a method of making a probe having a cantilever and a tip include providing a substrate having a surface and forming a tip extending substantially orthogonally from the surface . the method includes depositing an etch stop layer on the substrate , whereby the etch stop layer protects the tip during process . a silicon nitride layer is then deposited on the etch stop layer . an etch operation is used to release the cantilever and expose the etch stop layer protecting the tip . preferably , the tip is silicon and the cantilever supporting the tip , preferably via the etch stop layer , is silicon nitride . a probe for a surface analysis instrument made according to the method includes a tip and a silicon nitride cantilever having a thickness defined during the deposition process .