methodology enabling a generation of fins having a variable fin pitch less than 40 nm , and the resulting device are disclosed . embodiments include : forming a hardmask on a substrate ; providing first and second mandrels on the hardmask ; providing a first spacer on each side of each of the first and second mandrels ; removing the first and second mandrels ; providing , after removal of the first and second mandrels , a second spacer on each side of each of the first spacers ; and removing the first spacers .