Nanolithography is the technique to pattern materials and build devices under nano-scale. Nanolithography is often used together with thin-film-deposition, self-assembly, and self-organization techniques for various nanofabrications purpose. Many practical applications make use of nanolithography, including semiconductor chips in computers. There are many types of nanolithography, which include:
* Photolithography
* Electron-beam lithography
* X-ray lithography
* Extreme ultraviolet lithography
* Light coupling nanolithography
* Scanning probe microscope
* Nanoimprint lithography
* Dip-Pen nanolithography
* Soft lithography
Each nanolithography technique has varying factors of the resolution, time consumption, and cost. There are three basic methods used by nanolithography. One involves using a resist material that acts as a "mask", known as photoresists, to cover and protect the areas of the surface that are intended to be smooth. The uncovered portions can now be etched away, with the protective material acting as a stencil. The second method involves directly carving the desired pattern. Etching may involve using a beam of quantum particles, such as electrons or light, or chemical methods such as oxidation or Self-assembled monolayers. The third method places the desired pattern directly on the surface, producing a final product that is ultimately a few nanometers thicker than the original surface. To visualize the surface to be fabricated, the surface must be visualized by a nano-resolution microscope, which includes the scanning probe microscopy and the atomic force microscope. Both microscopes can also be engaged in processing the final product.