SPUTTERING SOURCE
A sputtering source comprises two facing plate shaped targets (5, 7) and a magnet arrangement (185,187) along each of the targets. An open coating outlet area (12) from the reaction space between the targets is limited by facing rims (9, 10) of the two plate shaped targets. Catcher plates (207, 205) along each of the rims respectively project in a direction from the rims towards each other into the open coating outlet area (12), thereby restricting the open coating outlet area (12) as limited by the mutually facing rims (9,10) of the two plate shaped targets.