Atomic force microscopy (AFM), a type of scanning force microscopy, was developed for mapping three-dimensional topographical variations in atomic surfaces with high resolution (on the order of fraction of nanometers). AFM was developed to overcome the material conduction limitations of electron transmission and scanning microscopy methods (SEM & STM). Invented by Binnig, Quate, and Gerbe in 1985, atomic force microscopy uses laser beam deflection to measure the variations in atomic surfaces. The method does not rely on the variation in electron conduction through the material, as the scanning tunneling microscope (STM) does, and therefore allow microscopy on nearly all materials, including polymers.
The application of AFM on polymeric surfaces is especially favorable because polymer general lack of crystallinity leads to large variations in surface topography. Surface functionalization techniques such as grafting, corona treatment, and plasma processing increase the surface roughness greatly (compared to the unprocessed substrate surface) and are therefore accurately measured by AFM.