DEVICE FOR MEASURING ABERRATIONS IN AN EYE-TYPE SYSTEM
The invention relates to a device for measuring aberrations in an eye-type system comprising, in particular, an illumination path (VE) with an illumination diaphragm (APT) and a test path (VA), imaging means (L1) and means of positioning the eye (VI) in relation to said imaging means. The inventive device also comprises a stray reflection filtration element (FLT), which is centred on the measurement axis (z) of the imaging means, and means for the optical conjugation (L2, L3) of the pupil of the eye with the plane of the illumination diaphragm and the test plane. According to the invention, the illumination beam path converges at the centre of the filtration element (FLT). The filtration element, the illumination path, the test path and the conjugation means are all interdependent and positioned on a platform (PTF1) that can move in relation to the imaging means (L1) along axis z. The illumination diaphragm is off-centre in relation to the measurement axis (z) such that the stray light flux reflected in particular by the imaging means (L1) is deflected from the test path by the filtration element (FLT).