a liquid vaporizer apparatus and method for chemical vapor deposition of liquid solutions into a controlled atmosphere of a cvd reaction chamber . the apparatus comprises an atomizer , gas curtain , heated porous media disks and a carrier gas mixer . the invention provides for the independent control of temperature , pressure and precursor stoichiometry during the atomizing and vaporization process thereby rendering the precise precursor vapor quality and quantity required for a given application . the invention employs the use of removable porous media disks which may be varied according to the desired operating pressure and precursors . in operation , the apparatus provides for a liquid precursor to first be atomized into a mist using an ultrasonic nozzle , then vaporized by heated media disks , and mixed with a carrier gas , then forced into cvd reaction chamber .