In general, when the image of an integrated circuit pattern formed on a photo-mask or other patterns is inspected, it is necessary to prepare a reference image and an image to be inspected.
Leswaku munhu a kota ku vona leswaku swiribyana sweswo leswi veketeriweke hi vukheta swi vumba xifaniso kumbe ntila wo karhi, u fanele a tlhentlha kutani a languta xifaniso hinkwaxo.