the present invention relates to a support base for light - sensitive photographic elements . in particular , the present invention relates to a support base comprising a support having coated thereon at least two antihalation layers overcoated by a protective layer . the support base for light - sensitive photographic elements of the present invention presents an improved coating quality with a reduced formation of mottle , defined as an irregularly patterned defect due to the tendency of the coated layers to reproduce any deformation present on the support .