the present invention provides novel tertiary alcohol compounds which are useful as monomers for the preparation of photoresist materials having high transparency and a great affinity for the substrate and hence suitable for use in photolithography using a light source comprising preferably light having a wavelength of 300 nm or less and more preferably light emitted from an arf excimer laser . specifically , the present invention provides tertiary alcohols compounds represented by the following general formula : wherein r 1 and r 2 each independently represents a straight - chain , branched or cyclic alkyl group having 1 to 10 carbon atoms , in which some or all of the hydrogen atoms on the constituent carbon atoms may be replaced by a halogen atom or halogen atoms , or r 1 and r 2 may be joined together to form an aliphatic hydrocarbon ring ; z represents a straight - chain , branched or cyclic divalent organic group having 2 to 10 carbon atoms ; and k is 0 or 1 .