the optical interconnect circuit presented herein solves a problem of implementing high - density , packageable optical interconnects for gaas optoelectronics . since gaas and si ic &# 39 ; s can be well interconnected electrically , this invention enables a high - speed , high - density interconnection of si ic &# 39 ; s . fig1 shows a schematic cross section of the basic concept . a si carrier 10 is used as the substrate for mounting the discrete si chips 11 and 11 &# 39 ; and gaas chips 12 and 13 , and as the optical substrate 14 for the optical interconnect circuit 15 . specifically the optical interconnect shown takes a signal from the si circuit 11 and converts it to a modulated optical beam in the gaas edge emitter 12 , couples it through a thin - film optical waveguide 15 to gaas photodetector 13 and then into si circuit 11 &# 39 ;. the gaas edge emitter 12 may be a diode laser , a light emitting diode , or a superluminescent diode . the gaas photodetector 13 may be a pn diode , a pin diode , an avalanche photodiode , or a photoconductor . the wavelength of the optical signal in gaas based semiconductor edge - emitters is in the range of ˜ 780 nm to ˜ 905 nm . the range basically refers to different compositions of al x ga 1 - x as which may be used . thus for example at al 0 . 30 ga 0 . 70 as the wavelength is ˜ 830 nm . the waveguide dimensions are generally on the order of the wavelength in the waveguide material . fig2 is reproduced from an optical micrograph of a cleaved cross section of a channel or trough waveguide in accordance with the invention . it should be noted from this figure that the trough depth etched into the silicon substrate is much greater than the waveguide thickness . in this embodiment the trough depth etched into the silicon substrate is about 10 microns , the thickness of the silicon dioxide ( sio 2 ) layer is in the range of 1 - 2 microns , and the thickness of the waveguide material is about 0 . 25 microns . optically the waveguide layer is transparent and thick enough to support one mode . in this embodiment the trough depth is approximately 40 times the waveguide thickness . the trough depth and waveguide thickness determine the optical waveguide channel confinement . additional fabricational procedures are not necessary to achieve channel confinement , thus enabling very low propagation loss . the propagation loss of the optical modes in the channel waveguides are determined essentially by the residual loss of the waveguide material itself . conventional channel waveguides are delineated by additional selective deposition or etching processes that always cause additional and usually very substantial propagation losses . the long thermal growth of sio 2 on si and the anisotropic etching of si in this invention smooth and straighten out the channel sidewalls , thus overcoming the fundamental limitations of conventional fabrication processes . the si carrier is an excellent substrate material for optical circuits and electronic circuits in gaas and si for the following reasons : ( a ) the thermally - grown sio 2 has excellent optical characteristics ( low optical absorption , low refractive index , smooth surface , etc . ), ( b ) the thermal conductivity of si is more than three times greater than in gaas , ( d ) si and its associated electronic device technology is very well understood , ( e ) si is available in large diameters at relatively low cost , ( f ) the electronic circuits can be discrete high - performance ic &# 39 ; s mounted on the si carrier or can be fabricated in the carrier itself , and ( g ) all components required in optical interconnect circuits can be fabricated monolithically on the si carrier . these components include branches , bends , crossovers , switches , and modulators . the photodetectors may be made in si or in gaas . fig3 is a more diagrammatic presentation of the basic optical channel waveguide structure and shows the silicon substrate 10 having grown on its surface 20 the thin film dielectric layer 12 of silicon dioxide ( sio 2 ). the uniform dielectric layer follows the contour of the surface and trough . deposited on the surface of layer 21 is the thin film layer 15 of waveguiding material . this optical channel waveguide is fabricated by anisotropic wet chemical etching of si to form the trough . the layer of sio 2 is preferably grown thermally and then the waveguide material 15 is deposited uniformly over the sio 2 top surface as shown in fig3 . the waveguide material may be , for example , zno , ta 2 o 5 al 2 o 3 or mixed oxide glassy films deposited by ion - beam sputtering . these material have relatively high indexes of refraction . the optical signal is confined to the waveguiding region and propagates along the flat - bottom of the trough . the waveguiding region is defined by the refractive index difference at its bottom ( the oxidized ( 100 ) face of si ), at its top ( the waveguide - air interface ), and at its sides ( the oxidized ( 111 ) faces of si ). as detailed earlier , the depth of the trough must be significantly larger than the thickness of the waveguide in order for the light to be confined to the trough . in one successful embodiment the width of the trough at the waveguide level of the trough bottom is about 5 microns . fig4 shows in more detail a fabrication sequence of the waveguide trough disclosed in fig2 and 3 . a ( 100 ) monocrystalline silicon substrate having a ( 100 ) planar surface 20 has formed on the surface , as shown in fig4 a , a silicon nitride and silicon dioxide etch mask 45 with delineation 46 . an anisotropic etch , such as koh , is then used to etch the trough 47 . the mask 45 is removed and a thermal oxide growth ( sio 2 ) 21 is made which is on the order of 1 - 2 microns thick . the planar waveguiding material 15 is then deposited , for example , by ion - beam sputtering . other thin film solid deposition techniques may be used as well . referring now to fig5 there is shown pictorially an example of a number of waveguides 40 and 41 , a corner bend 42 , a t - branch 43 , and a crossover 44 . a key feature of these channel waveguides is that they are all parallel or perpendicular to one another in the ( 100 ) plane . thus , many parallel channels can be packed in close proximity to one another with no interchannel interference . similarly , the abrupt 90 degree crossovers permit little , if any , crosstalk . proper mask design and controlled etching will enable corner bends , t - branches , and crossovers to be made as shown in fig5 . these are the basic components required to achieve high - density optical signal transmission , routing , and distribution . a key feature of both the t - branch and the corner bend in fig5 is that they are formed by the ( 100 ) face of si which is perpendicular to the plane of the waveguide and at 45 degrees to the ( 110 ) direction of both perpendicular intersecting channel waveguides . thus , the optical signal propagating in a single channel can be reflected efficiently into a perpendicular channel ( in the same way a beam of light is reflected from a mirror ). similarly , the protrusion 45 of the deflector in the t - branch of fig5 determines the fraction of the optical power propagating in each output channels . a pictorial view of an optical interconnect network is shown in fig6 and depicts a sample implementation of this optical interconnect circuit concept for gaas optoelectronic ic &# 39 ; s . both transmit and receive functions can be implemented on each ic . thus , for example , fig6 shows that signals from a gaas emitter 60 are transmitted through optical waveguide 61 , through a crossover 62 and a fan - out t - branch 63 to a pair of gaas photodetector receiving units 64 and 65 . a preferred embodiment of the optical interconnect circuit shown in fig7 is the inverted channel or mesa structure and fabrication sequence . the fabrication sequence is generally similar to that of fig4 earlier described , except that the etch mask pattern of fig7 is in a sense reversed . thus in fig7 a the si 3 n 4 / sio 2 mask 70 determines the position , size and route of the elevated channel or mesa to be formed . fig7 b shows the anisotropic etch step removing silicon ( about 10 micrometers ) to form a new shoulder surface 71 while leaving the original surface 72 delineating the future waveguide shape . the mask 70 is then removed . in fig7 c the oxide growth is performed to provide a uniform dielectric layer 73 of sio 2 over the silicon surface and mesa . this is followed in fig7 d by deposition of the thin film waveguide material 74 uniformly over the surface . the waveguiding material on top of the mesa now becomes the channel waveguide . in this elevated channel waveguide of fig7 d , as in the earlier described trough embodiment , the optical signal is contained by the waveguide edge within the channel waveguide . the bends , crossovers , t - branches and mesa waveguides follow basically the same rules as described for the trough embodiment . one difference is that the channel width in the mesa approach is the same as the mask width , whereas in the trough embodiment , the channel width is determined by the mask width as well as the etch depth .