a device for guiding movement of a stage , carrying thereon a semiconductor wafer , for printing in a reduced scale an integrated circuit pattern of a mask onto different portions of the semiconductor wafer through a reduction production lens , includes linear roller bearings for supporting the stage for movement in a predetermined direction , a slider and a roller for pressing a portion of the stage against the slider to thereby constrain the displacement of the stage in a direction perpendicular to the predetermined direction of movement , whereby higher accuracies of the stop position of the stage as well as higher speed of the stage movement are assured .