the present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput . a metrology system of fine pattern according to the pattern inspection technique has : a the column that includes a charged particle source , an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source , and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam ; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector ; and a sample introduction unit for introducing the sample into the inside of the column ; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column .