a photolithography method copies a pattern plane onto a working plane by a rotating imaging system . the pattern plane is parallel to the working plane . at a given instance , the imaging system images a small region of the pattern plane to the working plane . the imaging system rotates around a fixed axis perpendicular to the pattern plane and on each pass copies a circular arc shaped region from the pattern plane to the working plane . synchronized translation of the pattern plane and working plane in conjunction with rotation of the imaging system allows the entire pattern plane to be copied to the working plane . the photolithography method can achieve high resolution over a large field - of - view with high write speed and can include an autofocus system to account for variation in the flatness of the working plane . this photolithography method can be used in the visible , uv , ir or x - ray wavebands .