Moral philosophy.

Motivation.

In contemporary moral philosophy, motivational internalism (or moral internalism) is the view that moral convictions (which are not necessarily beliefs, e.g. feelings of moral approval or disapproval) are intrinsically motivating. That is, the motivational internalist believes that there is an internal, necessary connection between one's conviction that X ought to be done and one's motivation to do X. Conversely, the motivational externalist (or moral externalist) claims that there is no necessary internal connection between moral convictions and moral motives. That is, there is no necessary connection between the conviction that X is wrong and the motivational drive not to do X. (The use of these terms has roots in W.D. Falk's (1947) paper "'Ought' and Motivation").  These views in moral psychology have various implications. In particular, if motivational internalism is true, then an amoralist is unintelligible (and metaphysically impossible). An amoralist is not simply someone who is immoral, rather it is someone who knows what the moral things to do are, yet is not motivated to do them. Such an agent is unintelligible to the motivational internalist, because moral judgments about the right thing to do have built into them corresponding motivations to do those things that are judged by the agent to be the moral things to do. On the other hand, an amoralist is entirely intelligible to the motivational "externalist", because the motivational externalist thinks that moral judgments about the right thing to do not necessitate some motivation to do those things that are judged to be the right thing to do; rather, an independent desire—such as the desire to do the right thing—is required (Brink, 2003), (Rosati, 2006).

Reasons.

There is also a distinction in ethics and action theory, largely made popular by Bernard Williams (1979, reprinted in 1981), concerning internal and external reasons for action. An "internal reason" is, roughly, something that one has in light of one's own "subjective motivational set"—one's own commitments, desires (or wants), goals, etc. On the other hand, an "external reason" is something that one has independent of one's subjective motivational set. For example, suppose that Sally is going to drink a glass of poison, because she wants to commit suicide and believes that she can do so by drinking the poison. Sally has an internal reason to drink the poison, because she wants to commit suicide. However, one might say that she has an external reason not to drink the poison because, even though she wants to die, one ought not kill oneself no matter what—regardless of whether one wants to die.  Some philosophers embrace the existence of both kinds of reason, while others deny the existence of one or the other. For example, Bernard Williams (1981) argues that there are really only internal reasons for action. Such a view is called "internalism about reasons" (or "reasons internalism"). "Externalism about reasons" (or "reasons externalism") is the denial of reasons internalism. It is the view that there are external reasons for action; that is, there are reasons for action that one can have even if the action is not part of one's subjective motivational set.  Consider the following situation. Suppose that it's against the moral law to steal from the poor, and Sasha knows this. However, Sasha doesn't desire to follow the moral law, and there is currently a poor person next to him. Is it intelligible to say that Sasha has a reason to follow the moral law right now (to not steal from the poor person next to him), even though he doesn't care to do so? The reasons externalist answers in the affirmative ("Yes, Sasha has a reason not to steal from that poor person."), since he believes that one can have reasons for action even if one does not have the relevant desire. Conversely, the reasons internalist answers the question in the negative ("No, Sasha does not have a reason not to steal from that poor person, though others might."). The reasons internalist claims that external reasons are unintelligible; one has a reason for action only if one has the relevant desire (that is, only internal reasons can be reasons for action). The reasons internalist claims the following: the moral facts are a reason "for Sasha's action" not to steal from the poor person next to him only if he currently "wants" to follow the moral law (or if not stealing from the poor person is a way to satisfy his other current goals—that is, part of what Williams calls his "subjective motivational set"). In short, the reasoning behind reasons internalism, according to Williams, is that reasons for action must be able to explain one's action; and only internal reasons can do this.

Epistemology.

Justification.

Internalism.

Generally speaking, internalist conceptions of epistemic justification require that one's justification for a belief be internal to the believer in some way. Two main varieties of epistemic internalism about justification are access internalism and ontological internalism. Access internalists require that a believer must have internal access to the justifier(s) of her belief "p" in order to be justified in believing "p". For the access internalist, justification amounts to something like the believer being aware (or capable of being aware) of certain facts that make her belief in "p" rational, or her being able to give reasons for her belief in "p". At minimum, access internalism requires that the believer have some kind of reflective access or awareness to whatever justifies her belief. Ontological internalism is the view that justification for a belief is established by one's mental states. Ontological internalism can be distinct from access internalism, but the two are often thought to go together since we are generally considered to be capable of having reflective access to mental states.  One popular argument for internalism is known as the 'new evil demon problem'. The new evil demon problem indirectly supports internalism by challenging externalist views of justification, particularly reliabilism. The argument asks us to imagine a subject with beliefs and experiences identical to ours, but the subject is being systematically deceived by a malicious Cartesian demon so that all their beliefs turn out false. In spite of the subject's unfortunate deception, the argument goes, we do not think this subject ceases to be rational in taking things to be as they appear as we do. After all, it is possible that we could be radically deceived in the same way, yet we are still justified in holding most of our beliefs in spite of this possibility. Since reliabilism maintains that one's beliefs are justified via reliable belief-forming processes (where reliable means yielding true beliefs), the subject in the evil demon scenario would not likely have any justified beliefs according to reliabilism because all of their beliefs would be false. Since this result is supposed to clash with our intuitions that the subject is justified in their beliefs in spite of being systematically deceived, some take the new evil demon problem as a reason for rejecting externalist views of justification.

Externalism.

Externalist views of justification emerged in epistemology during the late 20th century. Externalist conceptions of justification assert that facts external to the believer can serve as the justification for a belief. According to the externalist, a believer need not have any internal access or cognitive grasp of any reasons or facts which make their belief justified. The externalist's assessment of justification can be contrasted with access internalism, which demands that the believer have internal reflective access to reasons or facts which corroborate their belief in order to be justified in holding it. Externalism, on the other hand, maintains that the justification for someone's belief can come from facts that are entirely external to the agent's subjective awareness.  Alvin Goldman, one of the most well-known proponents of externalism in epistemology, is known for developing a popular form of externalism called reliabilism. In his paper, “What is Justified Belief?” Goldman characterizes the reliabilist conception of justification as such:  "If S’s believing "p" at "t" results from a reliable cognitive belief-forming process (or set of processes), then S’s belief in "p" at "t" is justified.”  Goldman notes that a reliable belief-forming process is one which generally produces true beliefs.  A unique consequence of reliabilism (and other forms of externalism) is that one can have a justified belief without knowing one is justified (this is not possible under most forms of epistemic internalism). In addition, we do not yet know which cognitive processes are in fact reliable, so anyone who embraces reliabilism must concede that we do not always know whether some of our beliefs are justified (even though there is a fact of the matter).

As a response to skepticism.

In responding to skepticism, Hilary Putnam (1982) claims that semantic externalism yields "an argument we can give that shows we are not brains in a vat (BIV). (See also DeRose, 1999.) If semantic externalism is true, then the meaning of a word or sentence is not wholly determined by what individuals think those words mean. For example, semantic externalists maintain that the word "water" referred to the substance whose chemical composition is HO even before scientists had discovered that chemical composition. The fact that the substance out in the world we were calling "water" actually had that composition at least partially determined the meaning of the word. One way to use this in a response to skepticism is to apply the same strategy to the terms used in a skeptical argument in the following way (DeRose, 1999):  To clarify how this argument is supposed to work: Imagine that there is brain in a vat, and a whole world is being simulated for it. Call the individual who is being deceived "Steve." When Steve is given an experience of walking through a park, semantic externalism allows for his thought, "I am walking through a park" to be true so long as the simulated reality is one in which he is walking through a park. Similarly, what it takes for his thought, "I am a brain in a vat," to be true is for the simulated reality to be one where he is a brain in a vat. But in the simulated reality, he is not a brain in a vat.  Apart from disputes over the success of the argument or the plausibility of the specific type of semantic externalism required for it to work, there is question as to what is gained by defeating the skeptical worry with this strategy. Skeptics can give new skeptical cases that wouldn't be subject to the same response (e.g., one where the person was very recently turned into a brain in a vat, so that their words "brain" and "vat" still pick out real brains and vats, rather than simulated ones). Further, if even brains in vats can correctly believe "I am not a brain in a vat," then the skeptic can still press us on how we know we are not in that situation (though the externalist will point out that it may be difficult for the skeptic to describe that situation).  Another attempt to use externalism to refute skepticism is done by Brueckner and Warfield. It involves the claim that our thoughts are "about" things, unlike a BIV's thoughts, which cannot be "about" things (DeRose, 1999).

Semantics.

Semantic externalism comes in two varieties, depending on whether meaning is construed cognitively or linguistically. On a cognitive construal, externalism is the thesis that what concepts (or contents) are available to a thinker is determined by their environment, or their relation to their environment. On a linguistic construal, externalism is the thesis that the meaning of a word is environmentally determined. Likewise, one can construe semantic internalism in two ways, as a denial of either of these two theses.  Externalism and internalism in semantics is closely tied to the distinction in philosophy of mind concerning mental content, since the contents of one's thoughts (specifically, intentional mental states) are usually taken to be semantic objects that are truth-evaluable.  See also:

Philosophy of mind.

Within the context of the philosophy of mind, externalism is the theory that the contents of at least some of one's mental states are dependent in part on their relationship to the external world or one's environment.  The traditional discussion on externalism was centered around the semantic aspect of mental content. This is by no means the only meaning of externalism now. Externalism is now a broad collection of philosophical views considering all aspects of mental content and activity. There are various forms of externalism that consider either the content or the vehicles of the mind or both. Furthermore, externalism could be limited to cognition, or it could address broader issues of consciousness.  As to the traditional discussion on semantic externalism (often dubbed "content externalism"), some mental states, such as believing that water is wet, and fearing that the Queen has been insulted, have contents we can capture using 'that' clauses. The content externalist often appeal to observations found as early as Hilary Putnam's seminal essay, "The Meaning of 'Meaning'," (1975). Putnam stated that we can easily imagine pairs of individuals that are microphysical duplicates embedded in different surroundings who use the same words but mean different things when using them.  For example, suppose that Ike and Tina's mothers are identical twins and that Ike and Tina are raised in isolation from one another in indistinguishable environments. When Ike says, "I want my mommy," he expresses a want satisfied only if he is brought to his mommy. If we brought Tina's mommy, Ike might not notice the difference, but he doesn't get what he wants. It seems that what he wants and what he says when he says, "I want my mommy," will be different from what Tina wants and what she says she wants when she says, "I want my mommy."  Externalists say that if we assume competent speakers know what they think, and say what they think, the difference in what these two speakers mean corresponds to a difference in the thoughts of the two speakers that is not (necessarily) reflected by a difference in the internal make up of the speakers or thinkers. They urge us to move from externalism about meaning of the sort Putnam defended to externalism about contentful states of mind. The example pertains to singular terms, but has been extended to cover kind terms as well such as natural kinds (e.g., 'water') and for kinds of artifacts (e.g., 'espresso maker'). There is no general agreement amongst content externalists as to the scope of the thesis.  Philosophers now tend to distinguish between "wide content" (externalist mental content) and "narrow content" (anti-externalist mental content). Some, then, align themselves as endorsing one view of content exclusively, or both. For example, Jerry Fodor (1980) argues for narrow content (although he comes to reject that view in his 1995), while David Chalmers (2002) argues for a two dimensional semantics according to which the contents of mental states can have both wide and narrow content.  Critics of the view have questioned the original thought experiments saying that the lessons that Putnam and later writers such as Tyler Burge (1979, 1982) have urged us to draw can be resisted. Frank Jackson and John Searle, for example, have defended internalist accounts of thought content according to which the contents of our thoughts are fixed by descriptions that pick out the individuals and kinds that our thoughts intuitively pertain to the sorts of things that we take them to. In the Ike/Tina example, one might agree that Ike's thoughts pertain to Ike's mother and that Tina's thoughts pertain to Tina's but insist that this is because Ike thinks of that woman as his mother and we can capture this by saying that he thinks of her as 'the mother of the speaker'. This descriptive phrase will pick out one unique woman. Externalists claim this is implausible, as we would have to ascribe to Ike knowledge he wouldn't need to successfully think about or refer to his mother.  Critics have also claimed that content externalists are committed to epistemological absurdities. Suppose that a speaker can have the concept of water we do only if the speaker lives in a world that contains HO. It seems this speaker could know a priori that they think that water is wet. This is the thesis of privileged access. It also seems that they could know on the basis of simple thought experiments that they can only think that water is wet if they live in a world that contains water. What would prevent her from putting these together and coming to know a priori that the world contains water? If we should say that no one could possibly know whether water exists a priori, it seems either we cannot know content externalism to be true on the basis of thought experiments or we cannot know what we are thinking without first looking into the world to see what it is like.  As mentioned, content externalism (limited to the semantic aspects) is only one among many other options offered by externalism by and large.  See also:

Historiography of science.

Internalism in the historiography of science claims that science is completely distinct from social influences and pure natural science can exist in any society and at any time given the intellectual capacity. Imre Lakatos is a notable proponent of historiographical internalism.  Externalism in the historiography of science is the view that the history of science is due to its social context – the socio-political climate and the surrounding economy determines scientific progress. Thomas Kuhn is a notable proponent of historiographical externalism.

Internalism and externalism are two opposing ways of explaining various subjects in several areas of philosophy. These include human motivation, knowledge, justification, meaning, and truth. The distinction arises in many areas of debate with similar but distinct meanings.

Die Begriffe Externalismus und Internalismus sind philosophische Fachbegriffe, die aus den englischen Begriffen "externalism" und "internalism" in das Deutsche übertragen worden sind. Sie haben je nach Teilgebiet der Philosophie eine eigenständige Bedeutung. Ihre Anwendung findet sich in der Ethik, in der Wissenschaftstheorie, in der Erkenntnistheorie, in der Sprachphilosophie bzw. Semantik sowie in der Philosophie des Geistes. Die Begriffe treten jeweils als Paar auf, mit dem gegensätzliche philosophische Positionen gekennzeichnet werden. Beim Externalismus erhält die jeweils diskutierte Erklärung eines Sachverhalts eine Information oder einen Impuls, der von außen kommt, also nicht in dem Sachverhalt selbst liegt. Umgekehrt bezeichnet der Internalismus etwas, was in der Sache oder dem Untersuchungsgegenstand selbst liegt.


Situations requiring multiple patterning.

There are a number of situations which lead to multiple patterning being required.

Sub-resolution pitch.

The most obvious case requiring multiple patterning is when the feature pitch is below the resolution limit of the optical projection system. For a system with numerical aperture NA and wavelength λ, any pitch below 0.5 λ/NA would not be resolvable in a single wafer exposure. The resolution limit may also originate from stochastic effects, as in the case of EUV. Consequently, 20 nm linewidth still requires EUV double patterning, due to larger defectivity at larger pitches.

Two-dimensional pattern rounding.

It is well-established that dense two-dimensional patterns, which are formed from the interference of two or three beams along one direction, as in quadrupole or QUASAR illumination, are subject to significant rounding, particularly at bends and corners. The corner rounding radius is larger than the minimum pitch (~0.7 λ/NA). This also contributes to hot spots for feature sizes of ~0.4 λ/NA or smaller. For this reason, it is advantageous to first define line patterns, then cut segments from such lines accordingly. This of course, requires additional exposures. The cut shapes themselves may also be round, which requires tight placement accuracy.

Line tip vs. linewidth tradeoff.

The rounding of line tips naturally leads to a tradeoff between shrinking the line width (i.e., the width of the line tip) and shrinking the gap between opposite facing tips. As the line width shrinks, the tip radius shrinks. When the line tip is already less than the point spread function (k~0.6-0.7), the line tip naturally pulls back, increasing the gap between opposite facing tips. The point spread function likewise limits the resolvable distance between the centers of the line tips (modeled as circles). This leads in turn to a tradeoff between reducing cell width and reducing cell height. The tradeoff is avoided by adding a cut/trim mask (see discussion below). Hence, for the EUV-targeted 7nm node, with an 18 nm metal linewidth (k=0.44 for λ=13.5 nm, NA=0.33), the line tip gap of less than 25 nm (k=0.61) entails EUV single patterning is not sufficient; a second cut exposure is necessary.

Different parts of layout requiring different illuminations.

When patterns include feature sizes near the resolution limit, it is common that different arrangements of such features will require specific illuminations for them to be printed.  The most basic example is horizontal dense lines vs. vertical lines (half-pitch < 0.35 λ/NA), where the former requires a North-South dipole illumination while the latter requires an East-West dipole illumination. If both types are used (also known as cross-quadrupole C-Quad), the inappropriate dipole degrades the image of the respective line orientation. Larger pitches up to λ/NA can have both horizontal and vertical lines accommodated by quadrupole or QUASAR illumination, but diagonally spaced features and elbow features are degraded.  In DRAM, the array and periphery are exposed at different illumination conditions. For example, the array could be exposed with dipole illumination while the periphery could use annular illumination. This situation applies to any set of patterns (half-pitch < 0.5 λ/NA) with different pitches or different feature arrangements, e.g., rectangular arrays vs. staggered arrays. Any of the individual patterns is resolvable, but a single illumination cannot be used simultaneously for all of them.  The inclusion of both isolated and dense features is a well-known instance of multi-pitch patterning. Subresolution assist features (SRAFs) have been designed to enable the patterning of isolated features when using illumination tailored for the dense features. However, not all pitch ranges can be covered. In particular, semi-dense features may not be easy to include.

Specific example: hole arrays.

For the specific case of hole arrays (minimum half-pitch < 0.6 λ/NA), three well-known cases require three entirely different illuminations. A regular array generally requires Quasar illumination, while the same array rotated 45 degrees results in a checkerboard array that requires C-quad illumination. Different from both cases, an array with close to triangular or hexagonal symmetry requires hexapole illumination.

Multi-pitch patterns.

Sometimes a feature pattern inherently contains more than one pitch, and furthermore, these pitches are incompatible to the extent that no illumination can simultaneously image both pitches satisfactorily. A common example, again from DRAM, is the brick pattern defining the active regions of the array. In addition to the narrow pitch of the active regions, there is also the pitch between the active region separations or breaks, which is double that of the narrow pitch in the same direction. When the narrow pitch is < λ/NA (but still > 0.5 λ/NA), it cannot be imaged simultaneously with the double pitch due to the focus limitations of the latter. Selective etching, along with SADP or SAQP (to be described below), is the current best approach to achieve the simultaneous patterning of both pitches.

Small deviations from 2-beam interference.

A two-beam interference pattern (half-pitch <0.5 λ/NA) forms a set of regularly spaced lines. Breaks in such lines, e.g., brick patterns, are deviations from the interference pattern. Such breaks generally do not dominate the pattern, and are thus small deviations. These deviations are insufficient to completely offset the constructive or destructive interference of the underlying regular line pattern; sidelobes often result. Line end gaps are easily bridged under dipole illumination. Another mask exposure (usually referred as a cut mask) is therefore necessary to break the line pattern more robustly.

Line cutting.

The earliest implementation of multiple patterning involved line cutting. This first occurred for Intel's 45nm node, for 160 nm gate pitch. The use of a second mask to cut lines defined by a first mask does not help increase feature density directly. Instead it allows definition of features, e.g., brick patterns, which are based on lines spaced at a minimum pitch, in particular, when the lines are near the resolution limit and are generated by the two-beam interference mentioned above. The two-beam interference still dominates the diffraction pattern.  When applying the second mask to cut lines, the overlay relative to the first mask needs to be considered; otherwise, edge placement errors (EPE) may result. If the line pitch is already near the resolution limit, the cut pattern itself may have imaging difficulty, from reduced dose or focus window. In this case, more than one cut mask would have to be used, or else the cut has to extend over more than one line. Self-aligned cutting (to be discussed below) may be a preferred option.

Pitch splitting.

The earliest form of multiple patterning involved simply dividing a pattern into two or three parts, each of which may be processed conventionally, with the entire pattern combined at the end in the final layer. This is sometimes called "pitch splitting", since two features separated by one pitch cannot be imaged, so only skipped features can be imaged at once. It is also named more directly as "LELE" (Litho-Etch-Litho-Etch). This approach has been used for the 20 nm and 14 nm nodes. The additional cost of extra exposures was tolerated since only a few critical layers would need them. A more serious concern was the effect of feature-to-feature positioning errors (overlay). Consequently, the self-aligned sidewall imaging approach (described below) has succeeded this approach.  A "brute force" approach for patterning trenches involves a sequence of (at least) two separate exposures and etchings of independent patterns into the same layer. For each exposure, a different photoresist coating is required. When the sequence is completed, the pattern is a composite of the previously etched subpatterns. By interleaving the subpatterns, the pattern density can theoretically be increased indefinitely, the half-pitch being inversely proportional to the number of subpatterns used. For example, a 25 nm half-pitch pattern can be generated from interleaving two 50 nm half-pitch patterns, three 75 nm half-pitch patterns, or four 100 nm half-pitch patterns. The feature size reduction will most likely require the assistance of techniques such as chemical shrinks, thermal reflow, or shrink assist films. This composite pattern can then be transferred down into the final layer.  This is best described by considering a process example. A first exposure of photoresist is transferred to an underlying hardmask layer. After the photoresist is removed following the hardmask pattern transfer, a second layer of photoresist is coated onto the sample and this layer undergoes a second exposure, imaging features in between the features patterned in the hardmask layer. The surface pattern is made up of photoresist features edged between mask features, which can be transferred into the final layer underneath. This allows a doubling of feature density.  A variation on this approach which eliminates the first hardmask etch is "resist freezing", which allows a second resist coating over the first developed resist layer. JSR has demonstrated 32 nm lines and spaces using this method, where the freezing is accomplished by surface hardening of the first resist layer.  In recent years, the scope of the term 'pitch splitting' has gradually been expanded to include techniques involving sidewall spacers.

Sidewall image transfer.

In spacer patterning, a spacer is a film layer formed on the sidewall of a pre-patterned feature. A spacer is formed by deposition or reaction of the film on the previous pattern, followed by etching to remove all the film material on the horizontal surfaces, leaving only the material on the sidewalls. By removing the original patterned feature, only the spacer is left. However, since there are two spacers for every line, the line density has now doubled. This is commonly referred to as self-aligned double patterning (SADP). The spacer technique is applicable for defining narrow gates at half the original lithographic pitch, for example.  As pitch splitting has become more difficult due to possible differences in feature positions between different exposed parts, sidewall image transfer (SIT) has become more recognized as the necessary approach. The SIT approach typically requires a spacer layer to be formed on an etched feature's sidewall. If this spacer corresponds to a conducting feature, then ultimately it must be cut at no less than two locations to separate the feature into two or more conducting lines as typically expected. On the other hand, if the spacer corresponds to a dielectric feature, cutting would not be necessary. The prediction of how many cuts would be needed for advanced logic patterns has been a large technical challenge. Many approaches for spacer patterning have been published (some listed below), all targeting the improved management (and reduction) of the cuts.  As spacer materials are commonly hardmask materials, their post-etch pattern quality tends to be superior compared to photoresist profiles after etch, which are generally plagued by line edge roughness.  The main issues with the spacer approach are whether the spacers can stay in place after the material to which they are attached is removed, whether the spacer profile is acceptable, and whether the underlying material is attacked by the etch removing the material attached to the spacer. Pattern transfer is complicated by the situation where removal of the material adjacent to the spacers also removes a little of the underlying material. This results in higher topography on one side of the spacer than the other. Any misalignment of masks or excursion in pre-patterned feature critical dimension (CD) will cause the pitch between features to alternate, a phenomenon known as pitch walking.  The positioning of the spacer also depends on the pattern to which the spacer is attached. If the pattern is too wide or too narrow, the spacer position is affected. However, this would not be a concern for critical memory feature fabrication processes which are self-aligned.  When SADP is repeated, an additional halving of the pitch is achieved. This is often referred to as self-aligned quadruple patterning (SAQP). With 76 nm being the expected minimum pitch for a single immersion lithography exposure, 19 nm pitch is now accessible with SAQP.

Self-aligned contact/via patterning.

Self-aligned contact and via patterning is an established method for patterning multiple contacts or vias from a single lithographic feature. It makes use of the intersection of an enlarged feature resist mask and underlying trenches which are surrounded by a pre-patterned hardmask layer. This technique is used in DRAM cells and is also used for advanced logic to avoid multiple exposures of pitch-splitting contacts and vias.  Since 32 nm node, Intel has applied the above-mentioned self-aligned via approach, which allows two vias separated by a small enough pitch (112.5 nm for Intel 32 nm metal) to be patterned with one resist opening instead of two separate ones. If the vias were separated by less than the single exposure pitch resolution limit, the minimum required number of masks would be reduced, as two separate masks for the originally separated via pair can now be replaced by a single mask for the same pair.

Spacer-is-dielectric (SID) SADP.

In self-aligned double patterning (SADP), the number of cut/block masks may be reduced or even eliminated in dense patches when the spacer is used to directly pattern inter-metal dielectric instead of metal features. The reason is the cut/block locations in the core/mandrel features are already patterned in the first mask. There are secondary features which emerge from the gaps between spacers after further patterning. The edge between a secondary feature and the spacer is self-aligned with the neighboring core feature.

2D SID spacer patterning.

The use of SID may be applied to 2D arrays, by iteratively adding features equidistant from the previously present features, doubling the density with each iteration. Cuts not requiring tight positioning may be made on this spacer-generated grid.

Triangular spacer (honeycomb structure) patterning.

Samsung recently demonstrated DRAM patterning using a honeycomb structure (HCS) suitable for 20 nm and beyond. Each iteration of spacer patterning triples the density, effectively reducing 2D pitch by a factor of sqrt(3). This is particularly useful for DRAM since the capacitor layer can be fit to a honeycomb structure, making its patterning simpler.

Self-Aligned Quadruple Patterning(SAQP).

SADP may be applied twice in a row to achieve an effective pitch quartering. This is also known as self-aligned quadruple patterning (SAQP). With SAQP, the primary feature critical dimension (CD), as well as the spacing between such features, are each defined by either the first or second spacer.  It is preferred to have the second spacer define non-conducting features for more flexible cutting or trimming options.

Directed self-assembly (DSA).

The number of masks used for sidewall spacer patterning may be reduced with the use of directed self-assembly (DSA) due to the provision of gridded cuts all at once within a printed area, which can then be selected with a final exposure. Alternatively, the cut pattern itself may be generated as a DSA step. Likewise, a split via layout may be recombined in pairs.  Much progress had been reported on the use of PMMA-PS block copolymers to define sub-20 nm patterns by means of self-assembly, guided by surface topography (graphoepitaxy) and/or surface chemical patterning (chemoepitaxy). The key benefit is the relatively simple processing, compared to multiple exposures or multiple depositions and etching. The main drawback of this technique is the relatively limited range of feature sizes and duty cycles for a given process formulation. Typical applications have been regular lines and spaces as well as arrays of closely packed holes or cylinders. However, random, aperiodic patterns may also be generated using carefully defined guiding patterns.  The line edge roughness in block copolymer patterns is strongly dependent on the interface tension between the two phases, which in turn, depends on the Flory "chi" (χ) parameter. A higher value of χ is preferred for reduced roughness; the interfacial width between domains is equal to 2a(6χ), where a is the statistical polymer chain length. Moreover, χN > 10.5 is required for sufficient phase segregation, where N is the degree of polymerization (number of monomer repeats in the chain). On the other hand, the half-pitch is equal to 2(3/π)aNχ. The fluctuations of the pattern widths are actually only weakly (square root) dependent on the logarithm of the half-pitch, so they become more significant relative to smaller half-pitches.  DSA has not yet been implemented in manufacturing, due to defect concerns, where a feature does not appear as expected by the guided self-assembly.

Other multi-patterning techniques.

There have been numerous concerns that multiple patterning diminishes or even reverses the node-to-node cost reduction expected with Moore's Law. EUV is more expensive than three 193i exposures (i.e., LELELE), considering the throughput. Moreover, EUV is more liable to print smaller mask defects not resolvable by 193i. Some aspects of other considered multi-patterning techniques are discussed below.

Self-aligned triple patterning (SATP).

Self-aligned triple patterning has been considered as a promising successor to SADP, due to its introduction of a second spacer offering additional 2D patterning flexibility and higher density. A total of two masks (mandrel and trim) is sufficient for this approach. The only added cost relative to SADP is that of depositing and etching the second spacer. The main disadvantage of SATP succeeding SADP is that it would only be usable for one node. For this reason, self-aligned quadruple patterning (SAQP) is more often considered. On the other hand, the conventional SID SADP flow may be extended quite naturally to triple patterning, with the second mask dividing the gap into two features.

Tilted ion implantation.

Tilted ion implantation was proposed in 2016 by the University of Berkeley as an alternative method of achieving the same result as spacer patterning. Instead of core or mandrel patterns supporting deposited spacers, an ion masking layer pattern shields an underlying layer from being damaged by ion implantation, which leads to being etched away in a subsequent process. The process requires the use of angled ion beams which penetrate to just the right depth, so as not to damage already processed layers underneath. Also, the ion masking layer must behave ideally, i.e., blocking all ions from passing through, while also not reflecting off the sidewall. The latter phenomenon would be detrimental and defeat the purpose of the ion masking approach. Trenches as small as 9 nm have been achieved with this approach, using 15 keV Ar+ ion implantation at 15-degree angles into a 10 nm thermal SiO masking layer. A fundamental aspect of this approach is the correlation between damage width and damage pitch; both widen at the same time for fixed ion mask height and ion beam angle.

Complementary polarity exposures.

The method of complementary exposures is another way of reducing mask exposures for multiple patterning. Instead of multiple mask exposures for individual vias, cuts or blocks, two exposures of opposing or complementary polarity are used, so that one exposure removes interior portions of the previous exposure pattern. The overlapped regions of two polygons of opposite polarity do not print, while the non-overlapped regions define locations that print according to the polarity. Neither exposure patterns the target features directly. This approach was also implemented by IMEC as two "keep" masks for the M0A layer in their 7nm SRAM cell.

Self-aligned blocking or cutting.

Self-aligned blocking or cutting is currently being targeted for use with SAQP for sub-30 nm pitches. The lines to be cut are divided into two materials, which can be etched selectively. One cut mask only cuts every other line made of one material, while the other cut mask cuts the remaining lines made of the other material. This technique has the advantage of patterning double pitch features over lines at the minimum pitch, without edge placement errors.

EUV Multiple Patterning Possibilities.

Although EUV has been projected to be the next-generation lithography of choice, it could still require more than one lithographic exposure, due to the foreseen need to first print a series of lines and then cut them; a single EUV exposure pattern has difficulty with line end-to-end spacing control. In addition, the line end placement is significantly impacted by photon shot noise.  The existing 0.33 NA EUV tools are challenged below 16 nm half-pitch resolution. Tip-to-tip gaps are problematic for 16 nm dimensions. Consequently, EUV 2D patterning is limited to >32 nm pitch. Recent studies of optimizing the EUV mask features and the illumination shape simultaneously have indicated that different patterns in the same metal layer could require different illuminations. On the other hand, a single exposure only offers a single illumination.  For example, in a cross-pitch source-mask optimization for 7nm node, for 40-48 nm pitch and 32 nm pitch, the quality as determined by the normalized image log slope was insufficient (NILS<2), while only 36 nm pitch was barely satisfactory for bidirectional single exposure.  The underlying situation is that EUV patterns may be split according to different illuminations for different pitches, or different pattern types (e.g., staggered arrays vs. regular arrays). This could apply to line-cutting patterns as well as contact/via layers. It is also likely more than one cut would be needed, even for EUV.  At the 2016 EUVL Workshop, ASML reported that the 0.33 NA NXE EUV tools would not be capable of standard single exposure patterning for the 11-13 nm half-pitch expected at the 5 nm node. A higher NA of 0.55 would allow single exposure EUV patterning of fields which are half the 26 mm x 33 mm standard field size. However, some products, such as NVIDIA's Pascal Tesla P100, will be bisected by the half-field size, and therefore require stitching of two separate exposures. In any case, two half-field scans consume twice as much acceleration/deceleration overhead as a single full-field scan.

Multipatterning Implementations.

Memory patterns are already patterned by quadruple patterning for NAND and crossed quadruple/double patterning for DRAM. These patterning techniques are self-aligned and do not require custom cutting or trim masks. For 2x-nm DRAM and flash, double patterning techniques should be sufficient.  Current EUV throughput is still more than 3x slower than 193 nm immersion lithography, thus allowing the latter to be extended by multiple patterning. Furthermore, the lack of an EUV pellicle is also prohibitive.  As of 2016, Intel was using SADP for its 10 nm node; however, as of 2017, the 36 nm minimum metal pitch is now being achieved by SAQP. Intel is using triple patterning for some critical layers at its 14 nm node, which is the LELELE approach. Triple patterning is already demonstrated in 10 nm tapeout, and is already an integral part of Samsung's 10 nm process. TSMC is deploying 7 nm in 2017 with multiple patterning; specifically, pitch-splitting, down to 40 nm pitch. Beyond the 5 nm node, multiple patterning, even with EUV assistance, would be economically challenging, since the departure from EUV single exposure would drive up the cost even higher. However, at least down to 12 nm half-pitch, LELE followed by SADP (SID) appears to be a promising approach, using only two masks, and also using the most mature double patterning techniques, LELE and SADP.

Patterning costs.

"Ref.: A. Raley et al., Proc. SPIE 9782, 97820F (2016).  Compared to 193i SADP, EUV SADP cost is dominated by the EUV tool exposure, while the 193i SAQP cost difference is from the added depositions and etches. The processing cost and yield loss at a lithographic tool is expected to be highest in the whole integrated process flow due to the need to move the wafer to specific locations at high speed. EUV further suffers from the shot noise limit, which forces the dose to increase going for successive nodes. On the other hand, depositions and etches process entire wafers at once, without the need for wafer stage motion in the process chamber. In fact, multiple layers may be added under the resist layer for anti-reflection or etch hard-mask purposes, just for conventional single exposure.

Leading-edge logic/ASIC multi-patterning practices.

Even with the introduction of EUV technology in some cases, multiple patterning has continued to be implemented in the majority of layers being produced. For example, quadruple patterning continues to be used for 7nm by Samsung. TSMC's 7nm+ process also makes use of EUV in a multi-patterning context. Only a few layers are affected anyway; many remain conventional multi-patterning.

Mask costs.

The mask cost strongly benefits from the use of multiple patterning. The EUV single exposure mask has smaller features which take much longer to write than the immersion mask. Even though mask features are 4x larger than wafer features, the number of shots is exponentially increased for much smaller features. Furthermore, the sub-100 nm features on the mask are also much harder to pattern, with absorber heights ≈70 nm.

Wafer productivity.

"Note: WPM = WPH * # tools * uptime / # passes * 24 hrs/day * 30 days/month. Normalized WPM = WPM/(WPM for EUV 1 pass)"  Multiple patterning with immersion scanners can be expected to have higher wafer productivity than EUV, even with as many as 4 passes per layer, due to faster wafer exposure throughput (WPH), a larger number of tools being available, and higher uptime.

Multiple patterning specific issues.

Multiple patterning entails the use of many processing steps to form a patterned layer, where conventionally only one lithographic exposure, one deposition sequence and one etch sequence would be sufficient. Consequently, there are more sources of variations and possible yield loss in multiple patterning. Where more than one exposure is involved, e.g., LELE or cut exposures for SAQP, the alignment between the exposures must be sufficiently tight. Current overlay capabilities are ≈0.6 nm for exposures of equal density (e.g., LELE) and ≈2.0 nm for dense lines vs. cuts/vias (e.g., SADP or SAQP) on dedicated or matched tools. In addition, each exposure must still meet specified width targets. Where spacers are involved, the width of the spacer is dependent on the initial deposition as well as the subsequent etching duration. Where more than one spacer is involved, each spacer may introduce its own width variation. Cut location overlay error can also distort line ends (leading to arcing) or infringe on an adjacent line.

Mixed patterning methods.

Multiple patterning is evolving toward a combination of multiple exposures, spacer patterning, and/or EUV. Especially with tip-to-tip scaling being difficult in a single exposure on current EUV tools, a line-cutting approach may be necessary. IMEC reported that double patterning is becoming a requirement for EUV.  For line patterning, SADP/SAQP could have the advantage over the EUV exposure, due to cost and maturity of the former approach and stochastic missing or bridging feature issues of the latter. For grid location patterning, a single DUV exposure following grid formation also has the cost and maturity advantages (e.g., immersion lithography may not even be necessary for the spacer patterning in some cases) and no stochastic concerns associated with EUV. Grid location selection has an advantage over direct point cutting because the latter is sensitive to overlay and stochastic edge placement errors, which may distort the line ends.

Industrial adoption.

The evolution of multiple patterning is being considered in parallel with the emergence of EUV lithography. While EUV lithography satisfies 10-20 nm resolution by basic optical considerations, the occurrence of stochastic defects as well as other infrastructure gaps and throughput considerations prevent its adoption currently. Consequently, 7nm tapeouts have largely proceeded without EUV. In other words, the multiple patterning is not prohibitive, but more like a nuisance and growing expense. 5nm may be expected in 2020, with the evolution of multiple patterning and status of EUV considered at that time.

7nm and 5nm FinFETs.

Self-aligned quadruple patterning (SAQP) is already the established process to be used for patterning fins for 7 nm and 5 nm FinFETs. With SAQP, each patterning step gives a critical dimension uniformity (CDU) value in the sub-nanometer range (3 sigma). Among the four logic/foundry manufacturers, only Intel is applying SAQP to the metal layers, as of 2017.

DRAM.

Like NAND Flash, DRAM has also made regular use of multiple patterning. Even though the active areas form a two-dimensional array, one cut mask is sufficient for 20 nm. Furthermore, the cut mask may be simultaneously used for patterning the periphery, and thus would not count as an extra mask. When the active area long pitch is ~3.5 x the short pitch, the breaks in the active area form a hexagonal array, which is amenable to the triangular lattice spacer patterning mentioned above. Samsung has already started manufacturing the 18 nm DRAM.

NAND flash.

Planar NAND flash had several layers which use SADP below 80 nm pitch and SAQP below 40 nm pitch.  3D NAND flash used SADP for some layers. While it does not scale so aggressively laterally, the use of string stacking in 3D NAND would imply the use of multiple patterning (litho-etch style) to pattern the vertical channels.  Typically, for NAND, SADP patterns a set of lines from a core mask, followed by using a trim mask to remove the loop ends, and connecting pads with a third mask.

EUV Multipatterning.

EUV multiple patterning is not ruled out, especially for 5nm node. This is due to the tightening tip-to-tip (T2T) spec, representing the minimum distance between metal line ends. In addition, the distance between cuts must not be too small as to expose portions of lines in between.

Multiple patterning (or multi-patterning) is a class of technologies for manufacturing integrated circuits (ICs), developed for photolithography to enhance the feature density. It is expected to be necessary for the 10 nm and 7 nm node semiconductor processes and beyond. The premise is that a single lithographic exposure may not be enough to provide sufficient resolution. Hence additional exposures would be needed, or else positioning patterns using etched feature sidewalls (using spacers) would be necessary. Even with single exposure having sufficient resolution, extra masks have been implemented for better patterning quality such as by Intel for line-cutting at its 45nm node or TSMC at its 28nm node.

Unter Mehrfachstrukturierung () werden in der Halbleitertechnik verschiedene Strukturierungsverfahren für die Herstellung sehr dichter und feiner Strukturen zusammengefasst. Die meisten Verfahren basieren auf einer fotolithografischen Strukturierung (in der Regel die anspruchsvolle Immersionslithografie) mit doppeltem Abstandmaß (engl. "pitch") der gewünschten Strukturen. Prinzipiell können so die erzielbaren Strukturgrößen gegenüber Einfachstrukturierung halbiert werden; wobei im Fall der Immersionslithografie die erreichbaren Strukturgrößen bereits unterhalb der eigentlichen Auflösungsgrenze der für die Abbildung verwendeten Wellenlänge liegen.


Football at the 2007 South Pacific Games – Men's tournament

Tournament.

The final accredited athlete list at the SPG website shows 10 entered sides. Papua New Guinea, although listed by FIFA as having applied for the 2010 World Cup, did not enter. Tuvalu did enter (although they were not eligible for the World Cup). The group stage draw, undertaken by Tim Cahill, was held on 12 June 2007 in Auckland, New Zealand.  New Caledonia's captain, Pierre Wajoka scored a ninth-minute penalty against Tahiti in the opening fixture of the games, earning him the distinction of being the scorer of the first goal of the 2010 FIFA World Cup qualification process.

Group seedings.

Notes:

Group stage.

Group A.

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Group B.

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Knockout stage.

Final.

"(Note):" The three medallists, New Caledonia, Fiji, and Vanuatu, advanced to the 2008 OFC Nations Cup (together with automatic qualifier New Zealand).

Advancement questions.

Tuvalu.

There remained some uncertainty as to what procedure would occur to Tuvalu advance - as they were not members of FIFA (and therefore did not enter the 2010 FIFA World Cup). While no explicit ruling was communicated on this matter, comments in the press release for the OFC Second Stage draw referred to "nine eligible nations", suggesting that Tuvalu would not have advanced to the OFC Nations Cup regardless of their performance in the South Pacific Games. Had Tuvalu finished in a medal position, the fourth place team would presumably have qualified for the next round of qualifying with the other two medal winners and New Zealand. Tuvalu's early elimination from the competition put an end to any complication over the qualifying process for the next round.  This was the first time ever that a non-FIFA nation has competed in the World Cup. The closest situation in the past was the case of New Caledonia during the 2006 World Cup qualifiers. However, they were at the time in the process of accession to the organisation, and were eliminated from contention for the finals just days before their final admission to the FIFA family.

Papua New Guinea.

Papua New Guinea, having initially entered the 2010 World Cup and indicated their intention to enter the South Pacific Games, were involved in a dispute with their sporting authorities and failed to meet the official accreditation deadline for the South Pacific Games. This meant they were effectively disqualified from the World Cup.

Goalscorers.

There were 110 goals scored in 24 games, for an average of 4.58 goals per game.  Players in bold advanced to the next round.

The 2007 Pacific Games men's football tournament was held at the Toleafoa J.S. Blatter Complex in Apia, Samoa in from 25 August to 7 September 2007.

Bei den XIII. Südpazifikspielen 2007 auf Samoa wurden zwei Wettbewerbe im Fußball ausgetragen. Am Turnier der Männer nahmen zehn, am Turnier der Frauen, welches zum zweiten Mal nach 2003 ausgetragen wurde, neun Mannschaften teil. Alle Spiele wurden in der Zeit vom 25. August bis 7. September 2007 im Toleafoa J. S. Blatter Soccer Stadium in Faleata in der Nähe der Hauptstadt Apia ausgetragen.


Design.

The Austro-Hungarian "Marinekommandant" (Navy Commander), "Vizeadmiral" (Vice Admiral) Maximilian Daublebsky von Sterneck, outlined in a memorandum of 8 September 1884 the requirements for a torpedo cruiser. Such a vessel should have a reinforced bow for ramming as well as torpedoes for attacks on larger warships. The cruisers would also be small and fast enough to undertake patrol and reconnaissance duties. The first two ships of Sterneck's program, the, were built in Britain so the Austro-Hungarian Navy could gain experience building small cruisers. The program was overseen by the naval engineer Siegfried Popper, who was tasked with designing a third cruiser in July 1885, to be built domestically. The "Panther" class provided the basis for the third ship, "Tiger". A commission was convened on 16 September to discuss the parameters for the new cruiser; among the questions were whether the ship would replicate the "Panther"-class ships or it would be an entirely new design. "Konteradmiral" (Rear Admiral) Alexander Eberan von Eberhorst, who headed the commission in charge of the cruiser program, instructed Popper that the commission had decided that the new ship should have a speed of not less than and carry two guns like the "Panther"s, but the ship should be some larger.  The "Marinesektion" (Naval Section of the War Ministry) requested tenders from Stabilimento Tecnico Triestino (STT) and the British shipyard Armstrong, which had built the "Panther". class. The Armstrong proposal incorporated four 12 cm guns and was slightly longer than the "Panther" class, allowing for finer hull lines for less hydrodynamic resistance. STT's design was slightly smaller than "Panther", but was otherwise similar to Armstrong's ship; both firms guaranteed a speed of normally and at forced draft. The navy determined that Armstrong's design would have reduced maneuverability compared to "Panther", and the hull was too lightly built, so the STT proposal was chosen on 16 March 1886. STT received the contract on 25 May, for a price of 780,000 gulden; the contract stipulated a minimum speed of 18 knots, along with a bonus for every one-tenth of a knot over. Popper, who had been in Britain supervising the completion of and, returned to oversee the construction of "Tiger". Before work began, the builders decided to increase the length of the hull slightly to provide more space for the boiler room. Much of the steel used in the hull was domestically produced, but some material was purchased from British steelmakers.

Characteristics.

"Tiger" was long at the waterline and long overall. She had a beam of and a draft of on a displacement of. Her crew numbered 13 officers and 175 men, though this later decreased to a total of 177 officers and men. She was fitted with two pole masts.  The ship's propulsion system consisted of a pair of two-cylinder compound steam engines, with steam provided by four double-ended, coal-fired fire-tube boilers. The engines were ducted into a pair of funnels located amidships. The engines drove two screw propellers. The engines were rated at for a top speed of, though her service speed was from. Storage capacity for coal amounted to. She had a cruising radius of at a more economical speed of.  "Tiger" was armed with four 35-caliber (cal.) guns manufactured by Krupp in single mounts, which were sponsoned, two abreast of the funnels and the other two aft of the main mast. These were supported by a battery of six quick-firing guns and four 47 mm revolver cannon. They were also armed with four torpedo tubes. The torpedo tubes were located singly, in the bow, stern, and at either beam. In 1906, when "Tiger" was converted into a yacht, she was rearmed with just the six 47 mm QF guns.

Service history.

Construction – 1896.

The keel for "Tiger" was laid down at the Stabilimento Tecnico Triestino shipyard in Trieste on 5 October 1886. She was launched on 28 June 1887. Completion of the ship had been delayed by manufacturing problems from the domestic steel supplier, since the initial material sent did not meet the strength requirements. STT rejected it and requested better quality steel; this forced STT to inform the "Marinesektion" on 20 September 1887 that it would not be able to meet its delivery date. After fitting-out work was completed, "Tiger" was ready for sea trials by February 1888. While performing speed tests, she reached a speed of with forced draft and with normal power, earning STT its bonus. The ship then had her guns and torpedo equipment installed. She was commissioned into the fleet in late March. Archduke Charles Stephen of Austria, then ranked a "Fregattenkapitän" (frigate captain) served as the ship's first commander; her first duty was as the flotilla leader of a flotilla of torpedo boats, during the fleet maneuvers from 12 June to 24 July.  The ship took part in the second half of the annual fleet maneuvers from 13 June to 16 July 1889 held off the coast of Dalmatia. The maneuvers tested new tactical developments, including an abandonment of the line ahead formation in favor of an "en echelon" formation in groups of four vessels. She participated in the summer maneuvers in 1890, before departing on a major cruise to northern European waters. The German emperor, Kaiser Wilhelm II, invited the Austro-Hungarian fleet to take part in the annual fleet training exercises in August. "Tiger" joined the ironclads and and the protected cruiser for the trip to Germany, under the command of Rear Admiral Johann von Hinke. While en route, the squadron made visits in Gibraltar and Britain; during the latter stop, the ships took part in the Cowes Regatta, where they were reviewed by Queen Victoria. The ships also stopped in Copenhagen, Denmark and Karlskrona, Sweden. The Austro-Hungarian squadron stayed in Germany from 29 August to 3 September, where they took part in a naval review. During the voyage back to Austria-Hungary, the squadron visited Cherbourg, France and Palermo, Italy. The voyage was considered to be a great success in the Austro-Hungarian Navy. After returning home, "Tiger" was detached from the squadron on 13 October and was decommissioned in Pola on 26 October.  The same pattern as in previous years took place in the following four years, with the exception of 1893, when "Tiger" was not activated for the exercises. During the 1892 maneuvers, "Tiger" led a flotilla of torpedo craft consisting of the torpedo vessels and, the torpedo depot ship, and twelve torpedo boats during the second phase of the exercises. "Tiger" spent the years 1895 and 1896 in reserve status, and during the second year she was thoroughly overhauled, to include her engines and boilers. Her original 47 mm guns were replaced with new 44-cal. versions.

1897–1920.

In February 1897, "Tiger" deployed to Crete to serve in the International Squadron, a multinational force made up of ships of the Austro-Hungarian Navy, French Navy, Imperial German Navy, Italian Royal Navy ("Regia Marina"), Imperial Russian Navy, and British Royal Navy that intervened in the 1897-1898 Greek uprising on Crete against rule by the Ottoman Empire. She arrived as part of an Austro-Hungarian contingent that also included "Kronprinzessin Erzherzogin Stephanie", the armored cruiser, the torpedo cruisers "Leopard" and, three destroyers, and eight torpedo boats, the third-largest contingent in the International Squadron after those of the United Kingdom and the Kingdom of Italy. While operating with the squadron, "Tiger" was anchored off Kissamos when a severe storm threatened to force her ashore. Her crew had to cut the anchor chain loose so she could take shelter off the island of Gramvousa; divers later recovered the anchor. The International Squadron operated off Crete until December 1898, but Austria-Hungary, displeased with the decision to create an autonomous Cretan State under the suzerainty of the Ottoman Empire, withdrew its ships in March 1898. "Tiger" arrived in Pola on 31 March 1898, where she was reduced to reserve. On 29 May 1900, "Tiger" was reactivated, and she was assigned as the flagship of the II Division the following day. She served in this role for three months during the summer training period, before returning to the reserve fleet. In 1901, the navy decided to add bilge keels to the ship to reduce her tendency to roll in heavy seas. In addition, a dynamo, a steam control system, and electric lights were also installed. She participated in the summer training exercises in 1902 and 1903, before returning to reserve status on 15 September 1903. In late 1903, the navy began to consider what would be done with "Tiger", now 15 years old, for the remainder of her career. The navy considered four options in a meeting on 19 February 1904: to keep the ship armed with her original gun battery, to disarm her, to replace them with new 40-cal. versions, or replace them with 7 cm 45-cal. guns. Ultimately, the "Marinesektion" rejected all four proposals, since the ship's boilers were in poor condition by that point. Instead, they decided to convert the ship into an admiralty yacht, since she had little combat value by that time anyway. Additionally, the current yacht, "Pelikan", was to be converted into a depot ship for the torpedo training school. The plan was prepared in June, and the work was to be done at the Pola Naval Arsenal. The conversion work was done in 1905–1906 and she was renamed "Lacroma" on 29 January 1906. Her armament reduced to six 47 mm QF guns and the sponsons for her main battery were removed.  After the work was completed, "Lacroma" underwent sea trials beginning on 9 July 1906. She was thereafter assigned to her role as the yacht for the "Marinekommandant", at that time Admiral Rudolf Montecuccoli. The ship saw no significant service during World War I. In 1915, "Lacroma" was completely disarmed and thereafter used as a barracks ship for German U-boat crews in Pola starting in 1916. After Austria-Hungary's defeat in November 1918, was handed over to the new Royal Yugoslav Navy in 1918. On 5 November, the Italian occupation forces demanded that the entire Yugoslav fleet be handed over, but Rear Admiral Metodije Koch protested the demand to the Allied Naval Council. The council rejected his request to retain control of the fleet and allowed him to retain "Lacroma" only, and only in a disarmed state. This was only a temporary situation, however, as the fate of the former Austro-Hungarian fleet was determined at the Paris Peace Conference. In the postwar division of war prizes, the ship was awarded to Italy, where she was broken up in 1920.

SMS "Tiger" was a torpedo cruiser built for the Austro-Hungarian Navy in the mid-1880s. An enlarged and improved version of the, she was part of a program to build up Austria-Hungary's fleet of torpedo craft in the 1880s. The "Panther" class, purchased from a British shipyard, was acquired in part to gain experience building cruisers of the type; this provided the basis for the design of "Tiger". She was laid down at the Stabilimento Tecnico Triestino shipyard in October 1886, she was launched in June 1887, and was completed in March 1888. The ship was armed with a battery of four guns and three torpedo tubes, and was capable of speeds in excess of.

Die SMS "Tiger der Österreichisch-Ungarischen Marine war ein verbesserter Nachbau der Torpedokreuzer SMS "Panther" und SMS "Leopard". Die in Triest im Inland gebaute SMS "Tiger" wurde anfangs als "Torpedo-Rammkreuzer" bezeichnet, war geringfügig größer als die beiden aus Großbritannien gelieferten Schiffe und hatte eine stärkere Bewaffnung. 1906 wurde sie zur Yacht der Admiralität umgebaut und in SMS "Lacroma, nach einer Insel bei Dubrovnik, umbenannt. 1920 wurde die an die Alliierten ausgelieferte SMS "Lacroma" in Italien abgebrochen.


Life.

Klug was born into a Hamburg working-class family, the first of his parents' three recorded children. His father, Ernst Klug, had grown up far to the south in Vogtland where he had turned down the opportunity to train as a teacher, preferring an apprenticeship as a butcher because, as he put it, "a butcher can always get enough to eat". As a young man, while travelling, Ernst Klug met Emma Lucht in Hamburg. Her family came from nearby Albersdorf, and after a protracted courtship the couple married and set up their home in the Hamburg quarter of Eimsbüttel. The port facilities at Hamburg were booming during the early years of the twentieth century, and by the time Rudolf Klug was born in 1905 his father was working not as a butcher but as a dock worker. Ernst Klug was also active as a trades unionist.  Before he was 9 the First World War had broken out and his father was called away to join the army. In 1916 his younger brother, Ernst-Otto was born, and with the household budget under pressure Rudolf took work as a part-time errand boy, although his mother had to be persuaded to lie about his age for this to be possible. Meanwhile, he moved on from primary to secondary school, hoping to study to become a teacher. His father believed that the option was unaffordable, but his mother took extra work and as he grew older Rudolf also took every opportunity to work during the vacations in order to fund the necessary courses. In 1923 he embarked on a period as a trainee teacher, while continuing to study for the necessary qualification. His pedagogic studies focused, especially, on psychoanalysis and individual psychology. He qualified in 1927 (which was also the year in which his father died following a work accident at the docks) and took a teaching post at the Secondary School in Hamburg's Telemann Street. The co-educational school was considered a progressive establishment with a moderately socialist ethos. His sister later recalled that he developed excellent relationships with the children he taught and was also popular with parents.  With his younger sister, Kati, he started attending a youth club and his political awareness began to develop. While he was considering the need to broaden the access of working class children to education he became a co-founder of the so-called "Proletarische Volksheim-Jugend" organisation. In 1929 Rudolf and Kati joined the Young Communists and the Communist Party itself. They participated in day trips and evening political discussions organised by the party.  Hamburg city politics during the later 1920s, with the Social Democrats and traditional conservative parties losing out to the Communists on the left and, even more starkly, to the Nazis at the other extreme. Rudolf Klug became involved with the "Interests Community of Opposition Teachers" (""Interessengemeinschaft Oppositioneller Lehrer"" / IOL) which was created in 1931 in order to "oppose the dismantling of social rights and achievements in education and the growing risk of fascism". As a popular young teacher who was also a Communist Party activist Rudolf Klug generated mistrust at an increasingly jittery city hall, both among the Nazis and among the traditional conservatives. An investigation hearing was launched in May 1930 after he had been denounced for "creating squads of school children" to "fight against fascism in schools". The allegation concerned not the school where he worked but a nearby school in Rellinger Street (where he had never had any involvement). While the investigations triggered by the complaint were under way the party selected him as a candidate for the 1931 municipal elections and he was dismissed from the teaching service. Pupils and teachers at his own school in Telemann Street, supported by the governors, protested and the Social Democrat chairman of the governors Fritz Köhne succeeded in having him reinstated, but the supervisory school board nevertheless insisted that he be moved to another school, and asked the police to keep an eye on him.  The Nazis took power nationally in January 1933 and lost little time in converting the German state into a one-party dictatorship. Party political activity (unless in support of the Nazi party) became illegal. Early on Klug spoke out in public against the rapid withdrawal of human rights. Under the provisions of the Law for the Restoration of the Professional Civil Service (""Law for the Restoration of the Professional Civil Service"") which had been in force since 7 April 1933 Klug was identified for permanent exclusion from the schools service on 17 June 1933. The law in question is generally cited as a device for removing Jews from public service, but there was also scope for applying it to other public servants, including teachers, who fell out of official favour for non race-based political reasons. Klug's name appeared in an advertisement in several Hamburg which listed a number of teachers "on leave from the schools service" ("""aus dem Schuldienst beurlaubt""").  Klug had already had his apartment searched by police in May 1933, and been arrested while at school, but he had on that occasion been released for lack of evidence. Towards the end of the summer he was arrested again, and on 4 October 1933 condemned to a year in prison for "preparing high treason" (""Vorbereitung zum Hochverrat""). He was imprisoned at Wolfenbüttel till 11 August 1934, after which he was involved in forced labour at a young persons' holiday camp on the Island of Sylt. By the end of 1934 he was back in Hamburg and had taken work with the little coffee trading business set up near the dockside by the former municipal politician Kurt Adams. Two things he had in common with Adams (and with his fellow employees) were that he needed to support himself financially and that he had been deprived of his chosen career for reasons of politics and / or race. Klug's own work involved making deliveries by bicycle. In order to avoid drawing the interest of the authorities, the left-wing IOL, of which he had been a member earlier in the decade, had by now dissolved itself into a number of small and for most purposes isolated cells, but his delivery work nevertheless enabled Klug to keep in touch with political friends and teachers whom he had known in the IOL, as well as parents whom he had known when he was a teacher at the school in Telemann Street. And although his deliveries were officially only of coffee, he also took the opportunities presented to distribute illegal written materials.  Klug was probably subjected to a further arrest in 1935. In April 1937 he was one of around 100 political dissidents caught up in a Gestapo round-up. They were taken to the concentration camp at Sachsenhausen where Klug was held for three months. 1937 was also the year in which, after two years, his marriage to his wife Ilse broke up. On his release Klug returned to Hamburg, shortly afterwards resuming his illegal political activities and supporting himself with casual work. Later he found work as a credit control book keeper in Hamburg's Lurup quarter with an abrasives producer called Christiansen & Co. In 1938 he was interrogated at the city hall by the Gestapo who invited him to tell them about the illegal activities of teachers.  Participating in a political discussion group that masqueraded as an "emigrants' group", Rudolf Klug got to know the book seller Margaretha Kubicki. They married during 1940 and moved into an address at Barmbeker Street 93. Their daughter Anja was born on 18 April 1942.  In 1940 a communist resistance group coalesced in Hamburg around Bernhard Bästlein, Franz Jacob and Robert Abshagen. Rudolf Klug joined them. By the end of 1944 all four men would have been executed. In the world beyond Hamburg, the German invasion of Poland in September 1939 had triggered a wider war across Europe. Rudolf Klug's criminal record made him officially "unworthy for military service". According to his sister he was persuaded by comrades in the Bästlein-Jacob-Abshagen Group to apply to have his "fitness for military service" restored in order that he might join the army and create political opposition to the Nazis inside it. His wife always insisted that the application in question did not come from Klug at all. Either way, he was conscripted, not into the regular army but into a "Landsturm" (regional militia). Here he was trusted to guard prisoners of war.  Still guarding prisoners of war, Klug's final posting was to Narvik in the north of occupied Norway. Here he made contact with prisoners and with a group of Norwegian resistance movement activists. In the context of preparations for the escape of a group of inmates from the prison camp, Klug returned a Soviet officer's pistol that had been confiscated and was being kept in the office. The absence of the pistol was spotted and on 26 February 1944 Rudolf Klug was detained. He managed to escape from his captors, but was betrayed by members of his unit and re-arrested. On 15 March a military court gave him a double death sentence, finding him guilty of both treason during war and of desertion. On 28 March 1944 the sentence was carried out when Rudolf Klug was shot dead just outside Narvik, at Beisfjord.  The military court notified the widow that Klug had been buried "on the spot." The court ordered Margarete not to publish any death notice or obituary about her husband.

Rudolf Klug (8 October 1905 – 28 March 1944) was a Hamburg school teacher. He became a member of the Communist Party in 1928 and suffered from growing levels of harassment at work. When the Nazi Party took power in Germany at the beginning of 1933 his problems greatly intensified: he had already been dismissed from one teaching post, and participated in (now illegal) resistance to the government.

Rudolf Klug (* 8. Oktober 1905 in Hamburg; † 28. März 1944 in Beistfjord/Norwegen) war ein deutscher kommunistischer Pädagoge, Widerstandskämpfer gegen den Nationalsozialismus und NS-Opfer.


Life.

Johannes Bünderlin was born in Linz, Upper Austria and studied at the University of Vienna from 1515–1519 where he learned Hebrew, Greek and Latin, but left without taking a degree as he was unable to afford the tuition. He became a Lutheran preacher in the employ of an Austrian nobleman, but in 1526 received adult baptism as an Anabaptist in Augsburg, where he probably met Hans Denck. From Augsburg Bünderlin went first to Nikolsburg where Anabaptist leader Balthasar Hubmaier was arrested and later tortured and burned as a heretic. After two years, the continued persecution of Anabaptists prompted a move to the more free-thinking city of Strasbourg. Bünderlin was expelled from the city of Constance in 1530 because of his religious views.

Belief.

Bünderlin believed in a two-fold revelation of God, as the living Word in the soul of man, and through external signs and events. He believed that through love, one could realize the inward Word, bring the human will to peace and harmony with God's will and become one with the eternal Spirit. The purpose of religion was to awaken the mind and to direct it to the inward Word.  This union with the Spirit, of living upward toward the divine goodness instead of downward toward individual selfhood is an act of free will that results in Salvation.

Works.

Johannes Bünderlin wrote three books:  "Ein gemayne Berechnung über der Heiligen Schrift Inhalt", etc. ("A General Consideration of the Contents of Holy Scripture.") Printed in Strasbourg in 1529.  "Aus was Ursach sich Gott in die nyder gelassen und in Christo vermenschet ist", etc., 1529. ("For what cause God has descended here below and has become incarnate in Christ.")  "Erklärung durch Vergleichung der biblischen Geschrift, doss der Wassertauf sammt andern äusserlichen Gebräuchen in der apostolischen Kirchen geubet, on Gottes Befelch und Zeugniss der Geschrift, von etlichen dieser Zeit wider efert wird", etc., 1530. ("Declaration by comparison of the Biblical Writings that Baptism with Water, together with other External Customs practised in the Apostolic Church, have been reinstated by some at this time without the Command of God or the Witness of the Scriptures.")

Johannes Bünderlin (b. Linz before 1500 – after 1540) was an Austrian Anabaptist. Bünderlin was a humanist Catholic priest who had been attracted to the Reformation in Moravia and was baptised by Johannes Denck. Bünderlin returned to Linz and preached there until forced to leave for Konstanz in 1529 at the invitation of Johannes Zwick, though Zwick soon considered that Bünderlin was too radical in his ideas and Bünderlin set out for Prussia.

Johannes Bünderlin (auch "Johannes Wunderle", "Hans Wynnderl", "Hans Fischer", "Hans Vischer"; * wohl um 1498/1499; † nach 1539) war ein österreichischer Theologe. Er wandte sich vom katholischen Glauben ab und der Reformation zu. Später schloss er sich der Täuferbewegung an. Schließlich trennte er sich von den Täufern und entwickelte eine eigene spiritualistische Lehre.


Organization.

Before the event.

At the 2008 FEI-General Assembly in Buenos Aires, Argentina, Germany was chosen as the country to host the 2011 European Eventing Championship. Luhmühlen, location of the Luhmühlen Horse Trials, was chosen as the location for the event.  Luhmühlen had held the European Eventing Championships already in the years 1975, 1979, 1987 and 1999.

Event and location.

The European Eventing Championship was opened at the afternoon of Wednesday (August 24, 2011) with the opening ceremony “Ritte des Jahrhunderts” (rides of the century). Also on Wednesday the first horse inspection was held. The sport at the Championship had started on Thursday. On Sunday (August 28, 2011) the event ended with the medal ceremony.  The event was held at the eventing course in the “Westergellerser Heide” near Luhmühlen. Before the 2011 Luhmühlen Horse Trials, two months before the European Championship, the show ground of the course was completely rebuilt.  The main sponsor of the Championship was HSBC. Patroness of the event was German federal minister Ursula von der Leyen.

Competitions.

General.

Unmodified since the first European Eventing Championship (with the exception of the European Championship 1997) two medal rankings are held at the Championships: the individual and the team medal ranking.  Since 2005 the European Championships are held as long format three-day event in the new format without steeplechase: dressage, cross country and show jumping.  Eleven teams and also individual riders started at the 2011 European Eventing Championship, in total 70 riders with their horses started. All teams could start with four riders, also each nation could start two extra individual riders. Germany as host nation could start with one team and eight extra individual riders.

Timetable.

The first part of the competition was the dressage phase, held on Wednesday and on Friday (August 25 and 26, 2011). Before the riders participate at the Championship, a test rider ("guinea pig") rides to test the systems. This task is performed by German eventing rider Anna Siemer with her horse "Charlott".  The second part was the cross country phase on Saturday. The jumping phase, last part of the event, was held on Sunday. The competition was held each day from morning to afternoon.

Results.

Provisional result after dressage.

In the dressage phase Germany was the most successful team. The German team get a team result of 98.70 penalty points - the best dressage result in eventing history.  An important contribution to this result came from Ingrid Klimke with "FRH Butts Abraxxas". With a dressage result of 80.00% (annualised 30.00 penalty points) Klimke get her best ever eventing dressage result. With this result she was the leader of the individual ranking after dressage.  Individual ranking: Team ranking:

Provisional result after cross country.

The cross country day was rainy. The course, built by Mark Phillips was a challenging, but solvable task for the riders: two riders retired at the cross country day, eleven riders was eliminated at the cross country. The Belgian team consisted only of two riders after the cross country and was so no more complete team.  After cross country Germany was still in the lead - despite of the fall of the team rider Andreas Dibowski.  Individual ranking: Team ranking:

Final result.

After the cross country phase, on Sunday morning, the second horse inspection was held. Here the horses of a Spanish and of a Polish team rider were deemed "not fit to compete", so they were eliminated. Because of this the Polish team now consisted only of two riders - not a complete team.  Much changes in the individual ranking result from the show jumping phase. Again the German team was successful, team riders Sandra Auffarth and Michael Jung was clear in the show jumping course. As last rider in the competition Ingrid Klimke start in show jumping phase. Her horse "Abraxxas", who had often faults in show jumping in the past - had six time knocked a rail down in this show jumping course. Klimke, now eleventh in the final ranking, comment time with the words ""Sechs um - so schlecht ist er noch nie gesprungen"" (six down - so bad he had never jumped before).  German rider Michael Jung benefited from this. He hold his result form the dressage phase the whole competition, so he won the individual gold medal. Jung is now the third (after Virginia Leng and Zara Phillips) who is the current world and European eventing champion at the same time. The German team was because of the large gap of penalty points also after the show jumping phase in the lead. So Germany win the 2011 European Eventing team gold medal.  Rank two and three in the final individual ranking are also German eventing riders: young Sandra Auffarth won at their first senior championship individual silver. Bronze was won by Frank Ostholt - he benefited by a refusal of the horse of his wife Sara Algotsson-Ostholt in show jumping.  The riders of the British team had all one obstacle fault in the show jumping phase, so they lost the second place in team ranking. The French team rider had all one faults here, so they won team silver.

The 2011 European Eventing Championship was held from August 25 to August 28, 2011 in Luhmühlen, borough of the Samtgemeinde Salzhausen in Lower Saxony, Germany.

Die Europameisterschaften im Vielseitigkeitsreiten 2011 fanden vom 25. August bis 28. August 2011 im Salzhausener Ortsteil Luhmühlen statt. Es handelte sich hierbei um die 30. Europameisterschaft im Vielseitigkeitsreiten.


Planet.

Budha as a planet appears in various Hindu astronomical texts in Sanskrit, such as the 5th century "Aryabhatiya" by Aryabhatta, the 6th century "Romaka" by Latadeva and "Panca Siddhantika" by Varahamihira, the 7th century "Khandakhadyaka" by Brahmagupta and the 8th century "Sisyadhivrddida" by Lalla. These texts present Budha as one of the planets and estimate the characteristics of the respective planetary motion. Other texts such as "Surya Siddhanta" dated to have been complete sometime between the 5th century and 10th century present their chapters on various planets with deity mythologies.  The manuscripts of these texts exist in slightly different versions, present Budha's motion in the skies, but vary in their data, suggesting that the text were open and revised over their lives. The texts slightly disagree in their data, in their measurements of Budha's revolutions, apogee, epicycles, nodal longitudes, orbital inclination, and other parameters. For example, both "Khandakhadyaka" and "Surya Siddhanta" of Varaha state that Budha completes 17,937,000 revolutions on its own axis every 4,320,000 years, and had an apogee (aphelia) of 220 degrees in 499 CE; while another manuscript of "Surya Siddhanta" increases the revolutions by 60 to 17,937,060, and the apogee to 220 degrees and 26 seconds.  The 1st millennium CE Hindu scholars had estimated the time it took for sidereal revolutions of each planet including Budha, from their astronomical studies, with slightly different results:

Legends.

Budha appears as a deity in Indian texts, often as the son of Soma (moon god, Chandra) and Tara (wife of Bṛhaspati, Jupiter god). The legends of Budha as a deity is not consistent in Hindu "Puranas", and he alternatively is described as the son of goddess Rohini (a daughter of Daksha) and god Soma. By his spouse Ila, Budha had a son, king Pururavas.  One of the earliest mentions of "Budha" as a celestial body appears in the Vedic text "Pancavimsa Brahmana", and it appears in other ancient texts such as the Shatapatha Brahmana as well, but not in the context of astrology. In the ancient texts, Budha is linked to three steps of the Hindu god Vishnu.

Calendar and Hindu astrology.

Budha is the root of the word 'Budhavara' or Wednesday in the Hindu calendar. The word "Wednesday" in the Greco-Roman and other Indo-European calendars is also dedicated to planet Mercury ("day of Woden or Oden").  Budha is part of the Navagraha in Hindu zodiac system, considered benevolent, associated with an agile mind and memory. The role and importance of the Navagraha developed over time with various influences. Deifying planetary bodies and their astrological significance occurred as early as the Vedic period and was recorded in the Vedas. The earliest work of astrology recorded in India is the Vedanga Jyotisha which began to be compiled in the 14th century BCE. It was possibly based on works from the Indus Valley Civilization as well as various foreign influences. Babylonian astrology which was the first astrology and calendar to develop, and was adopted by multiple civilizations including India. The classical planets, including Mercury, were referenced in the Atharvaveda around 1000 BCE.  The Navagraha was furthered by additional contributions from Western Asia, including Zoroastrian and Hellenistic influences. The Yavanajataka, or 'Science of the Yavanas', was written by the Indo-Greeknamed "Yavanesvara" ("Lord of the Greeks") under the rule of the Western Kshatrapa king Rudrakarman I. The Yavanajataka written in 120 CE is often attributed to standardizing Indian astrology. The Navagraha would further develop and culminate in the Shaka era with the Saka, or Scythian, people. Additionally the contributions by the Saka people would be the basis of the Indian national calendar, which is also called the Saka calendar.  Budha is also the root for name for the week day in many other Indian languages. In modern Hindi, Odia, Telugu, Bengali, Marathi, Urdu, Kannada and Gujarati, Wednesday is called "Budhavara"; Tamil: "Budhan kizhamai"; Malayalam: "Budhanazhcha"; Thai: "Wan Phut" ().

Iconography.

Budha's iconography, according to Roshen Dalal, is as a benevolent but a minor male deity with light yellow colored body (or green), draped into yellow clothes, with a chariot made of air and fire, drawn by eight wind horses. He is also represented holding a scimitar, a club and a shield, riding a winged lion in Bhudhan Temple. In other illustrations, he rides a lion and has four arms.  "Budha" has been linguistically related to "Buddha", the founder of Buddhism, though this is controversial

Budha graha () is a Sanskrit word that connotes the planet Mercury. Budha, in puranic Hindu Legends, is also a deity.

Budha ( "m.", wörtlich „Weiser“) ist im Hinduismus eine Personifizierung des gleichnamigen Planeten Budha, der dem Merkur entspricht. Er gehört in der traditionellen indischen Astronomie zu den Navagrahas, den "Neun Planeten", denen im Glaubensleben ebenso wie in der indischen Astrologie Bedeutung zukommt. Sein Name sollte nicht mit dem Buddha, dem Begründer des Buddhismus, verwechselt werden.


Uses.

Catholic Church.

Saint Benedict of Nursia selected this psalm as the first psalm of the solemn office at the Sunday laudes. (Rule of St. Benedict, chapter XII).In a certain number of abbeys which maintain tradition, this Sunday service always begins with it. Saint Benedict also asked to perform this psalm during the laudes of the week (chapter XIII). However, other psalms later replaced Psalm 66 (67), with the exception of Sunday, so that all 150 psalms are read weekly.  Psalm 67 often appears in the Catholic liturgy. It is one of the four invitatory prayers of the daily office, and is recited at the Vespers of Wednesday of the second week, 8 and at the Lauds of the Tuesday of the third week.  It is read at several Masses throughout the year: because of its theme of universality of grace rendered to God, it is proposed on the Friday of the third week of Advent, and in the octave of the nativity of the St. Mary. It is also found on the 20th Sunday of the year A9, the 6th Sunday of Easter of the year C and the Wednesday of the 4th week of Easter.

Anglican Church.

It may be recited as a canticle in the Anglican liturgy of Evening Prayer according to the "Book of Common Prayer" as an alternative to the Nunc dimittis, when it is referred to by its incipit as the Deus misereatur (also A Song of God's Blessing).  One English hymn paraphrase of this psalm is "God of mercy, God of grace" by Henry Francis Lyte, generally sung to the tune "Heathlands" by Henry Smart.

Lutheran Church.

Also of note is Martin Luther's paraphrase, "Es woll uns Gott genädig sein", used particularly in Lutheran churches. In earlier hymnbooks this was set to the old chorale tune "Es wolle Gott uns gnädig sein", but the new Lutheran Service Book also provides a newer tune, "Elvet Banks".

Musical settings.

Musical settings of Psalm 67 were composed by Samuel Adler, Charles Ives and Thomas Tallis.

Psalm 67 is the 67th psalm from the biblical Book of Psalms. In the Greek Septuagint version of the bible, and in its Latin translation in the Vulgate, this psalm is "Psalm 66" in a slightly different numbering system.

Der 67. Psalm (nach griechischer Zählung der 66.) ist ein Psalm aus dem dritten Buch der Psalmen in der Bibel. Er ist der Gattung der Danklieder des Volkes zugehörig.


Early life and education.

Born at Englishton Park, near Lexington, Indiana, William was the son of businessman William Hayden English, and his wife Emma Mardulia Jackson. He was given a middle name after his maternal grandmother Mahala Eastin of Kentucky, whose immigrant ancestor was said to be a French Huguenot, D'Estaing, from southwestern France.  The English family moved to Indianapolis in 1865. His father became active in business and politics, and eventually owned substantial parcels of real estate. There the boy attended public and private schools. He was graduated in 1873 from the law department of the Northwestern Christian University (now Butler University) at Indianapolis.

Law practice and politics.

English was admitted to the bar the same year and set up his practice in Indianapolis. He worked at law until 1882, when he ran for Congress.  English was first elected to office in 1880 as a member of the State house of representatives. That year his father turned over to him management of English's Opera House, which he had just built in Indianapolis. The younger English was interested in theater and had just married an actress, Annie Fox.  English successfully contested as a Democrat the election in 1882 of Stanton J. Peelle to the Forty-eighth Congress; English was eventually seated, serving from May 22, 1884, to March 3, 1885.  He declined to be a candidate for renomination in 1884 and resumed his former business pursuits at Indianapolis. He served as delegate to the Democratic National Conventions in 1892 and 1896, and chairman of the committee on rules and order of business in the former. He left the Democratic Party in 1900 and became active in the Republican Party.  In the Spanish–American War (1896–1898), English served as captain and aide-de-camp on the staff of Gen. Joseph Wheeler.  Re-entering politics, English served as delegate to the Republican National Convention in 1912. He was elected in 1916 to the Indiana State senate. He was reelected in 1920 and again in 1924, serving until his death in Indianapolis, Indiana on April 29, 1926.  He was interred in Crown Hill Cemetery.

William Eastin English (November 3, 1850 – April 29, 1926) was an American attorney and politician, a U.S. Representative from Indiana. He was the son of vice-presidential candidate and businessman, William Hayden English, and his wife Emma Mardulia Jackson.

William Eastin English (* 3. November 1850 bei Lexington, Scott County, Indiana; † 29. April 1926 in Indianapolis, Indiana) war ein US-amerikanischer Politiker. In den Jahren 1884 und 1885 vertrat er den Bundesstaat Indiana im US-Repräsentantenhaus.


Synopsis.

In 1906 Vienna, a young lieutenant Franz (Alain Delon) has an affair with a married baroness, Lena, but decides to put an end to it when he meets Christine (Romy Schneider), a musician's daughter.  Christine is almost engaged to a composer, Binder. But she falls in love with Franz. Franz breaks it off with Lena but Lena's husband, the Baron Eggesdorf, has discovered about the affair.  While Christine and Franz plan their marriage the Baron challenges Franz to a duel. Franz is killed in the duel. Christine commits suicide.

Production.

Charles Spaak was reported as working on the screenplay. At the time of filming, Schneider was one of the most popular stars in Europe, having enjoyed success starring in the "Sissi" film trilogy. "Christine" was an attempt to duplicate this, being aimed more at the French market.  Delon had only just begun his career when he was cast. He and Schneider began a romantic affair that continued on and off for a number of years.

Reception.

The film was the seventeenth most popular film at the French box office in 1958. Before it was "The Ten Commandments", "Les Miserables", "The Cranes Are Flying", "Sissi – Fateful Years of an Empress", "Young Sinners", "Mon Oncle", "The Young Lions", "Girl and the River", "The Possessors", "The Law Is the Law", "Sans famille", "The Vikings", "In Case of Adversity", "Maigret Sets a Trap", "The Cat", and "The Mirror Has Two Faces".

Christine is a 1958 French period drama film, based on the play "" by Arthur Schnitzler. The film was directed by Pierre Gaspard-Huit and the title character was played by Romy Schneider. The cast included Alain Delon as a young lieutenant.

Christine ist ein französisch-italienisches Melodram von Regisseur Pierre Gaspard-Huit aus dem Jahre 1958. Im Mittelpunkt der Handlung, basierend auf Arthur Schnitzlers Schauspiel "Liebelei" (1895), steht ein junges Liebespaar, dessen gemeinsames Glück auf tragische Weise endet. In den Hauptrollen sind Romy Schneider und Alain Delon zu sehen.