a method of sample preparation for transmission electron microscope analysis is disclosed . the method renders a typical tem analysis on a sample having a photoresist layer practical . the method uses a conductive layer and a dielectric layer to protect a photoresist layer of the tem sample from slicing damages and ion bombardments . the conductive layer and the dielectric layer can also isolate the photoresist layer from moisture and oxygen - contained environments and prevent the photoresist layer from shrinking . moreover , the entire tem sample preparation process need not use any organic solvent or water to clean the sample .