a method and system are provided of using a patterning device . an exemplary method includes defining a first region on a surface , the first region being associated with a first element of the patterning device , defining a second region on the surface , the second region being associated with a second element of the patterning device , activating the first element to expose the overlapping region , and deactivating the second element when the first element is active . the first region and the second region overlap in an overlapping region .