a process for the amplification of structured resists utilizes a reaction between a nucleophilic group and an isocyanate group or thiocyanate group to link an amplification agent to a polymer present in the photoresist . the isocyanate group or the thiocyanate group in addition to the nucleophilic group form a reaction pair . one of the partners is provided on the polymer and the other partner on the amplification agent . the amplification reaction takes place more rapidly than a linkage to carboxylic anhydride groups . furthermore , the amplification reaction permits the use of polymers that have high transparency at short wavelengths of less than 200 nm , in particular 157 nm .