.Capacitively coupled plasma (CCP): similar to glow discharge plasmas, but generated with high frequency RF electric fields, typically 13.56 MHz. These differ from glow discharges in that the sheaths are much less intense. These are widely used in the microfabrication and integrated circuit manufacturing industries for plasma etching and plasma enhanced chemical vapor deposition.Inductively coupled plasma (ICP): similar to a CCP and with similar applications but the electrode consists of a coil wrapped around the discharge volume which inductively excites the plasma.Wave heated plasma: similar to CCP and ICP in that it is typically RF (or microwave), but is heated by both electrostatic and electromagnetic means.  Examples are helicon discharge, electron cyclotron resonance (ECR), and ion cyclotron resonance (ICR).  These typically require a coaxial magnetic field for wave propagation.Atmospheric pressure[සංස්කරණය]Arc discharge: this is a high power thermal discharge of very high t