the present invention relates to novel photosensitive quinolone compounds , specifically novel 3 - diazo 2 , 4 - quinolinedione compounds , that may be used in a variety of applications , such as , photosensitive coating compositions , pharmaceuticals , agricultural , amongst others . the invention further relates to a process for making the novel photosensitive 3 - diazo 2 , 4 - quinolinedione compounds . these compounds are particularity useful as a photoactive component in a positive working photoresist composition , particularity for use as a deep ultraviolet photoresist .