fig1 is an equivalent circuit diagram of a two - input nor circuit applied to the present invention . qn 1 and qn 2 denote nmos transistors each constituted by an sgt , and qp 1 and qp 2 denote pmos transistors each constituted by an sgt . the sources of the nmos transistors qn 1 and qn 2 are connected to a common reference voltage vss , and the drains thereof are connected to a common node n 1 . the drain of the pmos transistor qp 1 is connected to the node n 1 , the source thereof is connected to the drain of the pmos transistor qp 2 via a node n 2 , and the source of the pmos transistor qp 2 is connected to a power supply voltage vcc . an input signal in 1 is connected to the gates of the nmos transistor qn 1 and the pmos transistor qp 1 , and an input signal in 2 is connected to the gates of the nmos transistor qn 2 and the pmos transistor qp 2 . fig2 a and 2b illustrate a first embodiment . fig2 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig2 b is a cross - sectional view taken along a cut line a - a ′. referring to fig2 a , the pmos transistor qp 1 , the nmos transistor qn 1 , the nmos transistor qn 2 , and the pmos transistor qp 2 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig2 a and 2b , the components having the same structure as that in fig1 a and 18b are denoted by equivalent reference numerals in the 100s . planar silicon layers 102 pa , 102 n , and 102 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 101 disposed on a substrate . the planar silicon layers 102 pa , 102 n , and 102 pb are formed of a p + diffusion layer , an n + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 103 denotes a silicide layer disposed on surfaces of the planar silicon layers 102 pa , 102 n , and 102 pb , which connects the planar silicon layers 102 pa and 102 n to each other . 104 p and 104 p 2 denote p - type silicon pillars ; 104 n 1 and 104 n 2 denote n - type silicon pillars ; 105 denotes a gate insulating film surrounding the silicon pillars 104 p 1 , 104 p 2 , 104 n 1 , and 104 n 2 ; 106 denotes a gate electrode ; and 106 a and 106 b denote gate lines . n + diffusion layers 107 n 1 and 107 n 2 are formed at the tops of the p - type silicon pillars 104 p and 104 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 107 p 1 and 107 p 2 are formed at the tops of the n - type silicon pillars 104 n 1 and 104 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 108 denotes a silicon nitride film for protecting the gate insulating film 105 ; 109 n 1 , 109 n 2 , 109 p 1 , and 109 p 2 denote silicide layers connected to the n + diffusion layers 107 n 1 and 107 n 2 and the p + diffusion layers 107 p 1 and 107 p 2 , respectively ; 110 n 1 , 110 n 2 , 110 p 1 , and 110 p 2 denote contacts that connect the silicide layers 109 n 1 , 109 n 2 , 109 p 1 , and 109 p 2 to first metal lines 113 c , 113 c , 113 a , and 113 e , respectively ; 111 a denotes a contact that connects the gate line 106 a and a first metal line 113 b to each other ; and 111 b denotes a contact that connects the gate line 106 b and a first metal line 113 d to each other . 112 denotes a contact that connects the silicide layer 103 connected to the planar silicon layer 102 pb and a first metal line 113 f to each other . 114 p denotes a contact that connects the first metal line 113 a and a second metal line 115 to each other ; and 114 p 2 denotes a contact that connects the first metal line 113 e and the second metal line 115 to each other . the p - type silicon pillar 104 p 1 , the planar silicon layer 102 n , the n + diffusion layer 107 n 1 , the gate insulating film 105 , and the gate electrode 106 constitute the nmos transistor qn 1 . the p - type silicon pillar 104 p 2 , the planar silicon layer 102 n , the n + diffusion layer 107 n 2 , the gate insulating film 105 , and the gate electrode 106 constitute the nmos transistor qn 2 . the n - type silicon pillar 104 n 1 , the planar silicon layer 102 pa , the p + diffusion layer 107 p 1 , the gate insulating film 105 , and the gate electrode 106 constitute the pmos transistor qp 1 . the n - type silicon pillar 104 n 2 , the planar silicon layer 102 pb , the p + diffusion layer 107 p 2 , the gate insulating film 105 , and the gate electrode 106 constitute the pmos transistor qp 2 . the gate line 106 a is connected to the gate electrode 106 of the nmos transistor qn 1 . the gate line 106 b is connected to the gate electrode 106 of the nmos transistor qn 2 . the gate line 106 a is connected to the gate electrode 106 of the pmos transistor qp 1 . the gate line 106 b is connected to the gate electrode 106 of the pmos transistor qp 2 . the planar silicon layers 102 pa and 102 n serve as a common drain of the pmos transistor qp 1 and the nmos transistors qn 1 and qn 2 , and are connected to an output out 1 . the n + diffusion layer 107 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 113 c via the silicide layer 109 n 1 and the contact 110 n 1 , and the reference voltage vss is supplied to the first metal line 113 c . the n + diffusion layer 107 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 113 c via the silicide layer 109 n n and the contact 110 n 2 . the p + diffusion layer 107 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 113 a via the silicide layer 109 p 1 and the contact 110 p 1 , and the first metal line 113 a is connected to the second metal line 115 via the contact 114 p 1 . the p + diffusion layer 107 p 2 , which serves as the drain of the pmos transistor qp 2 , is connected to the first metal line 113 e via the silicide layer 109 p 2 and the contact 110 p 2 , and the first metal line 113 e is connected to the second metal line 115 via the contact 114 p 2 . here , the source of the pmos transistor qp 1 and the drain of the pmos transistor qp 2 are connected to each other via the second metal line 115 . the planar silicon layer 102 pb serves as the source of the pmos transistor qp 2 and is connected to the first metal line 113 f via the silicide layer 103 and the contact 112 . the power supply voltage vcc is supplied to the first metal line 113 f . the input signal in 1 is supplied to the first metal line 113 b , is supplied to the gate line 106 a via the contact 111 a , and is supplied to the gate electrodes of the pmos transistor qp 1 and the nmos transistor qn 1 . the input signal in 2 is supplied to the first metal line 113 d , is supplied to the gate line 106 b via the contact 111 b , and is supplied to the gate electrodes of the pmos transistor qp 2 and the nmos transistor qn 2 . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . fig3 a and 3b illustrate a second embodiment . fig3 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig3 b is a cross - sectional view taken along a cut line a - a ′. referring to fig3 a , the nmos transistors qn 2 and qn 1 and the pmos transistors qp 1 and qp 2 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig3 a and 3b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 200s . planar silicon layers 202 n , 202 pa , and 202 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 201 disposed on a substrate . the planar silicon layers 202 n , 202 pa , and 202 pb are formed of an n + diffusion layer , a p + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 203 denotes a silicide layer disposed on surfaces of the planar silicon layers 202 n , 202 pa , and 202 pb , which connects the planar silicon layers 202 n and 202 pa to each other . 204 p and 204 p 2 denote p - type silicon pillars ; 204 n 1 and 204 n 2 denote n - type silicon pillars ; 205 denotes a gate insulating film surrounding the silicon pillars 204 p 1 , 204 p 2 , 204 n 1 , and 204 n 2 ; 206 denotes a gate electrode ; and 206 a , 206 b , and 206 c denote gate lines . n + diffusion layers 207 n 1 and 207 n 2 are formed at the tops of the p - type silicon pillars 204 p and 204 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 207 p 1 and 207 p 2 are formed at the tops of the n - type silicon pillars 204 n 1 and 204 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 208 denotes a silicon nitride film for protecting the gate insulating film 205 ; 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 denote silicide layers connected to the n + diffusion layers 207 n 1 and 207 n 2 and the p + diffusion layers 207 p 1 and 207 p 2 , respectively ; 210 n 1 , 210 n 2 , 210 p 1 , and 210 p 2 denote contacts that connect the silicide layers 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 to first metal lines 213 b , 213 b , 213 d , and 213 d , respectively ; 211 a denotes a contact that connects the gate line 206 a and a first metal line 213 c to each other ; and 211 c denotes a contact that connects the gate line 206 c and a first metal line 213 e to each other . 212 denotes a contact that connects the silicide layer 203 connected to the planar silicon layer 202 pb and a first metal line 213 f to each other . the gate line 206 b is a line that connects the gate electrode 206 of the nmos transistor qn 2 and the gate electrode 206 of the pmos transistor qp 2 to each other , which will be described below . the p - type silicon pillar 204 p 1 , the planar silicon layer 202 n , the n + diffusion layer 207 n 1 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 1 . the p - type silicon pillar 204 p 2 , the planar silicon layer 202 n , the n + diffusion layer 207 n 2 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 2 . the n - type silicon pillar 204 n 1 , the planar silicon layer 202 pa , the p + diffusion layer 207 p 1 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 1 . the n - type silicon pillar 204 n 2 , the planar silicon layer 202 pb , the p + diffusion layer 207 p 2 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 2 . the gate line 206 a is connected to the gate electrode 206 of the nmos transistor qn 1 . the gate line 206 b is connected to the gate electrode 206 of the nmos transistor qn 2 . the gate line 206 a is connected to the gate electrode 206 of the pmos transistor qp 1 . the gate lines 206 b and 206 c are connected to the gate electrode 206 of the pmos transistor qp 2 . the planar silicon layers 202 n and 202 pa serve as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 , and are connected to an output out 1 . the n + diffusion layer 207 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 213 b via the silicide layer 209 n 1 and the contact 210 n 1 , and the reference voltage vss is supplied to the first metal line 213 b . the n + diffusion layer 207 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 213 b via the silicide layer 209 n n and the contact 210 n 2 . the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 213 d via the silicide layer 209 p 1 and the contact 210 p 1 . the p + diffusion layer 207 p 2 , which serves as the drain of the pmos transistor qp 2 , is connected to the first metal line 213 d via the silicide layer 209 p 2 and the contact 210 p 2 . here , the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , and the p + diffusion layer 207 p 2 , which serves as the drain of the pmos transistor qp 2 , are connected to each other via the first metal line 213 d . the planar silicon layer 202 pb serves as the source of the pmos transistor qp 2 , and is connected to the first metal line 213 f via the silicide layer 203 and the contact 212 . the power supply voltage vcc is supplied to the first metal line 213 f . the input signal in 1 is supplied to the first metal line 213 c , is supplied to the gate line 206 a via the contact 211 a , and is supplied to the gate electrodes of the pmos transistor qp 1 and the nmos transistor qn 1 . the input signal in 2 is supplied to first metal line 213 e , is supplied to the gate line 206 c via the contact 211 c , and is supplied to the gate electrode of the pmos transistor qp 2 . also , the input signal in 2 is supplied to the gate electrode of the nmos transistor qn 2 via the gate line 206 b . in this embodiment , the gate electrodes of the nmos transistor qn 2 and the pmos transistor qp 2 are connected to each other by using the extended gate line 206 b in order to omit a metal line . however , the gate line 206 b extends between diffusion layers in a free region , and thus an increase in the area does not occur . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . further , with the gate line 206 b being extended , connections can be made using only the first metal lines , and thus the second metal line can be effectively used . further , the first metal line 213 b for the reference voltage vss is disposed at the right end and the first metal line 213 f for the power supply voltage vcc is disposed at the left end . accordingly , the power supply can be shared in a case where a plurality of circuits are arranged side by side , and thus the area can be further reduced . fig4 a and 4b illustrate a third embodiment . fig4 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig4 b is a cross - sectional view taken along a cut line a - a ′. the arrangement of the transistors illustrated in fig4 a and 4b is the same as that illustrated in fig3 a and 3b , that is , the nmos transistors qn 2 and qn 1 and the pmos transistors qp 1 and qp 2 are arranged in a line from the right . a difference from fig3 a and 3b is a connection method for a gate input signal between the nmos transistor qn 2 and the pmos transistor qp 2 . in fig4 a and 4b , the components having the same structure as that in fig3 a and 3b are denoted by equivalent reference numerals in the 200s . planar silicon layers 202 n , 202 pa , and 202 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 201 disposed on a substrate . the planar silicon layers 202 n , 202 pa , and 202 pb are formed of an n + diffusion layer , a p + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 203 denotes a silicide layer disposed on surfaces of the planar silicon layers 202 n , 202 pa , and 202 pb , which connects the planar silicon layers 202 n and 202 pa to each other . 204 p and 204 p 2 denote p - type silicon pillars ; 204 n 1 and 204 n 2 denote n - type silicon pillars ; 205 denotes a gate insulating film surrounding the silicon pillars 204 p 1 , 204 p 2 , 204 n 1 , and 204 n 2 ; 206 denotes a gate electrode ; and 206 a , 206 b , and 206 c denote gate lines . n + diffusion layers 207 n 1 and 207 n 2 are formed at the tops of the p - type silicon pillars 204 p and 204 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 207 p 1 and 207 p 2 are formed at the tops of the n - type silicon pillars 204 n 1 and 204 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 208 denotes a silicon nitride film for protecting the gate insulating film 205 ; 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 denote silicide layers connected to the n + diffusion layers 207 n 1 and 207 n 2 and the p + diffusion layers 207 p 1 and 207 p 2 , respectively ; 210 n 1 , 210 n 2 , 210 p 1 , and 210 p 2 denote contacts that connect the silicide layers 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 to first metal lines 213 b , 213 b , 213 d , and 213 d , respectively ; 211 a denotes a contact that connects the gate line 206 a and a first metal line 213 c to each other ; 211 b denotes a contact that connects the gate line 206 b and a first metal line 213 a to each other ; and 211 c denotes a contact that connects the gate line 206 c and a first metal line 213 e to each other . 214 b denotes a contact that connects the first metal line 213 a and a second metal line 215 to each other ; and 214 c denotes a contact that connects the first metal line 213 e and the second metal line 215 to each other . 212 denotes a contact that connects the silicide layer 203 connected to the planar silicon layer 202 pb and a first metal line 213 f to each other . the p - type silicon pillar 204 p 1 , the planar silicon layer 202 n , the n + diffusion layer 207 n 1 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 1 . the p - type silicon pillar 204 p 2 , the planar silicon layer 202 n , the n + diffusion layer 207 n 2 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 2 . the n - type silicon pillar 204 n 1 , the planar silicon layer 202 pa , the p + diffusion layer 207 p 1 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 1 . the n - type silicon pillar 204 n 2 , the planar silicon layer 202 pb , the p + diffusion layer 207 p 2 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 2 . the gate line 206 a is connected to the gate electrode 206 of the nmos transistor qn 1 . the gate line 206 b is connected to the gate electrode 206 of the nmos transistor qn 2 . the gate line 206 a is connected to the gate electrode 206 of the pmos transistor qp 1 . the gate line 206 c is connected to the gate electrode 206 of the pmos transistor qp 2 . the planar silicon layers 202 n and 202 pa serve as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 , and are connected to an output out 1 . the n + diffusion layer 207 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 213 b via the silicide layer 209 n 1 and the contact 210 n 1 , and the reference voltage vss is supplied to the first metal line 213 b . the n + diffusion layer 207 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 213 b via the silicide layer 209 n n and the contact 210 n 2 . the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 213 d via the silicide layer 209 p 1 and the contact 210 p 1 . the p + diffusion layer 207 p 2 , which serves as the drain of the pmos transistor qp 2 , is connected to the first metal line 213 d via the silicide layer 209 p 2 and the contact 210 p 2 . here , the source of the pmos transistor qp 1 and the drain of the pmos transistor qp 2 are connected to each other via the first metal line 213 d . the planar silicon layer 202 pb serves as the source of the pmos transistor qp 2 and is connected to the first metal line 213 f via the silicide layer 203 and the contact 212 . the power supply voltage vcc is supplied to the first metal line 213 f . the input signal in 1 is supplied to the first metal line 213 c , is supplied to the gate line 206 a via the contact 211 a , and is supplied to the gate electrodes of the pmos transistor qp 1 and the nmos transistor qn 1 . the input signal in 2 is supplied to the first metal line 213 a , is supplied to the gate line 206 b via the contact 211 b , and is supplied to the gate electrode 206 of the nmos transistor qn 2 . also , the input signal in 2 is supplied to the second metal line 215 via the contact 214 b , is supplied to the gate line 206 c via the contact 214 c , the first metal line 213 e , and the contact 211 c , and is supplied to the gate electrode 206 of the pmos transistor qp 2 . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . further , with use of the second metal line , the gate line 206 b according to the second embodiment can be omitted . fig5 a and 5b illustrate a fourth embodiment . fig5 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig5 b is a cross - sectional view taken along a cut line a - a ′. the arrangement of the transistors illustrated in fig5 a and 5b is the same as that illustrated in fig2 a and 2b , that is , the pmos transistor qp 1 , the nmos transistors qn 1 and qn 2 , and the pmos transistor qp 2 are arranged in a line from the right . a difference from fig2 a and 2b is that the connection of the source and drain of the pmos transistor qp 2 is changed . in fig5 a and 5b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 100s . in an sgt , the drain and source are located in a lower layer portion and an upper layer portion , respectively , and the physical positions thereof are different . the drain and source are made so as to be as equivalent as possible , but the orientations of the drain and source are different and thus both of them may have different current characteristics in some cases . the present invention addresses this issue . planar silicon layers 102 pa , 102 n , and 102 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 101 disposed on a substrate . the planar silicon layers 102 pa , 102 n , and 102 pb are formed of a p + diffusion layer , an n + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 103 denotes a silicide layer disposed on surfaces of the planar silicon layers 102 pa , 102 n , and 102 pb , which connects the planar silicon layers 102 pa and 102 n to each other . 104 p and 104 p 2 denote p - type silicon pillars ; 104 n 1 and 104 n 2 denote n - type silicon pillars ; 105 denotes a gate insulating film surrounding the silicon pillars 104 p 1 , 104 p 2 , 104 n 1 , and 104 n 2 ; 106 denotes a gate electrode ; and 106 a and 106 b denote gate lines . n + diffusion layers 107 n 1 and 107 n 2 are formed at the tops of the p - type silicon pillars 104 p and 104 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 107 p 1 and 107 p 2 are formed at the tops of the n - type silicon pillars 104 n 1 and 104 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 108 denotes a silicon nitride film for protecting the gate insulating film 105 ; 109 n 1 , 109 n 2 , 109 p 1 , and 109 p 2 denote silicide layers connected to the n + diffusion layers 107 n 1 and 107 n 2 and the p + diffusion layers 107 p 1 and 107 p 2 , respectively ; 110 n 1 , 110 n 2 , 110 p 1 , and 110 p 2 denote contacts that connect the silicide layers 109 n 1 , 109 n 2 , 109 p 1 , and 109 p 2 to first metal lines 113 c , 113 c , 113 a , and 113 e , respectively ; 111 a denotes a contact that connects the gate line 106 a and a first metal line 113 b to each other ; and 111 b denotes a contact that connects the gate line 106 b and a first metal line 113 d to each other . 112 denotes a contact that connects the silicide layer 103 connected to the planar silicon layer 102 pb and a first metal line 113 f to each other . 114 p denotes a contact that connects the first metal line 113 a and a second metal line 115 to each other ; and 114 denotes a contact that connects the first metal line 113 f and the second metal line 115 to each other . the p - type silicon pillar 104 p 1 , the planar silicon layer 102 n , the n + diffusion layer 107 n 1 , the gate insulating film 105 , and the gate electrode 106 constitute the nmos transistor qn 1 . the p - type silicon pillar 104 p 2 , the planar silicon layer 102 n , the n + diffusion layer 107 n 2 , the gate insulating film 105 , and the gate electrode 106 constitute the nmos transistor qn 2 . the n - type silicon pillar 104 n 1 , the planar silicon layer 102 pa , the p + diffusion layer 107 p 1 , the gate insulating film 105 , and the gate electrode 106 constitute the pmos transistor qp 1 . the n - type silicon pillar 104 n 2 , the planar silicon layer 102 pb , the p + diffusion layer 107 p 2 , the gate insulating film 105 , and the gate electrode 106 constitute the pmos transistor qp 2 . the gate line 106 a is connected to the gate electrode 106 of the nmos transistor qn 1 . the gate line 106 b is connected to the gate electrode 106 of the nmos transistor qn 2 . the gate line 106 a is connected to the gate electrode 106 of the pmos transistor qp 1 . the gate line 106 b is connected to the gate electrode 106 of the pmos transistor qp 2 . the planar silicon layers 102 pa and 102 n serve as a common drain of the pmos transistor qp 1 and the nmos transistors qn 1 and qn 2 , and are connected to an output out 1 . the n + diffusion layer 107 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 113 c via the silicide layer 109 n 1 and the contact 110 n 1 , and the reference voltage vss is supplied to the first metal line 113 c . the n + diffusion layer 107 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 113 c via the silicide layer 109 n n and the contact 110 n 2 . the p + diffusion layer 107 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 113 a via the silicide layer 109 p 1 and the contact 110 p 1 , and the first metal line 113 a is connected to the second metal line 115 via the contact 114 p 1 . the planar silicon layer 102 pb , which serves as the drain of the pmos transistor qp 2 , is connected to the second metal line 115 via the silicide layer 103 , the contact 112 , the first metal line 113 f , and the contact 114 , and the p + diffusion layer 107 p 1 , which serves as the source of the pmos transistor qp 1 , and the planar silicon layer 102 pb , which serves as the drain of the pmos transistor qp 2 , are connected to each other via the second metal line 115 . the p + diffusion layer 107 p 2 , which serves as the source of the pmos transistor qp 2 , is connected to the first metal line 113 e via the silicide layer 109 p 2 and the contact 110 p 2 , and the power supply voltage vcc is supplied to the first metal line 113 e . with such connections , the orientations of the drains and sources of the pmos transistors qp 1 and qp 2 can be the same , that is , the directions in which currents flow therethrough can be the same , and accordingly the same current characteristic can be obtained . the input signal in 1 is supplied to the first metal line 113 b , is supplied to the gate line 106 a via the contact 111 a , and is supplied to the gate electrodes of the pmos transistor qp 1 and the nmos transistor qn 1 . the input signal in 2 is supplied to the first metal line 113 d , is supplied to the gate line 106 b via the contact 111 b , and is supplied to the gate electrodes of the pmos transistor qp 2 and the nmos transistor qn 2 . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . further , the current flow directions of the pmos transistor qp 1 and the pmos transistor qp 2 ( the orientations of the drains and sources ) can be the same . accordingly , the same current characteristic can be obtained and a favorable characteristic can be obtained . fig6 a and 6b illustrate a fifth embodiment . fig6 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig6 b is a cross - sectional view taken along a cut line a - a ′. the arrangement of the transistors illustrated in fig6 a and 6b is the same as that illustrated in fig3 a and 3b , that is , the nmos transistors qn 2 and qn 1 and the pmos transistors qp 1 and qp 2 are arranged in a line from the right . a difference from fig3 a and 3b is that the connection of the source and drain of the pmos transistor qp 2 is changed . in fig6 a and 6b , the components having the same structure as that in fig3 a and 3b are denoted by equivalent reference numerals in the 200s . in an sgt , the drain and source are located in a lower layer portion and an upper layer portion , respectively , and the physical positions thereof are different . the drain and source are made so as to be as equivalent as possible , but the orientations of the drain and source are different and thus both of them may have different current characteristics in some cases . the present invention addresses this issue . planar silicon layers 202 n , 202 pa , and 202 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 201 disposed on a substrate . the planar silicon layers 202 n , 202 pa , and 202 pb are formed of an n + diffusion layer , a p + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 203 denotes a silicide layer disposed on surfaces of the planar silicon layers 202 n , 202 pa , and 202 pb , which connects the planar silicon layers 202 n and 202 pa to each other . 204 p and 204 p 2 denote p - type silicon pillars ; 204 n 1 and 204 n 2 denote n - type silicon pillars ; 205 denotes a gate insulating film surrounding the silicon pillars 204 p 1 , 204 p 2 , 204 n 1 , and 204 n 2 ; 206 denotes a gate electrode ; and 206 a and 206 b denote gate lines . n + diffusion layers 207 n 1 and 207 n 2 are formed at the tops of the p - type silicon pillars 204 p and 204 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 207 p 1 and 207 p 2 are formed at the tops of the n - type silicon pillars 204 n 1 and 204 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 208 denotes a silicon nitride film for protecting the gate insulating film 205 ; 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 denote silicide layers connected to the n + diffusion layers 207 n 1 and 207 n 2 and the p + diffusion layers 207 p 1 and 207 p 2 , respectively ; 210 n 1 , 210 n 2 , 210 p 1 , and 210 p 2 denote contacts that connect the silicide layers 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 to first metal lines 213 b , 213 b , 213 d , and 213 f , respectively ; 211 a denotes a contact that connects the gate line 206 a and a first metal line 213 c to each other ; and 211 c denotes a contact that connects the gate line 206 b and a first metal line 213 e to each other . 212 denotes a contact that connects the silicide layer 203 connected to the planar silicon layer 202 pb and the first metal line 213 d to each other . the gate line 206 b is a line that connects the gate electrode 206 of the nmos transistor qn 2 and the gate electrode 206 of the pmos transistor qp 2 to each other , which will be described below . the p - type silicon pillar 204 p 1 , the planar silicon layer 202 n , the n + diffusion layer 207 n 1 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 1 . the p - type silicon pillar 204 p 2 , the planar silicon layer 202 n , the n + diffusion layer 207 n 2 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 2 . the n - type silicon pillar 204 n 1 , the planar silicon layer 202 pa , the p + diffusion layer 207 p 1 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 1 . the n - type silicon pillar 204 n 2 , the planar silicon layer 202 pb , the p + diffusion layer 207 p 2 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 2 . the gate line 206 a is connected to the gate electrode 206 of the nmos transistor qn 1 . the gate line 206 b is connected to the gate electrode 206 of the nmos transistor qn 2 . the gate line 206 a is connected to the gate electrode 206 of the pmos transistor qp 1 . the gate line 206 b is connected to the gate electrode 206 of the pmos transistor qp 2 . the planar silicon layers 202 n and 202 pa serve as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 , and are connected to an output out 1 . the n + diffusion layer 207 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 213 b via the silicide layer 209 n 1 and the contact 210 n 1 , and the reference voltage vss is supplied to the first metal line 213 b . the n + diffusion layer 207 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 213 b via the silicide layer 209 n n and the contact 210 n 2 . the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 213 d via the silicide layer 209 p 1 and the contact 210 p 1 . the planar silicon layer 202 pb , which serves as the drain of the pmos transistor qp 2 , is connected to the first metal line 213 d via the silicide layer 203 and the contact 212 . here , the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , and the planar silicon layer 202 pb , which serves as the drain of the pmos transistor qp 2 , are connected to each other via the first metal line 213 d . the p + diffusion layer 207 p 2 of the pmos transistor qp 2 serves as the source and is connected to the first metal line 213 f via the silicide layer 209 p 2 and the contact 210 p 2 . the power supply voltage vcc is supplied to the first metal line 213 f . the input signal in 1 is supplied to the first metal line 213 c , is supplied to the gate line 206 a via the contact 211 a , and is supplied to the gate electrodes of the nmos transistor qn 1 and the pmos transistor qp 1 . the input signal in 2 is supplied to the first metal line 213 e , is supplied to the gate line 206 b via the contact 211 c , and is supplied to the gate electrode of the pmos transistor qp 2 . the gate line 206 b is connected to the gate electrode of the nmos transistor qn 2 . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . further , connections can be made using only the first metal lines , and the second metal line can be effectively used . further , the current flow directions of the pmos transistor qp 1 and the pmos transistor qp 2 ( the orientations of the drains and sources ) can be the same . accordingly , the same current characteristic can be obtained and a favorable characteristic can be obtained . fig7 a and 7b illustrate a sixth embodiment . fig7 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig7 b is a cross - sectional view taken along a cut line a - a ′. the arrangement of the transistors illustrated in fig7 a and 7b is the same as that illustrated in fig4 a and 4b , that is , the nmos transistors qn 2 and qn 1 and the pmos transistors qp 1 and qp 2 are arranged in a line from the right . a difference from fig4 a and 4b is that the connection of the source and drain of the pmos transistor qp 2 is changed . in fig7 a and 7b , the components having the same structure as that in fig4 a and 4b are denoted by equivalent reference numerals in the 200s . in an sgt , the drain and source are located in a lower layer portion and an upper layer portion , respectively , and the physical positions thereof are different . the drain and source are made so as to be as equivalent as possible , but the orientations of the drain and source are different and thus both of them may have different current characteristics in some cases . the present invention addresses this issue . planar silicon layers 202 n , 202 pa , and 202 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 201 disposed on a substrate . the planar silicon layers 202 n , 202 pa , and 202 pb are formed of an n + diffusion layer , a p + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 203 denotes a silicide layer disposed on surfaces of the planar silicon layers 202 n , 202 pa , and 202 pb , which connects the planar silicon layers 202 n and 202 pa to each other . 204 p and 204 p 2 denote p - type silicon pillars ; 204 n 1 and 204 n 2 denote n - type silicon pillars ; 205 denotes a gate insulating film surrounding the silicon pillars 204 p 1 , 204 p 2 , 204 n 1 , and 204 n 2 ; 206 denotes a gate electrode ; and 206 a , 206 b , and 206 c denote gate lines . n + diffusion layers 207 n 1 and 207 n 2 are formed at the tops of the p - type silicon pillars 204 p and 204 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 207 p 1 and 207 p 2 are formed at the tops of the n - type silicon pillars 204 n 1 and 204 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 208 denotes a silicon nitride film for protecting the gate insulating film 205 ; 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 denote silicide layers connected to the n + diffusion layers 207 n 1 and 207 n 2 and the p + diffusion layers 207 p 1 and 207 p 2 , respectively ; 210 n 1 , 210 n 2 , 210 p 1 , and 210 p 2 denote contacts that connect the silicide layers 209 n 1 , 209 n 2 , 209 p 1 , and 209 p 2 to first metal lines 213 b , 213 b , 213 d , and 213 f , respectively ; 211 a denotes a contact that connects the gate line 206 a and a first metal line 213 c to each other ; 211 b denotes a contact that connects the gate line 206 b and a first metal line 213 a to each other ; and 211 c denotes a contact that connects the gate line 206 c and a first metal line 213 e to each other . 214 b denotes a contact that connects the first metal line 213 a and a second metal line 215 to each other ; and 214 c denotes a contact that connects the first metal line 213 e and the second metal line 215 to each other . 212 denotes a contact that connects the silicide layer 203 connected to the planar silicon layer 202 pb and the first metal line 213 d to each other . the p - type silicon pillar 204 p 1 , the planar silicon layer 202 n , the n + diffusion layer 207 n 1 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 1 . the p - type silicon pillar 204 p 2 , the planar silicon layer 202 n , the n + diffusion layer 207 n 2 , the gate insulating film 205 , and the gate electrode 206 constitute the nmos transistor qn 2 . the n - type silicon pillar 204 n 1 , the planar silicon layer 202 pa , the p + diffusion layer 207 p 1 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 1 . the n - type silicon pillar 204 n 2 , the planar silicon layer 202 pb , the p + diffusion layer 207 p 2 , the gate insulating film 205 , and the gate electrode 206 constitute the pmos transistor qp 2 . the gate line 206 a is connected to the gate electrode 206 of the nmos transistor qn 1 . the gate line 206 b is connected to the gate electrode 206 of the nmos transistor qn 2 . the gate line 206 a is connected to the gate electrode 206 of the pmos transistor qp 1 . the gate line 206 c is connected to the gate electrode 206 of the pmos transistor qp 2 . the planar silicon layers 202 n and 202 pa serve as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 , and are connected to an output out 1 . the n + diffusion layer 207 n 1 , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 213 b via the silicide layer 209 n 1 and the contact 210 n 1 , and the reference voltage vss is supplied to the first metal line 213 b . the n + diffusion layer 207 n 2 , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 213 b via the silicide layer 209 n n and the contact 210 n 2 . the p + diffusion layer 207 p 1 , which serves as the source of the pmos transistor qp 1 , is connected to the first metal line 213 d via the silicide layer 209 p 1 and the contact 210 p 1 . the planar silicon layer 202 pb , which serves as the drain of the pmos transistor qp 2 , is connected to the first metal line 213 d via the silicide layer 203 and the contact 212 . here , the source of the pmos transistor qp 1 and the drain of the pmos transistor qp 2 are connected to each other via the first metal line 213 d . the p + diffusion layer 207 p 2 serves as the source of the pmos transistor qp 2 and is connected to the first metal line 213 f via the silicide layer 209 p 2 and the contact 210 p 2 . the power supply voltage vcc is supplied to the first metal line 213 f . the input signal in 1 is supplied to the first metal line 213 c , is supplied to the gate line 206 a via the contact 211 a , and is supplied to the gate electrodes of the nmos transistor qn 1 and the pmos transistor qp 1 . the input signal in 2 is supplied to the first metal line 213 a , is supplied to the gate line 206 b via the contact 211 b , and is supplied to the gate electrode 206 of the nmos transistor qn 2 . also , the input signal in 2 is supplied to the second metal line 215 via the contact 214 b , is supplied to the gate line 206 c via the contact 214 c , the first metal line 213 e , and the contact 211 c , and is supplied to the gate electrode 206 of the pmos transistor qp 2 . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . further , with use of the second metal line , the gate line 206 b according to the second embodiment can be omitted . further , the current flow directions of the pmos transistor qp 1 and the pmos transistor qp 2 ( the orientations of the drains and sources ) can be the same . accordingly , the same current characteristic can be obtained and a favorable characteristic can be obtained . fig8 illustrates a modification example of the two - input nor circuit illustrated in fig1 . in fig1 , a common reference voltage vss is supplied to the sources of the nmos transistors qn 1 and qn 2 . in fig8 , reference voltages vss are supplied to the sources of the nmos transistors qn 10 and qn 20 , respectively . the operation of the nor circuit illustrated in fig8 is the same as that of the nor circuit illustrated in fig1 , but the wiring method for power supply lines in the case of arranging transistors is different . in a seventh embodiment , an arrangement based on fig8 will be described . fig9 a and 9b illustrate an arrangement according to the seventh embodiment . fig9 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig9 b is a cross - sectional view taken along a cut line a - a ′. referring to fig9 a , the nmos transistor qn 10 , the pmos transistor qp 10 , the nmos transistor qn 20 , and the pmos transistor qp 20 of the nor circuit illustrated in fig8 are arranged in a line from the right . in fig9 a and 9b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 300s . planar silicon layers 302 na , 302 pa , 302 nb , and 302 pb are disposed on an insulating film , such as a buried oxide ( box ) layer 301 disposed on a substrate . the planar silicon layers 302 na , 302 pa , 302 nb , and 302 pb are formed of an n + diffusion layer , a p + diffusion layer , an n + diffusion layer , and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 303 denotes a silicide layer disposed on surfaces of the planar silicon layers 302 na , 302 pa , 302 nb , and 302 pb , which connects the planar silicon layers 302 na , 302 pa , and 302 nb to one another . 304 p and 304 p 2 denote p - type silicon pillars ; 304 n 1 and 304 n 2 denote n - type silicon pillars ; 305 denotes a gate insulating film surrounding the silicon pillars 304 p 1 , 304 p 2 , 304 n 1 , and 304 n 2 ; 306 denotes a gate electrode ; and 306 a and 306 b denote gate lines . n + diffusion layers 307 n 1 and 307 n 2 are formed at the tops of the p - type silicon pillars 304 p and 304 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 307 p 1 and 307 p 2 are formed at the tops of the n - type silicon pillars 304 n 1 and 304 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 308 denotes a silicon nitride film for protecting the gate insulating film 305 ; 309 n 1 , 309 n 2 , 309 p 1 , and 309 p 2 denote silicide layers connected to the n + diffusion layers 307 n 1 and 307 n 2 and the p + diffusion layers 307 p 1 and 307 p 2 , respectively ; 310 n 1 , 310 n 2 , 310 p 1 , and 310 p 2 denote contacts that connect the silicide layers 309 n 1 , 309 n 2 , 309 p 1 , and 309 p 2 to first metal lines 313 a , 313 d , 313 c , and 313 f , respectively ; 311 a denotes a contact that connects the gate line 306 a and a first metal line 313 b to each other ; and 311 b denotes a contact that connects the gate line 306 b and a first metal line 313 e to each other . 312 denotes a contact that connects the silicide layer 303 connected to the planar silicon layer 302 pb and a first metal line 313 g to each other . 314 p 1 denotes a contact that connects the first metal line 313 c and a second metal line 315 to each other ; and 314 p 2 denotes a contact that connects the first metal line 313 f and the second metal line 315 to each other . the p - type silicon pillar 304 p 1 , the planar silicon layer 302 na , the n + diffusion layer 307 n 1 , the gate insulating film 305 , and the gate electrode 306 constitute the nmos transistor qn 10 . the p - type silicon pillar 304 p 2 , the planar silicon layer 302 nb , the n + diffusion layer 307 n 2 , the gate insulating film 305 , and the gate electrode 306 constitute the nmos transistor qn 20 . the n - type silicon pillar 304 n 1 , the planar silicon layer 302 pa , the p + diffusion layer 307 p 1 , the gate insulating film 305 , and the gate electrode 306 constitute the pmos transistor qp 10 . the n - type silicon pillar 304 n 2 , the planar silicon layer 302 pb , the p + diffusion layer 307 p 2 , the gate insulating film 305 , and the gate electrode 306 constitute the pmos transistor qp 20 . the gate line 306 a is connected to the gate electrode 306 of the nmos transistor qn 10 . the gate line 306 b is connected to the gate electrode 306 of the nmos transistor qn 20 . the gate line 306 a is connected to the gate electrode 306 of the pmos transistor qp 10 . the gate line 306 b is connected to the gate electrode 306 of the pmos transistor qp 20 . the planar silicon layers 302 na , 302 pa , and 302 nb serve as a common drain of the nmos transistor qn 10 , the pmos transistor qp 10 , and the nmos transistor qn 20 , and are connected to an output out 10 . the n + diffusion layer 307 n 1 , which serves as the source of the nmos transistor qn 10 , is connected to the first metal line 313 a via the silicide layer 309 n 1 and the contact 310 n 1 , and the reference voltage vss is supplied to the first metal line 313 a . the n + diffusion layer 307 n 2 , which serves as the source of the nmos transistor qn 20 , is connected to the first metal line 313 d via the silicide layer 309 n n and the contact 310 n 2 , and the reference voltage vss is supplied to the first metal line 313 d . the p + diffusion layer 307 p 1 , which serves as the source of the pmos transistor qp 10 , is connected to the first metal line 313 c via the silicide layer 309 p 1 and the contact 310 p 1 , and the first metal line 313 c is connected to the second metal line 315 via the contact 314 p 1 . the p + diffusion layer 307 p 2 , which serves as the drain of the pmos transistor qp 20 , is connected to the first metal line 313 f via the silicide layer 309 p 2 and the contact 310 p 2 , and the first metal line 313 f is connected to the second metal line 315 via the contact 314 p 2 . here , the source of the pmos transistor qp 10 and the drain of the pmos transistor qp 20 are connected to each other via the second metal line 315 . the planar silicon layer 302 pb serves as the source of the pmos transistor qp 20 , and is connected to the first metal line 313 g via the silicide layer 303 and the contact 312 . the power supply voltage vcc is supplied to the first metal line 313 g . the input signal in 1 is supplied to the first metal line 313 b , is supplied to the gate line 306 a via the contact 311 a , and is supplied to the gate electrodes of the pmos transistor qp 10 and the nmos transistor qn 10 . the input signal in 2 is supplied to the first metal line 313 e , is supplied to the gate line 306 b via the contact 311 b , and is supplied to the gate electrodes of the pmos transistor qp 20 and the nmos transistor qn 20 . the reference voltage vss supplied to the first metal line 313 a and the reference voltage vss supplied to the first metal line 313 d are connected to each other at a position that is not illustrated , and are supplied as the same reference voltage . fig9 a illustrates the reference voltages vss that are supplied to the first metal line 313 a and the first metal line 313 d , respectively , but they are disposed in upper portions of the nmos transistors qn 10 and qn 20 . thus , an increase in the area does not occur , and the area for disposition can be reduced by utilizing the feature of the sgts . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . although not illustrated , the connection of the source and drain of the pmos transistor qp 20 may be changed so that the current direction becomes the same as in the pmos transistor qp 10 , as in fig5 a and 5b or fig6 a and 6b . although not illustrated , in fig9 a and 9b , the first metal line 313 e , the contact 311 b , and the gate line 306 b for supplying a gate signal of the nmos transistor qn 20 and the pmos transistor qp 20 may be disposed on the left side of the pmos transistor qp 20 , that is , on the outer side of the second metal line 315 . accordingly , the first metal line 313 e for supplying the input signal in 2 can be disposed without restriction of the second metal line , and therefore the degree of freedom in disposition is increased . fig1 a and 10b illustrate still another embodiment . the equivalent circuit diagram of this embodiment is based on fig8 . this embodiment is greatly different from the above - described first to seventh embodiments in that the orientations of the sources and drains of the nmos transistors qn 10 and qn 20 and the pmos transistors qp 10 and qp 20 are reversed upside down . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig1 b is a cross - sectional view taken along a cut line a - a ′. referring to fig1 a , the nmos transistor qn 10 , the pmos transistors qp 10 and qp 20 , and the nmos transistor qn 20 of the nor circuit illustrated in fig8 are arranged in a line from the right . in fig1 a and 10b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 400s . planar silicon layers 402 na , 402 p , and 402 nb are disposed on an insulating film , such as a buried oxide ( box ) layer 401 disposed on a substrate . the planar silicon layers 402 na , 402 p , and 402 nb are formed of an n + diffusion layer , a p + diffusion layer , and an n + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 403 denotes a silicide layer disposed on surfaces of the planar silicon layers 402 na , 402 p , and 402 nb . 404 p and 404 p 2 denote p - type silicon pillars ; 404 n 1 and 404 n 2 denote n - type silicon pillars ; 405 denotes a gate insulating film surrounding the silicon pillars 404 p 1 , 404 p 2 , 404 n 1 , and 404 n 2 ; 406 denotes a gate electrode ; and 406 a and 406 b denote gate lines . n + diffusion layers 407 n 1 and 407 n 2 are formed at the tops of the p - type silicon pillars 404 p and 404 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 407 p 1 and 407 p 2 are formed at the tops of the n - type silicon pillars 404 n 1 and 404 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 408 denotes a silicon nitride film for protecting the gate insulating film 405 ; 409 n 1 , 409 n 2 , 409 p 1 , and 409 p 2 denote silicide layers connected to the n + diffusion layers 407 n 1 and 407 n 2 and the p + diffusion layers 407 p 1 and 407 p 2 , respectively ; 410 n 1 , 410 n 2 , 410 p 1 , and 410 p 2 denote contacts that connect the silicide layers 409 n 1 , 409 n 2 , 409 p 1 , and 409 p 2 to first metal lines 413 b , 413 g , 413 d , and 413 e , respectively ; 411 a denotes a contact that connects the gate line 406 a and a first metal line 413 c to each other ; and 411 b denotes a contact that connects the gate line 406 b and a first metal line 413 f to each other . 412 a denotes a contact that connects the silicide layer 403 connected to the planar silicon layer 402 na and a first metal line 413 a to each other ; and 412 b denotes a contact that connects the silicide layer 403 connected to the n + diffusion layer 402 nb and a first metal line 413 h to each other . 414 n 1 denotes a contact that connects the first metal line 413 b and a second metal line 415 to each other ; 414 n 2 denotes a contact that connects the first metal line 413 g and the second metal line 415 to each other ; and 414 p denotes a contact that connects the first metal line 413 d and the second metal line 415 to each other . the p - type silicon pillar 404 p 1 , the planar silicon layer 402 na , the n + diffusion layer 407 n 1 , the gate insulating film 405 , and the gate electrode 406 constitute the nmos transistor qn 10 . the p - type silicon pillar 404 p 2 , the planar silicon layer 402 nb , the n + diffusion layer 407 n 2 , the gate insulating film 405 , and the gate electrode 406 constitute the nmos transistor qn 20 . the n - type silicon pillar 404 n 1 , the planar silicon layer 402 p , the p + diffusion layer 407 p 1 , the gate insulating film 405 , and the gate electrode 406 constitute the pmos transistor qp 10 . the n - type silicon pillar 404 n 2 , the planar silicon layer 402 p , the p + diffusion layer 407 p 2 , the gate insulating film 405 , and the gate electrode 406 constitute the pmos transistor qp 20 . the gate line 406 a is connected to the gate electrode 406 of the nmos transistor qn 10 . the gate line 406 b is connected to the gate electrode 406 of the nmos transistor qn 20 . the gate line 406 a is connected to the gate electrode 406 of the pmos transistor qp 10 . the gate line 406 b is connected to the gate electrode 406 of the pmos transistor qp 20 . the second metal line 415 serves as a common drain of the nmos transistors qn 10 and qn 20 and the pmos transistor qp 10 , and is connected to an output out 10 . the planar silicon layer 402 na , which serves as the source of the nmos transistor qn 10 , is connected to the first metal line 413 a via the silicide layer 403 and the contact 412 a , and the reference voltage vss is supplied to the first metal line 413 a . the planar silicon layer 402 nb , which serves as the source of the nmos transistor qn 20 , is connected to the first metal line 413 h via the silicide layer 403 and the contact 412 b , and the reference voltage vss is supplied to the first metal line 413 h . the planar silicon layer 402 p , which serves as the source of the pmos transistor qp 10 , serves as the drain of the pmos transistor qp 20 . the p + diffusion layer 407 p 2 , which serves as the source of the pmos transistor qp 20 , is connected to the first metal line 413 e via the silicide layer 409 p 2 and the contact 410 p 2 , and the power supply voltage vcc is supplied to the first metal line 413 e . the input signal in 1 is supplied to the first metal line 413 c , is supplied to the gate line 406 a via the contact 411 a , and is supplied to the gate electrodes 406 of the pmos transistor qp 10 and the nmos transistor qn 10 . the input signal in 2 is supplied to the first metal line 413 f , is supplied to the gate line 406 b via the contact 411 b , and is supplied to the gate electrodes 406 of the pmos transistor qp 20 and the nmos transistor qn 20 . in this embodiment , reference voltages vss are respectively supplied to the first metal lines 413 a and 413 h , but they are disposed at the right and left ends in the figure . thus , the reference voltages vss can be shared in the case of arranging the circuits according to the embodiment of the present invention side by side ( not illustrated ) without causing an increase in the area . accordingly , the area for arrangement can be reduced by utilizing the feature of the sgts . further , in this embodiment , the output out 10 is connected to the second metal line , and thus there is a degree of freedom in obtaining an output . for example , the second metal line 415 , which serves as an output line , can be freely extended in the right direction or left direction in fig1 a . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . fig1 a , 11 b , and 11 c illustrate a ninth embodiment , which is a modification example of the eighth embodiment . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , fig1 b is a cross - sectional view taken along a cut line a - a ′, and fig1 c is a cross - sectional view taken along a cut line b - b ′. a common power supply voltage vcc is supplied , on the basis of the circuit diagram illustrated in fig1 . referring to fig1 a , the nmos transistor qn 1 , the pmos transistors qp 1 and qp 2 , and the nmos transistor qn 2 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig1 a and 11b , the components having the same structure as that in fig1 a and 10b are denoted by equivalent reference numerals in the 500s . a difference between this embodiment and the eighth embodiment ( fig1 a and 10b ) is that contacts 512 a and 512 b for supplying the reference voltage vss to the nmos transistors qn 1 and qn 2 are disposed on the upper and lower sides in fig1 a ( right and left sides in fig1 c ), whereas they are disposed on the right and left sides in fig1 a and 10b . planar silicon layers 502 na , 502 p , and 502 nb are disposed on an insulating film , such as a buried oxide ( box ) layer 501 disposed on a substrate . the planar silicon layers 502 na , 502 p , and 502 nb are formed of an n + diffusion layer , a p + diffusion layer , and an n + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 503 denotes a silicide layer disposed on surfaces of the planar silicon layers 502 na , 502 p , and 502 nb . 504 p and 504 p 2 denote p - type silicon pillars ; 504 n 1 and 504 n 2 denote n - type silicon pillars ; 505 denotes a gate insulating film surrounding the silicon pillars 504 p 1 , 504 p 2 , 504 n 1 , and 504 n 2 ; 506 denotes a gate electrode ; and 506 a , 506 b , 506 c , and 506 d denote gate lines . n + diffusion layers 507 n 1 and 507 n 2 are formed at the tops of the p - type silicon pillars 504 p and 504 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 507 p 1 and 507 p 2 are formed at the tops of the n - type silicon pillars 504 n 1 and 504 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 508 denotes a silicon nitride film for protecting the gate insulating film 505 ; 509 n 1 , 509 n 2 , 509 p 1 , and 509 p 2 denote silicide layers connected to the n + diffusion layers 507 n 1 and 507 n 2 and the p + diffusion layers 507 p 1 and 507 p 2 , respectively ; 510 n 1 , 510 n 2 , 510 p 1 , and 510 p 2 denote contacts that connect the silicide layers 509 n 1 , 509 n 2 , 509 p 1 , and 509 p 2 to first metal lines 513 b , 513 e , 513 c , and 513 d , respectively ; 511 a denotes a contact that connects the gate line 506 a and a first metal line 513 a to each other ; and 511 b denotes a contact that connects the gate line 506 d and a first metal line 513 f to each other . in fig1 a and 11c , 512 a denotes a contact that connects the silicide layer 503 connected to the planar silicon layer 502 na and a first metal line 513 g to each other . in fig1 a , 512 b denotes a contact that connects the silicide layer 503 connected to the planar silicon layer 502 nb and a first metal line 513 h to each other . 514 n 1 denotes a contact that connects the first metal line 513 b and a second metal line 515 to each other ; 514 n 2 denotes a contact that connects the first metal line 513 e and the second metal line 515 to each other ; and 514 p 1 denotes a contact that connects the first metal line 513 c and the second metal line 515 to each other . the p - type silicon pillar 504 p 1 , the planar silicon layer 502 na , the n + diffusion layer 507 n 1 , the gate insulating film 505 , and the gate electrode 506 constitute the nmos transistor qn 1 . the p - type silicon pillar 504 p 2 , the planar silicon layer 502 nb , the n + diffusion layer 507 n 2 , the gate insulating film 505 , and the gate electrode 506 constitute the nmos transistor qn 2 . the n - type silicon pillar 504 n 1 , the planar silicon layer 502 p , the p + diffusion layer 507 p 1 , the gate insulating film 505 , and the gate electrode 506 constitute the pmos transistor qp 1 . the n - type silicon pillar 504 n 2 , the planar silicon layer 502 p , the p + diffusion layer 507 p 2 , the gate insulating film 505 , and the gate electrode 506 constitute the pmos transistor qp 2 . the gate line 506 a is connected to the gate electrode 506 of the nmos transistor qn 1 . the gate line 506 d is connected to the gate electrode 506 of the nmos transistor qn 2 . the gate line 506 a is connected to the gate electrode 506 of the pmos transistor qp 1 via the gate line 506 b . the gate line 506 d is connected to the gate electrode 506 of the pmos transistor qp 2 via the gate line 506 c . the second metal line 515 serves as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 and is connected to an output out 1 . the planar silicon layer 502 na , which serves as the source of the nmos transistor qn 1 , is connected to the first metal line 513 g via the silicide layer 503 and the contact 512 a , and is further connected to a second metal line 516 via a contact 514 a . the reference voltage vss is supplied to the second metal line 516 . the planar silicon layer 502 nb , which serves as the source of the nmos transistor qn 2 , is connected to the first metal line 513 h via the silicide layer 503 and the contact 512 b , and is further connected to the second metal line 516 via a contact 514 b . the planar silicon layer 502 p , which serves as the source of the pmos transistor qp 1 , serves as the drain of the pmos transistor qp 2 . the p + diffusion layer 507 p 2 , which serves as the source of the pmos transistor qp 2 , is connected to the first metal line 513 d via the silicide layer 509 p 2 and the contact 510 p 2 , and the power supply voltage vcc is supplied to the first metal line 513 d . the input signal in 1 is supplied to the first metal line 513 a , is supplied to the gate line 506 a via the contact 511 a , and is supplied to the gate electrodes 506 of the nmos transistor qn 1 and the pmos transistor qp 1 . the input signal in 2 is supplied to the first metal line 513 f , is supplied to the gate line 506 d via the contact 511 b , and is supplied to the gate electrodes 506 of the nmos transistor qn 2 and the pmos transistor qp 2 . a basic unit of the layout of this circuit is referred to as a unit block ( ub ). a ub 500 is represented by a chained line . in a case where a plurality of nor circuits are arranged in the vertical direction in units of the unit blocks , the contacts 512 a and 512 b for supplying the reference voltage vss can be shared , and an increase in the area can be suppressed . in this embodiment , in contrast to the eighth embodiment , the contacts 512 a and 512 b for supplying the reference voltage vss to the nmos transistors qn 1 and qn 2 are disposed on the upper and lower sides in the figure . accordingly , the width in the horizontal direction can be greatly reduced . the second metal line 516 for supplying the reference voltage vss extends in the upper and lower sides and the left side in the figure , which provides a degree of freedom of external connection . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . fig1 a , 12 b , and 12 c illustrate a tenth embodiment , which is a modification example of the ninth embodiment . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , fig1 b is a cross - sectional view taken along a cut line a - a ′, and fig1 c is a cross - sectional view taken along a cut line b - b ′. fig1 a illustrates an example in which four nor circuits , each being the nor circuit illustrated in fig1 , are arranged . from the upper right of fig1 a , an nmos transistor qn 11 , pmos transistors qp 11 and qp 12 , and an nmos transistor qn 12 are arranged in a line . also , an nmos transistor qn 21 , pmos transistors qp 21 and qp 22 , and an nmos transistor qn 22 are arranged in a line in the second row . further , an nmos transistor qn 31 , pmos transistors qp 31 and qp 32 , and an nmos transistor qn 32 are arranged in a line in the third row . further , an nmos transistor qn 41 , pmos transistors qp 41 and qp 42 , and an nmos transistor qn 42 are arranged in a line in the fourth row . these four sets of nor circuits integrally constitute a nor circuit unit block ub 600 . in fig1 a , 12 b , and 12 c , the components having the same structure as that in fig1 a , 11 b , and 11 c are denoted by equivalent reference numerals in the 600s , and the description thereof is omitted . hereinafter , a difference from the ninth embodiment will be described . in this embodiment , the four sets of nor circuits are provided with a pair of contacts 612 a and 612 b . the contact 612 a supplies the reference voltage vss to the nmos transistors qn 11 , qn 21 , qn 31 , and qn 41 . the contact 612 b supplies the reference voltage vss to the nmos transistors qn 12 , qn 22 , qn 32 , and qn 42 . further , as a metal line for supplying the reference voltage vss , a second metal line 616 is provided so as to extend in the horizontal direction in fig1 a . in fig1 c , the sources of the nmos transistors qn 11 , qn 21 , qn 31 , and qn 41 are connected to a planar silicon layer 602 na , and are connected to a first metal line 613 k via a silicide layer 603 connected to the planar silicon layer 602 na and the contact 612 a . the first metal line 613 k is connected to the second metal line 616 via a contact 614 k . as illustrated in fig1 a , the second metal line 616 extends in the horizontal direction on the upper side , the horizontal direction on the lower side , and the vertical direction on the left side , so that the reference voltage vss can be freely supplied from the right and left . further , with the reference voltage vss being supplied in units of blocks , the nor circuits can be arranged with a minimum interval in the vertical direction in fig1 a , relative to the embodiment illustrated in fig1 a to 11c , and thus the entire size can be further reduced . in this embodiment , a pair of contacts are provided for four sets of nor circuits . however , in a power supply path , current flows via the silicide layer 603 , and thus the resistance of a silicide line may cause voltage drop . thus , the number of sets may be determined in consideration of the amount of current consumption and a resistance value . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . fig1 a and 13b illustrate the arrangement according to an eleventh embodiment . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig1 b is a cross - sectional view taken along a cut line a - a ′. referring to fig1 a , the nmos transistors qn 2 and qn 1 and the pmos transistors qp 1 and qp 2 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig1 a and 13b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 700s . planar silicon layers 702 n and 702 p are disposed on an insulating film , such as a buried oxide ( box ) layer 701 disposed on a substrate . the planar silicon layers 702 n and 702 p are formed of an n + diffusion layer and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 703 denotes a silicide layer disposed on surfaces of the planar silicon layers 702 n and 702 p . 704 p and 704 p 2 denote p - type silicon pillars ; 704 n 1 and 704 n 2 denote n - type silicon pillars ; 705 denotes a gate insulating film surrounding the silicon pillars 704 p 1 , 704 p 2 , 704 n 1 , and 704 n 2 ; 706 denotes a gate electrode ; and 706 a , 706 b , and 706 c denote gate lines . n + diffusion layers 707 n 1 and 707 n 2 are formed at the tops of the p - type silicon pillars 704 p and 704 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 707 p 1 and 707 p 2 are formed at the tops of the n - type silicon pillars 704 n 1 and 704 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 708 denotes a silicon nitride film for protecting the gate insulating film 705 ; 709 n 1 , 709 n 2 , 709 p 1 , and 709 p 2 denote silicide layers connected to the n + diffusion layers 707 n 1 and 707 n 2 and the p + diffusion layers 707 p 1 and 707 p 2 , respectively ; 710 n 1 , 710 n 2 , 710 p 1 , and 710 p 2 denote contacts that connect the silicide layers 709 n 1 , 709 n 2 , 709 p 1 , and 709 p 2 to first metal lines 713 d , 713 c , 713 f , and 713 g , respectively ; 711 a denotes a contact that connects the gate line 706 a and a first metal line 713 e to each other ; and 711 b denotes a contact that connects the gate line 706 b and a first metal line 713 b to each other . 712 denotes a contact that connects the silicide layer 703 connected to the planar silicon layer 702 n and a first metal line 713 a to each other . 714 n 1 denotes a contact that connects the first metal line 713 d and a second metal line 715 to each other ; 714 n 2 denotes a contact that connects the first metal line 713 c and the second metal line 715 to each other ; and 714 p denotes a contact that connects the first metal line 713 f and the second metal line 715 to each other . the p - type silicon pillar 704 p 1 , the planar silicon layer 702 n , the n + diffusion layer 707 n 1 , the gate insulating film 705 , and the gate electrode 706 constitute the nmos transistor qn 1 . the p - type silicon pillar 704 p 2 , the planar silicon layer 702 n , the n + diffusion layer 707 n 2 , the gate insulating film 705 , and the gate electrode 706 constitute the nmos transistor qn 2 . the n - type silicon pillar 704 n 1 , the planar silicon layer 702 p , the p + diffusion layer 707 p 1 , the gate insulating film 705 , and the gate electrode 706 constitute the pmos transistor qp 1 . the n - type silicon pillar 704 n 2 , the planar silicon layer 702 p , the p + diffusion layer 707 p 2 , the gate insulating film 705 , and the gate electrode 706 constitute the pmos transistor qp 2 . the gate line 706 a is connected to the gate electrode 706 of the nmos transistor qn 1 . the gate line 706 b is connected to the gate electrode 706 of the nmos transistor qn 2 . the gate line 706 a is connected to the gate electrode 706 of the pmos transistor qp 1 . the gate line 706 b is connected to the gate electrode 706 of the pmos transistor qp 2 via the gate line 706 c . the second metal line 715 serves as a common drain of the nmos transistors qn 1 and qn 2 and the pmos transistor qp 1 and is connected to an output out 1 . the planar silicon layer 702 n , which serves as the sources of the nmos transistors qn 1 and qn 2 , is connected to the first metal line 713 a via the silicide layer 703 and the contact 712 , and the reference voltage vss is supplied to the first metal line 713 a . the planar silicon layer 702 p , which serves as the source of the pmos transistor qp 1 , serves as the drain of the pmos transistor qp 2 . the p + diffusion layer 707 p 2 , which serves as the source of the pmos transistor qp 2 , is connected to the first metal line 713 g via the silicide layer 709 p 2 and the contact 710 p 2 , and the power supply voltage vcc is supplied to the first metal line 713 g . the input signal in 1 is supplied to the first metal line 713 e , is supplied to the gate line 706 a via the contact 711 a , and is supplied to the gate electrodes 706 of the nmos transistor qn 1 and the pmos transistor qp 1 . the input signal in 2 is supplied to the first metal line 713 b , is supplied to the gate line 706 b via the contact 711 b , and is supplied to the gate electrode 706 of the nmos transistor qn 2 . also , the input signal in 2 is supplied to the gate electrode 706 of the pmos transistor qp 2 via the gate line 706 c . in this embodiment , the reference voltage vss can be supplied from the rightmost side in the figure , and the power supply voltage vcc can be supplied from the leftmost side in the figure . thus , in a case where a plurality of circuits ( not illustrated ) are arranged side by side , the power supply voltage vcc and the reference voltage vss can be shared by the circuits , and the area can be further reduced . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . fig1 illustrates an equivalent circuit diagram of another nor circuit . a difference from the nor circuit illustrated in fig1 is that an input signal for an nmos transistor qn 200 and an input signal for a pmos transistor qp 200 are supplied through different lines . an input signal in 2 a is input to the gate of the nmos transistor qn 200 , and an input signal in 2 b is input to the gate of the pmos transistor qp 200 . as illustrated in fig1 , the input signals in 2 a and in 2 b are connected to a common input signal in 2 at another position , and thus the operation is the same as in fig1 . here , the lines for the input signals in 2 a and in 2 b are individually provided for the convenience of arrangement . an embodiment based on the connections illustrated in fig1 is illustrated in fig1 a and 15b . fig1 a and 15b illustrate a modification example of the embodiment illustrated in fig1 a and 13b . fig1 a and 15b illustrate the arrangement according to a twelfth embodiment . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig1 b is a cross - sectional view taken along a cut line a - a ′. referring to fig1 a , the nmos transistors qn 200 and qn 100 and the pmos transistors qp 100 and qp 200 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig1 a and 15b , the components having the same structure as that in fig1 a and 13b are denoted by equivalent reference numerals in the 700s . planar silicon layers 702 n and 702 p are disposed on an insulating film , such as a buried oxide ( box ) layer 701 disposed on a substrate . the planar silicon layers 702 n and 702 p are formed of an n + diffusion layer and a p + diffusion layer , respectively , through impurity implantation or the like , and serve as lower diffusion layers . 703 denotes a silicide layer disposed on surfaces of the planar silicon layers 702 n and 702 p . 704 p and 704 p 2 denote p - type silicon pillars ; 704 n 1 and 704 n 2 denote n - type silicon pillars ; 705 denotes a gate insulating film surrounding the silicon pillars 704 p 1 , 704 p 2 , 704 n 1 , and 704 n 2 ; 706 denotes a gate electrode ; and 706 a , 706 b , and 706 c denote gate lines . n + diffusion layers 707 n 1 and 707 n 2 are formed at the tops of the p - type silicon pillars 704 p and 704 p 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . p + diffusion layers 707 p 1 and 707 p 2 are formed at the tops of the n - type silicon pillars 704 n 1 and 704 n 2 , respectively , through impurity implantation or the like , and serve as upper diffusion layers . 708 denotes a silicon nitride film for protecting the gate insulating film 705 ; 709 n 1 , 709 n 2 , 709 p 1 , and 709 p 2 denote silicide layers connected to the n + diffusion layers 707 n 1 and 707 n 2 and the p + diffusion layers 707 p 1 and 707 p 2 , respectively ; 710 n 1 , 710 n 2 , 710 p 1 , and 710 p 2 denote contacts that connect the silicide layers 709 n 1 , 709 n 2 , 709 p 1 , and 709 p 2 to first metal lines 713 d , 713 c , 713 f , and 713 g , respectively ; 711 a denotes a contact that connects the gate line 706 a and a first metal line 713 e to each other ; 711 b denotes a contact that connects the gate line 706 b and a first metal line 713 b to each other ; and 711 c denotes a contact that connects the gate line 706 c and a first metal line 713 h to each other . 712 denotes a contact that connects the silicide layer 703 connected to the planar silicon layer 702 n and a first metal line 713 a to each other . 714 n 1 denotes a contact that connects the first metal line 713 d and a second metal line 715 to each other ; 714 n 2 denotes a contact that connects the first metal line 713 c and the second metal line 715 to each other ; and 714 p denotes a contact that connects the first metal line 713 f and the second metal line 715 to each other . the p - type silicon pillar 704 p 1 , the planar silicon layer 702 n , the n + diffusion layer 707 n 1 , the gate insulating film 705 , and the gate electrode 706 constitute the nmos transistor qn 100 . the p - type silicon pillar 704 p 2 , the planar silicon layer 702 n , the n + diffusion layer 707 n 2 , the gate insulating film 705 , and the gate electrode 706 constitute the nmos transistor qn 200 . the n - type silicon pillar 704 n 1 , the planar silicon layer 702 p , the p + diffusion layer 707 p 1 , the gate insulating film 705 , and the gate electrode 706 constitute the pmos transistor qp 100 . the n - type silicon pillar 704 n 2 , the planar silicon layer 702 p , the p + diffusion layer 707 p 2 , the gate insulating film 705 , and the gate electrode 706 constitute the pmos transistor qp 200 . the gate line 706 a is connected to the gate electrode 706 of the nmos transistor qn 100 . the gate line 706 b is connected to the gate electrode 706 of the nmos transistor qn 200 . the gate line 706 a is connected to the gate electrode 706 of the pmos transistor qp 100 . the gate line 706 c is connected to the gate electrode 706 of the pmos transistor qp 200 . the second metal line 715 serves as a common drain of the nmos transistors qn 100 and qn 200 and the pmos transistor qp 100 and is connected to an output out 100 . the planar silicon layer 702 n , which serves as the sources of the nmos transistors qn 100 and qn 200 , is connected to the first metal line 713 a via the silicide layer 703 and the contact 712 , and the reference voltage vss is supplied to the first metal line 713 a . the planar silicon layer 702 p , which serves as the source of the pmos transistor qp 100 , serves as the drain of the pmos transistor qp 200 . the p + diffusion layer 707 p 2 , which serves as the source of the pmos transistor qp 200 , is connected to the first metal line 713 g via the silicide layer 709 p 2 and the contact 710 p 2 , and the power supply voltage vcc is supplied to the first metal line 713 g . the input signal in 1 is supplied to the first metal line 713 e , is supplied to the gate line 706 a via the contact 711 a , and is supplied to the gate electrodes 706 of the nmos transistor qn 100 and the pmos transistor qp 100 . the input signal in 2 a is supplied to the first metal line 713 b , is supplied to the gate line 706 b via the contact 711 b , and is supplied to the gate electrode 706 of the nmos transistor qn 200 . the input signal in 2 b is supplied to the first metal line 713 h , is supplied to the gate line 706 c via the contact 711 c , and is supplied to the gate electrode 706 of the pmos transistor qp 200 . note that the input signals in 2 a and in 2 b are equivalent to the input signal in 2 illustrated in fig1 , but the names of the signals are different for convenience because the connection positions of the first metal lines are different . in this embodiment , a line for an input signal ( the first metal line 713 c ) is added to the configuration illustrated in fig1 a and 13b . however , the gate line 706 c illustrated in fig1 a can be omitted . thus , in a case where a plurality of circuits ( not illustrated ) are arranged in the vertical direction in the figure , the circuits can be arranged with a minimum pitch , and thus the entire size in the vertical direction can be reduced . according to this embodiment , four sgts constituting a two - input nor circuit can be arranged in a line without providing wasteful lines and contact regions , and a semiconductor device with a reduced area can be provided . in the above - described embodiments , a description has been given of arrangements by using examples of a process in which planar silicon layers are disposed on an insulating film , such as a buried oxide ( box ) layer disposed on a substrate . the same applies to a bulk cmos process . as an example , fig1 a and 16 b illustrate an embodiment in which the embodiment illustrated in fig2 a and 2b is implemented with a bulk cmos process . fig1 a is a plan view illustrating the layout ( arrangement ) of a two - input nor circuit according to the present invention , and fig1 b is a cross - sectional view taken along a cut line a - a ′. in fig1 a , the arrangement of the transistors is the same as that in fig2 a , that is , the pmos transistor qp 1 , the nmos transistors qn 1 and qn 2 , and the pmos transistor qp 2 of the nor circuit illustrated in fig1 are arranged in a line from the right . in fig1 a and 16b , the components having the same structure as that in fig2 a and 2b are denoted by equivalent reference numerals in the 100s . with reference to japanese patent no . 4756221 , no difference is seen in the plan view in fig1 a between the box process illustrated in fig2 a and 2b and the bulk cmos process illustrated in fig1 a and 16b . however , a difference therebetween can be seen in the cross - sectional view in fig1 b . referring to fig1 b , 150 denotes a p - type silicon substrate . 160 denotes an insulator for element isolation . 170 denotes an n - region serving as an isolation layer for preventing leakage . the manufacturing process and structure of the lower diffusion layer and the upper side thereof , that is , the portion other than the p - type silicon substrate 150 , the insulator 160 for element isolation , and the leakage preventing isolation layer 170 , are completely the same as those of the embodiment illustrated in fig2 a and 2b , and the first to twelfth embodiments of the present invention can be implemented through a bulk cmos process . however , the insulator 160 and the leakage preventing isolation layer 170 are provided , and thus the area increases accordingly . in the description of the embodiments , the silicon pillar of a pmos transistor is defined as an n - type silicon layer , and the silicon pillar of an nmos transistor is defined as a p - type silicon layer . however , in a fine process , it is difficult to control the density obtained through impurity implantation . thus , a so - called neutral ( intrinsic ) semiconductor with no impurity implantation may be used for silicon pillars of the pmos transistor and the nmos transistor , and a difference in work function unique to a metal gate material may be used for control of a channel , that is , thresholds of pmos and nmos . the essence of the present invention is the definition of the optimum arrangement of four transistors . in a case where the transistors are arranged in the optimum order , a wiring method and wiring positions for gate lines and a wiring method and wiring positions for metal lines that are not illustrated in the figures of the embodiments are also included in the technical scope of the present invention .