in one embodiment , the invention provides a method for manufacturing an array of interferometric modulators . each interferometric modulator comprises first and second optical layers which when the interferometric modulator is in an undriven state are spaced by a gap of one size , and when the interferometric modulator is in a driven state are spaced by a gap of another size , the size of the gap determining an optical response of the interferometric modulator . the method comprises fabricating interferometric modulators of a first type characterized by the size of the gap between its first and second optical layers when in the undriven state ; fabricating interferometric modulators of a second type characterized by the size of the gap between its first and second optical layers when in the undriven state ; and fabricating modulators of a third type characterized by the size of the gap between its first and second optical layers when in the undriven state , wherein fabricating the interferometric modulators of the first , second , and third types comprises using a sequence of deposition and patterning steps of not more than 9 masking steps to deposit and pattern layers of material on a substrate .