in fig1 - 4 , reference numeral 11 denotes a developer tank , 12 an electromagnetic valve , 13 a nozzle pipe , 14 a spoon - shaped nozzle having a taper ( hereinafter “ nozzle ”), 14 a a top portion of the nozzle 14 , 14 b a middle portion of the nozzle 14 , θ an spray angle of the developer , and 15 a substrate ( wafer ). the spray angle θ ( extension of the sprayed area ) of the developer is varied with the position of the spoon - shaped nozzle 14 , to which the developer is discharged by the nozzle pipe 13 . that is , the spray angle θ is large where the width of the spoon shape is large and small where the width is small . for example , in fig3 when the developer is discharged from the nozzle pipe 13 to the top portion 14 a of the nozzle 14 , the spray angle θ is small , and when the developer is discharged to the middle portion 14 b of the nozzle 14 , the spray angle θ is large . thus , according to the present invention , the spoon - shaped nozzle 14 is capable of not only forming a widely spread coating at a low pressure but also changing the spray angle θ only by changing the position of discharge of the developer under a constant pressure . an actual pressure is determined based upon various factors , such as the size of the nozzle pipe , the size of the spoon - shaped nozzle , the diameter of the substrate , the distance between the substrate and the spoon - shaped nozzle , and the flow amount of the developer . however , it may be as low as approximately 1 . 0 kg / cm 2 or below . in this embodiment , the discharge position of the developer is determined such that the sprayed developer covers the largest width of the substrate 15 , and the substrate 15 is rotated for the developer coating . that is , as shown in fig4 the substrate 15 is rotated with the nozzle pipe 13 and the nozzle 14 fixed at the same positions . the positions of the nozzle pipe 13 and the nozzle 14 are predetermined such that a width a of the sprayed developer becomes equal to the diameter of the substrate 15 . as described above , according to the first embodiment , it is possible to provide a widely spread coating at a constant pressure without changing the discharge pressure and the nozzle . in fig5 reference numeral 16 denotes a nozzle adjustment mechanism . in the second embodiment , the positions of the nozzle pipe and the nozzle are adjusted by the nozzle adjustment mechanism 16 with the substrate fixed without any rotation . in fig6 reference number 15 a denotes a first position ( right - hand position ) of the substrate 15 , 15 b a second position ( quarter position ) of the substrate 15 , 15 c a third position ( half position ) of , 15 d a fourth position ( three - quarter position ), and 15 e a fifth position ( left - hand position ). that is , the nozzle 14 is slid from a position { circle over ( 1 )} to a position { circle over ( 5 )} for coating the substrate 15 . at this point , the developer discharge position to the nozzle 14 is adjusted by sliding the nozzle pipe 13 such that the width a of the sprayed developer becomes equal to the width of each sprayed position of the substrate 15 . for example , when the substrate 15 is coated from the first position 15 a to the third position 15 c , the nozzle 14 is moved from the position { circle over ( 1 )} to the position { circle over ( 3 )} and the nozzle pipe 13 is scanned in a horizontal direction ( x - axis direction ) such that the developer is discharged from the top portion 14 a ( the spray angle θ is small ) of the nozzle 14 to the middle portion 14 b ( the spray angle θ is large ) of the nozzle 14 . the nozzle 14 may be scanned instead of the scan of the nozzle pipe 13 . in this embodiment , the substrate 15 is not rotated during the coating so that the waste of developer is minimized . in fig7 - 8 , reference numeral 21 denotes a nozzle block which integrates the nozzle pipe 13 and the nozzle 14 , 22 a nozzle block body , 23 a fixture to fixing the nozzle pipe 13 to the nozzle block body 22 , 24 an adjusting mechanism ( for example , a piezoelectric expansion device ) for the nozzle 14 , and 25 a scanning mechanism ( for example , a linear motor ) for the nozzle block 21 . the position of the nozzle 14 with respect to the nozzle pipe 13 is adjusted by the adjusting mechanism 24 such that the discharge position of the developer supplied by the nozzle pipe 13 onto the nozzle 14 moves from the top portion 14 a through the middle portion 14 b to the top portion 14 a again . the position of the nozzle block 21 is varied by the driving mechanism 25 so that the application of the developer onto the stationary substrate 15 is smoothly performed . according to the second embodiment , the nozzle pipe 13 and the nozzle 14 are simultaneously scanned by the scanning mechanism so that the stationary substrate 15 is efficiently coated with the developer with the minimum waste . the present invention is not limited to the above preferred embodiments and a number of variations are possible without departing from the scope and spirit of the present invention . accordingly , those variations should not be excluded from the scope of the present invention . ( a ) it is possible to provide a widely spread coating at a constant pressure without changing the discharge pressure and the nozzle . ( b ) it is possible that the stationary substrate is efficiently coated with the developer with the minimum waste .