Controllable patterning and CVD growth of isolated carbon nanotubes with direct parallel writing of catalyst using Dip Pen Nanolithography
We report a process to fabricate carbon nanotubes (CNT) by chemical vapor deposition at predetermined location. This process was enabled by patterning catalyst nanoparticles directly on silicon substrates with nanometer-scale precision using Dip Pen Nanolithography(R) (DPN(R)). A multi-pen writing method was employed to increase the patterning rate. The development of new molecular inks for the deposition of the precursor catalyst resulted in a high yield of isolated carbon nanotubes, ideal for subsequent device fabrication. Here, we demonstrate the advantages of the new method for producing high quality isolated CNT in scalable array geometries.