In photolithography, HMDS is often used as an adhesion promoter for photoresists. Best results are obtained by applying HMDS from the gas phase on heated substrates.
In electron microscopy, HMDS can be used as an alternative to critical point drying during sample preparation.
In pyrolysis-gas chromatography-mass spectrometry, HMDS is added to the analyte to create silylated diagnostic products during pyrolysis, in order to enhance detectability of compounds with polar functional groups.
In plasma-enhanced chemical vapor deposition (PECVD), HMDS is used as a molecular precursor as a replacement to highly flammable and corrosive gasses like SiH, CH, NH as it can be easily handled. HMDS is used in conjunction with a plasma of various gases such as argon, helium and nitrogen to deposit SiCN thin films/coatings with excellent mechanical, optical and electronic properties.