US006368773Bl  (12)  United States Patent  Jung et al.  (10)  Patent No.:  US 6 368 773 Bl  (45)  Date of Patent:  Apr. 9  2002  (54)  PHOTORESIST CROSS-LINKER AND  PHOTORESIST COMPOSITION  COMPRISING THE SAME  (75)  Inventors:  Jae Chang Jung; Keun Kyu Kong;  Myoung Soo Kim; Hyoung Gi Kim;  Hyeong Soo Kim; Ki Ho Baik; Jin  Soo Kim   all of Kyoungki-do  (KR)  (73)  Assignee:  Hyundai Electronics Industries Co.   Ltd. (KR)  ( *)  Notice:  Subject to any disclaimer  the term of this  patent is extended or adjusted under 35  U.S.C. 154(b) by  O  days.  (21)  Appl. No.:  09/448 916  (22)  Filed:  Nov. 24  1999  (30)  Foreign Application Priority Data  (51)  Int. Cl.7  ................................................  G03F 7/027  (52)  U.S. Cl.  ................................  430/281.1;  430/270.1;  430/325  (58)  Field of Search  ........................... 430/270.1  281.1   430/325; 526/271  317.1  333; 568/594   596  Nov. 27  1998  Feb. 22  1999  (KR) ............................................ 98-51355  (KR) ............................................. 99-5823  DE  EP  GB  3714276 Al  0 100 071 A2  695789  11/1988  2/1984  8/1953  (56)  References Cited  U.S. PATENT DOCUMENTS  FOREIGN PATENT DOCUMENTS  OIBER PUBLICATIONS  Academic Press Dictionary of Science and Technology  definitions of acetal  alkyl  carboxylic acid  ester and  ketone.*  2 866 813 A  *  12/1958 McTeer ...................... 260/488  3 468 857 A  9/1969 Graver ...................... 260/80.3  4 562 009 A  *  12/1985 Lysenko et al. ... ... ... 260/465.6  4 579 979 A  *  4/1986 Andrade et al. ............ 568/596  4 607 126 A  *  8/1986 Sajtos ........................ 568/385  5 200 051 A  *  4/1993 Cozzette et al. ............ 204/403  5 290 894 A  *  3/1994 Melrose et al. ............. 526/315  5 645 969 A  *  7/1997 Matsuo et al. .............. 430/165  6 121 399 A  *  9/2000 Webster et al. ............. 525/320  6 184 263  Bl  *  2/2001 Narang et al. ................ 522/11  CA90:138248  Sastre et al Angew. Makromol. Chem. 1978   73  25-33.*  U.S. application No. 09/448 964  Jung et al.  filed Nov. 24   1999.  Chemical Abstract No. 110:96578.  * cited by examiner  Primary Examiner-Rosemary  Ashton  (74)  Attorney  Agent  or  Firm-Townsend and Townsend  and Crew  LLP  The present invention relates to a cross-linker for photoresist  compositions which is suitable for a photolithography pro› cess using KrF (248 mn)  ArF (193 mn)  E-beam  ion beam  or EUV light sources. Preferred cross-linkers  according to  the present invention  comprise a copolymer of (i) a com› pound represented by following Chemical Formula 1 and/or  (ii) one or more compound(s) selected from the group  consisting of acrylic acid  methacrylic acid and maleic  anhydride.  (57)  ABSTRACT  wherein   R$_{1 }$ and  R$_{2 }$ individually represent straight or  branched C$_{1}$_$_{10 }$alkyl  straight or branched C$_{1}$_$_{10 }$ester   straight or branched C$_{1}$ _ $_{10 }$ketone  straight or branched  C$_{1}$ _ $_{10 }$carboxylic acid  straight or branched C$_{1}$ _ $_{10 }$acetal   straight or branched C$_{1}$ _ $_{10 }$alkyl including at least one  hydroxyl group  straight or branched C$_{1}$ _ $_{10 }$ester includ› ing at least one hydroxyl group  straight or branched  C$_{1}$ _ 10  ketone including at least one hydroxyl group   straight or branched C$_{1}$ _ $_{10 }$carboxylic acid including at  least one hydroxyl group  and straight or branched  C$_{1}$ _ $_{10 }$acetal including at least one hydroxyl group; and  R$_{3 }$ represents hydrogen or methyl.  10 Claims  12 Drawing Sheets  <Chemical Formula 1> 