referring to fig1 a , a substrate 10 and a coating of unzippable paste 13 is shown . unzippable paste 13 comprises an unzippable polymer 15 and / or their blends dissolved in solvent 18 , particles 17 such as oxide - free metal . an oxide - free metal or surface is one that does not form an oxide layer to permit a conductivity greater than 1 ohm - cm or the oxide layer is conducting with a conductivity greater than 1 ohm - cm . for example , c 4 bumps of an alloy of 97 wt . % pb and 3 wt . % sn typically have an oxide coating or layer which provides a contact resistance which is greater than 1 ohm - cm without reflow of the solder in the c 4 bump . unzippable polymer 15 is a polymer that completely volatilizes above a certain temperature defined as the unzipping temperature , t unzip . some examples of unzippable polymers 15 include poly ( methyl methacrylate ) ( pmma ), poly (∝- methyl styrene ) ( pams ), poly ( propylene carbonate ), poly ( ethylene carbonate ), and poly ( chloral ). all these polymers have a t unzip below 400 ° c . solvent 18 is one that may be organic and dissolves the above mentioned polymers . for example , n - methyl pyrrolidinone ( nmp ) is a good solvent for pmma and pams . particles 17 may be composed of one or more metals . at least one of the metal components should form an alloy with pb or sn wherein the alloy melts in the temperature range from 150 to 400 ° c . for example , particle 17 may be au , sn , or au / sn alloy . the particle should be oxide free or with an oxide that is conductive . the particles could also be made of composite material where the inner core may be ceramic or metal and the outer layer is an oxide free metal or a conductive oxide . particles in the paste may be in the range from 1 to 50 volumetric %. solvent 18 in paste 13 is removed by drying at t dry under a selected environment , leaving polymer 15 and particles 17 on the surface of substrate 10 . the temperature is then raised above the unzipping temperature t unzip of unzippable polymer 15 which results in the degradation and evaporation of the polymer components . fig1 c shows the final structure of substrate 10 coated with particles 17 after unzipping . the t dry is more than 50 ° c . below the t unzip . the selected environment may be air , n 2 , vacuum , forming gas , ar , he or a combination thereof . coating 12 may be patterned or uniform over substrate 10 . selective coating 12 may be achieved by a standard dispensing process such as screening , stenciling , etc . particles 17 shown in fig1 c may be in a monolayer or multilayer . particles 17 may form an interconnected percolating structure or discrete islands . fig2 - 4 show steps for coating c 4 bumps of an integrated circuit with unzippable paste 13 . unzippable paste 13 is screened on a smooth , clean surface of a solid substrate 22 through an interposer 24 . substrate 22 may be glass , silicon or ceramic . interposer 24 may comprise polyimide , polyester or other organic material or metal such as molybdenum , nickel , stainless steel , etc . interposer 24 may have a plurality of openings or vias 26 which are slightly larger than the diameter of the c 4 bumps 27 to be coated . the thickness of interposer 24 is less than the height of the c 4 bump 27 . typically , the diameter of c 4 bump 27 is 75 μm . the diameter of opening 26 may be in the range from 85 to 100 μm and the thickness of interposer 24 may be 50 μm . fig2 shows openings 26 filled with unzippable paste 13 . interposer 24 can be made by chemical etch , laser ablation or other conventional means to match the pattern of c 4 bumps on a chip or wafer . some other method of transferring the unzippable paste 13 to c 4 bumps 27 may be by pin transfer , dipping , brushing , etc . substrate 22 is then placed over or under a chip or wafer 34 of undiced or embedded chips having a plurality of c 4 bumps 27 thereon . openings 26 filled with unzippable paste 13 are aligned with corresponding bumps 27 on wafer 34 . the alignment is done by self aligning the chip with the vias 26 in interposer 24 . substrate 22 is brought closer to chip or wafer 34 so that c 4 bumps 27 are pressed into openings 26 and in contact with unzippable paste 13 as shown in fig3 . substrate 22 is then separated from or moved away from chip or wafer 34 so that c 4 bumps 27 are separated from contact with unzippable paste 13 in openings 26 . a thin layer 29 of unzippable paste 13 adheres to c 4 bumps 27 as the chip or wafer 34 is removed from proximity of substrate 22 as shown in fig4 . in this example , the geometry of each c 4 is well defined dimensionally and by composition , the contact area to unzippable paste 13 is nominally identical for each bump . as a result , the thickness and size of the paste film forming thin layer 29 on the c 4 bumps 27 are nominally of the same thickness . the thickness of thin layer 29 may be in the range from 0 . 1 to 50 μm with a thickness variation in the range from 0 . 05 to 25 μm . the process can be repeated a number of times by heating to t dry to increase the amount of particles adhering to the c 4 bumps . thin layer 29 is first dried by heating to t dry , then heated above t unzip and the melting temperature of the solder metals in the c 4 bumps 27 . the particles embed into the molten c 4 or react with solder metal , to form a strong bond between the particle and the c 4 . depending upon the particular unzippable polymer , metal , alloy , or other material selected . t unzip may be above or below the melting temperature t melt of the metal , alloy or other material . where t unzip is above t melt heating may be above t unzip in one step . where t unzip is below t melt , heating may first be above t unzip and below t melt and then raised above t melt . best practice is to completely remove the unzippable polymer prior to raising the temperature to t melt or above . heating is done typically in an oven or zone furnace with a nitrogen or preferably forming gas environment . during this thermal cycle , the unzippable paste 13 unzips and vaporizes and the metal filler particles 17 fuse with respective c 4 bumps forming an oxide - free conductive coating 32 on c 4 bumps 27 . fig5 shows an image of conductive coating 32 on a c 4 bump 27 taken by scanning electron microscopy ( sem ). the image in fig5 was taken after the heating cycle was completed at 360 ° c . for 30 mins . in a forming gas environment . conductive coating 32 as shown in fig5 is a uniform layer or coating of particles 17 which are au . fig6 is a graph of energy dispersive x - ray analysis of a site on conductive coating 32 on the c 4 bump 27 shown in fig5 . in fig6 the ordinate represents x - ray intensity and the abscissa represents energy in kev . curve 42 shows the x - ray intensity as a function of energy from 0 to 20 kev . peak 44 shows that the top surface of conductive coating 32 is au with very small traces of pb . curve 44 illustrates that conductive coating 32 has a high coverage of gold over c 4 bump 27 . fig7 is a graph of energy dispersive x - ray analysis of a site on c 4 bump 27 without conductive coating 32 . fig7 is formed from data obtained from the c 4 bump 27 shown in fig5 . in fig7 the ordinate represents x - ray intensity and the abscissa represents energy in kev . curve 46 shows the x - ray intensity as a function of energy from 0 to 20 kev . peak 48 shows that the surface of c 4 bump 27 is pb . a process for bonding chips 50 to a substrate 52 is now described . the chips 50 to be bonded would be processed to form , as described above , a layer 32 of particles 17 on its c 4 bumps 27 . a conductive adhesive paste 54 comprising a polymer binder and noble metal particles would be placed on electrical pads 55 on substrate 52 . the polymer binder may be a thermoplastic or thermoset polymer . the paste may also contain a solvent system that dissolves the polymer binder . chip 50 , after c 4 bumps 27 are processed to contain a au layer 32 , is bonded to paste 54 or paste bump 56 on substrate 52 by a method shown in fig8 . an example of a conductive paste suitable for use herein is described in u . s . pat . no . 5 , 086 , 558 by grube et al . which issued feb . 11 , 1992 and in u . s . u . s . pat . no . 5 , 866 , 044 which issued feb . 2 , 1999 by r . booth et al . filed oct . 21 , 1996 , both of which are incorporated herein by reference . typically if paste 54 is epoxy based , chip 50 is bonded by heating the assembly in a temperature range from 150 to 250 ° c . with 0 to 100 psi pressure . if paste 54 is thermoplastic , the temperature range is the same but the pressure can range from 10 to 100 psi . the attached chip 50 is then underfilled by an encapsulant to form a typical finished assembly . a process of testing the chip is now described . the c 4 bumps of the chip to be tested would be coated with layer 32 by a process described above . the c 4 bumps are electrically connected to the pads of the test probe by either physical contact using force or bonding using the thermoplastic paste method described above . for both methods , the contact pads of the test probe are oxide free . c 4 bumped chips are needed to be attached to fr 4 or other organic substates . such assemblies will be used in computers , office equipment , automobiles and trucks , control systems , cellular phones , etc . while there has been described and illustrated a process for forming a metal coating on a structure such as capping c 4 bumps with au to provide an oxide free surface on c 4 bumps on an integrated circuit chip , it will be apparent to those skilled in the art that modifications and variations are possible without deviating from the broad scope of the invention which shall be limited solely by the scope of the claims appended hereto .