a microlithography illumination system includes a first raster arrangement including a first plurality of bundle - forming raster elements arranged in or adjacent a first plane of the illumination system . the first plurality of bundle - forming raster elements is configured to generate a raster arrangement of secondary light sources . the illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field . the transmission optics includes a second raster arrangement comprising a second plurality of bundle - forming raster elements . the illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement . the displaceable segment includes exactly one of the raster elements , a group of several raster elements , a raster column , a raster area , or several groups of raster elements .