate exposure time , the mask 4 is lifted up , and the superfluous low - index material ( in this example , the shaded areas ) is removed ( fig5 ( d )). consequently , replicated grating structures 13 , which may differ from each other , remain on the light - sensitive areas of the pixels 21 . once the grating is replicated , techniques such as thermal evaporation or spin coating are used to deposit the high - index material 12 on top of the grating structures 13 ( fig5 ( e )). on top of the high - index layer , low - index material and further layers can be deposited in order to obtain three - dimensional structures such as shown in fig3 , and / or to form multi - layered dielectric filters or waveguides . the alternate deposition of high - index material 12 and low - index material 11 can be repeated once or several times in order to obtain three - dimensional dcfs 1 as shown in fig3 ( b )-( d ). this invention is not limited to the preferred embodiments described above , to which variations and improvements may be made , without departing from the scope of protection of the present patent .