an aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by using a plurality of exposure beams having a predetermined separation in at least a first direction for exposing a pattern onto said workpiece , where said predetermined separation is fixed to an initial system pitch in said first direction , comprising the actions of : scaling a pattern pitch in said first direction to be an integer multiple of said system pitch , adjusting the initial system pitch in said first direction to be an adjusted system pitch to maintain a scale of said pattern , adjusting said predetermined separation of exposure beams to said adjusted system pitch . other aspects of the present invention are reflected in the detailed description , figures and claims .