Jan. 30   2014  2  US 2014/0030643 Al  [0031]  each of n$_{1 }$ and n$_{2 }$ independently is an integer of 1 to  6.  [0032]  [2] The composition according to the above item  [1]  wherein the organic group is an alkyl group or an aryl  group.  [0033]  [3] The composition according to the above item [1]  or [2]  wherein the compound (R) is expressed by general  formula (1 )  and wherein at least one ofR$_{4 }$ and R$_{7 }$ is a hydro› gen atom.  [0034]  [  4] The composition according to the above item  [3]  wherein both of R$_{4 }$ and R$_{7 }$ are hydrogen atoms.  [0035]  [5] The composition according to the above item [1]  or [2]  wherein the compound (R) is expressed by general  formula (2)  and wherein R$_{7 }$ is a hydrogen atom.  [0036]  [6] The composition according to any of the above  items [1] to [5]  wherein the repeating unit (A) is expressed by  general formula (V) or (VI) below.  [0041]  X$_{6 }$ represents  a  single bond   --COO- or  ----CONR$_{64}$- in which R$_{64 }$represents a hydrogen atom or an  alkyl group   [0042]  L$_{6 }$ represents a single bond or an alkylene group   [0043]  Ar$_{6 }$represents a bivalent aromatic ring group   [0044]  Y $_{2}$    when n2:2 each independently  represents a  hydrogen atom or a group that when acted on by an acid  is  cleaved  provided that at least one ofY  $_{2}$s is a group that when  acted on by an acid  is cleaved  and  [0045]  n is an integer of 1 to 4.  [0046]  [7] The composition according to any of the above  items [1] to [6]  wherein the resin (P) further contains any of  repeating units (B) expressed by general formula (I) below.  [0037]  In general formula (V)  each of Rs 1  Rs$_{2 }$ and Rs$_{3 }$ independently represents a hydrogen atom  an alkyl group  a  cycloalkyl group  a halogen atom  a cyano group or an  alkoxycarbonyl group  provided that Rs$_{2 }$may be bonded to Ls  to thereby form a ring  which Rs$_{2 }$ represents an alkylene  group   [0038]  Ls represents a single bond or a bivalent connecting  group  provided that when a ring is formed in cooperation  with Rs$_{2}$    Ls represents a trivalent connecting group  and  [0039]  Rs$_{4 }$ represents an alkyl group  and each ofRss and  Rs$_{6 }$ independently represents a hydrogen atom  an alkyl  group  a cycloalkyl group or a monovalent aromatic ring  group  provided that  Rss  and Rs $_{6 }$may be bonded to each other  to thereby form a ring  and provided that  Rss  and Rs$_{6 }$are not  simultaneously hydrogen atoms.  [0047]  In general formula (I)  each of R$_{41}$  R$_{42 }$and R$_{43 }$ independently represents a hydrogen atom  an alkyl group  a  halogen atom  a cyano group or an alkoxycarbonyl group   [0048]  X$_{4 }$ represents  a  single bond   --COO- or  ----CONR$_{64}$- in which R$_{64 }$represents a hydrogen atom or an  alkyl group   [0049]  L$_{4 }$ represents a single bond or an alkylene group   [0050]  Ar$_{4 }$ represents a (n+l)-valent aromatic ring group   and  [0051]  n is an integer of 1 to 4.  [0052]  [8] The composition according to the above item  [7]  wherein the repeating unit (B) has a hydroxystyrene  structure.  [0053]  [9] The composition according to any of the above  items [1] to [8]  further comprising a basic compound other  than the compound (R).  [0054]  [10] The composition according to the above item  [9]  wherein the basic compound contains no hydroxyl group.  [0055]  [  11] The composition according to any of the above  items [1] to [10] for use in a pattern formation including  exposure by EUV.  [0056]  [12]  An  actinic-ray- or radiation-sensitive resin film  formed from the composition according to any of the above  items [1] to [11].  [0057]  [  13] A method of forming a pattern  comprising:  [0058]  exposing the film according to the above item [12] to  light  and  [0059]  developing the exposed film.  [0060]  [  14] The method according to item [ 13]  wherein the  exposure is carried out by EUV light.  [0061]  [15] A process for manufacturing an electronic  device  comprising the pattern forming method according to  the above item [13] or [14].  [0062]  [16]  An  electronic device manufactured by the pro› cess according to the above item [15].  [0063]  The present invention has made it feasible to pro› vide an actinic-ray- or radiation-sensitive resin composition  that can attain high sensitivity  favorable pattern shape  favor- [0040]  In general formula (VI)  each of R$_{61}$  R$_{62 }$and R$_{63 }$ independently represents a hydrogen atom  an alkyl group  a  cycloalkyl group  a halogen atom  a cyano group or an  alkoxycarbonyl group  provided that R$_{62 }$may be bonded to  Ar$_{6 }$ to thereby form a ring  which R$_{62 }$represents an alkylene  group   (VI)  (V)  (I)  Ri1  Ri3  I  I  --+C-C-t- 1  I  Ri2 Xi  I  L4  I  Ar4  I  (OH)n 