Photoresists are coatings, or oligomers, that are deposited on a surface and are designed to change properties upon irradiation of light. These changes either polymerize the liquid oligomers into insoluble cross-linked network polymers or decompose the already solid polymers into liquid products. Polymers that form networks during photopolymerization are referred to as negative resist. Conversely, polymers that decompose during photopolymerization are referred to as positive resists. Both positive and negative resists have found many applications including the design and production of micro-fabricated chips. The ability to pattern the resist using a focused light source has driven the field of photolithography.