a method is disclosed which is suitable for the calibration of a measuring table of a coordinate measuring machine . for this purpose , a mask is deposited in a three - point support of the measuring table , wherein the mask used for the calibration of the measuring table is a mask , which is used for the semiconductor production . the measurement of positions of a plurality of different structures which are arranged in a distributed manner on the mask is carried out . the structures are available in an initial orientation on the mask . the mask is rotated and the position of the structures is determined in the rotated orientation . afterwards , the mask is shifted and the position of the structures is also determined . a total correction function for eliminating coordinate - dependant measuring errors is determined , wherein the total correction function has a first correction function and a second correction function .