a charged particle beam device of the state of the art is schematically shown in fig2 . the charged particle beam device 1 comprises a top cover plate 20 to which a charged particle source 2 is attached . the wires 3 for providing the source 2 with power go through the top cover plate to a power source . in electron beam devices , electron sources such as tungsten - hairpin guns , lanthanum - hexaboride guns , field emission guns etc . can be used . the invention , however , is not limited to electron sources ; it can be used together with all kinds of charged particle sources . in the state of the art embodiment shown in fig2 an extractor and a suppressor 4 is arranged below the particle source 2 . the extractor which is , for example , set on an accelerating potential below the beam boost potential attracts the charged particles coming from the source . contrary to that , the suppressor , which is arranged between the accelerator and the source , is set on a suppression potential to limit the number of particles getting pulled towards the extractor . this way the beam current can be regulated and prevented from becoming to high . after the beam of charged particles 10 has been formed and left the source , a system of electromagnetic lenses , deflection coils , and stigmators is involved in the control and refinement of the charged particle beam before it hits the specimen . the particular arrangement of these components depends strongly on the specific applications of the charged particle device used . in many devices , a series of two or three condenser lenses ( not shown ) are used to successively demagnify the beam spot which is essential for better resolutions at high magnifications . a stigmator ( not shown ) is a component that is used to control any distortions in the roundness of the spot formed by the beam that is scanned over the specimen . beam spots that are not round will generate an image on the viewing monitor that is smeared in one direction . if required , a scan unit ( not shown ) is arranged in the optical column . for example , a set of small coils of wire are energized by a varying voltage produced by the scan generator and create a magnetic field that deflects the beam of charged particles back and forth in a controlled pattern called a raster . the raster is very similar to the raster in a television receiver . the final lens in or below the column , called the objective lens , focuses the image by controlling the movement of the crossover along the optical axis ( z - axis ) of the column . in fig2 an electrostatic lens 12 is arranged below the column . in many applications , however , a magnetic lens with a controllable current i through its windings is used . due to the large control current cooling is sometimes required . when the particles of the beam 10 strike the surface of specimen 14 , they undergo a series of complex interactions with the nuclei and electrons of the atoms of the sample . the interactions produce a variety of secondary products , such as electrons of different energy , x rays , heat , and light . many of these secondary products are used to produce the images of the sample and collect additional data from it . detectors for collecting the secondary products can either be circularly arranged around the optical axis or at the side . fig2 shows a disk shaped collector 16 with a bore at its center to let the primary beam pass on its way from source 2 to specimen 14 . in this embodiment , the detector is attached to a light guide 17 which goes through housing 18 and connects the detector with an imaging electronic ( not shown ). the light pulses created by the secondary products impinging onto detector 16 are guided outside the housing 18 and used for forming the final image . particularly in low voltage applications , the performance of a charged particle beam device can be considerably increased by using a beam booster . the beam booster causes the charged particles to travel at high speed through the optical column and then slows them down before they hit the specimen . the particles in the beam have different kinetic energies and thus different wavelength . the differing wavelengths cause the particles to be brought to focus at different points which blurs the image . the ratio of the difference in kinetic energy to the mean kinetic energy of the charge particles δe / e influences the extent to which the image is out of focus . since the variation in kinetic energy δe is largely independent with respect to the total kinetic energy of the particle e , the lens defect can be reduced by letting the charged particles enter the objective lens at a relative high speed and subsequently decelerate them before they hit the specimen . a beam boost in a typical optical column of a charge particle device is realized by letting the charged particles on their way from the source to the objective lens see a high potential . this is achieved by shielding the beam path from all conductive parts having a potential considerably different to the beam boost potential . in the embodiment shown in fig2 , shielding electrodes 30 shield the beam path from the grounded housing 18 and , if required , from beam alignment coils which , in general , are also put on ground potential . for shielding electrodes 30 , a so called liner tube is often used . in the lower part of the column , shielding electrodes 32 shield , for example , the beam path from the grounded housing 18 . in the central part of the column a valve unit 6 , 8 is arranged . it separates the vacuum in the gun chamber from the vacuum prevailing in the specimen chamber ( see e . g . fig4 ). furthermore , it allows replacement of the specimens without breaking the vacuum of the gun chamber by closing the sliding valve 8 which is attached to the holding unit 6 . the sliding valve 8 and holding unit 6 are also put on beam boost potential so that they do not adversely effect the electrical field in the vicinity of the beam path . it should be noted , however , that depending on the particular setup of the optical column or the application used , a valve unit is not always required . in certain devices used in the state of the art , the shielding electrodes and all other parts which are set on beam boost potential are connected to each other to form a single inner channel around the beam path . this results in very good shielding of the beam path from disturbing fields . in general , the above mentioned components , shielding electrodes 30 ( or liner tube ), valve unit 6 , 8 , shielding electrodes 32 need to be fixed to the grounded housing 18 . this requires an isolation between the housing and these components . the difference in potential used to boost the beam is in general higher than 1 kv . therefore , the insulators 34 , 36 , 38 have to be adapted to the high voltage difference . the housing 18 is connected to the walls of the specimen chamber 22 which are only partially shown in fig2 . for security reasons the housing is grounded . the materials used for the housing are usually electrically and magnetically conductive to shield the inside from disturbing electric and magnetic fields . fig1 shows an embodiment of the present invention . thereby , the same reference numbers denote corresponding parts . the charged particle beam device 1 with its housing 40 being put on beam boost potential during operation of the device comprises a charged particle source 2 with an accelerator and a suppressor 4 . the power supply wires 3 for particle source 2 are laid through top cover plate 20 . below the particle source 2 , a suppressor and accelerator unit regulates the beam current . a lens system for guiding the beam , stigmators , deflection coils etc . are not shown in fig1 . only valve unit 6 , 8 for dividing the optical column into two sections which can be held at different vacuum levels , ( if necessary ) is connected to housing 40 and put on beam boost potential . consequently , valve unit 6 , 8 does not require insulators and the electrical fields stemming from holding unit 6 and sliding valve 8 do not disturb the beam boost potential prevailing in the column . detector 16 is positioned in beam path 10 to collect secondary products . it is maintained at beam boost potential either with a conductive connection along light guide 17 or with any other conductive connection arranged between the detector and the housing or other conductive parts being put on beam boost potential . it should be noted that not all optical columns need a valve unit 6 , 8 . additionally , the detector does not always need to be located in the beam path . it can be positioned at the side or even outside and below the optical column e . g . in transmission microscopes . if a particular application necessitates an optical component to be arranged close to the beam path then it is preferred to keep it a beam boost potential . the possible disturbing influence of the electrical field of a component depends on its size , its distance to the beam path , the materials used , and its potential during operation of the charged particle beam device . this allows one to estimate to what extend it is necessary to put the respective part on beam boost potential . it is most preferred , however , to keep all possibly disturbing components or parts on beam boost potential . fig1 shows a electrostatic objective lens 12 with three electrodes below the housing 40 of the charged particle beam device . in a preferred embodiment , the upper electrode is maintained at beam boost potential . the middle electrode is used for focusing the charged particles coming from the source onto the specimen . simultaneously , this electrode decelerates the charged particles before they hit the specimen . the lower electrode is primarily used for controlling , e . g . it adjusts the extracting field for secondary particles coming from the source . the use of three electrodes is not a necessity , in principal , only one electrode would suffice . however , this limits for example the options of regulating the focusing properties of the objective lens . top cover plate 20 is connected to housing 40 and therefore on beam boost potential . the wires 3 which supply charged particle source 2 with power and the source itself are in general not on beam boost potential . isolation is provided between the top cover plate 20 on one side and wires 3 and source 2 on the other side . alternatively , it is possible to maintain the top cover plate 20 at the potential of the charged particle source 2 , but then the isolation needs to be provided between housing 40 and top cover plate 20 . housing 40 and top cover plate 20 are surrounded by a cover 42 and top cover 46 which are put on ground potential . in between housing 40 and cover 42 and in between top cover plate 20 and top cover 46 an insulating layer 48 is put . the insulating layer could be a dielectric material of varying thickness or a sufficiently large air gap . particularly in the latter case , it is preferred to round the edges of top cover plate 20 to reduce the likely hood of electric discharge . in addition , insulation is provided between wire 3 and top cover 46 . fig3 shows the prior art charged particle beam device of fig2 , however , with omitted insulators . shielding electrodes 30 and 32 are directly connected with housing 40 and on beam boost potential . depending on the application , stigmators , deflection coils or any other components could be arranged behind them . it should be noted , however , that it is not mandatory to have these components arranged behind shielding electrodes . the optical column is surrounded by cover 42 and cover plate 46 . advantageously , all parts and components located between source 2 and objective lens are put on beam boost potential . it is possible to place getter material close to the charged particle source to evacuate the gun chamber even more . depending on the exact location , the getter material is either put on beam boost potential or on the potential of the charged particle source . alternatively , a getter pump can be arranged outside the column and a tube connects the pump with the gun chamber . naturally , the tube end extending into the gun chamber is preferably put on beam boost potential during operation . the parts of the tube which either go through the housing 40 or through cover 42 need to be insulated accordingly . this could be done with insulating layers and / or with flanges having insulating material at their interfaces . fig4 shows the lower part of the optical column connected to the specimen chamber 22 . in general , the specimen chamber has a separate vacuum pump ( not shown ) for evacuating the chamber . to avoid leakage , a sealing 44 e . g . o - ring is put between cover 42 and specimen chamber . depending on the specific set up of the wall , an alternative or additional sealing can be put between housing 40 and cover 42 .