a method of sraf printing using etch - aware sraf print avoidance engines and the resulting device are provided . embodiments include performing mask to resist simulations for a mask having both a plurality of features to be formed on a substrate and a plurality of sub resolution assist features ; detecting srafs of the plurality that will print through to a resist ; checking dimensions of the detected srafs to determine whether one or more of the srafs will etch through to the substrate ; modifying the one or more of the srafs ; and forming the mask after the one or more of the srafs have been modified .