methods of imprint lithography are described . generally , the methods include imprinting , via a patterned mold , a pattern into a polymerizable fluid composition on a substrate to form a patterned imprinting layer . a conformal layer is overlayed on the patterned imprinting layer . a portion of the conformal layer is used as a hard mask for subsequent processing . the imprinted pattern may be transferred to the substrate by a plurality of etches .