降低彩色濾光片製程中「黑色缺陷」之良率提升研究
To fulfill end-users’ constant requirements, comes the rapid and innovative developments on monitor markets, such as larger panels, lower prices, wider view angles, high color gamut, high contrast, high penetration, High color saturation, etc. No matter what kind of TFT-LCD, it needs Color Filter (CF) for presenting colors. CF is one of the key materials of TFT-LCD; moreover, various demands are been strictly enforced and repeated under the CF production. Among these producing procedures, the Photolithography process of pigment dispersion method has its high reliability, high definition and heat-resistant capacity. It has been widely adopted for producing color filter. Nowadays, as the TV panel becomes larger and the selling price is getting lower, how to get more cost down becomes a main issue. Color Filter, which rates about 20~30% in the overall TFT-LCD cost proportion, definitely needs to be cost down in the first place. Thus simplifying the CF production procedures, buying lower cost materials and reducing production lost are the important subjects. This thesis is focused on the defects in the processes of CF, array and semi-conductor, especially on the Black Defect, one of the top three major factors of causing defects happened in processes. In order to reduce the black defects and get superior yield in the CF process, it is improved through changing the material properties and finding out the best process parameters. This improvement allowed the better efficiency of the overall color filter.