a laminated structure for use as a thy film photoresist , which includes a supporting layer , a photosensitive resin layer and a protective layer . the protective layer is a polyester film that has a maximum surface roughness between 1 , 500 nm and 2 , 500 nm , and a sheet resistance between 1 × 10 8 ω /□ and 1 × 10 12 ω /□. the laminated structure is particularly applicable to the manufacture of a photosensitive device and a circuit of a printed circuit board or a lead frame .