The Poisoning Mechanism Study of ITO Target
In order to better understand the ITO target poisoning mechanism,this paper introduces the technology of magnetron sputtering thin film preparation principle,reviews the poisoning research present situation of the ITO target in the sputtering process,analyzed the possible causes effecting ITO target poisoning phenomenon,introduces in detail the present 3 kinds of solution ITO target poisoning phenomenon method process for the preparation of ITO target:different effects,the best Sn dopant and other elements of the dopant and the influence of the sputtering process,points out their remission ITO target poisoning phenomenon principle,and looks to the future to solve our country ITO toxicity problem of targets the development direction,which provides certain reference function to our country ITO target development.