METHODS AND APPARATUS FOR MANUFACTURING SEMICONDUCTORS
A semiconductor device includes an insulator between an electrode and a substrate. For example, the semiconductor device may include an insulated gate component, such as a MOSFET. The insulator is comprised of a material having a relatively high dielectric constant compared to silicon dioxide, such as titanium dioxide. The titanium dioxide is suitably formed by initially depositing titanium nitride. The titanium nitride may be exposed to an oxidizing ambient, such as nitric oxide ambient. The titanium nitride reacts with nitric oxide to form titanium dioxide.