fig1 a illustrates a cross - sectional view of a semiconductor device package 1 in accordance with an embodiment of the present disclosure . the semiconductor device package 1 includes a substrate 10 , electronic components 11 a , 11 b , 11 c , a package body 12 , a seed layer 13 , an emi shield 14 , and a protection layer 15 . the substrate 10 is formed of , for example , a printed circuit board , such as a paper - based copper foil laminate , a composite copper foil laminate , or a polymer - impregnated glass - fiber - based copper foil laminate . the substrate 10 may include a redistribution layer ( rdl ) or traces ; for example , for electrical connection between components ( e . g ., the electronic components 11 a , 11 b , 11 c ) mounted on a top surface 101 of the substrate 10 . in one or more embodiments , the electronic components 11 a , 11 b , 11 c are disposed on pads on the substrate 10 . the substrate 10 can be replaced by other suitable carriers , such as a leadframe . the electronic component 11 a is disposed on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic component 11 a is an active component , such as a chip or a semiconductor die . the electronic component 11 a can be electrically connected to the substrate 10 by flip chip bonding , wire - bonding , or both . the electronic components 11 b , 11 c are disposed on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic components 11 b , 11 c are surface mounted on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic components 11 b , 11 c are passive components , for example , resistors , capacitors , inductors , filters , diplexers , baluns , or a combination of such components . the package body 12 is disposed on the top surface 101 of the substrate 10 to encapsulate the electronic components 11 a , 11 b , 11 c . the package body 12 can be , or can include , for example , an epoxy resin having fillers , a molding compound ( e . g ., an epoxy molding compound or other molding compound ), a polyimide , a phenolic compound or material , a material with a silicone dispersed therein , or a combination thereof . the seed layer 13 is disposed on the package body 12 to cover a top surface of the package body 12 , and also to cover lateral surfaces of the package body 12 and lateral surfaces of the substrate 10 that are substantially coplanar with respective lateral surfaces of the package body 12 . the seed layer 13 is formed of , for example , copper ( cu ), tin ( sn ), stainless steel , another metal or metal alloy , or a combination thereof . the emi shield 14 is disposed on the seed layer 13 and covers a top surface and lateral surfaces of the seed layer 13 . the seed layer 13 is disposed between the package body 12 and the emi shield 14 to strengthen the adhesion between the package body 12 and the emi shield 14 . as shown in fig1 a , the emi shield 14 includes an electrically conductive layer 14 a and a magnetically permeable layer 14 b . the conductive layer 14 a is disposed on the seed layer 13 . the electrically conductive layer 14 a is , or includes , a material with a high conductivity and a high magnetic saturation . for example , the electrically conductive layer 14 a is silver ( ag ), cu , aluminum ( al ), gold ( au ), or an alloy thereof . one measure of electrical conductivity is in terms of siemens per meter ( s / m ). examples of suitable electrically conductive materials for the electrically conductive layer 14 a include those having a conductivity greater than about 10 4 s / m , such as at least about 10 5 s / m , at least about 10 6 s / m , at least about 3 × 10 6 s / m , at least about 4 × 10 6 s / m , at least about 5 × 10 6 s / m , or at least about 6 × 10 6 s / m . electrical conductivity of a material can be measured at room temperature . the magnetically permeable layer 14 b is disposed on the electrically conductive layer 14 a . the magnetically permeable layer 14 b is , or includes , a material with a high permeability and a low magnetic saturation . the magnetically permeable layer 14 b can be , or can include , for example , molybdenum ( mo ), nickel ( ni ), cobalt ( co ), iron ( fe ), iron - cobalt alloy ( feco ), iron - nickel alloy ( feni or nife ), nickel - vanadium alloy ( niv ) or an alloy thereof , another magnetically permeable metal or metal alloy ( e . g ., another nickel - containing or iron - containing material ), or a combination thereof . one measure of magnetic permeability of a material is in terms of its relative permeability with respect to a permeability of free space . examples of suitable magnetically permeable materials for the magnetically permeable layer 14 b include those having a relative permeability greater than about 1 , such as at least about 2 , at least about 5 , at least about 10 , at least about 50 , at least about 100 , at least about 500 , at least about 1000 , at least about 5000 , at least about 10 4 , at least about 10 5 , or at least about 10 6 . magnetic permeability of a material can measured at room temperature and at a particular field strength , such as 0 . 5 tesla or 0 . 002 tesla . in one or more embodiments , the permeability of the magnetically permeable layer 14 b is in a range from about 500 henries / meter ( h / m ) to about 3000 h / m . in one or more embodiments , a ratio of a thickness of the electrically conductive layer 14 a to a thickness of the magnetically permeable layer 14 b is in a range of about 30 : 1 to about 400 : 1 . in one or more embodiments , a ratio of the thickness of the electrically conductive layer 14 a to the thickness of the magnetically permeable layer 14 b is in a range of about 40 : 1 to about 100 : 1 . in one or more embodiments , a ratio of the thickness of the electrically conductive layer 14 a to the thickness of the magnetically permeable layer 14 b is in a range of about 50 : 1 to about 70 : 1 . in one or more embodiments , a ratio of the thickness of the electrically conductive layer 14 a to the thickness of the magnetically permeable layer 14 b is greater than about 1 : 1 , such as about 30 : 1 or greater , about 40 : 1 or greater , or about 50 : 1 or greater . the ratio may change based on the use of different materials . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 3 μm . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 4 μm . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 5 μm . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 7 μm . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 10 μm . in one or more embodiments , the thickness of the electrically conductive layer 14 a is about 40 μm . in one or more embodiments , the thickness of the magnetically permeable layer 14 b is in a range from about 0 . 09 μm to about 0 . 11 μm . in one or more embodiments , the thickness of the magnetically permeable layer 14 b is about 0 . 1 μm . in one or more embodiments , the emi shield 14 includes multiple electrically conductive layers 14 a and / or multiple magnetically permeable layers 14 b . in such embodiments , the electrically conductive layers 14 a may be interspersed with the magnetically permeable layer 14 b . in one or more embodiments including multiple electrically conductive layers 14 a , each electrically conductive layer 14 a has substantially the same thickness . in other embodiments , one or more of the multiple electrically conductive layers 14 a has a different thickness than one or more others of the multiple electrically conductive layers 14 a . in one or more embodiments including multiple magnetically permeable layers 14 b , each magnetically permeable layer 14 b has substantially the same thickness . in other embodiments , one or more of the multiple magnetically permeable layers 14 b has a different thickness than one or more others of the multiple magnetically permeable layers 14 b . in one or more embodiments , a sum of thicknesses of the multiple electrically conductive layers 14 a and the multiple magnetically permeable layers 14 b ( e . g ., a thickness of the emi shield 14 ) is about 10 . 5 micrometers ( μm ). in one or more embodiments , the sum of thicknesses is about 12 . 5 μm . in one or more embodiments , the sum of thicknesses is about 14 . 5 μm . in one or more embodiments , the sum of thicknesses is about 15 . 5 μm . in one or more embodiments , the sum of thicknesses is about 20 . 5 μm . the protection layer 15 is disposed on the emi shield 14 and covers a top surface and lateral surfaces of the emi shield 14 . the protection layer 15 serves to protect the emi shield 14 from rusting , and the emi shielding effect is further enhanced by the protection layer 15 . in one or more embodiments , the protection layer 15 is formed of , for example , stainless steel , epoxy , niv , or a combination thereof . vias 16 are disposed adjacent to a periphery of the substrate 10 . more particularly , the vias 16 are disposed adjacent to the lateral surfaces of the substrate 10 . in one or more embodiments , the vias 16 may be grounding segments . the vias 16 are electrically connected to at least some of traces or other electrical interconnects included in the substrate 10 and provide electrical pathways to reduce emi . in one or more embodiments , a height of the vias 16 is substantially the same as a thickness of the substrate 10 ; namely , a difference between the height of the vias 16 and the thickness of the substrate 10 is less than or equal to ± 10 % of the thickness of the substrate 10 , such as less than or equal to ± 5 %, less than or equal to ± 4 %, less than or equal to ± 3 %, less than or equal to ± 2 %, less than or equal to ± 1 %, less than or equal to ± 0 . 5 %, less than or equal to ± 0 . 1 %, or less than or equal to ± 0 . 05 %. in one or more embodiments , the vias 16 are formed from a metal , a metal alloy , or another suitable electrically conductive material . fig1 b provides performance test results , illustrating emi shielding performance for various embodiments of the emi shield 14 . in the embodiments tested , the seed layer 13 was stainless steel ( sus ), the electrically conductive layer ( s ) 14 a were cu , the magnetically permeable layer ( s ) 14 b were a nickel - iron ( nife ) alloy , and the protection layer 15 was sus . in fig1 b , the second column shows a thickness in μm of the seed layer 13 for the various embodiments ; the third , fifth and seventh columns show a thickness in μm of the electrically conductive layer ( s ) 14 a in the various embodiments ( as applicable ); the fourth and the sixth columns show a thickness in μm of the magnetically permeable layer ( s ) 14 b in the various embodiments ( as applicable ); the eighth column shows a thickness in μm of the protection layer 15 in the various embodiments ; the ninth column shows a combined ( total ) thickness in μm of the seed layer 13 , the electrically conductive layer ( s ) 14 a , the magnetically permeable layer ( s ) 14 b and the protection layer 15 ; and the tenth column shows the measurement results of the shielding effectiveness at 10 megahertz ( mhz ). as seen in fig1 b ( items 1 , 2 , 3 ), for a single electrically conductive layer 14 a of cu and a single magnetically permeable layer 14 b of nife , as the thickness of the electrically conductive layer 14 a is increased from about 5 μm to about 10 μm to about 40 μm , the shielding effectiveness increases . as also seen in fig1 b ( items 4 , 5 , 6 ), for two electrically conductive layers 14 a of cu interspersed with two magnetically permeable layers 14 b of nife , as the thickness of each electrically conductive layer 14 a is increased from about 5 μm to about 7 μm to about 10 μm , the shielding effectiveness increases . as further seen in fig1 b , for three electrically conductive layers 14 a of cu interspersed with three magnetically permeable layers 14 b of nife , as the thickness of each electrically conductive layer 14 a is increased from about 4 μm to about 5 μm ( items 7 , 8 ), the shielding effectiveness increases ; and the total thickness has more impact on the shielding effectiveness than does a variation of thickness between the electrically conductive layers 14 a ( items 9 , 10 , as compared to items 7 , 8 ). because the emi shield 14 includes two types of layers , namely the electrically conductive layer ( s ) 14 a and the magnetically permeable layer ( s ) 14 b , the emi shield 14 can have characteristics of both high conductivity and high permeability . in addition , the electrically conductive layer ( s ) 14 a and the magnetically preamble layer ( s ) 14 b can be layered in an interspersed manner ( e . g ., such that an electrically conductive layer 14 a would not directly contact another electrically conductive layer 14 a , or such as a magnetically preamble layer 14 b would not directly contact another magnetically preamble layer 14 b ), which can increase the emi shielding performance ( compare , for example , items 2 and 4 , items 3 and 7 , and items 6 and 8 in fig1 b ). for example , to achieve a same emi shielding performance , the emi shield 14 with multiple interspersed layers as described is thinner than with a single shielding layer . therefore , in accordance with the present disclosure , the cost for manufacturing the semiconductor device package 1 can be reduced by reducing the total thickness of the emi shield 14 through use of the multiple layers . therefore , in comparison with using a single shielding layer , the multi - layer emi shield 14 as described in the present disclosure can provide improved emi shielding performance . further , as shown by the tests of fig1 b at 10 mhz , emi shielding performance is improved by the emi shield 14 for components 11 a , 11 b and 11 c of the semiconductor device package 1 operating at a relatively low frequency ( 10 mhz ). fig2 illustrates a cross - sectional view of a semiconductor device package 2 in accordance with an embodiment of the present disclosure . the semiconductor device package 2 in fig2 is similar to the semiconductor device package 1 in fig1 a , except that a coverage of a seed layer 23 , an emi shield 24 and a protection layer 25 in fig2 is different from the coverage of the corresponding seed layer 13 , emi shield 14 and protection layer 15 in fig1 a . as shown in fig2 , the seed layer 23 is disposed on the package body 12 and covers the top surface of the package body 12 . lateral surfaces of the seed layer 23 , lateral surfaces of the substrate 10 , and lateral surfaces of the package body 12 are substantially coplanar . the emi shield 24 is disposed on the seed layer 23 to cover a top surface of the seed layer 23 . lateral surfaces of the emi shield 24 and respective lateral surfaces of the seed layer 23 are substantially coplanar . the protection layer 25 is disposed on the emi shield 24 to cover a top surface of the emi shield 24 and the substantially coplanar lateral surfaces of the substrate 10 , the package body 12 , the seed layer 23 and the emi shield 24 . fig3 a - 3c illustrate a semiconductor manufacturing process in accordance with an embodiment of the present disclosure . referring to fig3 a , a substrate 10 is provided . the substrate 10 is , for example , a printed circuit board , such as a paper - based copper foil laminate , a composite copper foil laminate , or a polymer - impregnated glass - fiber - based copper foil laminate . the substrate 10 can include a redistribution layer ( rdl ) or traces for electrical connection between components mounted on a top surface 101 of the substrate 10 . the substrate 10 can be replaced by other suitable carriers , such as a leadframe . electronic components 11 a , 11 b , 11 c are placed on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic component 11 a is an active component , such as a chip or a semiconductor die . the electronic component 11 a can be electrically connected to the substrate 10 by flip chip bonding , wire - bonding , or both . the electronic components 11 b , 11 c are surface mounted on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic components 11 b , 11 c are passive components , for example , resistors , capacitors , inductors , filters , diplexers , baluns , or a combination of such components . vias 16 are formed in the substrate 10 . the vias 16 are connected to electrical interconnects included in the substrate 10 and provide electrical pathways to reduce emi . in one or more embodiments , the vias 16 can be formed by : ( i ) forming openings by , for example , photolithography , chemical etching , laser drilling , or mechanical drilling ; and ( ii ) plating the openings by using , for example , a metal , a metal alloy , a matrix with a metal or a metal alloy dispersed therein , or another suitable electrically conductive material . referring to fig3 b , a package body 12 is formed to substantially cover or encapsulate the electronic components 11 a , 11 b , 11 c . for example , the package body 12 can be formed by applying an encapsulant to the top surface 101 of the substrate 10 . the encapsulant may include a novolac - based resin , an epoxy - based resin , a silicone - based resin , or another suitable material . the encapsulant can be applied using any of a number of molding techniques , such as compression molding , injection molding , or transfer molding . in one or more embodiments , the substrate 10 is one of a series of substrates 10 joined together , and subsequent to forming the package body 12 , the series of substrates 10 is singulated to form individual devices , which are then processed through subsequent stages . referring to fig3 c , a seed layer 13 is formed adjacent to exposed surfaces , including exterior surfaces of the package body 12 , lateral surfaces of the vias 16 exposed by the package body 12 , and lateral surfaces of the substrate 10 . the seed layer 13 can be formed , for example , by physical vapor deposition ( pvd ), chemical vapor deposition ( cvd ), electroless plating , electroplating , sputtering or spraying . the seed layer 13 may be , or may include , for example , cu , sn , stainless steel , another metal or metal alloy , or a combination thereof . an electrically conductive layer 14 a is formed on the seed layer 13 to cover a top surface and lateral surfaces of the seed layer 13 . the electrically conductive layer 14 a can be formed , for example , by pvd , cvd , electroless plating , electroplating , sputtering or spraying . the electrically conductive layer 14 a is , or includes , a material with a high conductivity and high magnetic saturation . for example , the electrically conductive layer 14 a may be , or may include , for example , ag , cu , al , au , or an alloy thereof . a magnetically permeable layer 14 b is formed on the electrically conductive layer 14 a to cover a top surface and lateral surfaces of the electrically conductive layer 14 a . the electrically conductive layer 14 b can be formed , for example , by pvd , cvd , electroless plating , electroplating , sputtering or spraying . the magnetically permeable layer 14 b is , or includes , a material with a high permeability and low magnetic saturation . the magnetically permeable layer 14 b may be , or may include , for example , mo , ni , co , fe , feco , feni ( or nife ), niv or an alloy thereof , another magnetically permeable metal or metal alloy ( e . g ., another nickel - containing or iron - containing material ), or a combination thereof . a protection layer 15 is formed on the magnetically permeable layer 14 b to cover a top surface and lateral surfaces of the magnetically permeable layer 14 b . the protection layer 15 can be formed , for example , by pvd , cvd , electroless plating , electroplating , sputtering or spraying . the protection layer 15 may be , or may include , for example , stainless steel , epoxy , niv , or a combination thereof . in one or more embodiments , the emi shield 14 includes multiple electrically conductive layers 14 a and / or multiple magnetically permeable layers 14 b . in such embodiments , the electrically conductive layers 14 a may be interspersed with the magnetically permeable layer 14 b . different layers of the emi shield 14 can be formed using a same or similar coating technique , or different coating techniques . in one or more embodiments including multiple electrically conductive layers 14 a , each electrically conductive layer 14 a has substantially the same thickness . in other embodiments , one or more of the multiple electrically conductive layers 14 a has a different thickness than one or more others of the multiple electrically conductive layers 14 a . in one or more embodiments including multiple magnetically permeable layers 14 b , each magnetically permeable layer 14 b has substantially the same thickness . in other embodiments , one or more of the multiple magnetically permeable layers 14 b has a different thickness than one or more others of the multiple magnetically permeable layers 14 b . in one or more embodiments , during the formation of the emi shield 14 , a magnetic dipole rearrangement technique can be performed so that a magnetically permeable moment of the magnetically permeable layer 14 b is rearranged , by applying an appropriate magnetic field over area on which the emi shield 14 is to be formed , to maintain the magnetically permeable layer 14 b of the emi shield 14 at a high relative permeability . for example , a magnetic field of about 100 to about 1000 oersted ( oe ) can be applied during the formation of the magnetically permeable layer 14 b , so that the permeability of the magnetically permeable layer 14 b would be in a range from about 500 h / m to about 3000 h / m . in one or more embodiments , annealing at about 100 to about 1000 celsius can be applied to the emi shield 14 to maintain the magnetically permeable layer 14 b of the emi shield 14 at high relative permeability ( from about 500 h / m to about 3000 h / m ). due to the high permeability of the magnetically permeable layer 14 b of the emi shield 14 , the semiconductor device packages of the present disclosure have improved emi shielding performance . in one or more embodiments , the substrate 10 is one of a series of substrates 10 joined together , and subsequent to the stage of fig3 c , the series of substrates 10 is singulated to form individual devices . fig4 a - 4d illustrate a semiconductor manufacturing process in accordance with an embodiment of the present disclosure . referring to fig4 a , a series of substrates 10 are provided . each substrate 10 is , for example , a printed circuit board , such as a paper - based copper foil laminate , a composite copper foil laminate , or a polymer - impregnated glass - fiber - based copper foil laminate . each substrate 10 can include a redistribution layer ( rdl ) or traces for electrical connection between components mounted on a top surface 101 of the substrate 10 . the substrate 10 can be replaced by other suitable carriers , such as leadframes . electronic components 11 a , 11 b , 11 c are placed on the top surface 101 of each substrate 10 . in one or more embodiments , the electronic component 11 a is an active component , such as a chip or a semiconductor die . the electronic component 11 a can be electrically connected to the substrate 10 by flip chip bonding , wire - bonding , or both . the electronic components 11 b , 11 c are surface mounted on the top surface 101 of the substrate 10 . in one or more embodiments , the electronic components 11 b , 11 c are passive components , for example , resistors , capacitors , inductors , filters , diplexers , baluns , or a combination of such components . vias 16 are formed in each substrate 10 . the vias 16 are connected to electrical interconnects included in the substrate 10 and provide electrical pathways to reduce emi . in one or more embodiments , the vias 16 can be formed by ( i ) forming openings by , for example , photolithography , chemical etching , laser drilling , or mechanical drilling ; and ( ii ) plating the openings by using , for example , a metal , a metal alloy , a matrix with a metal or a metal alloy dispersed therein , or another suitable electrically conductive material . referring to fig4 b , a package body 12 is formed to substantially cover or encapsulate the electronic components 11 a , 11 b , 11 c . for example , the package body 12 can be formed by applying an encapsulant to the top surface 101 of the substrate 10 . the encapsulant may be , for example , a novolac - based resin , an epoxy - based resin , a silicone - based resin , or another suitable material . the encapsulant may be applied using any of a number of molding techniques , such as compression molding , injection molding , or transfer molding . referring to fig4 c , a seed layer 23 is formed on a top surface of the package body 12 . the seed layer 23 can be formed , for example , by pvd , cvd , electroless plating , electroplating , spraying or sputtering . the seed layer 23 may be , or may include , for example , cu , sn , stainless steel , another metal or metal alloy , or a combination thereof . a electrically conductive layer 24 a is formed on the seed layer 23 . the electrically conductive layer 24 a can be formed by , for example , pvd , cvd , electroless plating , electroplating or spraying . the electrically conductive layer 24 a may be , or may include , a material with a high conductivity and high magnetic saturation . for example , the electrically conductive layer 24 a may be ag , cu , al , au , or an alloy thereof . a magnetically permeable layer 24 b is formed on the electrically conductive layer 14 a . the electrically conductive layer 24 b can be formed , for example , by pvd , cvd , electroless plating , electroplating , spraying or sputtering . the magnetically permeable layer 24 b may be , or may include , a material with a high permeability and low magnetic saturation . the magnetically permeable layer 24 b may be , or may include , for example , mo , ni , co , fe , feco , feni ( or nife ), niv or an alloy thereof , another magnetically permeable metal or metal alloy ( e . g ., another nickel - containing or iron - containing material ), or a combination thereof . in one or more embodiments , the emi shield 24 includes multiple electrically conductive layers 24 a and / or multiple magnetically permeable layers 24 b . in such embodiments , the electrically conductive layers 24 a may be interspersed with the magnetically permeable layer 24 b . different layers of the emi shield 24 can be formed using a same or similar coating technique , or different coating techniques . in one or more embodiments including multiple electrically conductive layers 24 a , each electrically conductive layer 24 a has substantially the same thickness . in other embodiments , one or more of the multiple electrically conductive layers 24 a has a different thickness than one or more others of the multiple electrically conductive layers 24 a . in one or more embodiments including multiple magnetically permeable layers 24 b , each magnetically permeable layer 24 b has substantially the same thickness . in other embodiments , one or more of the multiple magnetically permeable layers 24 b has a different thickness than one or more others of the multiple magnetically permeable layers 24 b . in one or more embodiments , during the formation of the emi shield 24 , a magnetic dipole rearrangement technique can be performed so that a magnetically permeable moment of the magnetically permeable layer 14 b is rearranged , by applying an appropriate magnetic field over area on which the emi shield 24 is to be formed , to maintain the magnetically permeable layer 24 b of the emi shield 24 at a high relative permeability . for example , a magnetic field of about 100 to about 1000 oe can be applied during the formation of the magnetically permeable layer 24 b , so that the permeability of the magnetically permeable layer 24 b would be in a range from about 500 h / m to about 3000 h / m . in one or more embodiments , annealing at about 100 to about 1000 celsius can be applied to the emi shield 24 to maintain the magnetically permeable layer 24 b of the emi shield 24 at high relative permeability ( from about 500 h / m to about 3000 h / m ). due to the high permeability of the magnetically permeable layer 24 b of the emi shield 24 , the semiconductor device packages of the present disclosure have improved emi shielding performance . as shown in fig4 c , lateral surfaces of the emi shield 24 ( e . g ., lateral surfaces of the electrically conductive layer ( s ) 24 a and lateral surfaces of the magnetically permeable layer ( s ) 24 b ), lateral surfaces of the seed layer 23 , lateral surfaces of the package body 12 , and lateral surfaces of the substrate 10 are substantially coplanar . referring to fig4 d , a singulation technique is performed to separate the series of substrates 10 into multiple individual substrates 10 . the singulation technique may be performed by laser cutting , sawing or other suitable technique . referring to fig4 e , a protection layer 25 is formed on the magnetically permeable layer 24 b to cover a top surface of the magnetically permeable layer 24 b and the substantially coplanar lateral surfaces of the emi shield 24 , the seed layer 23 , the package body 12 and the substrate 10 . the protection layer 25 may be formed , for example , by pvd , cvd , electroless plating , electroplating , sputtering or spraying . the protection layer 25 may be , or may include , for example , stainless steel , epoxy , niv , or a combination thereof . for the embodiments described above in which the emi shield ( e . g ., emi shield 14 or 24 ) includes multiple electrically conductive layers ( e . g ., electrically conductive layers 14 a or 24 a ) and / or multiple magnetically permeable layers ( e . g ., magnetically permeable layers 14 b or 24 b ), a number of electrically conductive layers may be different than a number of magnetically permeable layers . accordingly , the number of electrically conductive layers may be less than , equal to , or greater than the number of magnetically permeable layers . for example , the number of electrically conductive layers may be n , and the number of magnetically permeable layers may be n − 1 . as used herein , the terms “ substantially ” and “ about ” are used to describe and account for small variations . for example , when used in conjunction with a numerical value , the terms can encompass a range of variation of less than or equal to ± 10 % of that value , such as less than or equal to ± 5 %, less than or equal to ± 4 %, less than or equal to ± 3 %, less than or equal to ± 2 %, less than or equal to ± 1 %, less than or equal to ± 0 . 5 %, less than or equal to ± 0 . 1 %, or less than or equal to ± 0 . 05 %. for another example , two values which are “ substantially the same ” can encompass a difference between the two values that is less than or equal to ± 10 % of one of the values , such as less than or equal to ± 5 %, less than or equal to ± 4 %, less than or equal to ± 3 %, less than or equal to ± 2 %, less than or equal to ± 1 %, less than or equal to ± 0 . 5 %, less than or equal to ± 0 . 1 %, or less than or equal to ± 0 . 05 %. two surfaces can be deemed to be coplanar or substantially coplanar if a displacement between the two surfaces is no greater than 5 μm , no greater than 2 μm , no greater than 1 μm , or no greater than 0 . 5 μm . for another example , a material can be deemed to “ substantially cover ” a surface if the material covers greater than 95 % of the surface ; and a material can be deemed to “ substantially cover ” a component if more than 95 % of each surface of the component exposed to the material is covered by the material . additionally , amounts , ratios , and other numerical values are sometimes presented herein in a range format . it can be understood that such range formats are used for convenience and brevity , and should be understood flexibly to include numerical values explicitly specified as limits of a range , but also to include all individual numerical values or sub - ranges encompassed within that range as if each numerical value and sub - range is explicitly specified . while the present disclosure has been described and illustrated with reference to specific embodiments thereof , these descriptions and illustrations do not limit the present disclosure . it can be clearly understood by those skilled in the art that various changes may be made , and equivalent components may be substituted within the embodiments without departing from the true spirit and scope of the present disclosure as defined by the appended claims . the illustrations may not necessarily be drawn to scale . there may be distinctions between the artistic renditions in the present disclosure and the actual apparatus , due to variables in manufacturing processes and such . there may be other embodiments of the present disclosure which are not specifically illustrated . the specification and drawings are to be regarded as illustrative rather than restrictive . modifications may be made to adapt a particular situation , material , composition of matter , method , or process to the objective , spirit and scope of the present disclosure . all such modifications are intended to be within the scope of the claims appended hereto . while the methods disclosed herein have been described with reference to particular operations performed in a particular order , it can be understood that these operations may be combined , sub - divided , or re - ordered to form an equivalent method without departing from the teachings of the present disclosure . therefore , unless specifically indicated herein , the order and grouping of the operations are not limitations of the present disclosure .