Copper is the most common interconnecting material in the field of microelectronic packaging, which is widely used in advanced electronic packaging technologies. However, with the trend of the miniaturization of electronic devices, the dimensions of interconnectors have decreased from hundreds of microns to tens of or even several microns, which has brought serious reliability issues. As a result, nanotwinned copper (nt-Cu) has been proposed as a potential candidate material and is being certified progressively. Firstly, the physical properties of nt-Cu have been widely studied. Notably, the higher thermal stability and oxidation resistance of the (111) texture causes nt-Cu to maintain excellent physical properties under high-temperature serving conditions. Secondly, recent works on the electrolyte and electroplating processes of nt-Cu on wafer substrates are summarized, focusing on how to reduce the thickness of the transition layer, improve the twin density, and achieve complicated pattern filling. Thirdly, nt-Cu can effectively eliminate Kirkendall voids when it serves as UBM or a CuP. Additionally, the high (111) texture can control the preferred orientation of interfacial intermetallic compounds (IMCs) at the Cu–Sn interface, which should be helpful to improve the reliability of solder joints. nt-Cu has superior electromigration resistance and antithermal cycling ability compared to ordinary copper RDLs and TSVs. Above all, nt-Cu has attracted much attention in the field of microelectronic packaging in recent years. The preparation–performance–reliability interrelationship of nt-Cu is summarized and displayed in this paper, which provides a solid theoretical basis for its practical applications.