Metal borate thin films have been grown by a variety of techniques, including liquid-phase epitaxy (e.g. FeBO, β‐BaBO), electron-beam evaporation (e.g. CrBO, β‐BaBO), pulsed laser deposition (e.g. β‐BaBO,  Eu(BO)), and atomic layer deposition (ALD). Growth by ALD was achieved using precursors composed of the tris(pyrazolyl)borate ligand and either ozone or water as the oxidant to deposit CaBO, SrBO, BaBO, Mn(BO), and CoBO films.