*Glow discharge plasmas: non-thermal plasmas generated by the application of DC or low frequency RF (<100 kHz) electric field to the gap between two metal electrodes. Probably the most common plasma; this is the type of plasma generated within fluorescent light tubes.
*Capacitively coupled plasma (CCP): similar to glow discharge plasmas, but generated with high frequency RF electric fields, typically 13.56 MHz. These differ from glow discharges in that the sheaths are much less intense. These are widely used in the microfabrication and integrated circuit manufacturing industries for plasma etching and plasma enhanced chemical vapor deposition.
*Cascaded arc plasma source: a device to produce low temperature (≈1eV) high density plasmas (HDP).
*Inductively coupled plasma (ICP): similar to a CCP and with similar applications but the electrode consists of a coil wrapped around the chamber where plasma is formed.
*Wave heated plasma: similar to CCP and ICP in that it is typically RF (or microwave). Examples include helicon discharge and electron cyclotron resonance (ECR).