now referring to the drawings , preferred embodiments of the invention are described below . fig1 is a flow chart showing a formation method of light shielding means 4 of a liquid crystal display apparatus 20 of an embodiment of the invention . fig2 a - 2f are sectional views illustrating formation steps of the light shielding means 4 . as shown in fig2 a , an ito film 2a to be used as transparent electrodes 2 is formed on the entire of one surface 1a of a light transmitting substrate 1 with an insulating property ( e . g ., practiced by glass ) in step a1 . the ito film 2a ( e . g ., 2500 å thick ) is formed in a sputtering method . as shown in fig2 b , in order to form a resist layer 3 a resist is applied on the ito film 2a in step a2 . as the resist is employed , for example , a positive - type photoresist under the trade name &# 34 ; fh 2030d &# 34 ; made by fuji hunt electronics technology co . the application is conducted , for example , by the use of a roll coater . in step a3 , prebaking treatment is carried out at 140 ° c . for half - hour using a heating apparatus such as an oven . in step a4 , exposure treatment is carried out using a mask having an electrode pattern corresponding to below - mentioned transparent electrodes 2 . in step a5 , development treatment is carried out . as shown in fig2 c , the resist layer 3 solubilized by the exposure treatment is removed by the development treatment . as shown in fig2 d , the ito film 2a bared by the development treatment is etched to form the transparent electrodes 2 made of ito in step a6 . in this embodiment , a plurality of transparent electrodes 2 with a width of 200 μm were formed so as to be strip - shaped , and parallel with one another , and further so as to have an interval of 20 μm thereamong . in step a7 , light shielding means 4 is formed in an electrodeposition method . in this step , a part of the resist layer 3 on one longitudinal end of the strip - shaped electrode 2 is removed in order to form an electrode terminal for conducting electrodeposition and the bared surface is washed by water and dried . additionally , the remaining resist layer 3 is baked at 200 ° c . for an hour . subsequently , an electroconducting tape to be used as an electrodeposition terminal is stuck onto the bared surface of the transparent electrode 2 and electrodeposition is carried out . as shown in fig2 e , light shielding means 4 is formed on the side face of the transparent electrode 2 . subsequently , the light shielding means 4 is baked for an hour , for example , at 170 ° c . the molecules of the light shielding means 4 are bridged and the molecular bonding is strengthened by virtue of the baking . as a result , chemical and physical properties of the light shielding means 4 are improved . as shown in fig2 f , all of the remaining resist layer 3 is removed in step a8 . after removing the resist layer 3 by the use of , for example , 3 wt % solution of naoh , the bared surface is washed by water and dried . fig3 is a sectional view for explaining the above - mentioned electrodeposition . the electrodeposition means that a polymeric material dissolved or dispersed in a solvent and a colorant such as a pigment or dyestuff are adhered to an electrode by an electrophoresis phenomenon . in an electrodeposition bath 21 in which a red - color , a blue - color , and a green - color pigment , a water soluble epoxy resin , a cellosolve solvent , and water are mixed are dipped a light transmitting substrate 1 having the transparent electrode 2 and resist layer 3 formed by patterning and a counter electrode 22 , and a dc voltage is applied employing the transparent electrodes 2 as anodes and the counter electrode as a cathode . such an electrodeposition method that deposition occurs on an anode is a so - called anion electrodeposition method . the formation of the light shielding means 4 can be conducted not only in the anion electrodeposition method , but also indication electrodeposition method that deposition occurs on a cathode when a voltage is applied employing the transparent electrodes 2 as cathodes and the counter electrode 22 as an anode . in the following are described practical manufacturing conditions of the formation of the light shielding means 4 in the anion and the cation electrodeposition method , giving examples . first , in the case of the anion electrodeposition method , for example , polyester melamine resin , and a black - color pigment consisting of a red - color , a blue - color , and a green - color pigment are employed as a polymeric material and a colorant , respectively . the following components are contained in the electrodeposition bath 21 . ______________________________________polyethylene resin 65 partsmelamine resin 15 partsred - color pigment 10 partsblue - color pigment 10 partsgreen - color pigment 10 partsethylcellosolve 20 partswater 880 parts 1 , 010 parts by weight______________________________________ the electrodes are dipped into the above - mentioned electrodeposition bath 21 , and a dc voltage of 120 v is applied for a minute , employing the transparent electrodes 2 as anodes and the counter electrode 22 as a cathode . secondly , in the case of the cation electrodeposition method , for example , a cationic acrylic resin and the same black - color pigment as that of the above example in the anion electrodeposition method are employed as a polymeric material and a colorant , respectively . the following components are contained in the electrodeposition bath 21 . ______________________________________acrylic resin 50 partsred - color pigment 6 partsblue - color element 6 partsgreen - color element 6 partsethylcellosolve 25 partsisopropyl alcohol 3 partssulfuric acid 1 . 5 partswater 800 parts 897 . 5 parts by weight______________________________________ the electrodes are dipped in the above - mentioned electrodeposition bath 21 , and employing the transparent electrodes 2 as cathodes and the counter electrode 22 as an anode , a dc voltage of 100 v is applied for three minutes . fig4 is an enlarged sectional view of light shielding means 4 formed in the electrodeposition method . when the above - mentioned electrodeposition is carried out , the formation of the light shielding means 4a , 4b is initiated from the side faces 2c of the transparent electrodes 2a , 2b which are perpendicular to a surface 1a of a light transmitting substrate 1 and uncoated with resist layers 3a , 3b . more specifically , the light shielding means 4a , 4b extending from the side surfaces 2c in parallel with the surface 1a of the light transmitting substrate are formed . further , the light shielding means 4a , 4b formed between transparent electrodes 2a , 2b adjacent to each other are fused and become unified one . thus , the light shielding means 4 having the same thickness as that of the transparent electrodes 2a , 2b can be formed in a desired position with high accuracy . in the anion electrodeposition method , the transparent electrodes 2 are never reduced . therefore , there is no occurrence of decrease of the light transmissivity of the electrodes 2 . on the other hand , the transparent electrodes 2 are reduced in the cation electrodeposition . however , on the side surface 2c of the transparent electrode 2 , the reduction of the side surface 2c , on which the light shielding means 4 of this embodiment is formed has little effectivity on the light transmissivity of the entire electrode 2 . accordingly , the light shielding means 4 can be formed also in the cation electrodeposition . fig5 is a sectional view showing a constitution of a liquid crystal display apparatus 20 . the liquid crystal display apparatus 20 is of a stn - type employing a phase difference plate for black - and - white image , and comprises a pair of substrate members 23 , 24 , a liquid crystal layer 11 , phase difference plates 12 , 14 , polarizing plates 13 , 15 , a light conducting plate 16 , a light dispersing plate 17 , a reflective plate 18 and a light source 19 . the substrate member 23 comprises a light transmitting substrate 1 , transparent electrodes 2 , light shielding means 4 , a top coating layer 5 , and an alignment layer 6 and the other substrate member 24 comprises a light transmitting substrate 7 , a transparent electrode 8 , a top coating layer 9 , an alignment layer 10 and light shielding means ( not shown ). the transparent electrodes 2 and light shielding means 4 are formed on one surface 1a of the light transmitting substrate 1 comprising the substrate member 23 on a segment electrode side in the above - mentioned manner . the transparent electrodes 2 are formed so as to have a width of 200 μm and a spacing of 20 μm therebetween . an example of the number of the transparent electrodes 2 is 1 , 120 . the light shielding means 4 is , as mentioned above , formed on the side face of the transparent electrodes 2 . further , the top coating layer 5 and the alignment layer 6 are formed in this order on the transparent electrodes 2 and the light shielding means 4 . on the other hand , the same as that of the substrate member 23 , the transparent electrode 8 and the light shielding means ( not shown ) are formed on one surface 7a of the light transmitting substrate 7 , which composes the substrate member 24 on a common electrode , has an insulating property like the light transmitting substrate , and is realized by glass or the like . further , the top coating layer 9 and the alignment layer 10 are formed on the transparent electrode 8 in this order . a liquid crystal display apparatus 20 wherein such transparent electrode 2 , 8 are formed is driven in a vertical two - divisional method . the surface of the alignment layers 6 , 10 realized by a material such as a polyimide resin is treated , for example , by rubbing . such a pair of substrate members 23 , 24 are bonded leaving a predetermined space so that respective alignment layers 6 , 10 are opposed to each other and the transparent electrodes 2 are at right angles to the transparent electrode 8 . in this occasion , an injection hole for injecting a liquid crystal material is provided . a liquid crystal material is injected through the injection hole to form the liquid crystal layer 11 . after injection , the injection hole is sealed . the phase difference plates 12 , 14 and the polarizing plate 13 , 15 are laminated and bonded in this order on the other surfaces 1b , 7b of the light transmitting substrates 1 , 7 , respectively . further , a large scale integrated circuit ( lsi ) etc , are connected . a liner light source 19 is arranged on a polarizing plate 13 side . the light from the light source 19 is guided by the light conducting plate 16 arranged on the side of the light transmitting substrate 1 , reflected by the reflective plate 18 , dispersed by the dispersing plate 17 and enters into the liquid crystal layer 11 . the liquid crystal display device 20 is of a single matrix type , wherein a crossing portion of the transparent electrodes 2 of the substrate member 23 and the transparent electrode 8 of the substrate member 24 is used as picture elements . additionally , the periphery of a display screen is used as a light shielding region . for that purpose , 48 lines starting from one end of the 1120 segment electrodes , 48 lines from the other end thereof , 16 lines from one end of the 800 common electrodes and 16 lines from the other thereof are not used for display . as a result , displaying is conducted in 1024 × 768 dots . further , the liquid crystal display apparatus 20 is driven in 374 duty . the contrast ratio of display under these conditions is 14 : 1 . the ratio is improved in comparison with that ( 12 : 1 ) without light shielding means 4 . such liquid crystal display apparatus 20 is preferably applied to a liquid crystal display apparatus for a work station , desk top publishing etc . of which a high resolution is required and a small liquid crystal display apparatus for a palm top computer . fig6 is a sectional view showing a color filter 33 formed in the electrodeposition method . since the color filter 33 is formed on a plurality of transparent electrodes 32 on the light transmitting substrate 31 which are stripe - shaped by patterning , the color filter 33 is also formed as a plurality of strip - shaped filters . the color filter is formed so as to have a thickness of about 1 . 5 μm . in this formation , the greatest possible care is taken so as to prevent the color filter from protruding out of the side faces of a electrode 32 . an overcoating layer 34 , which is realized by a synthetic resin having a light transmitting property , is formed on the color filter 33 , and further a transparent electrode 35 and an alignment layer 36 are formed in this order . the transparent electrode 35 , which is formed on the entire surface of the overcoating layer 34 , is used as that for displaying . the substrate member 37 in which the color filter 33 is thus formed is bonded with a substrate member in which , for example , a tft element and a picture element electrode are formed , interposing a liquid crystal layer therebetween . in the formation of the above - mentioned color filter 33 , an electrode 32 for electrodeposition as well as an electrode 35 for display is necessary . however , the light shielding means 4 of this embodiment is formed using the transparent electrode 2 for display . additionally , manufacturing steps are simplified in comparison with those of conventional light shielding means made of metallic chrome or made of laminated color filters . as a result , the manufacturing cost can be reduced . in the embodiment , the light shielding means 4 is formed by the use of a water - soluble epoxy resin having a low transparency for the purpose of shielding light and to use as a water - soluble resin an acrylic - melamine resin , polyester - melamine resin , acrylic resin or the like is also in the scope of the invention . as the resist layer 3 , a negative - type photo - resist and a heat resistant photo - resist may be used as well as a positive - type photo - resist . sno 2 and a complex of ito or sno 2 with a metal may be employed as transparent electrodes 2 , 8 as well as ito . additionally , a pigment may be contained in the electrodeposition bath 21 , unlimited to an oil soluble black - color dye , and the above - mentioned resins may be contained therein . besides a cellosolve solvent , other solvents may be also used . conditions for forming the light shielding means 4 are not limited to those described in the embodiments and may be suitably selected . further , in the embodiment is described an example of a liquid crystal display apparatus of a stn - type employing the phase difference plate for black - and - white image . however , a liquid crystal display apparatus of the invention can be applied to a stn - type , a ferroelectric , and an antiferroelectric liquid crystal display apparatus , and an active matrix type liquid crystal display apparatus using a tft or mim , in which the same effect can be obtained , regardless of black - and - white image or color image . further the invention can be preferably applied to a liquid crystal optical apparatus including light shielding means such as optical shutters for a stereoscopic television and an optical printer . the invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof . the present embodiments are therefore to be considered in all respects as illustrative and not restrictive , the scope of the invention being indicated by the appended claims rather than by the foregoing description and all changes which come within the meaning and the range of equivalency of the claims are therefore intended to be embraced therein .