Supercritical fluids can be used to deposit functional nanostructured films and nanometer-size particles of metals onto surfaces. The high diffusivities and concentrations of precursor in the fluid as compared to the vacuum systems used in chemical vapour deposition allow deposition to occur in a surface reaction rate limited regime, providing stable and uniform interfacial growth. This is crucial in developing more powerful electronic components, and metal particles deposited in this way are also powerful catalysts for chemical synthesis and electrochemical reactions. Additionally, due to the high rates of precursor transport in solution, it is possible to coat high surface area particles which under chemical vapour deposition would exhibit depletion near the outlet of the system and also be likely to result in unstable interfacial growth features such as dendrites. The result is very thin and uniform films deposited at rates much faster than atomic layer deposition, the best other tool for particle coating at this size scale.