a pattern selecting device for a sewing machine of the type having a housing , a panel mounted on the housing for indicating a number of pattern indicia to be selected by the sewing machine operator , and an electronic memory storing a number of stitch control data for producing the stitches in accordance to the pattern indicia . the panel is provided with a first portion carrying a first group of pattern indicia and a second portion for indicating a second group of pattern indicia and a third group of pattern indicia . the pattern selecting device includes two screening plates mounted on the second portion . both plates are movable relative to the second and third groups of indicia in the second section to selectively hide one of the second and third groups of indicia and visualize the other of the second and third groups of indicia or to hide both the second and third groups of indicia . the device is further provided with a switching arrangement operated to move the screening plates relative to the second and third groups of indicia . the switching arrangement produces a first electric signal when the screening plates hide one of the second and third groups of indicia and visualize the other of the second and third groups of indicia , and produces a second electric signal when the screening plates hide both of the second and third groups of indicia .