a multi mode ion implantation system , which operates in both an arc discharge mode of operation and a non arc discharge mode of operation , is described . the multi mode ion implantation system may consist of dual ionization volumes forming two ion sources , an arc discharge source and a non arc discharge source , in tandem . the dual chambers and the two sources feed the ion implantation system with material of various species for multi mode , an arc discharge and a non arc discharge operation .