an inductive - coupled plasma apparatus employs a shield to reduce sputter contamination . a method for manufacturing the shield is included . an apparatus for generating a high - density plasma includes a process chamber having a dielectric window located along a plane , a coil located outside the process chamber proximate to the dielectric window and substantially parallel to the plane , and a shield located between the coil and the dielectric window . the shield has multiple openings , wherein the multiple openings of the shield are disposed at locations corresponding to areas between the turns of the coil .