the present invention relates to a method of eliminating microbubbles associated with a developer solution . the method includes depositing the developer solution over an exposed photoresist film which overlies a substrate and agitating the developer solution using waves . the agitation of the developer solution causes the microbubbles to exit the developer solution and reduces defects previously associated therewith . in addition , a system for eliminating microbubbles associated with a developer solution is disclosed . the system includes an apparatus for applying the developer solution to a photoresist film which overlies a substrate and a developer agitation system . the developer agitation system is operably coupled to the developer solution and agitates the developer solution using waves , which causes the microbubbles to exit the developer solution .