US 9 612 535 B2  302  301  -continued  having a hydroxyl group is 1/99 to 99/1  preferably 10/90 to  90/10  and more preferably 20/80 to 60/40.  As a solvent having a hydroxyl group  alkyleneglycol  monoalkyl ether is preferred  and as a solvent not having a  hydroxyl group  alkyleneglycol monoalkyl ethercarboxylate  is preferred.  [ 6] Basic Compound  The electron beam- or extreme ultraviolet-sensitive resin  composition according to the present invention may further  contain basic compound. The basic compound is preferably  a compound whose basicity is strong compound compared  to phenol. In addition  this basic compound is preferably an  organic basic compound  and more preferably a basic com› pound containing nitrogen.  Basic compound that contains usable nitrogen is not  particularly limited  but for example  the compounds that are  classified into the following (1) to (7) can be used.  (1) Compound represented by Formula (BS-1)  (BS-1)  R  I  R-N-R  In Formula (BS-1)   Each R independently represents a hydrogen atom or an  organic group  provided that at least one of three kinds of R  is an organic group. Such an organic group is a straight or  branched alkyl group  a monocyclic or polycyclic cycloalkyl  group  aryl group or aralkyl group.  The carbon number of an alkyl group as R is not particu› larly limited  but generally 1 to 20  and preferably 1 to 12.  The carbon number of a cycloalkyl group as R is not  particularly limited  but generally 3 to 20  and preferably 5  to 15.  The carbon number of an aryl group as R is not particu› larly limited  but generally 6 to 20  and preferably 6 to 10.  Specifically  a phenyl group  a naphthyl group and the like  are exemplified.  The carbon number of an aralkyl group as R is not  particularly limited  but generally 7 to 20  and preferably 7  to 11. Specifically  a benzyl group and the like are exem- plified.  An alkyl group  a cycloalkyl group  an aryl group and an  aralkyl group R may be groups in which a hydrogen atom is  substituted with a substituent. Examples of the substituent  may include an alkyl group  a cycloalkyl group  an aryl  group  an aralkyl group  a hydroxyl group  a carboxyl group   an alkoxy group  an aryloxy group  an alkylcarbonyloxy  group  an alkyloxycarbonyl group and the like.  Further  the compound represented by Formula (BS-1)  may be a compound in which at least two of Rare preferably  an organic group.  Specific examples of the compound represented by For› mula (BS-1) may include tri(n-butyl)amine  tri-n-pentylam› ine  tri-n-octylamine  tri-n-decyl amine  triisodecyl amine   dicyclohexyl methyl amine  tetradecyl amine  pentadecyl  amine  hexadecyl amine  octadecyl amine  didecyl amine   methyl octadecyl amine  di-methyl undecyl amine  N N-di› methyl-dodecyl amine  methyl di-octadecylamine  N N› dibutyl aniline  N N-dihexyl aniline  2 6-diisopropyl aniline   and 2 4 6-tri (t-butyl) aniline and the like.  Further  as a basic compound represented by Formula  (BS-1)  examples thereof may include an alkyl group in  (PA-16)  OH  O  0  ~1  ..  ..s  0  OH  O  0  ~~1  ..  ..s  0  (PA-17)  ~\/  ..  ..s  0  #  (PA-18)  The compound which decomposes by the action of the  above-described acid to generate an acid may be used alone  or in combination of two or more thereof.  Further  the content of the compound which decomposes  by the action of an acid to generate an acid is preferably 0.1  to 40% by mass  more preferably 0.5 to 30% by mass  and  still more preferably 1.0 to 20% by mass based on the total  solid content of the electron beam- or extreme ultraviolet- sensitive resin composition.  [5] Resist Solvent (a Coating Solvent)  A solvent which may be used for preparing the compo› sition is not particularly limited as long as it can decompose  each component  but examples thereof may include alkyle› neglycol  monoalkyl  ethercarboxylate  (propyleneglycol  monomethylether acetate (PGMEA) (alias: l-methoxy-2- acetoxy propane) and the like)  alkyleneglycol monoalkyl  ether  (propyleneglycol  monomethylether  (PGME;  l-methoxy-2-propanol) and the like)  alkyl ester lactate  (ethyl lactate  lactate methyl and the like)  cyclic lactone  (y-butyrolactone and the like  preferably 4 to 10 carbon  atoms)  chained or cyclic ketone (2-heptanone  cyclo› hexanone and the like  preferably 4 to 10 carbon atoms)   alkylenecarbonate ( ethylene carbonate  propylene carbonate  and the like)  alkyl carboxylate (alkyl acetate such as butyl  acetate is preferred)  alkyl alkoxy acetate (ethyl ethoxypro› pionate) and the like. Examples of other usable solvents may  include solvents described in [0244] and forth of U.S. Patent  Application Publication No. 2008/0248425 Al.  Among the above-described solvents  alkyleneglycol  monoalkylether carboxylate and alkyleneglycol monoalkyl  ether are preferred.  These solvents may be used alone or in combination of  two or more thereof. When two or more solvents are mixed   it is preferred that a solvent having a hydroxyl group is 65  mixed with a solvent not having a hydroxyl group. The mass  ratio of a solvent having a hydroxyl group to a solvent not 