SUBSTRATE CARRIER, AND SPUTTER DEPOSITION APPARATUS AND METHOD USING THE SAME
A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a non-conductive carrier body (102) having a first end (111) and an opposing second end (112); an electrically insulated first guiding device (120) provided at the first end (111) of the ceramic carrier body (102); and an electrically insulated second guiding device (130) provided at the second end (112) of the ceramic carrier body (102).