Silicon wafers are treated with solutions of electronic-grade hydrofluoric acid in water, buffered water, or alcohol.  One of the relevant reactions is simply removal of silicon oxides:
:SiO  +  4 HF  →  SiF  +  2 HO
The key reaction however is the formation of the hydrosilane functional group.
atomic force microscope (AFM) has been used to manipulate hydrogen-terminated silicon surfaces.