compositions for directed self - assembly patterning techniques are provided . methods for directed self - assembly are also provided in which a dsa composition comprising a block copolymer is applied to a substrate and then self - assembled to form the desired pattern . the block copolymer includes at least two blocks and is selected to have a high interaction parameter . the bcps are able to form perpendicular lamellae by simple thermal annealing on a neutralized substrate , without a top coat . the bcps are also capable of micro - phase separating into lines and spaces measuring at 10 nm or smaller , with sub - 20 - nm l 0 capability .