disclosed is an exposure apparatus having an element to be cooled and being configured to expose a substrate to patter radiation by using the element , the apparatus including a reservoir configured to house a liquid coolant therein , a first pump disposed between the reservoir and the element and configured to supply the coolant from the reservoir to the element , a heater disposed between the first pump and the element and configured to heat the coolant supplied from the first pump , a jacket configured to receive the coolant from the heater and to cool the element , a second pump disposed between the jacket and the reservoir and configured to supply the coolant from the jacket to the reservoir , and a cooler disposed between the second pump and the reservoir and configured to cool the coolant supplied from the second pump .