CROSS-REFERENCE TO RELATED APPLICATION(S) 
       [0001]    This application claims priority to Japanese Patent Application No. 2012-121812, filed on May 29, 2012, Japanese Patent Application No. 2012-123550, filed on May 30, 2012, and Japanese Patent Application No. 2012-164406, filed on Jul. 25, 2012, the contents of which are hereby incorporated by reference into the present application. 
       TECHNICAL FIELD 
       [0002]    The present application relates to a deflector. 
       DESCRIPTION OF RELATED ART 
       [0003]    Japanese Patent Application Laid-open No. 2007-199096 discloses a deflector. This deflector includes a substrate portion, a support portion having a lower end fixed to the substrate portion, a swing portion swingably placed on an upper end of the support portion, a reflective portion formed on an upper surface of the swing portion, and a drive mechanism applying torque about a swing axis to the swing portion. In this deflector, the drive mechanism swings the swing portion, so that a reflection angle of incident light is changed. In this deflector, the swing portion is formed in a rectangular flat plate shape, and stoppers corresponding to four corners of the swing portion are provided above the swing portion. In the deflector, even when force of separating the swing portion from the support portion acts, the stoppers prevent the swing portion from coming off. 
         [0004]    Japanese Patent Application Laid-open No. 2008-3309 discloses a deflector. This deflector includes a substrate portion, a movable portion swingably supported relative to three axes of a pitch axis, a roll axis and a yaw axis at a support point, a position thereof with respect to the substrate portion being substantially fixed, a reflective portion formed on the movable portion such that a reflective surface thereof is orthogonal to the yaw axis, and a drive mechanism rotationally driving the movable portion about the yaw axis such that a contact edge of the movable portion is brought into contact with a surface of the substrate portion. In this deflector, the drive mechanism rotates and drives the movable portion, so that a reflection angle can be adjusted to an arbitrary azimuth angle. The deflector can scan in a direction of longitude. 
         [0005]    In other words, the deflector disclosed in Japanese Patent Application Laid-open No. 2008-3309 includes a substrate portion, a swing portion swingably supported relative to at least two axes parallel to the substrate portion at a support point, a position thereof with respect to the substrate portion being substantially fixed, a reflective portion formed on the swing portion, and a drive mechanism swinging the swing portion and causing a contact edge of the swing portion to abut on a contact surface of the substrate portion at a desired azimuth angle. In this deflector, the drive mechanism adjusts the azimuth angle at which the contact edge of the swing portion abuts on the contact surface of the substrate portion, so that a reflection angle can be adjusted to an arbitrary azimuth angle. This deflector can scan in a direction of longitude. 
       BRIEF SUMMARY OF INVENTION 
       [0006]    The present application discloses a deflector including a substrate portion, a movable portion, a reflective portion, a support portion, and a moving mechanism. The movable portion is supported by a first end of the support portion. A second end of the support portion is supported by the substrate portion. An end of the movable portion is capable of coming into contact with the substrate portion. The reflective portion is formed on the movable portion. The moving mechanism is capable of driving the movable portion so as to bring the movable portion into at least any one of a first state, a second state, a third state, and a fourth state. In the first state, a contact position between the movable portion and the substrate portion is in a first direction from the second end of the support portion. In the second state, the contact position between the movable portion and the substrate portion is in a second direction from the second end of the support portion. In the third state, the contact position between the movable portion and the substrate portion is in the first direction from the second end of the support portion. In the fourth state, the contact position between the movable portion and the substrate portion is in the second direction from the second end of the support portion. The first direction and the second direction differ from each other. An angle of the reflective portion in the first state, an angle of the reflective portion in the second state, an angle of the reflective portion in the third state, and an angle of the reflective portion in the fourth state differ from each other. 
     
    
     
       BRIEF DESCRIPTION OF DRAWINGS 
         [0007]      FIG. 1  is a perspective view showing a schematic configuration of a deflector  10  of an embodiment; 
           [0008]      FIG. 2  is a side view showing an example of a configuration where a biasing mechanism  24  biases a swing plate  20  toward a support member  14  by utilizing magnetic force; 
           [0009]      FIG. 3  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0010]      FIG. 4  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0011]      FIG. 5  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0012]      FIG. 6  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0013]      FIG. 7  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0014]      FIG. 8  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0015]      FIG. 9  is a side view showing another example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing magnetic force; 
           [0016]      FIG. 10  is a side view showing an example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing electrostatic force; 
           [0017]      FIG. 11  is a side view showing an example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing surface tension of a non-volatile liquid  40 ; 
           [0018]      FIG. 12  is a side view showing an example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing restoring force of a soft adhesive  50 ; 
           [0019]      FIG. 13  is a side view showing an example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing restoring force of elastic members  60 ; 
           [0020]      FIG. 14  is a plan view showing an example of a configuration where the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by utilizing restoring force of elastic members  72 ,  74 ; 
           [0021]      FIG. 15  is a side view of the configuration of  FIG. 14 ; 
           [0022]      FIG. 16  is a side view showing an example of a configuration where a drive mechanism  22  applies torque to the swing plate  20  by using magnetic force; 
           [0023]      FIG. 17  is a side view showing an example of a configuration where the drive mechanism  22  applies torque to the swing plate  20  by using Lorentz force; 
           [0024]      FIG. 18  is a perspective view showing a schematic configuration of a deflector  100  of an embodiment; 
           [0025]      FIG. 19  is a side view showing an example of a configuration where a biasing mechanism  112  biases a support member  106  toward a substrate  102  by utilizing magnetic force; 
           [0026]      FIG. 20  is a side view showing another example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing magnetic force; 
           [0027]      FIG. 21  is a side view showing another example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing magnetic force; 
           [0028]      FIG. 22  is a side view showing an example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing electrostatic force; 
           [0029]      FIG. 23  is a side view showing an example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing surface tension of non-volatile liquid  130 ; 
           [0030]      FIG. 24  is a side view showing an example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing restoring force of a soft adhesive  140 ; 
           [0031]      FIG. 25  is a side view showing an example of a configuration where the biasing mechanism  112  biases the support member  106  toward the substrate  102  by utilizing restoring force of elastic members  150 ; 
           [0032]      FIG. 26  is a top plan view showing a schematic configuration of a deflector  210  of an embodiment; 
           [0033]      FIG. 27  is a side view showing an example of a state where an end in a minor axis direction of a movable plate  216  is in contact with a substrate portion  212 ; 
           [0034]      FIG. 28  is a side view showing an example of a state where an end in a major axis direction of the movable plate  216  is in contact with a substrate portion  212 ; 
           [0035]      FIG. 29  is a figure showing an example of a relation between an azimuth angle θ of a contact point as viewed from the substrate portion  212 , and an elevation angle φ of a reflective surface of the movable plate  216 ; 
           [0036]      FIG. 30  is a figure showing an example of phase shifting between the substrate portion  212  and the movable plate  216  resulting from the movable plate  216  rotating once; 
           [0037]      FIG. 31  is a figure of illustrating a principle of generation of phase shifting between the azimuth angle θ of the contact point as viewed from the substrate portion  212 , and a phase angle α of the contact point as viewed from the movable plate  216 ; 
           [0038]      FIG. 32  is a top plan view showing an example of another aspect of the movable plate  216 ; 
           [0039]      FIG. 33  is a top plan view showing an example of another aspect of the movable plate  216 ; 
           [0040]      FIG. 34  is a top plan view showing an example of another aspect of the movable plate  216 ; 
           [0041]      FIG. 35  is a figure showing an example of a variation pattern of the elevation angle φ with respect to the phase angle α; 
           [0042]      FIG. 36  is a figure showing another example of the variation pattern of the elevation angle φ with respect to the phase angle α; 
           [0043]      FIG. 37  is a figure showing another example of the variation pattern of the elevation angle φ with respect to the phase angle α; 
           [0044]      FIG. 38  is a figure showing another example of the variation pattern of the elevation angle φ with respect to the phase angle α; 
           [0045]      FIG. 39  is a side view showing another aspect of the deflector  210  of the embodiment; 
           [0046]      FIG. 40  is a top plan view showing a schematic configuration of a deflector  310  of an embodiment; 
           [0047]      FIG. 41  is a longitudinal sectional taken along XLI-XLI in  FIG. 40 ; 
           [0048]      FIG. 42  is a top plan view showing a schematic configuration of a deflector  410  of an embodiment; 
           [0049]      FIG. 43  is a longitudinal sectional view taken along XLIII-XLIII in  FIG. 42 , showing an example of a state where a swing plate  416  swings; 
           [0050]      FIG. 44  is a side view showing an example of a state where a swing plate  416  and a support column  414  are connected by a biaxial joint  424 ; 
           [0051]      FIG. 45  is another side view showing an example of the state where the swing plate  416  and the support column  414  are connected by the biaxial joint  424 ; 
           [0052]      FIG. 46  is a figure showing an example of a configuration where the support column  414  with low bending rigidity is directly fixed to the swing plate  416 ; 
           [0053]      FIG. 47  is a figure showing an example of a state in which an adjustment mechanism  420  is implemented by using a linear actuator  432 ; 
           [0054]      FIG. 48  is a figure showing an example of a state in which the adjustment mechanism  420  is implemented by using a linear actuator  448 ; 
           [0055]      FIG. 49  is a longitudinal sectional view showing a schematic configuration of a deflector  500  of an embodiment; 
           [0056]      FIG. 50  is a longitudinal sectional view showing a schematic configuration of another aspect of the deflector  500  of the embodiment; 
           [0057]      FIG. 51  is a top plan view showing a schematic configuration of another aspect of the deflector  500  of the embodiment; and 
           [0058]      FIG. 52  is a longitudinal sectional view taken along LII-LII in  FIG. 51 , showing an example of a state where a swing plate  506  swings. 
       
    
    
     DETAILED DESCRIPTION OF INVENTION 
       [0059]    In the technology of Japanese Patent Application Laid-open No. 2007-199096, since the stoppers are present above the swing portion, i.e., above the reflective portion, there is a problem that the stoppers block incident light or reflected light, and this substantially reduces a reflection area of the deflector. In a deflector having a swing portion swingably placed on a substrate portion via a support portion, a technology capable of preventing the swing portion from coming off without a stopper provided above the swing portion has been expected. 
         [0060]    The present application provides a technology for solving the above-described problem. According to the present application, there is provided a technology capable of preventing a swing portion from coming off without a stopper provided above the swing portion, in a deflector having the swing portion swingably placed on a substrate portion via a support portion. 
         [0061]    The deflector disclosed in the present application includes a substrate portion, a support portion having a lower end fixed to the substrate portion, a swing portion swingably placed on an upper end of the support portion, a reflective portion formed on an upper surface of the swing portion, a drive mechanism applying torque about a swing axis to the swing portion, and a biasing mechanism biasing the swing portion toward the support portion, at least when force of separating the swing portion from the support portion acts. 
         [0062]    In the above-described deflector, the biasing mechanism biasing the swing portion toward the support portion prevents the swing portion from coming off. The coming off of the swing portion can be prevented without providing a stopper above the swing portion. Additionally, in the above-described deflector, the biasing mechanism biases the swing portion toward the support portion, and hence the deflector can be arranged in a desired direction regardless of a direction in which gravity acts. In the above-described deflector, as long as the biasing mechanism biases the swing portion toward the support portion at least when the force of separating the swing portion from the support portion acts, any biasing mechanism may be employed, for example, a biasing mechanism always biasing the swing portion toward the support portion may be employed, or a biasing mechanism biasing the swing portion toward the support portion only when the force of separating the swing portion from the support portion acts may be employed. 
         [0063]    In the above-described deflector, the biasing mechanism can be implemented in various manners. For example, the biasing mechanism may include a magnet provided on at least one of the support portion and the swing portion, and may bias the swing portion toward the support portion by utilizing magnetic force. In this case, the swing portion preferably includes the magnet, and the support portion preferably includes a magnetic material. 
         [0064]    Alternatively, the biasing mechanism may include an insulator provided on at least one of the support portion and the swing portion, and voltage applying means for applying a voltage between the support portion and the swing portion, and may bias the swing portion toward the support portion by utilizing electrostatic force. 
         [0065]    Alternatively, the biasing mechanism may include non-volatile liquid applied to abutting parts of the swing portion and the support portion, and may bias the swing portion toward the support portion by utilizing surface tension of the non-volatile liquid, when the force of separating the swing portion from the support portion acts. In this case, a part, to which the non-volatile liquid is applied, is preferably subjected to lyophilic treatment. 
         [0066]    Alternatively, the biasing mechanism may include an adhesive bonding the abutting parts of the swing portion and the support portion together, and may bias the swing portion toward the support portion by utilizing restoring force of the adhesive, when the force of separating the swing portion from the support portion acts. 
         [0067]    Alternatively, the biasing mechanism may include an elastic member connecting the swing portion to the support portion, and may bias the swing portion toward the support portion by utilizing restoring force of the elastic member, when the force of separating the swing portion from the support portion acts. 
         [0068]    In the above-described deflector, a convex portion is preferably formed on a part, abutting on the swing portion, of the support portion, and a concave portion is preferably formed on a part, abutting on the support portion, of the swing portion. With such a configuration, it is possible to reliably prevent the swing portion from coming off the support portion. 
         [0069]    In another deflector disclosed in the present application includes a substrate portion, a support portion swingably placed on the substrate portion, a swing portion fixed on an upper end of the support portion, a reflective portion formed on an upper surface of the swing portion, a drive mechanism applying torque about a swing axis to the swing portion, and a biasing mechanism biasing the support portion toward the substrate portion, at least when force of separating the support portion from the substrate portion acts. 
         [0070]    In the above-described deflector, the biasing mechanism biasing the support portion toward the substrate portion prevents the swing portion from coming off the support portion. The coming off of the swing portion can be prevented without providing a stopper above the swing portion. Additionally, in the above-described deflector, the biasing mechanism biases the support portion toward the substrate portion, and hence the deflector can be arranged in a desired direction regardless of a direction in which gravity acts. In the above-described deflector, as long as the biasing mechanism biases the support portion toward the substrate portion at least when the force of separating the support portion from the substrate portion acts, any biasing mechanism may be employed, for example, a biasing mechanism always biasing the support portion toward the substrate portion may be employed, or a biasing mechanism biasing the support portion toward the substrate portion only when the force of separating the support portion from the substrate portion acts may be employed. 
         [0071]    In the above-described deflector, the biasing mechanism can be implemented in various manners. For example, the biasing mechanism may include a magnet provided on at least one of the substrate portion and the support portion, and may bias the support portion toward the substrate portion by utilizing magnetic force. In this case, the substrate portion preferably includes the magnet, and the support portion preferably includes a magnetic material. 
         [0072]    Alternatively, the biasing mechanism may include an insulator provided on at least one of the substrate portion and the support portion, and voltage applying means for applying a voltage between the substrate portion and the support portion, and may bias the support portion toward the substrate portion by utilizing electrostatic force. 
         [0073]    Alternatively, the biasing mechanism may include non-volatile liquid applied to abutting parts of the substrate portion and the support portion, and may bias the support portion toward the substrate portion by utilizing surface tension of the non-volatile liquid, when the force of separating the support portion from the substrate portion acts. In this case, a part, to which the non-volatile liquid is applied, is preferably subjected to lyophilic treatment. 
         [0074]    Alternatively, the biasing mechanism may include an adhesive bonding the abutting parts of the substrate portion and support portion together, and may bias the support portion toward the substrate portion by utilizing restoring force of the adhesive, when the force of separating the support portion from the substrate portion acts. 
         [0075]    Alternatively, the biasing mechanism may include an elastic member connecting the swing portion to the substrate portion, and may bias the support portion toward the substrate portion by restoring force of the elastic member, when the force of separating the support portion from the substrate portion acts. 
         [0076]    In the above-described deflector, a convex portion is preferably formed on a part, abutting on the substrate portion, of the support portion, and a concave portion is preferably formed on a part, abutting on the support portion, of the substrate portion. With such a configuration, it is possible to reliably prevent the swing portion and the support portion from coming off the substrate portion. 
         [0077]    In the technology of Japanese Patent Application Laid-open No. 2008-3309, an elevation angle of the reflective surface with respect to a surface of the substrate portion is constant, and therefore the reflective surface cannot be adjusted at an arbitrary elevation angle, and scanning cannot be performed in a direction of latitude. A deflector capable of scanning not only in the direction of longitude, but also in the direction of latitude has been expected. 
         [0078]    The present application provides a technology for solving the above-described problem. According to the present application, there is provided a technology capable of implementing a deflector enabling scanning in both of the direction of longitude and the direction of latitude. 
         [0079]    Another deflector disclosed in the present application includes a substrate portion, a movable portion swingably supported relative to three axes of a pitch axis, a roll axis and a yaw axis at a support point, a position thereof with respect to the substrate portion being substantially fixed, a reflective portion formed on the movable portion such that a reflective surface thereof is orthogonal to the yaw axis, and a drive mechanism rotationally driving the movable portion about the yaw axis such that a contact edge of the movable portion is brought into contact with a surface of the substrate portion. In the deflector, a shape of the movable portion is formed such that a distance from the support point to the contact edge changes according to a phase angle. 
         [0080]    The phase angle described herein means an angle formed by a reference line of the movable portion as viewing the movable portion from a direction of the yaw axis in plan view. The azimuth angle described herein means an angle formed by a reference line of the substrate portion as viewing the surface of the substrate portion in plan view. The direction of longitude described herein means a direction at which the azimuth angle increases and reduces. The elevation angle described herein means an angle formed by the surface of the substrate portion. The direction of latitude described herein means a direction at which the elevation angle increases and reduces. 
         [0081]    In the above-described deflector, the shape of the movable portion is formed such that the distance from the support point to the contact edge changes according to a phase angle α. When the movable portion is rotated about the yaw axis such that the contact edge is brought into contact with the substrate portion, a phase angle α of a contact point as viewed from the movable portion also changes with the change of an azimuth angle θ of the contact point as viewed from the substrate portion, resulting in changes of an elevation angle φ of the reflective surface. Therefore, a relation between the azimuth angle θ of the contact point as viewed from the substrate portion, and the elevation angle φ of the reflective surface will be, for example, shown in  FIG. 29 . 
         [0082]    As shown in  FIG. 29 , in the above-described deflector, a different elevation angle φ with respect to the same azimuth angle θ is implemented each time the movable portion rotates once. This principle will be described in an embodiment in detail. Consequently, the above-described deflector enables combination of an arbitrary azimuth angle θ and the elevation angle φ by repeatedly rotating the movable portion. The deflector enables scanning in both of the direction of longitude and the direction of latitude. 
         [0083]    The above-described deflector may be configured so that the movable portion has a shape such that a distance from the support point to the contact edge in a direction orthogonal to the yaw axis changes according to the phase angle. With such a configuration, the movable portion can have a shape such that a distance from the support point to the contact edge changes according to the phase angle. In this case, for example, when viewed on a plane orthogonal to the yaw axis, the contact edge of the movable portion may be an oval centering on the support point. Alternatively, when viewed on the plane orthogonal to the yaw axis, the contact edge of the movable portion may be a circle centering on a position offset from the support point. Alternatively, when viewed on the plane orthogonal to the yaw axis, the contact edge of the movable portion may be a polygon centering on the support point. 
         [0084]    The above-described deflector may be also configured so that the movable portion has a shape such that a distance from the reflective surface to the contact edge in a yaw axis direction changes according to the phase angle. With such a configuration, the movable portion can have a shape such that a distance from the support point to the contact edge changes according to the phase angle. 
         [0085]    The above-described deflector may include a substrate portion-side support portion, which has a lower end fixed to the substrate portion, and may be configured such that the support point is provided on an upper end of the substrate portion-side support portion. Additionally, the above-described deflector may include a movable portion-side support portion, which has an upper end fixed to the movable portion, and may be configured such that the support point is provided on an lower end of the movable portion-side support portion. 
         [0086]    Another deflector disclosed in the present application includes a substrate portion, a swing portion swingably supported relative to at least two axes parallel to the substrate portion at a support point, a position thereof with respect to the substrate portion being substantially fixed, a reflective portion formed on the swing portion, a drive mechanism causing the swing portion to swing, and causing a contact edge of the swing portion to abut on a contact surface of the substrate portion at a desired azimuth angle, an adjustment mechanism adjusting a distance from the support point to the contact surface in a direction orthogonal to the substrate portion. 
         [0087]    The azimuth angle described herein means an angle formed by a reference line of the substrate portion as viewing a surface of the substrate portion in plan view. A direction of longitude described herein means a direction in which the azimuth angle increases and reduces. An elevation angle described herein means a direction formed by the surface of the substrate portion. A direction of latitude described herein means a direction in which the elevation angle increases and reduces. 
         [0088]    According to the above-described deflector, the azimuth angle, at which the drive mechanism causes the contact edge of the swing portion to abut on the contact surface of the substrate portion, is adjusted, so that a reflection angle can be adjusted to an arbitrary azimuth angle. Additionally, according to the above-described deflector, the adjustment mechanism adjusts the distance from the support point to the contact surface in the direction orthogonal to the substrate portion, so that an elevation angle of the swing portion, at which the contact edge of the swing portion abuts on the contact surface of the substrate portion, can be adjusted, and the reflection angle can be adjusted to an arbitrary elevation angle. According to the above-described deflector, it is possible to scan not only in the direction of longitude but also in the direction of latitude. 
         [0089]    The above-described deflector may include a support member supported by the substrate portion and provided with a support point on an end in a direction orthogonal to the substrate portion, and may be configured such that the above-described adjustment mechanism adjusts a protrusion amount of the support point from the substrate portion. 
         [0090]    According to the above-described deflector, the protrusion amount of the support point from the substrate portion can be adjusted, so that the elevation angle of the swing portion when the contact edge of the swing portion abuts on the contact surface of the substrate portion can be adjusted, and the reflection angle can be adjusted to an arbitrary elevation angle. 
         [0091]    Alternatively, the above-described deflector may include a contact member supported by the substrate portion and formed with a contact surface, and may be configured such that the adjustment mechanism adjusts a protrusion amount, from the substrate portion, of the contact surface, on which the contact edge of the swing portion abuts. 
         [0092]    According to the above-described deflector, the protrusion amount of the contact surface from the substrate portion is adjusted, so that the elevation angle of the swing portion when the contact edge of the swing portion abuts on the contact surface of the substrate portion can be adjusted, and the reflection angle can be adjusted to an arbitrary elevation angle. 
       Embodiment 
       [0093]      FIG. 1  shows a deflector  10  of this embodiment. The deflector  10  mainly includes a substrate  12 , a support member  14 , a connecting member  18 , a swing plate  20 , a drive mechanism  22 , and a biasing mechanism  24 . A reflective film  20   a  reflecting incident light is formed on an upper surface of the swing plate  20 . The deflector  10  causes the swing plate  20  to swing with respect to the substrate  12 , thereby changing a reflection angle of the incident light by the reflective film  20   a . The substrate  12  is formed, for example, in a silicon wafer. The swing plate  20  is formed, for example, from silicon. The reflective film  20   a  is an evaporated film such as Al. 
         [0094]    A lower end of the support member  14  is fixed to a center of an upper surface of the substrate  12 . The connecting member  18  is fixed to a center of a lower surface of the swing plate  20 . The swing plate  20  is swingably placed in a state in which the connecting member  18  abuts on an upper end of the support member  14 . 
         [0095]    The drive mechanism  22  applies torque about a swing axis to the swing plate  20 , thereby swinging the swing plate  20 . A peripheral edge of the swing plate  20  abuts on the substrate  12 , thereby defining a swing angle in swinging of the swing plate  20 . Alternatively, in a case where restoring force acts when torque about the swing axis is applied to the swing plate  20 , the swing angle is defined by a position where the torque and the restoring force balance. In this embodiment, electrodes  16  formed on the substrate  12 , and an electrode (not shown) formed on the swing plate  20  configure the drive mechanism  22 . A voltage is applied between the electrodes  16  formed on the substrate  12 , and the electrode formed on the swing plate  20 , so that electrostatic force acts between both the electrodes, and torque about the swing axis is applied to the swing plate  20 . 
         [0096]    The biasing mechanism  24  biases the swing plate  20  toward the support member  14 , at least when force of separating the swing plate  20  from the support member  14  acts. The biasing mechanism  24  can prevent the swing plate  20  from coming off the support member  14 . 
         [0097]    In the deflector  10  of this embodiment, the swing plate  20  is biased toward the support member  14  by using magnetic force, thereby implementing the biasing mechanism  24 . As shown in  FIG. 2 , the support member  14  is formed by a magnetic material such as Ni. The connecting member  18  is formed by a magnet such as an electromagnet and a permanent magnet. The connecting member  18  is fixed to a lower surface of the swing plate  20  by using, for example, an adhesive. A polar direction of the magnetic force of the connecting member  18  is arranged in a direction orthogonal to the swing plate  20 . A convex portion is formed on a tip of the support member  14 , and a concave portion is formed on a center of a lower surface of the connecting member  18 . The convex portion on the tip of the support member  14  abuts on the concave portion of the connecting member  18 , so that the swing plate  20  is swingably supported by the support member  14 . With such a configuration, the swing plate  20  is always biased toward the support member  14  by magnetic force acting between the support member  14  and the connecting member  18 , and the swing plate  20  can be prevented from coming off the support member  14 . 
         [0098]    As long as the convex portion abuts on the concave portion of the connecting member  18 , and can swingably support the swing plate  20 , any shape of the convex portion on the tip of the support member  14  may be employed. For example, the convex portion may be formed in a triangular pyramid, or a hemisphere. As long as the concave portion of the connecting member  18  abuts on the convex portion on the tip of the support member  14 , and the swing plate  20  is swingably supported, the concave portion of the connecting member  18  may be formed in any shape. 
         [0099]    The support member  14  may be entirely formed by a magnetic material such as Ni as described above, or the support member  14  may be entirely formed by a non-magnetic material such as Al and only the tip part may be plated with a plating  14   a  of a magnetic material such as Ni, as shown in  FIG. 3 . 
         [0100]    As shown in  FIG. 4 , the convex portion may be formed on the connecting member  18 , and the concave portion may be formed on the tip of the support member  14 . Also in this case, the support member  14  may be entirely formed by a magnetic material, or the support member  14  may be entirely formed by a non-magnetic material and only the tip part may be plated by a magnetic material. 
         [0101]    As shown in  FIG. 5 , the polar direction of the magnetic force of the connecting member  18  may be arranged in a direction along the swing plate  20 . 
         [0102]    As shown in  FIG. 6 , a magnet  26  such as an electromagnet and a permanent magnet may be provided on the swing plate  20 , in addition to the connecting member  18  abutting on the support member  14 . With such a configuration, the swing plate  20  is always biased toward the support member  14  by magnetic force acting between the support member  14  and the magnet  26 , and the swing plate  20  can be prevented from coming off the support member  14 . 
         [0103]    As shown in  FIG. 7 , the support member  14  may be formed by a magnet such as an electromagnet and a permanent magnet, and the connecting member  18  may be formed by a magnetic material such as Ni. In this case, the connecting member  18  may be entirely formed by a magnetic material, or only a part, abutting on the support member  14 , of the connecting member  18  may be plated by a magnetic material. In this case, the convex portion may be formed on the connecting member  18 , and the concave portion may be formed on the tip of the support member  14 . 
         [0104]    Alternatively, as shown in  FIG. 8 , a magnet  28  such as an electromagnet and a permanent magnet may be provided on the substrate  12 , in addition to the support member  14  abutting on the connecting member  18 . With such a configuration, the swing plate  20  is always biased toward the support member  14  by magnetic force acting between the magnet  28  and the connecting member  18 , and the swing plate  20  can be prevented from coming off the support member  14 . 
         [0105]    Alternatively, as shown in  FIG. 9 , the tip of the support member  14  may directly abut on the swing plate  20  without providing the connecting member  18 , and the swing plate  20  may be swingably supported. In this case, the swing plate  20  may be entirely formed by a magnetic material, or only a part, abutting a part, abutting on the support member  14 , of the swing plate  20  may be plated by a magnetic material. As shown in  FIG. 9 , the convex portion may be formed on the tip of the support member  14 , and the concave portion may be formed on the swing plate  20 . Alternatively, the concave portion may be formed on the tip of the support member  14 , and the convex portion may be formed on the swing plate  20 . 
         [0106]    Although the biasing mechanism  24  biases the swing plate  20  toward the support member  14  by magnetic force in the above description, the biasing mechanism  24  may bias the swing plate  20  toward the support member  14  by utilizing other kind of force. 
         [0107]    For example, as shown in  FIG. 10 , an insulator  30  is provided on the part, abutting on the support member  14 , of the connecting member  18 , a voltage applying mechanism  32  applies a voltage between the support member  14  and the connecting member  18 , thereby also enabling the biasing mechanism  24  utilizing electrostatic force to be implemented. In this case, the swing plate  20  is always biased toward the support member  14  by electrostatic force acting between the support member  14  and the connecting member  18 . As long as conduction between the support member  14  and the connecting member  18  can be prevented, the insulator  30  may be arranged in any manner. For example, the insulator  30  may be provided on a part, abutting on the connecting member  18 , of the support member  14 , or may be provided on both of the support member  14  and the connecting member  18 . 
         [0108]    Alternatively, as shown in  FIG. 11 , non-volatile liquid  40  is applied to abutting portions of the support member  14  and the connecting member  18 , thereby also enabling the biasing mechanism  24  to be implemented. In this case, when force of separating the swing plate  20  from the support member  14  acts, the swing plate  20  is biased toward the support member  14  by surface tension of the non-volatile liquid  40 , thereby enabling the swing plate  20  to be prevented from coming off the support member  14 . In a case of the configuration shown in  FIG. 11 , portions, applied with the non-volatile liquid  40 , of the support member  14  and/or the connecting member  18  may be subjected to lyophilic surface treatment. Particularly, in a case where the non-volatile liquid  40  is oil, the portions, applied with the non-volatile liquid  40 , of the support member  14  and/or the connecting member  18  may be subjected to lipophilic surface treatment. As the non-volatile liquid  40 , for example, silicon oil or grease may be used. 
         [0109]    Alternatively, as shown in  FIG. 12 , the abutting portions of the support member  14  and the connecting member  18  are bonded together by a soft adhesive  50 , thereby also enabling the biasing mechanism  24  to be implemented. In this case, when the force of separating the swing plate  20  from the support member  14  acts, the swing plate  20  is biased toward the support member  14  by restoring force of the soft adhesive  50 , thereby enabling the swing plate  20  to be prevented from coming off the support member  14 . As the soft adhesive  50 , for example, an epoxy adhesive or silicon rubber may be used. 
         [0110]    Alternatively, as shown in  FIG. 13 , the swing plate  20  and the substrate  12  are connected to each other by using elastic members  60  having elasticity in a direction orthogonal to the swing plate  20  (vertical direction in  FIG. 13 ), thereby also enabling the biasing mechanism  24  to be implemented. In an example shown in  FIG. 13 , the elastic members  60  connect between fixed members  62  fixed to the substrate  12 , and the peripheral edge of the swing plate  20 . In this case, when the force of separating the swing plate  20  from the support member  14  acts, the swing plate  20  is biased toward the support member  14  by restoring force of the elastic members  60 , thereby enabling the swing plate  20  to be prevented from coming off the support member  14 . 
         [0111]      FIG. 14  and  FIG. 15  each show a configuration where the swing plate  20  is connected to the substrate  12  by using an intermediate support plate  70 , and two pairs of elastic members  72 ,  74 . As shown in  FIG. 14 , the elastic members  72 ,  74  may be, for example, meander beams. In this case, corners of bending portions are rounded, thereby enabling durability of the elastic members  72 ,  74  to be improved. The elastic members  72  connect the peripheral edge of the swing plate  20  to the intermediate support plate  70 . The elastic members  74  connect between the intermediate support plate  70  and fixed members  76  fixed to the substrate  12 . With such a configuration, when the force of separating the swing plate  20  from the support member  14  acts, the swing plate  20  is biased toward the support member  14  by restoring force of the elastic members  72 ,  74 , thereby enabling the swing plate  20  to be prevented from coming off the support member  14 . 
         [0112]    Although the drive mechanism  22  applies torque to the swing plate  20  by utilizing electrostatic force in the above description, the drive mechanism  22  may apply torque to the swing plate  20  by utilizing other kind of force. 
         [0113]    For example, as shown in  FIG. 16 , electromagnets  80   a ,  80   b  may be arranged on the substrate  12 , electromagnets  82   a ,  82   b  may be arranged on the swing plate  20 , and torque is applied to the swing plate  20  by controlling ON/OFF of the respective electromagnets. 
         [0114]    Alternatively, as shown in  FIG. 17 , an electrical wire  90  along the peripheral edge of the swing plate  20  may be provided inside the swing plate  20 , a magnet  92  may generate a magnetic field in a direction along the swing plate  20 , and torque may be applied to the swing plate  20  by utilizing Lorentz force acting on the electrical wire  90  when a current source  94  flows a current on the electrical wire  90 . When the drive mechanism  22  is configured as in  FIG. 17 , the biasing mechanism  24  is configured by the elastic members  60 ,  72 ,  74  as in  FIG. 13 ,  FIG. 14  and  FIG. 15 , a current supply path to the electrical wire  90  inside the swing plate  20  may be also formed inside the elastic members  60 ,  72 ,  74 . 
         [0115]    Hereinafter, a deflector  100  according to another embodiment will be described.  FIG. 18  shows the deflector  100  of this embodiment. The deflector  100  mainly includes a substrate  102 , a connecting member  104 , a support member  106 , a swing plate  108 , a drive mechanism  110 , and a biasing mechanism  112 . A reflective film  108   a  reflecting incident light is formed on an upper surface of the swing plate  108 . The deflector  100  swings the swing plate  108  with respect to the substrate  102 , thereby changing a reflection angle of the incident light by the reflective film  108   a.    
         [0116]    The connecting member  104  is fixed to a center of an upper surface of the substrate  102 . An upper end of the support member  106  is fixed to a center of a lower surface of the swing plate  108 . The swing plate  108  is swingably placed in a state in which a lower end of the support member  106  abuts on the connecting member  104 . 
         [0117]    The drive mechanism  110  applies torque about a swing axis to the swing plate  108 , thereby swinging the swing plate  108 . A peripheral edge of the swing plate  108  abuts on the substrate  102 , thereby defining a swing angle in swinging of the swing plate  108 . In this embodiment, electrodes  114  formed on the substrate  102 , and an electrode (not shown) formed on the swing plate  108  configure the drive mechanism  110 . A voltage is applied between the electrodes  114  formed on the substrate  102 , and the electrode formed on the swing plate  108 , so that electrostatic force acts between both the electrodes, and torque about the swing axis is applied to the swing plate  108 . 
         [0118]    The biasing mechanism  112  biases the support member  106  toward the substrate  102 , at least when force of separating the support member  106  from the substrate  102  acts. The biasing mechanism  112  can prevent the support member  106  from coming off the connecting member  104 . 
         [0119]    In the deflector  100  of this embodiment, the support member  106  is biased toward the substrate  102  by using magnetic force, thereby implementing the biasing mechanism  112 . As shown in  FIG. 19 , the support member  106  is formed by a magnetic material such as Ni. The connecting member  104  is formed by a magnet such as an electromagnet and a permanent magnet. The connecting member  104  is fixed to the substrate  102  by using, for example, an adhesive. A polar direction of the magnetic force of the connecting member  104  is arranged in a direction orthogonal to the substrate  102 . A convex portion is formed on a tip of the support member  106 , and a concave portion is formed on a center of the connecting member  104 . The convex portion on the tip of the support member  106  abuts on the concave portion of the connecting member  104 , so that the swing plate  108  is swingably supported by the substrate  102 . With such a configuration, the support member  106  is always biased toward the substrate  102  by magnetic force acting between the support member  106  and the connecting member  104 , and the support member  106  can be prevented from coming off the connecting member  104 . 
         [0120]    As long as the convex portion abuts on the concave portion of the connecting member  104 , and can swingably support the swing plate  108 , any shape of the convex portion on the tip of the support member  106  may be employed. For example, the convex portion may be formed in a triangular pyramid, or a hemisphere. As long as the concave portion of the connecting member  104  abuts on the convex portion on the tip of the support member  106 , and the swing plate  108  can be swingably supported, the concave portion of the connecting member  104  may be formed in any shape. 
         [0121]    The support member  106  may be entirely formed by a magnetic material such as Ni as described above, or the support member  106  may be formed by a non-magnetic material such as Al and only the tip part may be plated with a magnetic material such as Ni. As described above, the polar direction of the magnetic force of the connecting member  104  may be arranged in the direction orthogonal to the substrate  102 , or may be arranged in a direction along substrate  102 . 
         [0122]    As shown in  FIG. 20 , the convex portion may be formed on the connecting member  104 , and the concave portion may be formed on the tip of the support member  106 . Also in this case, the support member  106  may be entirely formed by a magnetic material, or the support member  106  may be entirely formed by a non-magnetic material and only the tip part may be plated by a magnetic material. 
         [0123]    As shown in  FIG. 21 , the support member  106  may be formed by a magnet such as an electromagnet and a permanent magnet, and the connecting member  104  may be formed by a magnetic material such as Ni. In this case, the connecting member  104  may be entirely formed by a magnetic material, or only a part, abutting on the support member  106 , of the connecting member  104  may be plated by a magnetic material. In this case, the convex portion may be formed on the tip of the support member  106 , and the concave portion may be formed on the connecting member  104 . In this case, a magnet such as an electromagnet and a permanent magnet may be formed on the swing plate  108 , in addition to the support member  106  abutting on the connecting member  104 . 
         [0124]    Although the biasing mechanism  112  biases the support member  106  toward the substrate  102  by magnetic force in the above description, the biasing mechanism  112  may bias the support member  106  toward the substrate  102  by utilizing other kind of force. 
         [0125]    For example, as shown in  FIG. 22 , an insulator  120  is provided on the part, abutting on the support member  106 , of the connecting member  104 , a voltage applying mechanism  122  applies a voltage between the connecting member  104  and the support member  106 , thereby also enabling the biasing mechanism  112  utilizing electrostatic force to be implemented. In this case, the support member  106  is always biased toward the substrate  102  by electrostatic force acting between the connecting member  104  and the support member  106 . As long as conduction between the connecting member  104  and the support member  106  can be prevented, the insulator  120  may be arranged in any manner. For example, the insulator  120  may be provided on a part, abutting on the connecting member  104 , of the support member  106 , or may be provided on both of the connecting member  104  and the support member  106 . 
         [0126]    Alternatively, as shown in  FIG. 23 , non-volatile liquid  130  is applied to abutting portions of the connecting member  104  and the support member  106 , thereby also enabling the biasing mechanism  112  to be implemented. In this case, when force of separating the support member  106  from the substrate  102  acts, the support member  106  is biased toward the substrate  102  by surface tension of the non-volatile liquid  130 , thereby enabling the support member  106  to be prevented from coming off the connecting member  104 . In a case of the configuration shown in  FIG. 23 , portions, applied with the non-volatile liquid  130 , of the connecting member  104  and/or the support member  106  may be subjected to lyophilic surface treatment. Particularly, in a case where the non-volatile liquid  130  is oil, the portions, applied with the non-volatile liquid  130 , of the connecting member  104  and/or support member  106  may be subjected to lipophilic surface treatment. As the non-volatile liquid  130 , for example, silicon oil or grease may be used. 
         [0127]    Alternatively, as shown in  FIG. 24 , the abutting portions of the connecting member  104  and the support member  106  are bonded together by a soft adhesive  140 , thereby also enabling the biasing mechanism  112  to be implemented. In this case, when the force of separating the support member  106  from the substrate  102  acts, the support member  106  is biased toward the substrate  102  by restoring force of the soft adhesive  140 , thereby enabling the support member  106  to be prevented from coming off the connecting member  104 . As the soft adhesive  140 , for example, an epoxy adhesive or silicon rubber may be used. 
         [0128]    Alternatively, as shown in  FIG. 25 , the swing plate  108  and the substrate  102  are connected to each other by using elastic members  150  having elasticity in a direction orthogonal to the swing plate  108  (vertical direction in  FIG. 25 ), thereby also enabling the biasing mechanism  112  to be implemented. In an example shown in  FIG. 25 , the elastic members  150  connect between fixed members  152  fixed to the substrate  102 , and the peripheral edge of the swing plate  108 . In this case, when the force of separating the support member  106  from the substrate  102  acts, the support member  106  is biased toward the substrate  102  by restoring force of the elastic members  150 , thereby enabling the support member  106  to be prevented from coming off the connecting member  104 . 
         [0129]    Although the drive mechanism  110  applies torque to the swing plate  108  by utilizing electrostatic force in the above description, the drive mechanism  110  may apply torque to the swing plate  108  by utilizing magnetic force in a manner similar to that described in  FIG. 16 , or may apply torque to the swing plate  108  by utilizing Lorentz force in a manner similar to that described in  FIG. 17 . 
         [0130]      FIG. 26  shows a deflector  210  of another embodiment. The deflector  210  includes a substrate portion  212 , a support column  214 , a movable plate  216 , and a drive mechanism  218 . The substrate portion  212  is formed, for example, in a silicon wafer. 
         [0131]    As shown in  FIG. 27  or  FIG. 28 , the support column  214  has a lower end fixed to an upper surface of the substrate portion  212 . An upper end of the support column  214  is rounded, and placed with the movable plate  216  thereon. As shown in  FIG. 26 , the movable plate  216  is formed in an oval flat plate shape. Hereinafter, a major axis direction of an oval of the movable plate  216  is defined as a pitch axis, a minor axis direction of the oval of the movable plate  216  is defined as a roll axis, and a direction orthogonal to the movable plate  216  is defined as a yaw axis. The movable plate  216  is formed, for example, from silicon. A reflective film  216   a  reflecting incident light is formed on an upper surface of the movable plate  216 . The reflective film  216   a  is an evaporated film such as Al, for example. 
         [0132]    The support column  214  is formed by a magnetic material. A permanent magnet  216   b  is provided on a part, abutting on the support column  214 , of the movable plate  216 . The permanent magnet  216   b  is arranged such that a polar direction of magnetic force is a direction orthogonal to the movable plate  216 . In  FIG. 27 , a north pole of the permanent magnet  216   b  is hatched, and a south pole thereof is filled with white. The movable plate  216  is attracted to the support column  214  by the magnetic force of the permanent magnet  216   b . The upper end of the support column  214  is rounded, and the movable plate  216  is swingable relative to the three axes. In other words, the movable plate  216  is supported at a support point provided on the upper end of the support column  214  so as to be swingable relative to the three axes of the pitch axis, the roll axis, and the yaw axis. The support point described herein means a point which the swing axis passes when the movable plate  216  swings. 
         [0133]    The drive mechanism  218  includes three electromagnets  220   a ,  220   b ,  220   c , positions of which are fixed with respect to the substrate portion  212 . The electromagnets  220   a ,  220   b ,  220   c  are arranges such that heights of centers thereof substantially coincide with a height of a center of the permanent magnet  216   b  of the movable plate  216 . The electromagnets  220   a ,  220   b ,  220   c  are arranged such that polar directions of magnetic force thereof are along a plane parallel to the substrate portion  212 , and have angles each different by 2π/3. Intensity of the magnetic force generated by the electromagnets  220   a ,  220   b ,  220   c  is adjustable independently, a direction of magnetic force obtained by superimposing the magnetic force of the electromagnets  220   a ,  220   b ,  220   c , which acts on the permanent magnet  216   b , is adjustable to an arbitrary direction. 
         [0134]    For example, when the drive mechanism  218  causes magnetic force in a direction Y (vertical direction in  FIG. 26 ) to act with respect to the permanent magnet  216   b  of the movable plate  216 , torque is applied to movable plate  216  so as to incline a polar direction of magnetic force of the permanent magnet  216   b  to the direction Y, and the movable plate  216  swings. Consequently, as shown in  FIG. 27 , one of ends in the minor axis direction of the movable plate  216  comes into contact with a surface of the substrate portion  212 . Unlike in this case, when the drive mechanism  218  causes magnetic force in a direction X (horizontal direction in  FIG. 26 ) to act, torque is applied to movable plate  216  so as to incline the polar direction of the magnetic force of the permanent magnet  216   b  in the direction X, and the movable plate  216  swings. Consequently, as shown in  FIG. 28 , one of ends in the major axis direction of the movable plate  216  comes into contact with the surface of the surface of the substrate portion  212 . When the drive mechanism  218  causes a direction of the magnetic force acting on the permanent magnet  216   b  to rotate in a counterclockwise direction with respect to the substrate portion  212 , the movable plate  216  rotates about the yaw axis such that a contact edge is brought into contact with the surface of the substrate portion  212 . 
         [0135]      FIG. 29  shows a relation between an azimuth angle θ of the contact point as viewed from the substrate portion  212 , and an elevation angle φ of a reflective surface of the movable plate  216 , in rotating the movable plate  216  about the yaw axis such that the contact edge is brought into contact with the surface of the substrate portion  212 . Here, the azimuth angle θ indicates a rotation angle from an X-axis, the elevation angle φ indicates an inclination angle with respect to an XY plane (i.e., surface of the substrate portion  212 ). The movable plate  216  has a shape such that a distance from the support point to the contact edge in a direction orthogonal to the yaw axis changes according to a phase angle α. Here, the phase angle α indicates a rotation angle from the pitch axis. Accordingly, the phase angle α of the contact point as viewed from the movable plate  216  also changes with change of the azimuth angle θ of the contact point as viewed from the substrate portion  212 , resulting in change of the elevation angle φ of the reflective surface of the movable plate  216 . A reflection angle of the deflector  210  is defined by the azimuth angle θ of the contact point as viewed from the substrate portion  212 , and the elevation angle φ of the reflective surface of the movable plate  216 . 
         [0136]    As shown in  FIG. 30 , in the deflector  210  of this embodiment, when the movable plate  216  rotates about the yaw axis once from a state  200   a  in which a reference point (e.g., one of ends in the major axis direction) of the movable plate  216  is in contact with the substrate portion  212 , and is brought into a state  200   b  in which the reference point is contact with the substrate portion  212  again, a phase of the movable plate  216  is shifted by a prescribed angle δ with respect to the substrate portion  212 . Reasons of this are as follows. 
         [0137]    As shown in  FIG. 31 , when the movable plate  216  rotates about the yaw axis such that the contact edge is brought into contact with the substrate portion  212 , the azimuth angle θ of the contact point as viewed from the substrate portion  212  is changed by a infinitesimal angle dθ, and the phase angle α of the contact point as viewed from the movable plate  216  is changed by a infinitesimal angle dα, assuming that no slip occurs between the movable plate  216  and the substrate portion  212 , the following formula holds from a geometric relation. 
         [0000]        Rdα=R  cos φ dθ 
 
         [0000]        d α=cos φ dθ 
 
         [0138]    Accordingly, assuming that an shift amount of an angle between the azimuth angle θ of the contact point as viewed from the substrate portion  212 , and the phase angle α of the contact point as viewed from the movable plate  216  is phase shifting δ, the following relation is satisfied. 
         [0000]        dδ=dθ−d α=(1−cos φ) dθ 
 
         [0139]    Accordingly, the phase shifting δ occurring during increase of the azimuth angle θ of the contact point as viewed from the substrate portion  212  by 2π is given by the following formula. 
         [0000]      δ=∫ 0   2π (1−cos φ) dθ 
 
         [0140]    Resulting from the above-described phase shifting δ between the azimuth angle θ and the phase angle α, a different elevation angle φ with respect to the same azimuth angle θ is implemented each time the movable plate  216  rotates once, as shown in  FIG. 29 . Consequently, the deflector  210  of this embodiment enables combination of an arbitrary azimuth angle θ and the elevation angle φ by repeatedly rotating the movable plate  216 . The deflector  210  of this embodiment enables scanning in two directions, i.e., a direction of longitude and a direction of latitude. 
         [0141]    As the shape as viewed on a plane orthogonal to the yaw axis of the movable plate  216 , various shapes other than the above-described oval may be employed. 
         [0142]    For example, as shown in  FIG. 32 , the movable plate  216  may be formed in a circle. In this case, a position of a center of the circle is arranged at a position offset from the support point. Also in this case, the movable plate  216  has a shape such that a distance R from the support point to the contact edge changes according to the phase angle α, thereby enabling scanning in two directions of the azimuth angle θ and the elevation angle φ. 
         [0143]    Alternatively, as shown in  FIG. 33 , the movable plate  216  may be formed in a polygon. Alternatively, as shown in  FIG. 34 , the movable plate  216  may be formed in a Reuleau polygonal shape. Alternatively, the movable plate  216  may be formed in a heart shape, a star shape, or the like. Also in this case, the movable plate  216  has a shape such that a distance from the support point to the contact edge changes according to the phase angle, thereby enabling scanning in the two directions of the azimuth angle θ and the elevation angle φ. 
         [0144]    Alternatively, a shape of the contact edge of the movable plate  216  may be determined such that the change of the elevation angle φ according to the azimuth angle θ becomes a desired pattern. For example, as shown in  FIG. 35 , the shape of the contact edge of the movable plate  216  may be determined such that the elevation angle φ changes in a triangular waveform. In this case, the contact edge of the movable plate  216  is formed in a shape satisfying the following. 
         [0000]    
       
         
           
             
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         [0145]    Here, L denotes a height from the surface of the substrate portion  212  to the support point, φ o  denotes a central value of the elevation angle, and φ op  denotes amplitude of the elevation angle. 
         [0146]    In a case where the elevation angle φ is changed in a triangular waveform shown in  FIG. 36 , the contact edge of the movable plate  216  is formed in the following shape. 
         [0000]    
       
         
           
             
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                       ( 
                       
                         
                           
                             4 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 α 
                                 - 
                                 π 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     3 
                      
                     π 
                   
                   2 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   5 
                    
                   π 
                 
                 4 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             4 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 
                                   
                                     3 
                                      
                                     π 
                                   
                                   2 
                                 
                                 - 
                                 α 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     5 
                      
                     π 
                   
                   4 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   7 
                    
                   π 
                 
                 4 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             4 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 α 
                                 - 
                                 
                                   2 
                                    
                                   π 
                                 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     7 
                      
                     π 
                   
                   4 
                 
               
               ≤ 
               α 
               &lt; 
               
                 2 
                  
                 π 
               
             
           
         
       
     
         [0147]    In a case where the elevation angle φ is changed in a triangular waveform shown in  FIG. 37 , the contact edge of the movable plate  216  is formed in the following shape. 
         [0000]    
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             φ 
                             op 
                           
                            
                           α 
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 0 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 6 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 
                                   π 
                                   3 
                                 
                                 - 
                                 α 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   π 
                   6 
                 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 2 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 α 
                                 - 
                                 
                                   
                                     2 
                                      
                                     π 
                                   
                                   3 
                                 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   π 
                   2 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   5 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 π 
                                 - 
                                 α 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     5 
                      
                     π 
                   
                   6 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   7 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 α 
                                 - 
                                 
                                   
                                     4 
                                      
                                     π 
                                   
                                   3 
                                 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     7 
                      
                     π 
                   
                   6 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   3 
                    
                   π 
                 
                 2 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 
                                   
                                     5 
                                      
                                     π 
                                   
                                   3 
                                 
                                 - 
                                 α 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     3 
                      
                     π 
                   
                   2 
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   11 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 
                   L 
                   
                     sin 
                      
                     
                       ( 
                       
                         
                           
                             6 
                             π 
                           
                            
                           
                             
                               φ 
                               op 
                             
                              
                             
                               ( 
                               
                                 α 
                                 - 
                                 
                                   2 
                                    
                                   π 
                                 
                               
                               ) 
                             
                           
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
                  
                 
                     
                 
                  
                 for 
                  
                 
                     
                 
                  
                 
                   
                     11 
                      
                     π 
                   
                   6 
                 
               
               ≤ 
               α 
               &lt; 
               
                 2 
                  
                 π 
               
             
           
         
       
     
         [0148]    Alternatively, as shown in  FIG. 38 , the shape of the contact edge of the movable plate  216  may be determined such that the elevation angle φ is changed in a sine wave. In this case, the contact edge of the movable plate  216  is formed in a shape satisfying the following. 
         [0000]    
       
         
           
             
               R 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               L 
               
                 sin 
                  
                 
                   ( 
                   
                     
                       
                         φ 
                         op 
                       
                        
                       sin 
                        
                       
                           
                       
                        
                       n 
                        
                       
                           
                       
                        
                       α 
                     
                     + 
                     
                       φ 
                       o 
                     
                   
                   ) 
                 
               
             
           
         
       
     
         [0149]    Here, n denotes the number of cycles. 
         [0150]    The support column  214  is fixed to the substrate portion  212 , the movable plate  216  is swingably supported on the upper end of the support column  214 . However, unlike in this case, as shown in  FIG. 39 , the support column  214  may be fixed to the movable plate  216 , and the support column  214  and the movable plate  216  may be swingably supported on the lower end of the support column  214  by the substrate portion  212 . In an example shown in  FIG. 39 , a support base  212   a  formed by a magnetic material is formed on the upper surface of the substrate portion  212 , and the lower end of the support column  214  formed by a permanent magnet is placed so as to be in contact with the support base  212   a . The lower end of the support column  214  is rounded, and hence the support column  214  and the movable plate  216  are supported at the support point located on the lower end of the support column  214  so as to be swingable relative to the three axes of the pitch axis, the roll axis, and the yaw axis. With such a configuration, the combination of an arbitrary azimuth angle θ and the elevation angle φ can be implemented by repeatedly rotating the movable plate  216 , and scanning in two directions of a direction of longitude and a direction of latitude is enabled. 
         [0151]    Although the drive mechanism  218  rotates and drives the movable plate  216  about the yaw axis such that the contact edge of the movable plate  216  is brought into contact with the surface of the substrate portion  212 , by utilizing magnetic force in the above-described embodiment, various configuration of the drive mechanism  218  other than the above may be used. For example, an electrode is formed inside the movable plate  216 , a plurality of electrodes covered with insulating films is arranged on the upper surface of the substrate portion  212  in a prescribed pattern, and a voltage is selectively applied between the electrode of the movable plate  216  and the electrodes of the substrate portion  212 , thereby enabling the drive mechanism  218  utilizing the electrostatic force to be implemented. In this case, when a voltage is applied between a specified electrode of the substrate portion  212  and the electrode of the movable plate  216 , torque is applied to the movable plate  216  such that an end of the movable plate  216  above the specified electrode approaches the specified electrode of the substrate portion  212  by electrostatic force, and the contact edge of the movable plate  216  comes into contact with the surface of the substrate portion  212 . The electrodes of the substrate portion  212 , which a voltage is applied between the electrode of the movable plate  216  and, are successively changed, so that the movable plate  216  can rotate about the yaw axis such that the contact edge of the movable plate  216  is brought into contact with the surface of the substrate portion  212 . 
         [0152]    In the above-described embodiment, the permanent magnet  216   b  is provided on the lower surface of the movable plate  216 , the support column  214  is formed by a magnetic material, and the upper end of the support column  214  is rounded, and the movable plate  216  is supported to be swingable relative to the three axes of the pitch axis, the roll axis, and the yaw axis. However, various supporting aspects of the movable plate  216  other than the above may be employed. For example, a protruding portion having a spherical tip may be provided on the lower surface of the movable plate  216 , an engagement portion slidably engaged with the protruding portion may be provided on the upper end of the support column  214 , and the movable plate  216  may be supported so as to be swingable relative to the relative to the three axes of the pitch axis, the roll axis, and the yaw axis by the engagement of the protruding portion and the engagement portion. 
         [0153]      FIG. 40  shows a deflector  310  of another embodiment. Hereinafter, configurations similar to those of the deflector  210  of the above-described embodiment are denoted with the same reference numerals, and detailed description thereof will be omitted. The deflector  310  includes a substrate portion  212 , a support column  214 , a movable portion  316 , and a drive mechanism  218 . 
         [0154]    As shown in  FIG. 41 , the movable portion  316  has a circular flat plate portion  318 , and a skirt portion  320  formed on a peripheral edge of the flat plate portion  318 . A reflective film  318   a  reflecting incident light is formed on an upper surface of the flat plate portion  318 . The reflective film  318   a  is an evaporated film such as Al. A permanent magnet  318   b  abutting on the support column  214  of the magnetic material is provided on a lower surface of the flat plate portion  318 . In this embodiment, directions parallel to the flat plate portion  318  is defined as a pitch axis and a roll axis, and a direction orthogonal to the flat plate portion  318  is defined as a yaw axis. 
         [0155]    The skirt portion  320  extends in the direction orthogonal to the flat plate portion  318 . When the movable portion  316  swings, a lower end of the skirt portion  320  comes into contact with the surface of the substrate portion  212  as a contact edge of the movable portion  316 . As shown in  FIG. 41 , a height of the skirt portion  320  changes according to a phase angle α. Accordingly, the movable portion  316  of this embodiment has a shape such that a distance from the support point to the contact changes according to the phase angle α. 
         [0156]    Also in the deflector  310  of this embodiment, phase shifting δ exists between an azimuth angle θ of a contact point as viewed from the substrate portion  212 , and the phase angle α of the contact point as viewed from the movable portion  316 , thereby implementing a different elevation angle φ with respect to the same azimuth angle θ each time the movable portion  316  rotates once. Consequently, the deflector  310  of this embodiment enables combination of an arbitrary azimuth angle θ and the elevation angle φ by repeatedly rotating the movable portion  316 , and enables scanning in two directions of a direction of longitude and a direction of latitude. 
         [0157]    As long as a height of the skirt portion  320  changes according to the phase angle α, various shapes may be employed as a shape of the skirt portion  320 . 
         [0158]    For example, in a case where the elevation angle φ is changed in a triangular waveform shown in  FIG. 35 , a shape of the movable portion  316  is determined such that a height t of the skirt portion  320  satisfies the following. 
         [0000]    
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   2 
                                   π 
                                 
                                  
                                 
                                   φ 
                                   op 
                                 
                                  
                                 α 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               2 
                               π 
                             
                              
                             
                               φ 
                               op 
                             
                              
                             α 
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   0 
                 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 2 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   2 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       π 
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               2 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   π 
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     π 
                     2 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   3 
                    
                   π 
                 
                 2 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   2 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       
                                         2 
                                          
                                         π 
                                       
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               2 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   
                                     2 
                                      
                                     π 
                                   
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       3 
                        
                       π 
                     
                     2 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 2 
                  
                 π 
               
             
           
         
       
     
         [0159]    Here, T denotes a thickness of the flat plate portion  318 , L denotes a height from the surface of the substrate portion  212  from the support point φ o  denotes a central value of the elevation angle, and φ op  denotes amplitude of the elevation angle. 
         [0160]    In a case where the elevation angle φ is changed in a triangular waveform shown in  FIG. 36 , the shape of the movable portion  316  is determined such that the height of the skirt portion  320  satisfies the following. 
         [0000]    
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   4 
                                   π 
                                 
                                  
                                 
                                   φ 
                                   op 
                                 
                                  
                                 α 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               4 
                               π 
                             
                              
                             
                               φ 
                               op 
                             
                              
                             α 
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   0 
                 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 4 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   4 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       
                                         π 
                                         2 
                                       
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               4 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   
                                     π 
                                     2 
                                   
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     π 
                     4 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   3 
                    
                   π 
                 
                 4 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   4 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       π 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               4 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   π 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       3 
                        
                       π 
                     
                     4 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   5 
                    
                   π 
                 
                 4 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   4 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       
                                         
                                           3 
                                            
                                           π 
                                         
                                         2 
                                       
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               4 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   
                                     
                                       3 
                                        
                                       π 
                                     
                                     2 
                                   
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       5 
                        
                       π 
                     
                     4 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   7 
                    
                   π 
                 
                 4 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   4 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       
                                         2 
                                          
                                         π 
                                       
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               4 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   
                                     2 
                                      
                                     π 
                                   
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       7 
                        
                       π 
                     
                     4 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 2 
                  
                 π 
               
             
           
         
       
     
         [0161]    In a case where the elevation angle φ is changed in a triangular waveform shown in  FIG. 37 , the shape of the movable portion  316  is determined such that the height t of the skirt portion  320  satisfies the following. 
         [0000]    
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   φ 
                                   op 
                                 
                                  
                                 α 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               φ 
                               op 
                             
                              
                             α 
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   0 
                 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 6 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       
                                         π 
                                         3 
                                       
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   
                                     π 
                                     3 
                                   
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     π 
                     6 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 π 
                 2 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       
                                         
                                           2 
                                            
                                           π 
                                         
                                         3 
                                       
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   
                                     
                                       2 
                                        
                                       π 
                                     
                                     3 
                                   
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     π 
                     2 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   5 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       π 
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   π 
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       5 
                        
                       π 
                     
                     6 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   7 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       
                                         
                                           4 
                                            
                                           π 
                                         
                                         3 
                                       
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   
                                     
                                       4 
                                        
                                       π 
                                     
                                     3 
                                   
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       7 
                        
                       π 
                     
                     6 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   3 
                    
                   π 
                 
                 2 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       
                                         
                                           5 
                                            
                                           π 
                                         
                                         3 
                                       
                                       - 
                                       α 
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   
                                     
                                       5 
                                        
                                       π 
                                     
                                     3 
                                   
                                   - 
                                   α 
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       3 
                        
                       π 
                     
                     2 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 
                   11 
                    
                   π 
                 
                 6 
               
             
           
         
       
       
         
           
             
               t 
                
               
                 ( 
                 α 
                 ) 
               
             
             = 
             
               
                 T 
                 + 
                 
                   
                     
                       L 
                       - 
                       
                         R 
                          
                         
                             
                         
                          
                         
                           sin 
                            
                           
                             ( 
                             
                               
                                 
                                   6 
                                   π 
                                 
                                  
                                 
                                   
                                     φ 
                                     op 
                                   
                                    
                                   
                                     ( 
                                     
                                       α 
                                       - 
                                       
                                         2 
                                          
                                         π 
                                       
                                     
                                     ) 
                                   
                                 
                               
                               + 
                               
                                 φ 
                                 o 
                               
                             
                             ) 
                           
                         
                       
                     
                     
                       cos 
                        
                       
                         ( 
                         
                           
                             
                               6 
                               π 
                             
                              
                             
                               
                                 φ 
                                 op 
                               
                                
                               
                                 ( 
                                 
                                   α 
                                   - 
                                   
                                     2 
                                      
                                     π 
                                   
                                 
                                 ) 
                               
                             
                           
                           + 
                           
                             φ 
                             o 
                           
                         
                         ) 
                       
                     
                   
                    
                   
                       
                   
                    
                   for 
                    
                   
                     
                         
                     
                      
                     
                         
                     
                   
                    
                   
                     
                       11 
                        
                       π 
                     
                     6 
                   
                 
               
               ≤ 
               α 
               &lt; 
               
                 2 
                  
                 π 
               
             
           
         
       
     
         [0162]    Alternatively, as shown in  FIG. 38 , the shape of the movable portion  316  may be determined such that the elevation angle φ is changed in a sine wave. In this case, the shape of the movable portion  316  is determined such that the height t of the skirt portion  320  satisfies the following. 
         [0000]    
       
         
           
             
               
                 t 
                  
                 
                   ( 
                   α 
                   ) 
                 
               
               = 
               
                 T 
                 + 
                 
                   
                     L 
                     - 
                     
                       R 
                        
                       
                           
                       
                        
                       
                         sin 
                          
                         
                           ( 
                           
                             
                               
                                 φ 
                                 op 
                               
                                
                               sin 
                                
                               
                                   
                               
                                
                               n 
                                
                               
                                   
                               
                                
                               α 
                             
                             + 
                             
                               φ 
                               o 
                             
                           
                           ) 
                         
                       
                     
                   
                   
                     cos 
                      
                     
                       ( 
                       
                         
                           
                             φ 
                             op 
                           
                            
                           sin 
                            
                           
                               
                           
                            
                           n 
                            
                           
                               
                           
                            
                           α 
                         
                         + 
                         
                           φ 
                           o 
                         
                       
                       ) 
                     
                   
                 
               
             
              
             
                 
             
           
         
       
     
         [0163]    Here, n denotes the number of cycles. 
         [0164]    In this embodiment, as the shape of the flat plate portion  318 , various shapes may be employed. For example, the shape of the flat plate portion  318  may be an oval similar to that of the movable plate  216  of  FIG. 26 . 
         [0165]      FIG. 42  and  FIG. 43  each show a deflector  410  of another embodiment. The deflector  410  includes a substrate portion  412 , a support column  414 , a swing plate  416 , a drive mechanism  418 , and an adjustment mechanism  420 . The substrate portion  412  is formed, for example, in a silicon wafer. The deflector  410  is a MEMS device manufactured by utilizing a semiconductor manufacturing process. 
         [0166]    As shown in  FIG. 43 , the adjustment mechanism  420  is fixed to an upper surface of the substrate portion  412 . The support column  414  extends upward from the adjustment mechanism  420 . An upper end of the support column  414  is rounded, and is placed with the swing plate  416  thereon. The swing plate  416  is formed in a disc shape. The swing plate  416  is formed from silicon covered with an insulating film therearound and provided with conductivity. A reflective film  416   a  reflecting incident light is formed on an upper surface of the swing plate  416 . The reflective film  416   a  is an evaporated film such as Al, for example. 
         [0167]    The upper end of the support column  414  is plated with a plating  414   a  of a magnetic material. A permanent magnet  416   b  is provided on a part, abutting on the support column  414 , of the swing plate  416 . The permanent magnet  416   b  is arranged such that a polar direction of magnetic force is a direction orthogonal to the swing plate  416 . In  FIG. 43 , a north pole of the permanent magnet  416   b  is hatched, and a south pole thereof is filled with white. The swing plate  416  is attracted to the support column  414  by the magnetic force of the permanent magnet  416   b . The upper end of the support column  414  is rounded, and the swing plate  416  is swingable relative to three axes. In other words, the swing plate  416  is supported at a support point provided on the upper end of the support column  414  so as to be swingable relative to at least the two axes parallel to the substrate portion  412 . The support point described herein means a point which the swing axis passes when the swing plate  416  swings. 
         [0168]    The drive mechanism  418  includes a plurality of electrodes  422  formed on a surface of the substrate portion  412 . The electrodes  422  are arranged at such a position as to overlap the end of the swing plate  416  in plan view of the deflector  410  at regular intervals at each prescribed azimuth angle. Each of the electrodes  422  is formed from a conductive material (e.g., metal or silicon provided with conductivity) covered with an insulating film therearound. Each electrode  422  can selectively apply a voltage between the swing plate  416  and the electrode  422 . 
         [0169]    For example, when a voltage is applied between an electrode  422   a  located in a direction X (rightward in  FIG. 42 ) as viewed from the support point when viewing the deflector  410  in plan view from above, and the swing plate  416 , torque is applied to the swing plate  416  such that the swing plate  416  is inclined in the direction X by electrostatic attraction between the electrode  422   a  and the swing plate  416 . Consequently, as shown in  FIG. 43 , the swing plate  416  swings, and the end in the direction X of the swing plate  416  abuts on the electrode  422   a . Unlike in this case, when a voltage is applied between an electrode  422   b  located in a direction Y (leftward in  FIG. 42 ) as viewed from the support point when viewing the deflector  410  in plan view from above, and the swing plate  416 , torque is applied to the swing plate  416  such that the swing plate  416  is inclined in the direction Y by electrostatic attraction between the electrode  422   b  and the swing plate  416 . Consequently, the swing plate  416  swings, the end in the direction Y of the swing plate  416  abuts on the electrode  422   b . The electrodes  422 , which a voltage is applied between the swing plate  416  and, are successively changed in a clockwise direction or a counterclockwise direction, so that the swing plate  416  can continuously change the azimuth angle on a portion abutting on the substrate portion  412 . In the deflector  410  of this embodiment, the electrodes  422 , which a voltage is applied between the swing plate  416  and, are selected, so that the azimuth angle of the reflective film  416   a  can be arbitrarily adjusted. In the deflector  410  of this embodiment, a peripheral edge of the swing plate  416  corresponds to the contact edge, and the surface of the substrate portion  412  corresponds to the contact surface. 
         [0170]    The adjustment mechanism  420  includes a linear actuator, and can cause the support column  414  to advance and retreat in a vertical direction in  FIG. 43 . In other words, the adjustment mechanism  420  can adjust a protrusion amount of the support column  414  from the substrate portion  412 . The adjustment mechanism  420  adjusts the protrusion amount of the support column  414 , so that an elevation angle of the reflective film  416   a , at which the swing plate  416  swings and the end of the swing plate  416  abuts on the substrate portion  412 , can be adjusted. 
         [0171]    As described above, according to the deflector  410  of this embodiment, the azimuth angle and the elevation angle of the reflective film  416   a  can be arbitrarily adjusted. Scanning in the direction of latitude and the direction of longitude is enabled. 
         [0172]    Although the drive mechanism  418  brings the contact edge of the swing plate  416  into contact with the surface of the substrate portion  412  by utilizing electrostatic force in the above-described embodiment, various aspects of the drive mechanism  418  other than the above may be used. For example, a plurality of electromagnets arranged outside may act on a magnetic field in a direction parallel to the substrate portion  412  with respect to the permanent magnet  416   b  of the swing plate  416 , and the change in a direction of the magnetic field may cause the end of the swing plate  416  to abut on the substrate portion  412  at a desired azimuth angle. 
         [0173]    Although the permanent magnet  416   b  is provided on a lower surface of the swing plate  416 , the upper end of the support column  414  is rounded, and the support column  414  is plated with the plating  414   a  of the magnetic material, so that the swing plate  416  is supported so as to be swingable relative to at least the two axes parallel to the substrate portion  412  in the above-described embodiment, various supporting aspects of the swing plate  416  other than the above may be employed. For example, the swing plate  416  and the support column  414  may be formed from respective conductive materials, an insulator may be interposed between abutting portions of the swing plate  416  and the support column  414 , and a voltage may be applied between the swing plate  416  and the support column  414 , so that the swing plate  416  is attracted to the support column  414  by electrostatic force. Alternatively, non-volatile liquid may be applied to the abutting parts of the swing plate  416  and the support column  414 , so that the swing plate  416  is attracted to the support column  414  by surface tension of the non-volatile liquid. Alternatively, the abutting parts of the swing plate  416  and the support column  414  may be bonded together with a soft adhesive. With such a configuration, the swing plate  416  is supported with respect to the support column  414  so as to be swingable relative to at least the two axes parallel to the substrate portion  412 . 
         [0174]    Alternatively, as shown in  FIG. 44  and  FIG. 45 , a connecting member  416   c  may be formed on the lower surface of the swing plate  416 , and the upper end of the support column  414  and a lower end of the connecting member  416   c  may be connected with a biaxial joint  424 .  FIG. 44  and  FIG. 45  each show a case of using a cardan joint using a cross-shaped connecting member  424   a  as the biaxial joint  424 . With such a configuration, the swing plate  416  is supported with respect to the support column  414  so as to be swingable relative to at least the two axes parallel to the substrate portion  412 . Alternatively, as shown in  FIG. 46 , bending rigidity in the direction X and the direction Y of the support column  414  may be made lower, and the upper end of the support column  414  may be directly fixed to the swing plate  416 . Since the deflector is configured such that electrostatic attraction, magnetic attraction, or the like acts between the end of the swing plate  416  and the substrate portion  412 , the swing plate  416  is attracted to and is in contact with the substrate portion  412 , and the support column  414  is curved by this force. A protrusion amount of the support column  414  from the substrate portion  412  is relatively changed and adjusted, so that an angle (inclination) of the swing plate  416  formed by the substrate portion  412  can be changed. In this case, when torque is applied to the swing plate  416 , the support column  414  warps, and the swing plate  416  swings. With such a configuration, the swing plate  416  is supported with respect to the support column  414  so as to be swingable relative to at least the two axes parallel to the substrate portion  412 . 
         [0175]    The shape of the swing plate  416  is not limited to a disc shape, and various shapes may be employed. For example, the swing plate  416  may be formed in an oval or a polygon. 
         [0176]    Various aspects of the adjustment mechanism  420  may be used. For example, as shown in  FIG. 47 , the adjustment mechanism  420  adjusting the protrusion amount of the support column  414  can be implemented by using an electromagnetic linear actuator  432  including solenoids  426 , a spring  428 , and an armature  430 . Alternatively, as shown in  FIG. 48 , the adjustment mechanism  420  adjusting the protrusion amount of the support column  414  can be implemented by using a linear actuator  448  including a motor  440 , guides  442 , an external thread  444 , and an internal thread  446 . Alternatively, the adjustment mechanism  420  adjusting the protrusion amount of the support column  414  can be implemented by utilizing various linear actuators such as an electrostatic linear actuator, a gas-operated linear actuator, and a hydraulic linear actuator. 
         [0177]      FIG. 49  shows a deflector  500  of another embodiment. The deflector  500  includes a substrate portion  502 , a support column  504 , a swing plate  506 , a drive mechanism  508 , and an adjustment mechanism  510 . The substrate portion  502  is formed, for example, in a silicon wafer. The deflector  500  is a MEMS device manufactured by utilizing a semiconductor manufacturing process. 
         [0178]    The adjustment mechanism  510  includes an adjustment plate  512  and a rotation mechanism  514 . The adjustment plate  512  is placed on an upper surface of the substrate portion  502  so as to be relatively rotatable with respect to a direction orthogonal to the substrate portion  502 . A through hole  512   a  through which the support column  504  passes is formed on a center of the adjustment plate  512 . The support column  504  has a lower end fixed to the substrate portion  502 . An upper end of the support column  504  is rounded, and is placed with the swing plate  506  thereon. The swing plate  506  is formed in a disc shape. The swing plate  506  is formed from silicon covered with an insulating film therearound and provided with conductivity. A reflective film  506   a  reflecting incident light is formed on an upper surface of the swing plate  506 . The reflective film  506   a  is an evaporated film such as Al, for example. 
         [0179]    The upper end of the support column  504  is plated with a plating  504   a  of a magnetic material. A permanent magnet  506   b  is provided on a part, abutting on the support column  504 , of the swing plate  506 . The permanent magnet  506   b  is arranged such that a polar direction of magnetic force is a direction orthogonal to the swing plate  506 . The swing plate  506  is attracted to the support column  504  by the magnetic force of the permanent magnet  506   b . The upper end of the support column  504  is rounded, and the swing plate  506  is swingable relative to three axes. In other words, the swing plate  506  is supported at a support point provided on the upper end of the support column  504  so as to be swingable relative to at least the two axes parallel to the substrate portion  502 . 
         [0180]    The drive mechanism  508  includes a plurality of electrodes  513  arranged on a surface of the substrate portion  502 . The electrodes  513  are arranged, at regular intervals at each prescribed azimuth angle, at such a position as to overlap the end of the swing plate  506  in plan view of the deflector  500 . Each of the electrodes  513  is formed from a conductive material (e.g., metal or silicon provided with conductivity) covered with an insulating film therearound. Each electrode  513  can selectively apply a voltage between the swing plate  506  and the electrode  513 . When a voltage is applied between a specified electrode  513  and the swing plate  506 , torque is applied to the swing plate  506  by electrostatic attraction between the electrodes  513  and the swing plate  506 . Consequently, the swing plate  506  swings, and the end of the swing plate  506  abuts on a surface of the adjustment plate  512 . Also in the deflector  500  of this embodiment, the electrodes  513 , which a voltage is applied between the swing plate  506  and, are selected, so that the azimuth angle of the reflective film  506   a  can be arbitrarily adjusted, similarly to the deflector  410  of the above-described embodiment. In the deflector  500  of this embodiment, a peripheral edge of the swing plate  506  corresponds to the contact edge, the adjustment plate  512  corresponds to the connecting member, and the surface of the adjustment plate  512  corresponds to the contact surface. 
         [0181]    The adjustment plate  512  is formed such that a height in a circumferential direction is uneven. Accordingly, the rotation mechanism  514  rotates the adjustment plate  512 , so that the adjustment mechanism  510  increases and reduces the height of the adjustment plate  512  at an arbitrary azimuth angle. In other words, the adjustment mechanism  510  can adjust a protrusion amount, from the substrate portion  502 , of the contact surface of the adjustment plate  512 . The adjustment mechanism  510  adjusts the protrusion amount of the contact surface of the adjustment plate  512 , so that an elevation angle of the reflective film  506   a , at which the swing plate  506  swings and the end of the swing plate  506  abuts on the adjustment plate  512 , can be adjusted. 
         [0182]    As described above, according to the deflector  500  of this embodiment, the azimuth angle and the elevation angle of the reflective film  506   a  can be arbitrarily adjusted. Scanning in the direction of latitude and the direction of longitude is enabled. 
         [0183]    As the configuration of adjusting the protrusion amount of the contact member, various configurations other than the above may be employed. For example, as shown in  FIG. 50 , an extension plate  520  made of a piezoelectric element, and an adjustment plate  522  formed so as to have an even height in a circumferential direction may be successively stacked on the upper surface of the substrate portion  502 , a thickness of the extension plate  520  may be adjusted, thereby enabling adjustment of a protrusion amount, from the substrate portion  502 , of a contact surface of an adjustment plate  522 . The protrusion amount of the adjustment plate  522  from the substrate portion  502  can be also adjusted by raising and lowering the extension plate  520  with electromagnetic drive or mechanical drive from outside other than piezoelectric actuation. In this case, the extension plate  520  may be made from a magnetic material in a case of the electromagnetic drive, and from an insulating material or a rigid material which is subjected to insulation treatment in a case of the mechanical drive, other than the piezoelectric material. Alternatively, as shown in  FIG. 51  and  FIG. 52 , contact columns  516  having upper surfaces formed with contact surfaces may be arranged on the upper surface of the substrate portion  502  at equal intervals at each prescribed azimuth angle, and protrusion amounts of the contact columns  516  with respect to the substrate portion  502  may be increased and reduced by actuators  516   a  provided corresponding to the respective contact columns  516 . In this case, electrodes  513  can be formed inside the contact columns  516 . 
         [0184]    Representative and non-limiting specific examples of the present invention are described herein with referring to the drawings. The detailed description merely intends to illustrate the details to a person skilled in the art for carrying out the preferred examples of the present invention, while it does not intend to limit the scope of the present invention. Additional features and teachings may be used separately or in conjunction with other features or teachings in order to provide a further improved deflector. 
         [0185]    Combinations of the features and steps disclosed above in the detailed description are not requisite for carrying out the present invention in its broadest meaning, but are particularly described merely for illustrating representative specific examples of the present invention. Various features of the above-described representative specific examples as well as various features of those described in independent and dependent claims are not the ones which have to be combined as the specific examples or in the same order as described herein in order to provide additional and useful modes of the present invention. 
         [0186]    All features described in the present application and/or claims intend to be disclosed, individually and independently each other, as limitations for specific items described in the disclosure and claims at the time of filing the present application, separately from a structure of the features described in examples and/or claims. Descriptions on all numerical ranges and groups or sets intend to disclose intermediate aspects thereof as limitations for specific items described in the disclosure and claim at the time of filing the present application. 
         [0187]    An embodiment of the present invention is described in detail above, but this is merely an example of the present invention, and does not limit the claims. The techniques described in the claims include various alterations and modifications of the embodiment described above as an example. The technical elements described in the present application and drawings exhibit technical usefulness either independently or in various combinations, and are not limited to the combinations described in the claims at the time of filing. Further, the techniques cited in the present application and drawings achieve a plurality of objects simultaneously, and technical usefulness is attained simply by achieving one of these objects.
The present application discloses a deflector including a substrate portion, a movable portion, a reflective portion, a support portion, and a moving mechanism. The movable portion is supported by a first end of the support portion. A second end of the support portion is supported by the substrate portion. An end of the movable portion is capable of coming into contact with the substrate portion. The reflective portion is formed on the movable portion. The moving mechanism is capable of driving the movable portion so as to bring the movable portion into at least any one of a first state, a second state, a third state, and a fourth state.