A mechanism is provided in a data processing system for detecting lithographic hotspots. The mechanism receives a design layout. The mechanism generates spatial pattern clips from the design layout. The mechanism performs a transform on the spatial pattern clips to form frequency domain pattern clips. The mechanism performs feature extraction on the frequency domain pattern clips to form frequency domain features. The mechanism utilizes the extracted features on a set of training samples to train a machine learning classifier model. The mechanism classifies a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots.
Please help me write a proper abstract based on the patent claims. CLAIM: 1. A method, in a data processing system, for detecting lithographic hotspots, the method comprising: receiving a design layout; generating spatial pattern clips from the design layout; performing a transform on the spatial pattern clips to form frequency domain pattern clips; performing feature extraction on the frequency domain pattern clips to form frequency domain features; utilizing the extracted features on a set of training samples to train a machine learning classifier model; and classifying a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots. 2. The method of claim 1, wherein generating spatial pattern clips comprises using a sliding window to split the design layout into overlapping windows. 3. The method of claim 1, wherein performing feature extraction comprises extracting a square window of N by N samples from a given frequency domain pattern clip, wherein N is based on a numerical aperture of an imaging lens used in a photolithography process. 4. The method of claim 1, wherein performing feature extraction comprises extracting a frequency domain feature based on a subset of a given frequency domain pattern clip using layer, illumination, and optics information. 5. The method of claim 1, further comprising: training the machine learning classifier model using a support vector machine. 6. The method of claim 5, wherein training the machine learning classifier model comprises: finding a hyperplane w such that features are partitioned using maximum separation. 7. The method of claim 6, wherein finding the hyperplane comprises solving the following quadric equation: min1/2wTw, s.t.:w.v+b≧1,∀vεnonhotspot, w.v+b≦−1,∀vεhotspot, where T is the matrix transpose and b is a constant representing the intercept of the hyperplane with the axes. 8. The method of claim 1, wherein the trained machine learning classifier model comprises a support vector machine or a neural network. 9. The method of claim 1, further comprising: performing resolution enhancement technique optimization or ground rules to fix identified hotspots. 10. A computer program product comprising a computer readable storage medium having a computer readable program stored therein, wherein the computer readable program, when executed on a computing device, causes the computing device to: receive a design layout; generate spatial pattern clips from the design layout; perform a transform on the spatial pattern clips to form frequency domain pattern clips; perform feature extraction on the frequency domain pattern clips to form frequency domain features; utilize the extracted features on a set of training samples to train a machine learning classifier model; and classify a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots. 11. The computer program product of claim 10, wherein generating spatial pattern clips comprises using a sliding window to split the design layout into overlapping windows. 12. The computer program product of claim 10, wherein performing feature extraction comprises extracting a square window of N by N samples from a given frequency domain pattern clip, wherein N is based on a numerical aperture of an imaging lens used in a photolithography process. 13. The computer program product of claim 10, wherein the computer readable program further causes the computing device to: training the machine learning classifier model using a support vector machine. 14. The computer program product of claim 13, wherein training the machine learning classifier model comprises: finding a hyperplane w such that features are partitioned using maximum separation. 15. The computer program product of claim 14, wherein finding the hyperplane comprises solving the following quadric equation: min1/2wTw, s.t.:w.v+b≧1,∀vεnonhotspot, w.v+b≦−1,∀vεhotspot, where T is the matrix transpose and b is a constant representing the intercept of the hyperplane with the axes. 16. An apparatus, comprising: a processor; and a memory coupled to the processor, wherein the memory stores instructions which, when executed by the processor, cause the processor to: receive a design layout; generate spatial pattern clips from the design layout; perform a transform on the spatial pattern clips to form frequency domain pattern clips; perform feature extraction on the frequency domain pattern clips to form frequency domain features; utilize the extracted features on a set of training samples to train a machine learning classifier model; and classify a set of previously unseen patterns, based on frequency domain features of the previously unseen patterns using the trained machine learning classifier model, into hotspots and non-hotspots. 17. The apparatus of claim 16, wherein generating spatial pattern clips comprises using a sliding window to split the design layout into overlapping windows. 18. The apparatus of claim 16, wherein performing feature extraction comprises extracting a square window of N by N samples from a given frequency domain pattern clip, wherein N is based on a numerical aperture of an imaging lens used in a photolithography process. 19. The apparatus of claim 16, wherein the computer readable program further causes the computing device to: training the machine learning classifier model using a support vector machine. 20. The apparatus of claim 19, wherein training the machine learning classifier model comprises: finding a hyperplane w such that features are partitioned using maximum separation by solving the following quadric equation: min1/2wTw, s.t.:w.v+b≧1,∀vεnonhotspot, w.v+b≦−1,∀vεhotspot, where T is the matrix transpose and b is a constant representing the intercept of the hyperplane with the axes.