an immersion lithography method includes forming a resist layer on a substrate to be processed , performing immersion lithography in a state where liquid is locally interposed between the resist layer on the substrate and an optical system of an exposure apparatus , while the substrate and the optical system are relatively moved . in the immersion lithography , multiple exposures are performed for exposure regions in a portion of a surface of the substrate close to a rim of the substrate , and exposures of number of times smaller than the number of exposures of the multiple exposures are performed for exposure regions located inside the exposure regions .